Effect of Ta buffer and NiFe seed layers on pulsed-DC magnetron sputtered Ir20Mn80/Co90Fe10 exchange bias

A systematic investigation has been done on the correlation between texture, grain size evolution and magnetic properties in Ta/Ni₈₁Fe₁₉/Ir₂₀Mn₈₀/Co₉₀Fe₁₀/Ta exchange bias in dependence of Ta buffer and NiFe seed layer thickness in the range of 2-10 nm, deposited by pulsed DC magnetron sputtering technique. A strong dependence of 〈1 1 1〉 texture on the Ta/NiFe thicknesses was found, where the reducing and increasing texture was correlated with exchange bias field and unidirectional anisotropy energy constant at both NiFe/IrMn and IrMn/CoFe interfaces. However, a direct correlation between average grain size in IrMn and H_ex and H_c was not observed. L1₂ phase IrMn₃ could be formed by thickness optimization of Ta/NiFe layers by deposition at room temperature, for which the maximum exchange coupling parameters were achieved. We conclude finally that the coercivity is mainly influenced by texture induced interfacial effects at NiFe/IrMn/CoFe interfaces developing with Ta/NiFe thicknesses.     

Exchange Interactions in NiFe/Ta/IrMn Heterostructures under Conditions of Tantalum Deficiency

Physics of the Solid State - In the NiFe/Ta/IrMn structures, the contributions of two types of exchange interactions at the NiFe/IrMn interface, partially separated by sections of the nonmagnetic...     

Tunnel Мagnetoresistive Еlements for Magnetic Field Sensors

Technical Physics - We have developed technology for manufacturing chains of CoFe/Al2O3/NiFe tunnel magnetoresistive (TMR) elements with pinning on the IrMn antiferromagnetic layer. We have studied...     

TaN underlayers for spin valves deposited directly on top of Si substrates

TaN underlayers for spin valves were studied, which were deposited directly on top of Si substrates. The experimental results obtained with the TaN underlayer were compared with those obtained with other (Ta, Mo, and MoN) underlayers. The spin valve structure was Si/Underlayer(tÅ)/NiFe(21 Å)/CoFe(28 Å)/Cu(22 Å)/CoFe(18 Å)/IrMn(65 Å)/Ta(25 Å). The TaN underlayer for a spin valve element exhibited good adhesion to the Si substrate. The XRD patterns of the annealed TaN on bare Si substrate at 900 °C showed no Ta silicide phases, which suggests that the TaN layer may also be used as a diffusion barrier between Si substrate and the ensuing spin valve active layers, as well as an underlayer. A spin valve element having TaN underlayer deposited directly on top of a Si substrate showed a high MR ratio of about 8.3% after annealing at 200 °C. It is concluded that it is advantageous to use a TaN underlayer if one wants to fabricate spin valve elements directly on top of Si substrates.     

O2 plasma oxidation effect on magnetic properties of spin valves

The use of nano-oxide to improve the performance of spin valves has been extensively studied. But most of the investigations so far have been carried out on different samples. This may make some of the conclusions drawn from the experiments inconsistent because of the fluctuation in deposition conditions and device structures. In this work, the effect of nano-oxide on the properties of spin valves has been investigated through post-growth oxidation of the same sample in oxygen plasma for different rf powers and durations. The sample investigated was a bottom spin valve with the structure Si/SiO₂/Ta/NiFe/IrMn/CoFe/Cu/CoFe/Ta. A relative increase of 20% and 12% was obtained in the giant magnetoresistance (GMR) ratio of as-deposited and annealed samples, respectively. It was found that, at a fixed rf power, there is a peak of the GMR ratio as the oxidation time increases. A higher peak value of the GMR ratio was obtained for lower rf power, although the required oxidation time is longer. This result can be well understood by considering both the enhanced specularity at the insulator/metal interface and the loss of magnetic effective thickness of the free layer by the oxidation. Magnetic parameters such as the interlayer coupling field (H₀) and the coercivity of the free layer (H_cf) were also greatly influenced by the oxidation process. When only the Ta layer was oxidized, H₀ increases very slightly, and H_cf increases with the oxidation time. However, when the CoFe free layer was oxidized, a significant increase was found for H₀, and H_cf changes to decreasing. These results can be explained based on the Néel and RKKY coupling models. Received: 25 October 2001 / Accepted: 21 December 2001 / Published online: 3 June 2002     

