Simulation of surface structural relaxation kinetics in silica glass accelerated by water vapor

It is known that surface structural relaxation of silica glass takes place more rapidly than bulk structural relaxation, especially in the presence of water vapor. The effect of water vapor pressure, heat-treatment temperature and initial fictive temperature on the surface structural relaxation kinetics in silica glasses was investigated by measuring the change of the surface fictive temperature determined from the IR reflection peak shift of silica structural bands. The superimposed component of bulk structural relaxation was subtracted from the measured surface structural relaxation data to isolate the true surface structural relaxation kinetics. The obtained surface structural relaxation data as a function of fictive temperature, heating temperature and water vapor pressure were simulated with a model based on the diffusion equation with time-dependent surface concentration. The simulation model was used to predict the surface structural relaxation kinetics of the optical fiber having a high fictive temperature of ～ 1650 °C at 950 °C under 355 torr of water vapor, and it was confirmed that the present model can simulate surface structural relaxation of the fiber reasonably well.     

Deceleration of surface structural relaxation in chlorine-containing silica glass due to chlorine volatilization

Both surface and bulk fictive temperatures of chlorine-containing silica glass were measured using the IR method, after thermal, mechanical and chemical treatments. A metastable equilibrium state at 1200 °C was first established for the glass by heat-treatment and a uniform fictive temperature was observed except for the sample surface created by polishing after the heat-treatment. The densified layer of the polished surface shifted the IR peak wavenumber, making the fictive temperature appear higher than the bulk. During the second heat-treatment at 950 °C, the sample with the as-heat-treated surface and uniform fictive temperature of 1200 °C developed non-uniform fictive temperature distribution with the bulk fictive temperature becoming lower than the surface fictive temperature. Usually, surface structural relaxation is faster than bulk structural relaxation and the surface fictive temperature becomes lower than the bulk fictive temperature when heat-treated at a lower temperature than the initial fictive temperature. The observed anomalous feature was attributed to chlorine volatilization from the glass surface layer creating a high viscosity surface layer. This conclusion was supported by the diffusion data of chlorine in the glass available in the literature.     

Adequacy test of the fictive temperatures of silica glasses determined by IR spectroscopy

Adequacy of the fictive temperature determined by the IR spectroscopy method was examined for various silica glasses by measuring the extent of the memory effect. The IR method of fictive temperature measurement of silica glasses relies upon the assumption that a silica glass has a silica structural band with a unique wavenumber when it has a particular fictive temperature. Silica glasses with various impurities or added components such as Cl, F, and OH were given a cross-over heat-treatment and the extent of the resulting deviation of the wavenumber during the second stage heat-treatment at a constant temperature corresponding to the apparent fictive temperature of the sample was determined. Silica glasses containing high concentrations of water or fluorine exhibited distinct memory effects while glasses with low water concentration or Cl did not. These results seem to indicate that the main source of the memory effect in silica glasses is the composition fluctuation rather than density fluctuation. Thus, the IR method of determining the fictive temperature is adequate for high purity silica glasses even when the glass samples have unknown thermal history.     

Fictive temperature of GeO2 glass: Its determination by IR method and its effects on density and refractive index

A simple IR method of determining the fictive temperature of GeO₂ glass, both surface and bulk, was developed using the same technique developed earlier for silica glass. Specifically, IR absorption and reflection peak wavenumbers of GeO₂ structural bands were found to be correlated with the fictive temperature of the glass. Using this method structural relaxation kinetics can be investigated. Density and refractive index of GeO₂ glass were also measured as a function of fictive temperature.     

Effects of aluminum impurity on the structural relaxation in silica glass

To elucidate effects of Al impurity on the glass-forming process in silica glass, the structural relaxation in Al-containing silica glass, with alkali ions of only trace levels, was investigated by observing the fictive temperature. The fictive temperature was determined by infrared (IR) absorption analysis. Al, even at concentrations lower than 10 wtppm, increases the relaxation time and the activation energy of the -relaxation. It also suppresses the sub-relaxational process due to OH ions. These results indicated that Al should have other effects on structural relaxation than alkali–aluminate complex formation, as has been thought to be the cause for an increase in the -relaxation time and thus the viscosity of silica glass. Furthermore, the structural relaxation does not merely depend on the number of non-bridging oxygen atoms in the glass network.     

