银纳米颗粒/多孔硅复合材料的制备与气敏性能研究

采用双槽电化学腐蚀法以电阻率为10-15 Ω·cm的p型<100>晶向的单晶硅片制备了孔径约为1.5 μm, 孔深约为15-20 μm的p型多孔硅, 并以此多孔硅作为基底采用无电沉积法通过调控沉积时间在其表面沉积了不同厚度的银纳米颗粒薄膜. 采用扫描电子显微镜和X 射线衍射仪表征了银纳米颗粒/多孔硅复合材料的形貌和微观结构, 结果表明银纳米颗粒较均匀的分布于多孔硅的表面上且沉积时间对产物的形貌有重要影响. 采用静态配气法在室温下研究了银纳米颗粒/多孔硅复合材料对NH₃的气敏性能. 气敏测试结果表明沉积时间对产物的气敏性能影响较大. 当沉积时间较短时, 适量银纳米颗粒掺杂的多孔硅复合材料由于其较高的比表面积以及特殊的形貌和结构, 对NH₃气体表现出较高的灵敏度、优良的响应/恢复性能. 室温下, 其对50 ppm 的NH₃气体的气敏灵敏度可以达到5.8左右.     

n型多孔硅光致发光研究

对在无光照条件下,电化学阳极腐蚀方法制备的n型多孔硅进行了光致发光性能研究.在325nm的激发光照射下,多孔硅样品的发光峰在620nm处,其橙红色的发光肉眼可见,并随阳极电流密度与腐蚀时间乘积的增加.先增强,后减弱.其发光峰位置与量子限制效应、表面态及缺陷态有关,发光强度与样品表面深度较浅孔洞所占的面积比成正比.     

氧化钨纳米线-单壁碳纳米管复合型气敏元件的室温NO2敏感性能与机理

利用溶剂热法合成了一维的氧化钨纳米线, 通过掺入适量单壁碳纳米管(SWNT)制备了基于氧化钨纳米线-SWNT 复合结构的室温气敏元件并评价了其对NO₂气体的室温敏感性能. 利用X射线与扫描电子显微镜表征了材料的微结构, 结果表明, 合成的氧化钨纳米线具有单斜的W₁₈O₄₉结构, 复合材料中SWNT被包埋在氧化钨纳米线中间. 气敏性能测试结果表明, 氧化钨纳米线-SWNT复合结构气敏元件在室温下对NO₂气体表现出了高的灵敏度和超快的响应特性; 较低的SWNT掺入量对获得好的气敏性能有利. 分析了基于复合结构材料气敏元件的可能的气敏机理, 认为元件良好的室温敏感性能与SWNT掺入在复合结构材料中引入大量的贯穿气孔和p-n异质结有关.     

硅纳米线/氧化钒纳米棒复合材料的制备与气敏性能研究

采用纳米球光刻和金属辅助刻蚀法以p型单晶硅片制备了硅纳米线阵列, 并以此作为基底, 通过溅射不同时长的金属钒薄膜并进行热退火氧化处理, 制备出硅纳米线/氧化钒纳米棒复合材料. 采用扫描电子显微镜和X射线衍射仪表征了该复合材料的微观特性, 结果表明该结构增大了材料的比表面积, 有利于气体传感, 并且镀膜时间对后续生长的氧化钒纳米棒形貌有明显影响. 采用静态配气法在室温下测试了该复合材料对NO₂的气敏性能, 气敏测试结果表明沉积钒膜的时间对复合材料的气敏性能影响较大. 当选择合适的镀膜时间时, 适量氧化钒纳米棒增加了材料表面积并形成大量pn结结构, 相比纯硅纳米线对NO₂气体的灵敏度有明显提升, 且在室温下表现出优良的选择性. 同时, 对气敏机理做了定性解释, 认为硅纳米线与氧化钒纳米棒之间形成的pn结及能带结构在接触NO₂ 时的动态变化是其气敏响应提升的主要机制.     