High temperature magnetoresistance in (Co,CoFe and NiFe)/Cu/CoFe/IrMn spin-valves

The MR characteristics of temperature variations ranging from room temperature to 570 K for IrMn spin-valves which consist of free layer Co, CoFe and NiFe were studied. Co-SV had the highest MR value in all temperature ranges among them and even at 510 K the MR ratio held more than half of room temperature value. Whereas CoFe-SV had a slightly higher MR than NiFe-SV below 450 K, above 450 K CoFe-SV showed a lower MR ratio than NiFe-SV. MR loops of large coercivity such as CoFe free magnetic layer collapsed in the lower elevated temperature compared to NiFe and Co. Small coercivity of the free magnetic layer would be preferable to spin-valves.     

一种非连续纳米氧化层自旋阀的显微结构研究

利用高分辨电子显微学方法(HREM)研究了纳米氧化层镜面反射自旋阀多层结构Ta(35nm)Ni80Fe20(2nm)Ir17Mn83(6nm)Co90Fe10(15nm)NOL1Co90Fe10(2nm)Cu(22nm)Co90Fe10(15nm)NOL2Ta(3nm).该自旋阀的巨磁电阻(GMR)效应高达15%,较无此镜面反射纳米氧化层(NOL)的自旋阀提高近1倍,同时交换偏置场亦有所增强.高分辨显微结构分析表明,介于钉扎层与被钉扎层之间的氧化层(NOL1)并未完全氧化,即除氧化过程生成的CoFe氧化物 关键词： 自旋阀 纳米氧化层 高分辨电子显微学 巨磁电阻效应     

Antiferromagnet IrMn thickness dependence in exchange-biased perpendicular magnetic anisotropy based on CoFe/Pt/CoFe/[IrMn(tIrMn)] multilayers

The effect of the antiferromagnetic IrMn thickness upon the magnetic properties of CoFe/Pt/CoFe/[IrMn(t_IrMn)] multilayers is studied. An oscillatory interlayer coupling (IEC) has been shown in pinned CoFe/Pt(t_Pt)/CoFe/IrMn multilayers with perpendicular anisotropy. The period of oscillation corresponds to about 2 monolayers of Pt. The oscillatory behavior of IEC depends on the nonmagnetic metallic Pt thickness and is thought to be related to the antiferromagnetic ordering induced by the IrMn layer. From the extraordinary Hall voltage amplitude (EHA) curves as function of IrMn thickness, we report that the oscillation dependence of IEC for the [CoFe/Pt/CoFe] multilayer system induced by IrMn with spacer-layer thickness is a important features of perpendicular exchange biased system.     

A Decrease in the Exchange Bias Caused by an Increase in the Effective Thickness of the Copper Layer in the NiFe/Cu/IrMn Heterostructures

Physics of the Solid State - In a series of NiFe/Cu/IrMn structures with a variable effective thickness of the nonmagnetic copper interlayer (up to its absence in the NiFe/IrMn sample), we observed...     

Angular and NiFe thickness dependence of exchange bias in IrMn/NiFe/IrMn thin film

Exchange biased IrMn/NiFe/IrMn thin films were studied as a function of NiFe thickness. In plane angular dependence of a resonance field distribution which is measured by FMR was analyzed as a combined effect of an unidirectional anisotropy and an uniaxial anisotropy. The unidirectional anisotropic field and the uniaxial anisotropic field were linearly varied with NiFe thickness while the films with a thicker NiFe layer do not follow the linear variation. Resonance field and linewidth variations were also analysed with NiFe thickness.     

Flexible tuning microwave permeability spectrum in [ferromagnet/antiferromagnet]_n exchange-biased multilayer stack structure

NiFe/[IrMn/NiFe/IrMn] 5 /[NiFe/IrMn] 4 /NiFe structured exchange-biased multilayer films are designed and prepared by magnetron sputtering. The static and the microwave magnetic properties are systematically investigated. The results reveal that adding a partially pinned ferromagnetic layer can effectively broaden the ferromagnetic resonance linewidth toward the low frequency domain. Moreover, a wideband multi-peak permeability spectrum with a 3.1-GHz linewidth is obtained by overlapping the spectra of different partially pinned ferromagnetic layers and [antiferromagnet/ferromagnet/antiferromagnet] n stacks. Our results show that the linewidth of the sample can be feasibly tuned through controlling the proper exchange bias fields of different stacks. The designed multilayered thin films have potential application for a tunable wideband high frequency noise filter.     