Size effect on surface structural relaxation kinetics of silica glass sample

It is known that surface structural relaxation takes place more rapidly than bulk structural relaxation, especially in the presence of water vapor. The surface structural relaxation kinetics of the silica glass fiber and plates was compared at 950 °C and the surface structural relaxation kinetics of silica glass fiber was found to be faster than that of the silica glass plate, even though the composition and initial fictive temperatures of the samples were the same. The observed difference of the surface structural relaxation kinetics between silica glass fiber and silica glass plate can be accounted for using a diffusion equation with time-dependent surface concentration. The analysis indicates that there is a general size effect on the surface structural relaxation kinetics, with smaller sized samples exhibiting faster relaxation kinetics.     

Fictive temperature measurement of alumino-silicate glasses using IR spectroscopy

A simple IR reflection method was used in a previous study to determine the fictive temperature of silica glasses and a soda-lime glass. The IR method is based upon the fact that the silica structural band of a glass takes a unique wavenumber at a particular fictive temperature. When this method was applied to an alumino-silicate glass in this study, however, the IR reflection peak wavenumber of the glass surface was found to be strongly affected by the reaction of the glass with water vapor in the atmosphere. Still, it was possible to measure the fictive temperature of the alumino-silicate glass using IR spectroscopy by taking an IR reflection of the bulk sample after eliminating the surface layer affected by the reaction with water vapor. The IR peak wavenumber of the silica structural band decreased with increasing fictive temperature for the alumino-silicate glass, similar to silica glass.     

Fictive temperature dependence of subcritical crack growth rate of normal glass and anomalous glass

Subcritical crack growth rates of soda–lime–silicate glass, which is a typical normal glass, and silica glass, which is a typical anomalous glass, with different fictive temperatures were measured by the double-cleavage-drilled-compression (DCDC) fracture mechanics technique under both dry and humid atmospheres in order to clarify the effect of the fictive temperature on mechanical strength and fatigue. In the humid atmosphere, the soda–lime–silicate glass with a higher fictive temperature showed a slower crack growth rate than the same glass with a lower fictive temperature while the silica glass with a higher fictive temperature showed a faster crack growth rate than the silica glass with a lower fictive temperature. These results imply that normal glass with a higher fictive temperature is expected to show a higher mechanical strength compared with the same glass with a lower fictive temperature and anomalous glass with a higher fictive temperature is expected to show a lower mechanical strength than the same glass with a lower fictive temperature when tested in ambient air if the flaw size is the same. In the dry atmosphere, the fictive temperature effects on the crack growth rate in both glasses were small and within the experimental error.     

IR investigation of density changes of silica glass and soda-lime silicate glass caused by microhardness indentation

Density changes of silica glass and soda-lime silicate glass caused by ball indentation and Vickers indentation were investigated. The IR reflection peak shift of the silica structural band was monitored to determine the extent of the fictive temperature change and the corresponding density change. Under the central portion of the ball indentation, the density of silica glass increased while a change in the soda-lime silicate glass structure was not clear. On the other hand, in the vicinity of the Vickers indentation, the opposite trend was observed. Namely, soda-lime silicate glass exhibited the structural change corresponding to the density decrease, while the structural change of the silica glass was uncertain. The initial density of the silica glass influenced the change of density under ball indentation in such a way that the initial density difference of the glass samples was reduced.     

Structural relaxation in sputter-deposited silica glass

We investigated structural relaxation below the glass transition temperature in sputter-deposited silica glass. Structural relaxation was obtained from annealing behavior of the IR reflection structural band position. Results were compared with that of bulk silica glass. Results showed the following. (1) The structural relaxation time is 10⁶ times shorter than that of bulk silica glass. (2) The activation energy is close to that of bulk silica glass. (3) Once the structural relaxation reaches a steady state, the structure of silica glass film resembles that of bulk silica glass.     

