热蒸发法Zn／ZnO叶状微米结构自组装生长及其发光特性

采用热蒸发法在ZnO缓冲层覆盖着Si衬底上合成了2D叶状的Zn晶枝结构,Zn的晶枝长度约为几十微米,厚度约为200nm,随后Zn晶枝在O2的气氛下热处理,在晶枝表面获得纤细、均匀的ZnO纳米线。晶枝按照无催化、自组装、汽相生长模式生长,晶枝最快生长方向是沿着载气气流的方向释放凝固潜热,XRD分析结果结果显示了Zn纳米线具有六角纤锌矿结构,Zn/ZnO的发光谱显示,在380nm处有一弱的UV近带边发射和中心在505nm处的强绿光发射,绿光发射归因于施主/受主对之间的辐射跃迁。     

热蒸发法制备ZnO纳米棒阵列

氩气氛常压下，利用热蒸发法，在无催化剂、无ZnO预沉积层的硅衬底上制备了取向良好，排列整齐的ZnO纳米棒阵列．在距Zn源不同位置的Si衬底上得到了不同形貌的样品．硅衬底置于锌源正上方是得到取向一致的ZnO纳米阵列的一个关键性条件．用场发射扫描电子显微镜、X射线粉末衍射表征样品表面形貌、晶体结构．进一步研究了样品的生长机制和荧光性质．     

用电子束热蒸发技术制备ZnO薄膜

本文报道了用电子束热蒸发技术制备ZnO薄膜,薄膜具有(002)取向,通过电子扫描显微镜确认晶粒大小在150nm左右,现有的薄膜在525nm处有强的光致发光。     

电阻热蒸发镀膜与电子束蒸发镀膜对纳米球刻蚀方法制备二维银纳米阵列结构的影响

在使用纳米球刻蚀法制备二维银纳米点阵的过程中,使用不同的镀膜方法在同样的模板上得到了不同形貌的银纳米阵列结构.使用电阻热蒸发镀膜方法获得了六角排列的银纳米三角形阵列结构,使用电子束蒸发镀膜方法则获得了六角排列的银纳米环阵列结构.研究表明,沉积纳米粒子的粒径、表面纳米曲率效应和热能是形成不同结构形貌的纳米阵列结构的关键因素. 关键词： 银纳米阵列 电阻热蒸发 电子束蒸发 纳米球刻蚀     

氧化锌纳米棒的生长过程研究

利用高分子聚乙烯吡咯烷酮(PVP)和乙酸锌的配合物作为前驱体,在300 ℃温度下煅烧,并制备了氧化锌纳米棒。生成的产物用XRD,TEM,SAED等测试方法进行了表征。为了研究氧化锌纳米棒的生长过程,我们通过控制制备前驱体所需原料的比例不变,改变在300 ℃温度下煅烧的时间,分别为0.5, 3, 12和24 h,来观察生成产物的形貌特征。实验发现在110 ℃温度下干燥的前驱体中已经有氧化锌微晶生成;在300 ℃温度下煅烧0.5 h后就出现了明显的由几个纳米大小的微晶所组成的氧化锌纳米棒;煅烧3 h后的产物是结构非常完整的径直单晶ZnO纳米棒;12和24 h煅烧前驱体生成的ZnO纳米棒长度有所增加,ZnO的量基本保持不变。实验发现氧化锌的生长是沿着c轴方向,但是在横向也有生长方向。     

CdS纳米带和纳米锯的热蒸发法的合成和光学性质研究

利用氢气辅助的一步热蒸发法,在镀有金膜的硅片上制备出大量的CdS纳米结构. CdS纳米结构由纤锌矿结构的CdS纳米带和纳米锯组成. 研究表明沉积温度对CdS纳米结构的形貌和尺寸具有重要影响. 用气-液-固和气-固复合生长机理解释了CdS纳米结构的形成过程.光致发光测试表明CdS纳米带和纳米锯均发射出波长为512 nm的很强的绿色发光峰,对应于CdS的带-带跃迁. 同时对CdS纳米结构的光波导性质也进行了观察和讨论.     

溶液法制备氧化锌晶体的微结构及发光特性研究

以醋酸锌和六次甲基四胺为原料在不同的溶液环境中,采用水热法或热溶液法合成了不同形貌的微纳氧化锌。氧化锌形貌和尺寸的控制对合成环境有强烈的依赖。通过化学吸附将乙二胺四乙酸二钠和柠檬酸吸附在氧化锌的极性面上,可以抑制极性面的晶体生长,调控氧化锌的晶体形貌。这种选择吸附性导致了样品形貌的不同。拉曼光谱测试结果表明,在柠檬酸溶液中合成的氧化锌的晶粒更小。光致发光光谱测试结果表明,所得到的氧化锌的发光是激子和缺陷发光。

     

氧化锌纳米线的场发射

热蒸发法在硅基底上制备了任意取向的氧化锌纳米线阵列。经过热蒸发过程，硅基底表面覆盖了大量均匀分布的氧化锌岛，在这些岛上生长出了直径为几十纳米的非定向纳米线。出于实用考虑，基底周围的温度在制备过程中保持在500°C以下。从这些氧化锌纳米线获得了场发射。测得10μA/cm2所对应的开启场强为3.0V/μm。并且用透明阳极技术研究了发射中心分布。观察到场发射来自于整个样品表面。从这些结果可以看出氧化锌纳米线在平板显示器中有着巨大的应用潜力.     