Influence of Ga+ ion irradiation on thermal relaxation of exchange bias field in exchange-coupled CoFe/IrMn bilayers

This paper reports that the CoFe/IrMn bilayers are deposited by magnetron sputtering on the surfaces of thermallyoxidized Si substrates.It investigates the thermal relaxations of both non-irradiated and Ga + ion irradiated CoFe/IrMn bilayers by means of holding the bilayers in a negative saturation field.The results show that exchange bias field decreases with the increase of holding time period for both non-irradiated and Ga + ion irradiated CoFe/IrMn bilayers.Exchange bias field is also found to be smaller upon irradiation at higher ion dose.This reduction of exchange bias field is attributed to the change of energy barrier induced by ion-radiation.     

Electrical measurement of antiferromagnetic moments in exchange-coupled IrMn/NiFe stacks

We employ antiferromagnetic tunneling anisotropic magnetoresistance to study the behavior of antiferromagnetically ordered moments in IrMn exchange coupled to NiFe. Experiments performed by common laboratory tools for magnetization and electrical transport measurements allow us to directly link the broadening of the NiFe hysteresis loop and its shift (exchange bias) to the rotation and pinning of antiferromagnetic moments in IrMn. At higher temperatures, the broadened loops show zero shift, which correlates with the observation of fully rotating antiferromagnetic moments inside the IrMn film. The onset of exchange bias at lower temperatures is linked to a partial rotation between distinct metastable states and pinning of the IrMn antiferromagnetic moments in these states. The observation complements common pictures of exchange bias and reveals an electrically measurable memory effect in an antiferromagnet.     

Bias voltage and temperature dependence of magneto-electric properties in double-barrier magnetic tunnel junction with amorphous Co-Fe-B electrodes

Bias voltage and temperature dependence of magneto-electric properties in double-barrier magnetic tunnel junctions(DBMTJs) with a structure of [IrMn/CoFe/Ru/CoFeB]/Al-O/CoFeB/Al-O/[CoFeB/Ru/CoFe/IrMn], have been investigated. The DBMTJs show a large tunnel magnetoresistance (TMR) ratio of up to 57.6%, a high V_1/2 value of 1.26 V and small switching field H_c of 9.5 Oe at room temperature (RT). The TMR reaches the maximum at 30 K, about 89.0%, and decreases slightly from 30 to 4.2 K. A novel zero-bias anomaly (ZBA) in the P state is found and is temperature dependent, more sharply at low temperature, whereas a normal ZBA exists in the AP state. These effects are ascribed to magnon-, phonon- and impurity-assisted tunneling, and variation of density of states. The DBMTJ with a large TMR ratio, a high V_1/2, and small switching field H_c is promising for developing the future spin electronic devices.     

Growth and characterization of silicon nitride films on various underlying materials

Characteristics of silicon nitride (SiN_x:H) films, grown by plasma enhanced chemical vapor deposition (PECVD) on various metals such as Ta, IrMn, NiFe, Cu, and CoFe at various temperatures down to 100 °C, were studied using measurements of BHF etch rate, surface roughness and Auger electron spectroscopy (AES). The results were compared with those obtained for SiN_x:H films on Si. The deposition rate of SiN_x:H films increased slightly as deposition temperature decreased, and showed a weak dependence on the underlying materials. The surface of the nitride films deposited on all underlying materials at lower temperatures (below 150 °C) became rougher. In particular, a bubble-like surface was observed on the nitride film deposited on NiFe at 100 °C. At higher deposition temperatures (above 200 °C), SiN_x:H films on all the above metals had small RMS values, except for films on Cu which cracked at 250 °C. BHF (10:1) etch rate increased dramatically for nitride films deposited below 150 °C. For different underlying films, the BHF etch rate was quite different, but exhibited the same trend with decrease in deposition temperature. AES measurements showed that Si and N concentrations in the SiN_x:H films were only slightly different for the various deposition temperatures and underlying materials. AES depth profile of nitride films indicated that both surface O content and the depth of oxygen penetrating into SiN_x:H increased for low temperature-deposited films. However, there was no observed oxygen signal from within the films, even for films deposited at 100 °C, and both Si and N concentrations were uniform throughout the film. Received: 26 October 2001 / Accepted: 2 March 2001 / Published online: 20 June 2001     

