本征GaAs量子阱中电子自旋扩散输运的时-空分辨吸收光谱研究

发展了一种时-空分辨圆偏振光抽运-探测光谱及其理论,并用于本征GaAs量子阱中电子自旋扩散输运的实验研究.获得室温下本征GaAs量子阱中的“自旋双极扩散系数”为D_as=37.5±15 cm²/s.此结果比用自旋光栅法测量到的掺杂GaAs量子阱中电子自旋扩散系数小.解释为是由于“空穴库仑拖曳”效应减慢了电子自旋波包的扩散输运. 关键词： 时-空分辨抽运-探测光谱 电子自旋扩散 GaAs量子阱     

Cd0.96Zn0.04Te光致载流子动力学特性的太赫兹光谱研究

采用光抽运-太赫兹探测技术研究Cd_0.96Zn_0.04Te的载流子弛豫和瞬:态电导率特性.在中心波长800 nm的飞秒抽运光激发下,Cd_0.96Zn_0.04Te的载流子弛豫过程用单指数函数进行了拟合,其载流子弛豫时间长达几个纳秒,且在一定光激发载流子浓度范围内随光激发载流子浓度的增大而减小,这与电子-空穴对的辐射复合有关.在低.光激发载流子浓度(4.51×10¹⁶—1.81×10¹⁷ cm^-3)下,Cd_0.96Zn_0.04Te的太赫兹(terahertz,THz)瞬态透射变化率不随光激发载流子浓度增大而变化,主要是由于陷阱填充效应造成的载流子损失与光激发新增的载流子数量近似.随着光激发载流子浓度继续增大(1.81×10¹⁷—1.44×10¹⁸ cm^-3),THz瞬态透射变化率随光激发载流子浓度的增大而线性增大,是由于缺陷逐渐被...     

内嵌InAs量子点的δ掺杂GaAs/AlxGa1-xAs二维电子气特性分析

采用分子束外延技术对δ掺杂GaAs/Al_xGa_1-xAs二维电子气(2DEG)样品进行了生长. 在样品生长过程中, 分别改变掺杂浓度(N_d)、空间隔离层厚度(W_d) 和Al_xGa_1-xAs中Al组分(x_Al)的大小, 并在双温(300 K, 78 K)条件下对生长的样品进行了霍尔测量; 结合测试结果, 分别对N_d, W_d及x_Al与GaAs/Al_xGa_1-xAs 2DEG的载流子浓度和迁移率之间的关系规律进行了细致的分析讨论. 生长了包含有低密度InAs量子点层的δ掺杂GaAs/Al_xGa_1-xAs 2DEG 样品, 采用梯度生长法得到了不同密度的InAs量子点. 霍尔测量结果表明, 随着InAs量子点密度的增加, GaAs/Al_xGa_1-xAs 2DEG的迁移率大幅度减小, 实验中获得了密度最低为16×10⁸/cm²的InAs量子点样品. 实验结果为内嵌InAs量子点的δ掺杂GaAs/Al_xGa_1-xAs 2DEG的研究和应用提供了依据和参考. 关键词： 二维电子气 InAs量子点 载流子浓度 迁移率     

自旋密度光栅和本征GaAs量子阱中的电子自旋双极扩散

为研究空穴对自旋极化电子扩散的影响,提出用自旋密度光栅方法来观察电子自旋扩散过程。由飞秒激光在本征GaAs多量子阱中激发产生瞬态自旋光栅和瞬态自旋密度光栅,并用于研究电子自旋扩散和电子自旋双极扩散。实验测得自旋双极扩散系数Das ＝25.4 cm 2/s,低于自旋扩散系数Ds ＝113.0 cm 2/s,表明自旋密度光栅中电子自旋扩散受到空穴的显著影响。     

赝配GaAs/In0.2Ga0.8As量子阱导带不连续量的C-V和电容瞬态测量

分别采用二种不同方法测量分子束外延(MBE)生长GaAs/In_0.2Ga_0.8As单量子阱结构的导带不连续量ΔE_c:1) 考虑样品界面电荷修正的电容-电压(C-V)分布；2) 量子阱载流子热发射产生的电容瞬态(DLTS).C-V测得的ΔE_c=0.227eV,大约相当于89% ΔE_g.DLTS测得的ΔE_c=0.229eV,大约相当于89.9% ΔE_g.结果 关键词：     

