Structural analysis of Cd-Te-O films prepared by RF reactive sputtering

Crystalline and microcrystalline Cd-Te-O samples have been obtained by RF reactive sputtering from a CdTe target using N₂O as oxidant. The growth conditions were substrate temperatures of 323 K, 573 K and 773 K and cathode voltage of −400 V, corresponding to 30 W of forward power. The samples were studied by micro-Raman spectroscopy, X-ray diffraction and optical transmittance. The films are remarkably transparent in the visible range, with transmittances about 88% at 400 nm and band gap energies above the absorption edge of the glass substrates. Although only the samples prepared at 773 K present defined diffraction peaks, the analysis of the Raman spectra indicate that samples prepared at 323 K and 573 K have a defined microstructure indeed. The spectra fitting performed by comparison with pattern compounds demonstrate that Cd-Te-O films are formed of Te-O units similar to those present in metal oxide-doped tellurite glasses, such as TeO₃ and TeO_3 + 1 linked through Cd-O bonds. As the substrate temperature increases the microstructure evolves from a γ-TeO₂ richer state to Cd_xTe_yO_z. In the crystalline sample the main phase identified was CdTeO₃ even though evidence of other phases was observed.     

Characterization of hydrogenated amorphous silicon thin films prepared by magnetron sputtering

Magnetron sputtered hydrogenated amorphous silicon (a-Si:H) thin films have been characterized. Hydrogen (H₂) with argon (Ar) was introduced into the sputtering chamber to create the plasma. A sudden increase in the deposition rate occurred when the hydrogen was added. The maximum hydrogen content of 16 atomic percent (at.%) was achieved and a bandgap of about 2.07 eV was determined from the spectral investigations of the hydrogenated films. The effect of radio frequency (RF) power on the deposition rate, as well as on the hydrogen content was investigated. To change the hydrogen content in the films, the hydrogen flow rate was varied while keeping the argon flow rate constant. The hydrogen content in the films increased with increasing hydrogen flow rate up to the maximum content of 16 at.% and then decreased for further increases in hydrogen flow.     

Morphology,composition, structure and optical properties of thermally annealed Cu2O thin films prepared by reactive DC sputtering method

Abstract

Thin films copper oxides are perspective materials for many optoelectronic applications, including photovoltaics. The samples were deposited on glass and silicon substrates by magnetron sputtering method using Modular Platform PREVAC. After deposition the samples were thermally treated by annealing in oxygen atmosphere for 60?min at 450?°C. Morphology confirms that all the films have crystalline structure. Optical measurements show that the films have wide band gap within the range 2.20÷2.48?eV before and 2.03÷2.40?eV after annealing. The article presents the discussion about the influence of annealing on Cu₂O thin film parameters.     

Formation of microcrystalline structure in a-Si:H films prepared by RF sputtering

Formation of microcrystalline structure in a-Si:H films prepared by RF sputtering has been investigated by TEM and FT-IR. The Films deposited in pure H₂ have grain-like structure and tend to crystallize with increasing the gas pressure, while the films deposited in Ar containing 10 % H₂ usually become amorphous. With increasing input power and the gas pressure, however, the latter films tend to have amorphous-microcrystalline mixed structure, and corresponding to this structural change, shift of optical absorption edge to lower energy and decreases of resistivity and activation energy of its temperature dependence are observed.     

Optical band gap of zinc nitride films prepared by reactive rf magnetron sputtering

Polycrystalline Zn₃N₂ films are prepared on Si and quartz glass substrates by RF magnetron sputtering at room temperature. The structural and optical properties are studied by X‐ray diffraction and double beam spectrophotometer, respectively. X‐ray diffraction indicates that the Zn₃N₂ films deposited on Si and quartz glass substrates both have a preferred orientation in (321) and (442), also are cubic in structure with the lattice constant a=0.9847 and 0.9783 nm, respectively. The absorption coefficients as well as the film thickness are calculated from the transmission spectra, and their dependence on photon energy is examined to determine the optical band gap. Zn₃N₂ is determined to be an indirect‐gap semiconductor with the band gap of 2.11(2) eV. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Copper nitride (Cu3N) thin films deposited by RF magnetron sputtering

The copper nitride thin films were prepared on glass substrate by RF magnetron sputtering method. At pure nitrogen atmosphere, the nitrogen flow rate affects the copper nitride thin films’ structures. Only a little part of nitrogen atoms insert into the body center of Cu₃N structure and parts of nitrogen atoms insert into Cu₃N crystallites boundary at higher nitrogen flow rate. But the indirect optical energy gap, E_opg, decreases with increasing nitrogen flow rate. The typical value of E_opg is 1.57 eV. In a nitrogen and argon mixture atmosphere, when the nitrogen partial was less than 0.2 Pa at 50 sccm total flow rate, the (1 1 1) peak of copper nitride appears. Thermal decomposition temperature of Cu₃N thin films deposited in pure nitrogen and 30 sccm flow rate was less than 300 °C. The surface morphology was smooth.     