Enhancement of MR ratios using thin oxide layers in PtMn and α-Fe2O3-based spin valves

Spin valves having thin oxide layers in the pinned and/or free layers were prepared by sputtering. MR ratios of the spin valves were increased from 8.1 to 11.9% by inserting the oxide layer into the pinned layer in Ta/PtMn/CoFe/Cu/CoFe/Ta spin valves. MR ratio of 13.9% and considerably large sheet ΔR of 2.55 Ω were obtained in the PtMn-based spin valves having the oxide layer in the pinned and free layer. Larger MR ratio of 17.3% and the sheet ΔR of 1.3 Ω were obtained in the PtMn-based dual-type spin valves having the oxide layer in both pinned layers. α-Fe₂O₃ based spin valves having thin oxide layers were also prepared. MR ratios of the spin valves were increased from 11.9 to 14.3% by inserting the oxide layer into the free layer in α-Fe₂O₃/CoFe/Cu/CoFe/Ta spin valves. The enhancement of the MR ratios may be attributed to the specular scattering effect of the conduction electrons by the thin oxide layers.     

Thermal relaxation of exchange bias field in an exchange coupled CoFe/IrMn bilayer

This paper reports that a CoFe/IrMn bilayer was deposited by high vacuum magnetron sputtering on silicon wafer substrate; the thermal relaxation of the CoFe/IrMn bilayer is investigated by means of holding the film in a negative saturation field at various temperatures. The exchange bias decreases with increasing period of time while holding the film in a negative saturation field at a given temperature. Increasing the temperature accelerates the decrease of exchange field. The results can be explained by the quantitative model of the nucleation and growth of antiferromagnetic domains suggested by Xi H W et al. [2007 Phys. Rev. B 75 014434], and it is believed that two energy barriers exist in the investigated temperature range.     

Pseudo spin-valves with Al or Nb as spacer layer: GMR and search for spin switch behaviour

The magnetoresistance of several Ferromagnet/Normal metal/Ferromagnet spin-valve type structures has been investigated using Al as normal spacer layer. A magnetoresistance ratio up to 4.1% at room temperature and 5.7% at 0.3 K is found for the sandwich with both Co layers, while slightly lower signals are found for the structures involving CoFe and NiFe layers. The magnetoresistance dependence for Co/Al/Co, Co/Al/CoFe and Co/Al/NiFe on the spacer layer thickness exhibits the familiar non monotonic behaviour with second peak slightly larger than the one reported for Cu based pseudo spin valves. At cryogenic temperatures, preliminary results on the onset of spin switch effects in Co/Al/Co and the full spin switch effect in Co/Nb/Co are also reported here.     

Bi对自旋阀钉扎场的影响及机理

实验发现将Bi插入自旋阀多层膜TaNiFeCuBi(x)NiFeFeMn中可以显著地提高自旋阀的钉扎场Hex.采用XPS对Cu,Bi元素的分布情况进行了研究,发现Bi的插入明显抑制了Cu原子在自旋阀的制备过程中在NiFeFeMn界面的偏聚.进一步研究表明:自旋阀钉扎层NiFeFeMn界面中,Cu原子的存在是导致自旋阀Hex小于TaNiFeFeMn多层膜Hex的主要原因. 关键词： 自旋阀 钉扎场 交换各向异性 表面活化剂     

几种元素的界面插层对Ta/NiFe/Ta的各向异性磁电阻效应的影响

文章中,通过磁控溅射制备了界面处插入4d,5d元素薄层(包括Ru,Pd,Ag和Au)的Ta/NiFe/Ta多层膜,并对它们的磁输运和磁性以及微结构进行了测试和表征.结果显示,Pd和Pt一样界面效应显著,能有效地提高NiFe薄膜退火前后的AMR比值,并抑制磁性死层.表面能比较小、熔点相对低的插层材料Ag,Au在退火过程中容易通过晶界扩散,强烈破坏其AMR性能.对于熔点高、表面能比较大的插层材料如Ru,磁性死层同样得到了抑制,NiFe薄膜的温度稳定性也可以得到提高.结果表明界面插层从界面电子自旋-轨道散射、界面死层和界面原子扩散等方面深刻影响NiFe薄膜的AMR. 关键词： 各向异性磁电阻 界面效应 原子扩散