Thermal expansion of glasses in the As2Se3–AsI3 system

Thermal expansion coefficients (α) of glasses in the As₂Se₃–AsI₃ system are measured in the glass transition region and temperature dependence of the fictive temperature is calculated on the basis of relaxation model. It is found that the increase of AsI₃ content results in: an increase of α, decrease of the glass transition temperature (T_g), increase of the α change at T_g, an effect of quenching rate on α, and also changes in the structural relaxation times spectrum. The data are discussed within the framework of the assumption that the addition of AsI₃ to As₂Se₃ results in: (1) destruction of the As₂Se₃ glass network, (2) structural inhomogeneity of the glasses increase, (3) the temperature dependence of chemical–structural equilibria occurring in the liquid state increases.     

Structural relaxation and optical properties in transparent nanocrystalline β-quartz glass-ceramic

We studied structural relaxation in a nanocrystalline β-quartz solid solution (s.s.) glass-ceramic through density measurement, and the effect of structural relaxation on its optical properties. The density of the glass-ceramic changed as structural relaxation proceeded in the glass phase. It was found that the glass-ceramic whose glass phase has a high fictive temperature shows a high optical transmittance because of less optical scattering. We also demonstrated that the refractive index difference between the crystal and glass phases can be calculated from the scattering coefficients of the specimens with different fictive temperatures. The calculated refractive index of the crystalline phase was in fair agreement with the indices of a high-quartz crystal.     

Rayleigh scattering in silica glass with heat treatment

We investigated Rayleigh scattering in silica glass with heat treatment under various conditions, including quenching and slow cooling, and its relation to fictive temperature. The Rayleigh scattering intensity varied according to the conditions of the heat treatment. The scattering intensity in slowly cooled samples is less than that in quenched samples after heating at the same temperature. We evaluated fictive temperatures based on measurements of infrared absorption and Raman scattering. The Rayleigh scattering intensity was related to the fictive temperature regardless of the heat treatment conditions, and a linear relation between them was obtained. In addition, we suggest that the decrease in scattering intensity in slowly cooled samples results from structural relaxation due to viscous flow during the cooling process.     

Thermally modulated differential scanning calorimetry of a glass of composition 45Na2O-40B2O3-10Al2O3-5In2O3

The kinetics of structural relaxation and of glass transition of the 45Na₂O-40B₂O₃-10Al₂O₃-5In₂O₃ glassforming melt is studied by means of standard DSC and of temperature modulated DSC. In this way the dependence of the fictive temperature on cooling rate is determined simultaneously with the determination of the dependence of the dynamic glass transition temperature on modulation frequency. Both sets of data are fitted together in terms of the equation of Ritland-Bartenev. It was found that the activation energy of the structural relaxation exhibits a moderate dependence on temperature with the dimensionless fragility parameter α=3.3 (for strong systems, α is about 1 and increases to about 8 for some very fragile polymeric systems).     

Thermal expansion of synthetic fused silica as a function of OH content and fictive temperature

A matrix of synthetic fused silica samples with OH contents from 30 to 1300 ppm and of a fictive temperature from 1000 to 1300 °C has been characterized regarding their thermal expansion with high precision. The thermal expansion increases with fictive temperature and drops with OH content. Although fictive temperature and OH are coupled due to the influence of OH on the relaxation of the network, an independent influence of the OH content on thermal expansion has been observed. This may provide a deeper insight into the impact of impurities incorporated into the fused silica network.     

An electrospray technique for hyperquenched glass calorimetry studies: Propylene glycol and di-n-butyl phthalate

We describe an electrospray technique for in situ preparation, for differential scanning calorimetry study, of samples of molecular liquids quenched into the glassy state on extremely short time scales (hyperquenched). We study the cases of a hydrogen-bonded liquid, propylene glycol, PG and a Van der Waals liquid, di-n-butyl phthalate DBP. Using a fictive temperature method of obtaining the temperature dependence of enthalpy relaxation, we show that the electrospray method yields quenching rates of ∼10⁵ K/s, while the more common method, dropping a sealed pan of sample into liquid nitrogen, yields only 120 K/s. These hyperquenched samples start to relax, exothermically, far below the glass temperature, at a temperature (0.75T_g) where the thermal energy permits escape from the shallow traps in which the system becomes localized during hyperquenching. This permits estimation of the trap depths, which are then compared with the activation energy estimated from the fictive temperature of the glass and the relaxation time at the fictive temperature. The trap depth in molar energy units is compared with the ‘height of the landscape’ for PG, the quasi-lattice energy of the liquid based on the enthalpy of vaporization, and the single molecule activation energy for diffusion in crystals. The findings are consistent with the mechanism of relaxation invoked in a current model of relaxation in glassforming liquids. In the case of di-n-butyl phthalate we investigate the additional question of sub-T_g annealing effects. We find the ‘shadow’ glass transition, (an annealing prepeak) seen previously only in multicomponent mineral and metallic glasses. The phenomenon is important for understanding microheterogeneities in viscous liquid structures.     

