铜电极在含苯并三唑的硼砂-硼酸缓冲溶液中的光电化学行为研究

用光电化学方法研究了铜电极在含苯并三唑(BTA)的硼砂-硼酸缓冲溶液中的光电化学行为。BTA能使铜电极的光响应由p-型转变为n-型。产生光响应的原因是铜电极表面的Cu2O膜。当BTA存在时由于BTA的作用致使电极表面Cu2O膜中共存着p-型和n-型区域, 电位正移和频率增加导致电极显示n-型光响应。     

铜电极在含苯并三唑的硼砂-硼酸缓冲溶液中的光电化学行为研究

用光电化学方法研究了铜电极在含苯并三唑(BTA)的硼砂—硼酸缓冲溶液中的光电化学行为.BTA能使铜电极的光响应由p-型转变为n-型.产生光响应的原因是铜电极表面的Cu_2O膜, 当BTA存在时由于BTA的作用致使电极表面Cu_2O膜中共存着P-型和n-型区域,电位正移和频率增加导致电极显示n-型光响应.     

复方钨酸盐对铜缓蚀协同作用的光电化学和SERS 研究

主要采用光电化学方法和表面增强拉曼光谱技术对具有环境友好性的钨酸盐与BTA复配使用对铜的缓蚀协同效应和作用机理进行了研究。实验表明Na2WO4对铜的缓蚀作用机理与BTA不同,在电位正向扫描过程中,光电流并不发生转型,其大小变化也不大;但在电位负向扫描过程中产生的阴极光电流峰值明显增大,缓蚀剂浓度越大,光电流越大,缓蚀效果越好,而Na2WO4与BTA复配使用时具有较好的协同效应,光电化学和SERS结果都说明其协同机理为两者都能对铜的缓蚀产生作用,前暑能促使电极表面产生的铜的氧化物增多;后者能与铜(Ⅰ)生成聚合物膜。     

复方钨酸盐对铜缓蚀协同作用的光电化学和SERS 研究

主要采用光电化学方法和表面增强拉曼光谱技术对具有环境友好性的钨酸盐与BTA复配使用对铜的缓蚀协同效应和作用机理进行了研究。实验表明Na2WO4对铜的缓蚀作用机理与BTA不同,在电位正向扫描过程中,光电流并不发生转型,其大小变化也不大;但在电位负向扫描过程中产生的阴极光电流峰值明显增大,缓蚀剂浓度越大,光电流越大,缓蚀效果越好,而Na2WO4与BTA复配使用时具有较好的协同效应,光电化学和SERS结果都说明其协同机理为两者都能对铜的缓蚀产生作用,前暑能促使电极表面产生的铜的氧化物增多;后者能与铜(Ⅰ)生成聚合物膜。     

模拟水中铜镍合金B10耐蚀性的光电化学研究

采用循环伏安、光电化学和电化学阻抗谱技术对模拟水中铜镍合金B10的腐蚀行为进行了研究.在电位从正往负向扫描中 B10表面膜显示p-型光响应,光响应来自电极表面的Cu2O层,但最大光电流比硼砂-硼酸中的要低。B10电极的耐蚀性能随着溶液中Cl-、SO42-和S2-浓度及pH的增加而降低。温度的升高会导致光电流由p-型转为n-型,耐蚀性能急剧下降。电化学阻抗谱测量结果与光电化学方法得到的结果相一致。     

苯并三唑和8-羟基喹啉对铜的缓蚀协同作用

通过电化学极化曲线和电化学阻抗谱研究了苯并三唑（BTA）和8 羟基喹啉（HQ）对铜的缓蚀协同作用， BTA和HQ复配使用后提高了电极的膜电阻，降低了电极的膜电容，增强了对铜腐蚀的抑制作用.通过MM2分子力学程序和PPP SCF量子化学方法优化计算了BTA和HQ的分子结构参数，分析讨论了它们之间的缓蚀协同效应.     

PCB酸性蚀刻液中缓蚀剂对厚铜线路制作的影响

以2-巯基苯并噻唑(2-MBT)、 苯并三氮唑(BTA)和苯氧基乙醇(MSDS)作为缓蚀剂, 研究了其加入在酸性蚀刻液后对PCB厚铜线路的缓蚀效果。通过接触角测试、电化学测试和蚀刻因子得出缓蚀状态,并结合扫描电子显微镜观察铜表面形貌。通过分子动力学计算和量子化学模拟分析缓蚀剂在铜表面的吸附机理。结果表明,2-MBT + MSDS与BTA + MSDS的分子结构可有效地平行吸附在铜表面,且吸附能高于单一缓蚀剂。加入了2-MBT + MSDS的蚀刻液,对厚度约为33 μm铜线路进行刻蚀,铜线路的蚀刻因子提高到6.59,可有效应用于PCB厚铜线路制作。     