多晶SiGe栅量子阱pMOSFET阈值电压模型

本文基于多晶SiGe栅量子阱SiGe pMOSFET器件物理,考虑沟道反型时自由载流子对器件纵向电势的影响,通过求解泊松方程,建立了p+多晶SiGe栅量子阱沟道pMOS阈值电压和表面寄生沟道开启电压模型.应用MATLAB对该器件模型进行了数值分析,讨论了多晶Si_1-yGe_y栅Ge组分、Si_1-xGe_x量子阱沟道Ge组分、栅氧化层厚度、Si帽层厚度、沟道区掺杂浓度和 关键词： 多晶SiGe栅 寄生沟道 量子阱沟道 阈值电压     

近800 nm波长张应变GaAsP/AlGaAs量子阱激光器有源区的设计

张应变GaAs_1-xP_x量子阱是高性能大功率半导体激光器的核心有源区,基于能带结构分析优化其结构参数具有重要的应用指导意义.首先,基于6×6 Luttinger-Kohn模型,采用有限差分法计算了张应变GaAs_1-xP_x量子阱的能带结构,得到了第一子带间跃迁波长固定为近800 nm时的阱宽-阱组分关系,即随着阱组分x的增加,需同时增大阱宽,且阱宽较大时靠近价带顶的是轻空穴第一子带lh₁,阱宽较小时靠近价带顶的是重空穴第一子带hh₁.计算并分析了导带第一子带c₁到价带子带lh₁和hh₁的跃迁动量矩阵元.针对808 nm量子阱激光器,模拟计算了阈值增益与阱宽的关系,得到大阱宽有利于横磁模激射,小阱宽有利于横电模激射.进一步考虑了自发辐射和俄歇复合之后,模拟计算了808 nm量子阱激光器的阱宽与阈值电流密度的关系,阱宽较大时载流子对高能级子带的填充使得阈值电流密度增加,而阱宽较小时则是低的有源区光限制因子导致阈值电流密度升高,因此存在一最佳的阱宽-阱组分组合,可使阈值电流密度达到最小.本文的模拟结果可对张应变GaAs_1-xP_x量子阱激光器的理论分析和结构设计提供理论指导.     

载流子导引的折射率变化偏振相关性研究

分析了载流子浓度、张应变量大小、量子阱阱宽和量子阱垒区材料组分对量子阱结构TE模和TM模折射率变化的影响.综合调配以上参数得到1530—1570 nm波长范围内同时具有大的折射率变化量(10^-2量级)和折射率变化低偏振相关(10^-4量级)的量子阱结构.研究表明,不同的调配参数组合可以得到同一波长范围内基本一致的折射率变化谱.     

GaAs体材料及其量子阱的光学极化退相特性

采用飞秒时间分辨瞬态简并四波混频技术，在室温下测量了GaAs体材料及其量子阱材料GaAs/Al_0.3Ga_0.7As的光学极化超快退相时间，当激光中心波长为785nm，受激载流子浓度为10¹¹cm^-2时，它们的退相时间分别为28fs和46fs.量子阱材料的退相时间比体材料的长，这是由于量子阱中的载流子在垂直于GaAs/AlGaAs界面的运动受到限制，运动呈现二维特性，大大减小了载流子的散射概率.实验中观察到瞬态简并四波混 关键词： 时间分辨简并四波混频 飞秒激光脉冲 退相 密度矩阵     