矫顽力可调的多孔硅基Fe膜

采用电化学腐蚀法制备了不同多孔度的多孔硅(PS),再通过磁控溅射法在该PS衬底上沉积了一定厚度的Fe膜;并对样品进行了X射线衍射的结构分析、扫描隧道显微技术的表面形貌观察和磁光克尔效应的测量.发现在同一Fe膜厚度下，相对于参考样品硅上的Fe膜，多孔硅上Fe膜的矫顽力更大;同时观察到多孔硅基Fe膜随着PS多孔度的增加，矫顽力相应变大;而对于多孔度相同的多孔硅基样品,随着Fe膜厚度的增加矫顽力却逐步减小.得出了多孔硅特有的海绵状疏松结构能有效调节Fe膜矫顽力大小的结论. 关键词： 多孔硅 海绵状结构 Fe薄膜 矫顽力     

Sn掺杂ZnO薄膜的室温气敏性能及其气敏机理

采用化学气相沉积方法在预制好电极的玻璃基底上制备出Sn掺杂ZnO薄膜和纯ZnO薄膜. 两种样品典型的形貌为四足状ZnO晶须, 其直径约为150-400 nm, 呈疏松状结构. 气敏测试结果显示Sn掺杂ZnO薄膜具有优良的室温气敏性, 并对乙醇具有良好的气敏选择性, 而纯ZnO薄膜在室温条件下对乙醇和丙酮均没有气敏响应. X射线衍射结果表明两种样品均为六方纤锌矿结构. Sn掺杂ZnO样品中没有出现Sn及其氧化物的衍射峰, 其衍射结果与纯ZnO样品对比, 衍射峰向小角度偏移. 光致发光结果表明, Sn掺杂ZnO薄膜与纯ZnO薄膜均出现紫外发光峰和缺陷发光峰, 但是Sn的掺杂使得ZnO的缺陷发光峰明显增强. 将Sn掺杂ZnO样品在空气中退火后, 其室温气敏性消失, 说明Sn掺杂ZnO样品的室温气敏性可能与其缺陷含量高有关. 采用自由电子散射模型解释了Sn掺杂ZnO薄膜的室温气敏机理.     

金刚石膜/多孔硅复合材料的性能表征

提出了一种新颖的多孔硅表面钝化技术,即采用微波等离子体辅助的化学气相沉积（MPCVD）方法在多孔硅上沉积金刚石薄膜。采用原子力显微镜（AFM）、扫描电子显微镜（SEM）、X射线衍射仪（XRD）、拉曼光 谱仪和荧光分光度计对多孔硅及金刚石膜的表面形貌、结构和发光特性进行了表征。结果表明采用微波等离子体化学气相沉积法可在多孔硅基片上形成均匀、致密、性能稳定且对可见光具有全透性的金刚石膜。金刚石膜与多孔硅的复合,大大稳定了多孔硅的发光波长和强度,同时增强了多孔硅的机械强度。     

纳米结构薄膜型气敏传感器的研究进展

薄膜型气敏器件对气体具有探测灵敏度高、响应时间快、制备成本较低、易于小型化等特点,并且适于制备微型传感器,因此成为近年来传感器研究的重点。将纳米结构材料制作成薄膜型气敏传感器,具有常规传感器不可替代的优点：纳米结构构成的固体材料具有庞大的界面,提供了大量气体通道,从而大幅度提高了灵敏度和降低了工作温度,并可缩小传感器的尺寸。文章主要介绍了当前国内外纳米结构薄膜型气敏传感器的研究现状,概述了几种常见的纳米结构单元薄膜的气敏特性,扼要地分析了今后纳米薄膜型传感器的研究趋势。     