Atomic dynamics in different regions of the potential energy surface

The atomic dynamics in two (bulk) metallic glasses, Ni₄₀Pd₄₀P₂₀ and Zr₅₅Cu₃₀Al₁₀Ni₅, were investigated by neutron inelastic scattering in different regions of the potential energy landscape, which are reached by slow cooling the bulk glasses and by hyper-quenching the same alloys. The results prove that the atomic dynamics depends also on the fictive temperature, i.e. the region of the potential energy surface, in which the glass is frozen in. Obviously the shapes of the basins or inherent structures are not the same everywhere on the potential energy surface, and the glass with a higher fictive temperature has more low energy modes than has the same glass with a lower fictive temperature. As results from computer simulation have suggested already, on moving to regions of lower mean potential energy (aging), part of theses low energy modes are transferred to the energy region of the calculated Debye cut-off energy. The difference between the vibrational entropies, calculated from the generalized vibrational density-of-states, which have been determined for both fictive temperatures, shows that the contribution from the vibrational entropy to the total entropy change, when moving through the potential energy landscape, is small for the two metallic glasses investigated. Structural relaxation of the hyper-quenched glass removes part of the additional low energy modes, but quantitatively possibly only at the low and perhaps also at the high-energy limit of the density-of-states. The wavelength dependence of the dynamics suggests that the additional low energy modes in the glass with the higher fictive temperature are not dominated by extended but more likely by localized modes.     

Fictive temperature measurement of amorphous SiO2 films by IR method

The structure and properties of amorphous materials, in general, change with their thermal history. This is usually explained using the concept of fictive temperature, i.e., the temperature at which the super-cooled liquid state turned into a glassy state. In earlier studies, a simple IR method was used to determine the fictive temperature of silica glasses, both bulk and fiber. In the present study the applicability of the same technique for thin amorphous silica films on silicon was examined. It was found that the IR absorption as well as reflection peak wavenumber of the silica structural band can be used to determine the fictive temperature of amorphous silica films on silicon with an unknown thermal history. Specifically, IR absorbance spectra of an amorphous silica film of thickness greater than 0.5 μm grown on silicon can be taken before and after etching a thin surface layer of 20–30 nm and the peak wavenumber of the difference signal can be compared with the pre-determined calibration curve to convert the peak wavenumber to the fictive temperature. For a film thicker than ∼2 μm, IR reflection peak wavenumber can be converted directly to the fictive temperature of the film by using the calibration curve.     

Towards the origin of the memory effect in oxide glasses

Glass samples with same composition and properties but different thermal histories can exhibit different behavior upon a subsequent heat-treatment, a phenomenon known as the memory effect. Generally, it is considered that the memory effect is due to nanoscale density fluctuation, which exists in all glasses and causes non-exponential relaxation with more than one relaxation time. Earlier, we studied the memory effect of various silica glasses and found that some pure silica glasses did not exhibit the memory effect while some silica glasses with higher impurity contents exhibited the memory effect. Based upon this finding, we suggested that the phenomenon originated from concentration fluctuation rather than density fluctuation. In this study, the memory effect in 6 mol% K₂O-94 mol% SiO₂ glass was investigated. The K₂O-SiO₂ glass system has a metastable immiscibility below the glass transition temperature and the chosen glass composition is the critical composition corresponding to the estimated critical temperature of the immiscibility boundary. Thus, it is expected that this glass composition would exhibit large super-critical concentration fluctuation, which increases with decreasing heat-treatment temperature. Density fluctuation, on the other hand, increases with increasing heat-treatment temperature. A much larger memory effect was observed at the lower heat-treatment temperature for the present glass. This result supports our earlier contention that the origin of the memory effect is composition fluctuation rather than density fluctuation.