Gd3+/Y3+共掺对Nd:CaF2晶体光谱性能的影响

通过坩埚下降法生长了系列共掺Nd,Gd:CaF₂和Nd,Y:CaF₂晶体, 研究了Gd³⁺/Y³⁺共掺对Nd³⁺光谱性能以及Nd:CaF₂晶体晶胞参数的影响规律. 对于0.5 at.%Nd, x at.%Gd(x=2,5,8,10):CaF₂系列晶体, 当调控Gd³⁺掺杂浓度为2 at.%时, 具有最大的荧光寿命499 μs; 当Gd³⁺掺杂浓度为5 at.%时, 具有最大的吸收截面1.47×10^-20 cm², 最大的发射截面1.9×10^-20 cm²; 当Gd³⁺掺杂浓度为8 at.%时, 具有最佳的发射带宽29.03 nm. 对于0.6 at.%Nd, xat.%Y(x=2, 5, 8, 10):CaF₂系列晶体, Y³⁺掺杂浓度为5 at.%时, 有最大的吸收截面2.41×10^-20 cm², 最大的发射截面3.17×10^-20 cm²; 当Y³⁺掺杂浓度为10 at.%时, 具有最长的荧光寿命359.4 μs,并且具有最大发射带宽26 nm.     

用非相干光时间延迟四波混频测量二极扩散系数

报道了用非相干光时间延迟四波混频测量二极扩散系数的理论计算,测得CdS:Cu的二极扩散系数为0.3cm²/s,并与PbS超微粒子的测量结果进行了比较。     

Implantation doping of germanium with Sb,As, and P

The ions of Sb, As, and P have been implanted into germanium at energies ranging from 200 keV to 700 keV. Annealing was performed at 400°C, 550°C, and 650°C. The doping profile was determined by differentialCV-measurements. Strong outdiffusion (80%) and diffusion into the bulk material was observed after annealing. The remaining doping concentration and the diffusion constants were determined by a computer fit at 650°C. We foundD _Sb=1.8×10⁻¹³ cm²/s,D _As=9×10⁻¹⁴ cm²/s andD _P=4×10⁻¹⁴ cm²/s. Lower values of the diffusion constant were determined when the samples were covered with a SiO₂ layer.     

Extremely fast ambipolar diffusion in n-i-p-i doping superlattices investigated by an all-optical pump-and-probe technique

We report on investigations of the ambipolar diffusion process in n-i-p diodes and n-i-p-i doping superlattices performed by a new all-optical pump-and-probe technique. This new technique allows not only the determination of the ambipolar diffusion coefficient but also the spatially resolved investigation of the stationary distribution of the optically-induced excess carriers. The n-i-p-i doping superlattice exhibited an extremely large ambipolar diffusion coefficient in the range of 10⁴cm²s⁻¹. The ambipolar diffusion coefficient of the n-i-p and n-i-p-i structure was demonstrated not to be a constant but a function of the charge carrier density. This strongly affects the spatial distribution of the excess carriers especially in the large signal regime (density of photo-generated carriers much larger than dark carrier concentration). The spatial distribution of the carriers in the small as well as in the large signal case can be understood theoretically if the real dependence of the ambipolar diffusion coefficient on the carrier density is taken into account.     

硅的低温电学性质

本文在20°—300°K研究了室温载流子浓度2×10¹²—1×10²⁰cm^-3含硼或磷(砷)Si的电学性质。对一些p-Si样品用弱场横向磁阻法及杂质激活能法进行了补偿度的测定,并进行了比较。从霍尔系数与温度关系的分析指出,对于较纯样品,硼受主能级的电离能为0.045eV,磷施主能级为0.045eV,在载流子浓度为10¹⁸—10¹⁹cm^-3时发现了费米简并,对载流子浓度为2×10¹⁷—1×10¹⁸cm^-3的p-Si及5×10¹⁷—4×10¹⁸cm^-3的n-Si观察到了杂质电导行为。从霍尔系数与电导率计算了非本征的霍尔迁移率。在100°—300°K间,晶格散射迁移率μ满足关系式AT^-a,其中A=2.1×10⁹,α=2.7(对空穴);或A=1.2×10⁸,α=2.0(对电子)。另外,根据我们的材料(载流子浓度在5×10¹¹—5×10²⁰cm^-3间),分别建立了一条电阻率与载流子浓度及电阻率与迁移率的关系曲线,以提供制备材料时参考之用。     

A simple measure of the ionic diffusion coefficient in the mixed conductor Cu3VS4

A simple method with three electrodes has been used to measure the diffusion coefficient of the mobile Cu⁺ ion in the mixed conductor Cu₃VS₄ on the basis of the ambipolar diffusion theory. By this method we find that the diffusion coefficient is about 1×10⁻⁷ cm²/s at 300K with an activation energy of 0.44eV.     