氧化锌晶体的水热法生长及性能表征

报道以块状氧化锌陶瓷为培养料,KOH、LiOH和H2O2的混合水溶液为矿化剂体系,采用水热法生长出尺寸为30mm×38mm×8mm的氧化锌晶体。氧化锌晶体 c(0001)和-c(0001)方向的生长速度分别为0.17,0.09mm/day。 c面的颜色为浅绿色,而-c面的颜色为深褐色。在室温下测得 c面的载流子浓度为104cm-3,电阻率为80Ω·cm,迁移率为100cm2/V·s。晶体(0001)面的双晶摇摆曲线的FWHM为45arc-sec。对氧化锌晶体 c面在室温条件下的光致发光谱和吸收光谱进行了测试分析。     

导流型热蒸发沉积制备微球表面聚酰胺酸涂层

在自行研制的导流型热蒸发沉积装置上开展了微球表面聚酰胺酸（PAA）涂层制备工艺研究。探讨了单体原料处理和改变升温过程对沉积速率的影响。两种单体分别采用两个相互独立的蒸发源加热蒸发,使用两个晶振膜厚测量探头,通过对膜厚探头、样品盘和导流管端头三者的空间位置和对称关系的调整和实验标定,实现了两种单体近似等化学计量比的沉积。采用间歇性压电振动或敲击配合样品盘的旋转作为微球运动的激励方式,在聚-α-甲基苯乙烯（PAMS）微球上制备出均匀的表面质量好的PAA涂层。     

Control of ZnO nanowire arrays by nanosphere lithography (NSL) on laser-produced ZnO substrates

Nanosphere lithography (NSL) is a successful technique for fabricating highly ordered arrays of ZnO nanowires typically on sapphire and GaN substrates. In this work, we investigate the use of thin ZnO films deposited on Si by pulsed laser deposition (PLD) as the substrate. This has a number of advantages over the alternatives above, including cost and potential scalability of production and it removes any issue of inadvertent n-type doping of nanowires by diffusion from the substrate. We demonstrate ordered arrays of ZnO nanowires, on ZnO-coated substrates by PLD, using a conventional NSL technique with gold as the catalyst. The nanowires were produced by vapor phase transport (VPT) growth in a tube furnace system and grew only on the areas pre-patterned by Au. We have also investigated the growth of ZnO nanowires using ZnO catalyst points deposited by PLD through an NSL mask on a bare silicon substrate.     

ZnO Nanobelts and Hollow Microspheres Grown on Cu Foil

采用低温热蒸发法在铜箔衬底上制备了大量ZnO纳米带、空心微米球和“海胆”状球．采用XRD、激光拉曼光谱仪、SEM和荧光光谱仪分别对ZnO纳米结构的微结构、形貌和光致发光性质进行研究．分析表明,纳米带的宽度大约为500 nm且长度超过10μm,而空心微米球的直径为5～10μm;ZnO纳米结构的发光主要是较强的蓝绿缺陷态发光,以及弱的紫外带隙态发光．铜衬底上ZnO纳米结构的制备使得ZnO纳米结构和导电衬底之间具有良好黏着性和电接触性．     

Fabrication and photoluminescence of P doped ZnO nanobelts by thermal evaporation method

Uniform and flat single crystal ZnO:P nanobelts (NBs) were fabricated on Si (1 0 0) substrates by the thermal evaporation method. The growth process, free-catalyst self-assembly vapor-solid (V-S) mechanism, was described and investigated deeply in terms of thermodynamics and kinetics. Then, the photoluminescence (PL) properties of ZnO NBs were studied in a temperature range from 10 to 270 K. At 10 K the recombination of acceptor-bound exciton (A⁰X) was predominant in the PL spectrum, and was attributed to the transition of P_Zn−2V_Zn complex bound exciton. The active energy of A⁰X and acceptor binding energy were calculated to be 17.2 and 172 meV, respectively. The calculated acceptor binding energy of P doped ZnO nanostructure is in good agreement with that of P doped ZnO film.     

Formation of hierarchical ZnO nanostructures “nanocombs”: Growth mechanism, structural and optical properties

ZnO nanocombs have been fabricated in high yield via a thermal evaporation process on Si(1 1 1) substrate by using metallic zinc powder and oxygen as source materials for zinc and oxygen, respectively, without the use of catalyst or additives at low-temperature. Morphological investigations revealed that the nanocombs were grown in high density over the whole substrate surface. The branches (teeth) of the nanocombs are uniform and nicely attached along one side of the ribbon-like stem and are arranged in a proper manner. X-ray diffraction patterns confirmed that the grown nanostructures were single-crystalline and possessed a wurtzite hexagonal phase. Room-temperature photoluminescence (PL) spectrum of the grown nanostructures is exhibit a dominant, sharp and strong UV emission with a suppressed deep-level emission indicating good crystallinity and optical properties for the as-grown ZnO nanocombs.     

Growth and characterization of thin ZnO films deposited on glass substrates by electrodeposition technique

Electrodeposition technique was used in order to produce nanometric zinc oxide films on glass insulating substrates. The effect of electrolyte concentration and applied current density on the formation and growth of electrodeposited Zn thin films in aqueous solutions of ZnSO₄ were studied. After a thermal oxidation, a characterization of the structural morphology of the films deposited was carried out by optical microscopy (OM), atomic force microscopy (AFM), scanning electron microscopy (SEM) and by grazing incidence X-rays diffraction (GIXD). These characterization techniques show that the grains size of the films after oxidation at temperature 450 °C is between 5 and 15 nm, as well as the structure is polycrystalline nature with several orientations. UV/vis spectrophotometry confirms that it is possible to obtain transparent good ZnO films with an average transmittance of approximately 80% within the visible wavelength region, as well as the optical gap of obtained ZnO films is 3.17 eV.