纳米结构薄膜型气敏传感器的研究进展

薄膜型气敏器件对气体具有探测灵敏度高、响应时间快、制备成本较低、易于小型化等特点,并且适于制备微型传感器,因此成为近年来传感器研究的重点。将纳米结构材料制作成薄膜型气敏传感器,具有常规传感器不可替代的优点:纳米结构构成的固体材料具有庞大的界面,提供了大量气体通道,从而大幅度提高了灵敏度和降低了工作温度,并可缩小传感器的尺寸。文章主要介绍了当前国内外纳米结构薄膜型气敏传感器的研究现状,概述了几种常见的纳米结构单元薄膜的气敏特性,扼要地分析了今后纳米薄膜型传感器的研究趋势。     

氧化钨纳米线气敏传感器的制备及其室温NO_2敏感特性

纳米结构的氧化钨有高比表面积和气体吸附能力,在气体传感器领域得到了广泛研究.本文采用磁控溅射金属钨薄膜和两步热氧化工艺在二氧化硅衬底上生长出氧化钨纳米线.通过改变第二步氧化温度,研究退火温度对氧化钨纳米线气敏特性的影响.采用扫描电子显微镜、X射线衍射仪、X射线光电子能谱分析仪和透射射电子显微镜表征材料的微观特性和晶体结构,利用静态配气法测试气敏性能.研究结果表明,经过退火处理后氧化钨纳米线密度略微降低,300℃比400℃退火后的氧化钨结晶性差,对应的表面态含量多,有利于室温气体敏感性.测试NO_2的气敏性能,经过对比得出300℃退火温度下制备的氧化钨纳米线在室温下表现出较很好的气敏响应,对6 ppm(1 ppm=10~(-6))NO_2达到2.5,对检测极限0.5 ppm NO_2响应达1.37.氧化钨纳米线在室温下表现出反常的P型响应,是因为氧化钨纳米线表面被氧气吸附形成反型层,空穴取代电子成为主要载流子所致.     

The light-enhanced NO2 sensing properties of porous silicon gas sensors at room temperature

The NO2 gas sensing behavior of porous silicon（PS） is studied at room temperature with and without ultraviolet（UV） light radiation.The PS layer is fabricated by electrochemical etching in an HF-based solution on a p ＋-type silicon substrate.Then,Pt electrodes are deposited on the surface of the PS to obtain the PS gas sensor.The NO2 sensing properties of the PS with different porosities are investigated under UV light radiation at room temperature.The measurement results show that the PS gas sensor has a much higher response sensitivity and faster response-recovery characteristics than NO2 under the illumination.The sensitivity of the PS sample with the largest porosity to 1 ppm NO2 is 9.9 with UV light radiation,while it is 2.4 without UV light radiation.We find that the ability to absorb UV light is enhanced with the increase in porosity.The PS sample with the highest porosity has a larger change than the other samples.Therefore,the effect of UV radiation on the NO2 sensing properties of PS is closely related to the porosity.     

Pulsed laser deposition of tungsten and tungsten oxide thin films with tailored structure at the nano- and mesoscale

Nanostructured thin films synthesized by assembling atoms or clusters present a structure characterized by a modulation at the nanoscale and by a large effective area, which can be exploited for the tailoring of specific structural or electronic properties. These systems are appealing for functional applications, e.g. in sensing and catalysis. We have investigated the deposition of tungsten and tungsten oxide thin films with a wide range of morphologies by exploiting nanosecond pulsed laser deposition (PLD) in an inert background atmosphere (He, Ar and Kr). We show that the non-dimensional ratio of the target-to-substrate distance to the time integrated visible plume length, which depends on the gas mass and pressure and on the substrate position, permits to select morphologies ranging from a compact structure with a density similar to bulk, to a film with an open, low density foam-like mesostructure and a high fraction of voids.     