Elektronenverluste in einem abklingenden Wasserstoffplasma

The time dependence of the electron density in the afterglow period of an electrodeless discharge in hydrogen was measured by means of 4- and 8-mm microwave interferometry. An exponential decay was observed in the late afterglow permitting the evaluation of a time constant in the density range from 10¹²–10¹⁰ electrons per cm³. The decay time of the plasma was influenced by the discharge conditions. Electron losses could be explained by ambipolar diffusion and attachment to impurities. Two diffusion coefficients were found correlated to the discharge duration. The mobility value H₀=10.1±1.0 cm²/V · sec calculated from the diffusion coefficient found for short discharge pulses agrees with Saporoschenkos mobility value μ₀=10.2 cm²/V · sec for the H ₃ ⁺ -ion. A second mobility value μ₀=14.8±1.2cm²/V · sec found for longer discharge pulses might refer to the H⁺-ion.     

The ground-state rotational constants of silane

From thirty-nine combination difference equations we have determined three significant ground-vibronic state constants of silane: β ⁰/hc=2·85941 cm^-1, γ ⁰/hc=-3·82×10^-5 cm^-1 and ε ⁰/hc=-7·97×10^-7 cm^-1 or in Hecht's notation B ₀=2·85941 cm^-1, D _s=3·82×10^-5 cm^-1 and D _t=2·436×10^-6 cm^-1.     

Surface diffusion of lead on tungsten

Field electron microscopy is used to study the surface diffusion of lead on tungsten. A simple method to measure rough values of the diffusion coefficient and its dependence on sub-monolayer coverage is described and tested. In the region around (001) the displacement energy found is about 1.30 eV/atom up to 10¹⁵ atoms/cm² where it decreases to 0.78 eV/atom. In the residual region except (110) this energy at 1.5×10¹⁴ atoms/cm² is 1.22 eV/atom, it decreases at 4 × 10¹⁴ atoms/cm² to 0.61 eV/atom and increases at 10¹⁵ atoms/cm² to 0.78 eV/atom. Corresponding values of the diffusion coefficient D and of the preexponential D₀ are given. The dependence of D on submonolayer coverage is discussed.     

Ni-15%Mo合金熔体热物理性质的Monte Carlo模拟

采用EAM势对6×6×6的Ni-15%Mo合金熔体进行Monte Carlo模拟,通过对不同温度下获得的NVT系统的平衡态统计分析得出Ni-15%Mo合金熔体在过冷态和过热态时的热物理性质.通过构造系统生成新表面,表面张力做功使系统能量发生改变,从而得到液态表面张力的模拟结果.Ni-15%Mo合金熔体的表面张力在1500—2000 K的温度范围内,随温度的变化规律为σ=1.918-1.130×10^-3（T-T_m） N/m 关键词： Monte Carlo模拟 表面张力 比热 Ni-15%Mo合金     

Thermal stability and radiation hardness of SiC-based schottky-barrier diodes

Pt/W/Cr/SiC Schottky-barrier diodes that retain good electrophysical parameters up to 450°C are studied. With the Auger electron spectroscopy (AES) method, it is shown that the thermal stability is provided by using a multilayer metal composition that ensures the metal/SiC interface stability. The surface-barrier structures obtained are tested for radiation hardness. They are irradiated by fast neutrons with a fluence of 4.42×10¹⁵ n/cm² and attendant γ radiation with a dose of 8.67×10⁵ R in the concentration range of N _d-N _a=10¹⁶−5×10¹⁷ cm⁻³. Irreversible modifications of the structures at N _d-N _a≤8×10¹⁶ cm⁻³ are found. The degradation of the parameters is inversely proportional to the doping level.