2-十二烷基二硫代-4-苯基-1,3,4-噻二唑-5-硫酮的合成及其对铜的缓蚀性能

合成了2-十二烷基二硫代-4-苯基-1,3,4-噻二唑-5-硫酮(DPTT),用元素分析、IR1、H NMR等技术对化合物进行了结构表征.采用动态旋转挂片法考察了DPTT和苯并三唑(BTA)复配时对铜的缓蚀作用.结果表明,单一DPTT在浓度为3.0 mg/L时缓蚀效果最佳;DPTT与BTA复配使用时显示出较好的协同效应,1.0 mg/L DPTT和1.0 mg/L BTA复配时缓蚀效果最好.     

模拟水中白铜B30耐蚀性影响因素的光电化学研究

用动电位伏安法和光电化学方法对模拟水中白铜B30耐蚀性影响因素进行了研究. 白铜B30表面膜显示p-型光响应, 光响应来自电极表面的Cu₂O层, 在模拟水溶液中表面膜的半导体性质会发生转变, 由p-型转为n-型; 在不同 Cl^－, SO₄^2－浓度的模拟水溶液中, 电位正向扫描时呈现阳极光电流, 电位负向扫描时随着Cl^－, SO₄^2－离子浓度的增加, 光响应由p-型向n-型转变, 阳极光电流峰面积与阴极光电流峰面积之比增大, 耐蚀性能降低; 随着温度的升高, 白铜B30的耐蚀性能降低; 在pH＝7～9之间, 其耐蚀性能随着pH的升高而提高, 当pH＞9时, 其耐蚀性能随着pH的升高呈降低趋势.     

铜镍和铜钴合金电极在碱性介质中的光电化学

用动电位伏安法对含镍量10％、30％和50％的铜镍合金以及含钴量5.1％、9.7％、15 ％、25％和40％的铜钴合金电极在硼砂-硼酸缓冲溶液（pH 8.5）中的光电化学行为进行了 研究.铜镍合金和铜钴合金均显示p-型光响应,铜镍合金的光响应来自Cu2O,铜钴合金的光 响应来自Cu2O和氧化钴.含镍量10％和30％的铜镍合金电极以及含钴量5.1％铜钴合金电极的 最大光电流iph,max均大于纯铜电极,含钴量15％、25％和40％的铜钴合金电极以及含镍量 50％的铜镍合金电极由于电极表面相当一部分面积分别被氧化钴和氧化镍所占有,iph,max 小于纯铜电极.铜镍合金电极的φv值（电位负向扫描过程中电极表面完全还原为Cu时的电位 ）负于纯铜电极,而铜钴合金电极的φv值与纯铜电极大致相等, NiO的存在致使铜镍合金 表面Cu2O膜具有更大的稳定性.从光电化学角度通过φv和iph,max反映铜合金的耐腐蚀性能 与交流阻抗法测得的结果相符.     

Surface enhanced Raman spectra of benzotriazole adsorbed on a copper electrode

The surface enhanced Raman spectrum of benzotriazole (BTAH) adsorbed on a copper electrode has been studied as a function of the potential applied to the electrode. The effect of pH and of the type of halide in the electrolyte solution has also been investigated. The presence of some complexes involving Cu(I), benzotriazole or benzotriazolate (BTA^-) and the halide has been characterized. The protective film formed on copper surface, in the presence of benzotriazole, has been identified as cuprous benzotriazolate [Cu(I)BTA].     

What determines the inhibition effectiveness of ATA, BTAH, and BTAOH corrosion inhibitors on copper?

Three corrosion inhibitors for copper-3-amino-1,2,4-triazole (ATA), benzotriazole (BTAH), and 1-hydroxybenzotriazole (BTAOH)-were investigated by corrosion experiments and atomistic computer simulations. The trend of corrosion inhibition effectiveness of the three inhibitors on copper in near-neutral chloride solution is determined experimentally as BTAH ? ATA ? BTAOH. A careful analysis of the results of computer simulations based on density functional theory allowed to pinpoint the superior inhibiting action of BTAH and ATA as a result of their ability to form strong N-Cu chemical bonds in deprotonated form. While these bonds are not as strong as the Cl-Cu bonds, the presence of solvent favors the adsorption of inhibitor molecules onto the surface due to stronger solvation of the Cl(-) anions. Moreover, benzotriazole displays the largest affinity among the three inhibitors to form intermolecular aggregates, such as [BTA-Cu](n) polymeric complex. This is another factor contributing to the stability of the protective inhibitor film on the surface, thus making benzotriazole an outstanding corrosion inhibitor for copper. These findings cannot be anticipated on the basis of inhibitors' molecular electronic properties alone, thus emphasizing the importance of a rigorous modeling of the interactions between the components of the corrosion system in corrosion inhibition studies.     