The light-enhanced NO₂ sensing properties of porous silicon gas sensors at room temperature

The NO2 gas sensing behavior of porous silicon(PS) is studied at room temperature with and without ultraviolet(UV) light radiation.The PS layer is fabricated by electrochemical etching in an HF-based solution on a p +-type silicon substrate.Then,Pt electrodes are deposited on the surface of the PS to obtain the PS gas sensor.The NO2 sensing properties of the PS with different porosities are investigated under UV light radiation at room temperature.The measurement results show that the PS gas sensor has a much higher response sensitivity and faster response-recovery characteristics than NO2 under the illumination.The sensitivity of the PS sample with the largest porosity to 1 ppm NO2 is 9.9 with UV light radiation,while it is 2.4 without UV light radiation.We find that the ability to absorb UV light is enhanced with the increase in porosity.The PS sample with the highest porosity has a larger change than the other samples.Therefore,the effect of UV radiation on the NO2 sensing properties of PS is closely related to the porosity.     

钒掺杂W18O49纳米线的室温p型电导与NO2敏感性能

钨氧化物纳米线在高灵敏度低功耗气体传感器中极具应用潜力, 且通过掺杂改性可进一步显著改善其敏感性能. 本文以WCl₆为钨源, NH₄VO₃为掺杂剂, 采用溶剂热法合成了钒掺杂的W₁₈O₄₉纳米线. 利用扫描电镜、透射电镜、X射线衍射、X射线光电子能谱仪表征了纳米线的微结构, 并利用静态气敏性能测试系统评价了掺杂纳米线的NO₂敏感性能. 研究结果表明: 五价钒离子受主掺杂进入氧化钨晶格结构, 抑制了纳米线沿轴向的生长并导致了纳米线束的二次集聚; 室温下, 钒掺杂W₁₈O₄₉纳米线接触NO₂气体后表现出反常的p型响应特性; 随工作温度逐渐升高至约110 ℃时, 发生从p型到n型的电导特性转变; 该掺杂纳米线气敏元件对浓度低至80 ppb (1 ppb=10^-9) 的NO₂气体具有明显的室温敏感响应和良好的响应稳定性. 分析并探讨了钒掺杂W₁₈O₄₉纳米线的高室温敏感特性及其p-n电导转型机理, 认为钒掺杂W₁₈O₄₉纳米线在室温下的良好敏感响应及反常p型导电性与掺杂纳米线表面高密度非稳表面态诱导的低温气体强吸附有关. 关键词： 氧化钨 纳米线 气体传感器 室温灵敏度     

Ellipsometry investigation of the effects of annealing temperature on the optical properties of indium tin oxide thin films studied by Drude-Lorentz model

Float glass substrates covered by high quality ITO thin films (Balzers) were subjected for an hour to single thermal treatments at different temperature between 100 °C and 600 °C. In order to study the electric and optical properties of both annealed and not annealed ITO-covered float glasses, ellipsometry, spectrophotometry, impedance analysis, and X-ray measurements were performed. Moreover, variable angle spectroscopic ellipsometry provides relevant information on the electronic and optical properties of the samples. ITO film is modeled as a dense lower layer and a surface roughness layer. The estimated optical density for ITO and the optical density of the surface roughness ITO layer increases with the annealing temperature. In the near-IR range, the extinction coefficient decreases while the maximum of the absorption in the near UV range shift towards low photon energy as the annealing temperature increases. Spectrophotometry was used to estimate the optical band-gap energy of the samples. The thermal annealing changes strongly the structural and optical properties of ITO thin films, because during the thermal processes, the ITO thin film absorbs oxygen from air. This oxygen absorption decreases the oxygen vacancies therefore the defect densities in the crystalline structure of the ITO thin films also decrease, as confirmed both by ellipsometry and X-ray measurements.     