纳米尺度TiO2聚苯胺多孔膜电极光电化学研究

用光电流作用谱，光电流－电势图等光电化学方法研究了ＴｉＯ２／聚本胺复合多孔膜电极在不含氧化还原和含有没氧化还原对体系中的光电转换过程。结果说明，ＴｉＯ２／聚苯胺复合多孔膜电极为双层ｍ－型半导体结构，ＴｉＯ２多孔膜的禁带宽度为３．２ｅＶ，外层聚苯胺膜的禁带宽度为２．８８ｅＶ。     

Corrosion inhibition by benzotriazole derivatives and sodium dodecyl sulphate as corrosion inhibitors for copper in ground water at different temperatures

1‐(2‐Pyrrole carbonyl) benzotriazole (PBTA) and 1‐(2‐thienyl carbonyl)‐benzotriazole (TBTA) were synthesized. Different concentrations of PBTA, TBTA, sodium dodecyl sulphate (SDS), and molybdate (Mo) were evaluated as corrosion inhibitors for copper in ground water medium at different temperatures. The obtained results were compared with the effect of benzotriazole (BTA) on the inhibition of copper corrosion at the same condition. The study was performed using potentiodynamic polarization, electrochemical impedance spectroscopy, cyclic voltammetry, and scanning electron microscopy investigations. A good inhibition is ensured at elevated temperatures. All measurements indicated that PBTA, TBTA, and BTA act as good corrosion inhibitors and their inhibition efficiency (IE%) increased with combining them with optimum concentration of SDS and Mo. Furthermore, the best performance was recorded for the compound PBTA + SDS + Mo, which was found to offer increased IE% in a synergistic manner, thereby acting as a good corrosion inhibitor for copper in ground water medium. Copyright © 2015 John Wiley & Sons, Ltd.     

铜电极光电响应p型转变为n型的机理探讨

用动电位扫描和η（量子效率）～hv关系研究了钢电极在含或不含氯离子的硼砂－硼酸缓冲溶液中的电化学和光电化学行为.当溶液中不含氧离子时，铜电极呈p型光响应；相当量的氯离子存在时，光响应从p型转变为n型. 研究表明p→n的转型不是由于电极表面生成了化合物CuCl，而应归因于氯离子对Cu2O膜的掺杂.     

Influence of 5-chloro and 5-methyl benzotriazole on the corrosion of copper in acid solution: an experimental and a theoretical approach

The inhibition of copper corrosion in aerated 0.1 mol l⁻¹ hydrochloric acid solutions was studied using electrochemical polarization in the presence of different concentrations of benzotriazole and its two derivatives, 5-chloro and 5-methyl benzotriazole. The inhibition efficiencies obtained from cathodic Tafel plots increased markedly with increase in the additive concentration. Benzotriazole and 5-methyl-benzotriazole were found to be cathodic type corrosion inhibitors for concentrations higher than 10⁻⁴ mol l⁻¹ . However, the 5-chloro-benzotriazole was found to be a mixed inhibitor for concentrations up to 10⁻³ mol l⁻¹, above this concentration the inhibitor behaves as an anodic type inhibitor. The inhibitors are physisorbed on the copper surface following a Langmuir’s isotherm. The inhibition efficiencies depended on the inhibitor concentration and follows the order 5-chloro-benzotriazole > 5-methyl-benzotriazole > 1-H-benzotriazole. From the theoretical calculations, the change in the inhibition mechanism observed for 5-chloro-benzotriazole at concentrations higher than 10⁻³ mol l⁻¹ is associated with the electronic acceptor characteristic of chloro, which increases the benzotriazole acidity allowing the formation of CuBTA.     

An electrochemical and SERS investigation of the influence of pH on the effectiveness of some corrosion inhibitors of copper

The adsorption on Cu of the corrosion inhibitors benzotriazole (BTA), 2-mercaptobenzothiazole, 2-mercaptobenzimidazole and 2-mercaptobenzoxazole has been characterized in both neutral and acid chloride solutions using electrochemical techniques and surface enhanced Raman spectroscopy. The undissociated inhibitors and their anions are adsorbed simultaneously, the surface concentration ratio depending on the pH and electrode potential. At low pH, BTA is adsorbed weakly and it is displaced from surface sites by both Cl⁻ and the strongly adsorbed 2-mercaptobenzothiazole. These spectroscopic results explain the low corrosion inhibition due to BTA in acid solution.