衬底温度和硼掺杂对p型氢化微晶硅薄膜结构和电学特性的影响

以B₂H₆为掺杂剂,采用射频等离子体增强化学气相沉积技术在玻璃衬底上制备p型氢化微晶硅薄膜.研究了衬底温度和硼烷掺杂比对薄膜的微结构和暗电导率的影响.结果表明：在较高的衬底温度下很低的硼烷掺杂比即可导致薄膜非晶化;在实验范围内,随着衬底温度升高薄膜的晶化率单调下降,暗电导率先缓慢增加然后迅速下降,变化趋势与硼烷掺杂比的影响极为相似.最后着重讨论了p型氢化微晶硅薄膜的生长机理. 关键词： p型氢化微晶硅薄膜 衬底温度 晶化率 电导率     

Improvement in electrical and photovoltaic properties of a-Si/c-Si heterojunction with slanted nano-columnar amorphous silicon thin films for photovoltaic applications

The flat a-Si and slanted nanocolumnar (S-nC) a-Si thin films were prepared on c-Si and corning glass substrates by e-beam physical vapor deposition (EB-PVD) technique. The structural properties of all the grown thin films were determined by X-Ray Diffraction (XRD) analysis and Raman spectroscopy. Surface and cross-sectional morphology of a-Si/c-Si and S-nC a-Si/c-Si heterojunctions were investigated by Field Emission Scanning Electron Microscopy (FE-SEM). Sculptured thin films demonstrate potential for significant nanoscale applications in the area of thin film technology. The electrical and photovoltaic properties of these heterojunctions have been investigated by means of dc current–voltage (I–V) measurements at room temperature in dark and light conditions. The S-nC STFs' performance has been found to be improvable on changing the morphology of the thin film. We have found that, the porous morphology of this structure improves the photosensitivity features in photovoltaic devices and solar cell technology. We gained a high open voltage value, such as 900 mV in S-nC a-Si/c-Si thin film, without any doping process.     

Ni,Fe离子掺杂对Ge-Sb-Se薄膜的结构与性能影响研究

采用低温烧结靶材，以电子束蒸发方法制备了掺Fe和掺Ni的Ge-Sb-Se薄膜，所制备的薄膜均为p型半导体.用AFM，UV-VIS，Hall和阻抗分析仪研究了薄膜的形貌、结构和性能.研究表明薄膜形成时的成膜离子活性大、掺杂元素与系统本征元素电负性间差值小以及一定的热处理后，薄膜的网络结构相对较完整，网络畸变较小，缺陷也较少.掺杂Fe，Ni既可参与Ge-Sb-Se薄膜成键，影响网络结构的完整性；也会在费米能级附近引入缺陷态密度，增加了对载流子跃迁的陷阱作用.与Fe掺杂相比，Ni掺杂使薄膜具有较完整的网络结构，较低的中性悬挂键浓度和在交变电场下可具有较少的极化子产生，相应粗糙度较小、光学带隙较宽、载流子迁移率较高、载流子浓度较低和薄膜介电损耗较小. 关键词： Fe Ni掺杂 低温烧结靶材 Ge-Sb-Se薄膜     

Mn-Na共掺ZnO非极性薄膜的结构及其光电磁性能研究

非极性方向生长的ZnO基多量子阱消除了量子限域Stark效应, 可以提高光电器件的发光效率. 据此我们采用脉冲激光沉积方法(PLD)在r面蓝宝石衬底上生长了高质量的a面(1120)单一取向非极性Zn(Mn,Na)O薄膜. X射线衍射(XRD)、场发射扫描电子显微镜(FE-SEM)、Hall测试、X射线光电子能谱(XPS)等测试结果表明: 衬底温度和生长气压对Zn(Mn,Na)O薄膜的非极性生长影响很大, 在600℃和0.02 Pa条件下实现了Mn-Na共掺, 得到了高结晶质量并具有良好光电性能的非极性Zn(Mn,Na)O薄膜. 此外, 我们还利用超导量子干涉仪(SQUID)研究了Zn(Mn,Na)O薄膜的生长取向对其室温铁磁性能的影响规律, 并对引起磁性变化的机理进行了讨论.