Characteristics of sputtered zinc-oxide films prepared by UBM sputtering for thin film transistors

In this work, we describe the characteristics of zinc-oxide (ZnO) thin films synthesized on Si (001) and Corning (7059) glass substrates by unbalanced magnetron (UBM) sputtering under various ZnO film thicknesses and RF powers. We investigated the characteristics of ZnO films' structural, optical, and electrical properties with various film thicknesses and RF powers for the active channel in a thin film transistor (TFT). We used the UBM sputtering system for high rate deposition of ZnO films. The ZnO film surface was rough and the grain size of the film increased with increasing RF power and film thickness. The electrical properties improved with the increase of RF power and film thickness. These results can be explained by the improvement of the crystallinity in the ZnO film related to the grain size increase with increasing RF power and ZnO film thickness.     

Optical investigations on the existence of phase transition in ZnO:Li thin films prepared by DC sputtering method

We investigated the effect of temperature on the absorption spectra of Zn_0.8Li_0.2O thin films (ZnO:Li), deposited at 573 K, in the wavelength range 190‐800 nm. The films were deposited on sapphire, MgO or quartz substrates by DC sputtering method. The results show a shift of the optical energy gap (E_g), with direct allowed transition type near the fundamental edge, to lower wavelengths as the temperature increases. The temperature rate of E_g changes considerably showing an anomaly around 320 K depending on type of substrate. The founded results indicated that replacement of Zn ions with Li ions induces a ferroelectric phase in the ZnO wurtzite‐type semiconductor. The exponential dependence of the absorption coefficient on the incident photon energy suggests the validity of the Urbach rule. (© 2007 WILEY ‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Deep ultraviolet emission of ZnO films prepared by RF magnetron sputtering at changing substrate temperature

ZnO films with deep ultraviolet emission on (0 0 0 6) sapphire substrates were prepared by RF magnetron sputtering at periodically changing substrate temperature. It is found that the as-prepared ZnO films consist of the obvious multilayered structures from the SEM images of their cross-sections. Room temperature photoluminescence of ZnO films with multilayered structure shows two emissions centered at 332 and 388 nm with 260 nm excited wavelength. The strong deep ultraviolet emission at 332 nm is due to the O 2p dangling-bond state in the multilayered structure of ZnO films. Raman scattering spectrum of sample shows that such structured ZnO film possesses strong compressive stress.     

Low-temperature growth of nanocrystalline silicon films prepared by RF magnetron sputtering: Structural and optical studies

In order to contribute to the understanding of the optoelectronics properties of hydrogenated nanocrystalline silicon films, a detailed study has been conducted. Structural analysis (infrared absorption and Raman scattering spectroscopy), combined with optical measurements spectroscopy (optical transmission, photothermal deflection spectroscopy and photoconductivity) were used to characterize the films. The samples were elaborated by radio-frequency magnetron sputtering of crystalline silicon target, under a hydrogen (70%) and Argon (30%) gas mixture, at three different total pressures (2, 3 and 4 Pa) and varying substrate temperature (100, 150 and 200 °C). The results clearly indicate that the films deposited at 2 Pa are amorphous, while for 3 and 4 Pa nanocrystalline structures are observed. These results are discussed in the framework of the existing models.     

Properties of titanium solid solutions prepared by reactive sputtering

Films of titanium solid solutions Ti-X_x (X = C, N, or O) of the hexagonal phase were prepared on glass substrates heated at 350°C in a mixture of argon and the reactive gas with controlled partial pressures from 2×10^?6 to 8×10^?3 Torr. The maximum solubilities of C, N, and O in Ti were estimated to be 0.05, 0.46, and 0.28, respectively. The observed values of the maximum solubilities are discussed in connection with the structural and electrical properties.     

BaMoO4 thin films prepared by electrochemical method at room temperature

Highly crystallized BaMoO₄ films were prepared on molybdenum substrates in Ba(OH)₂ solutions by electrochemical method at room temperature. The deposition conditions (reaction temperature and current density) during electrochemical formation were researched. The films were characterized by using the X‐ray Diffraction (XRD), Scanning Electronic Microscopy (SEM) and X‐ray Photoelectron Spectroscopy (XPS) analyses. The XRD analyses show that the films are good crystalline with single scheelite‐type tetragonal structure; the SEM photographs show that the films are densely deposited with double tetragonal tapers in shape; and the XPS analyses reveal that the composition of the BaMoO₄ films (embodied Ba²⁺, Mo⁶⁺ and O^2‐) is in agreement with stoichiometry. The optimum electrochemical conditions for BaMoO₄ films formation are the lower reacting temperature (near room temperature) and the feasible current density (about 1mA/cm²)     

Characteristics of sputtered amorphous carbon films prepared by a closed-field unbalanced magnetron sputtering method

We discuss the tribological performance of sputtered amorphous carbon (a-C) films deposited by closed-field unbalanced magnetron (CFUBM) sputtering with a graphite target using a mixture of helium (He) and argon (Ar) as sputtering gases. We investigated the effects of the graphite target power density on the micro-structural and physical properties. In the Raman spectra, the G-peak position moved to the higher wavenumbers. The I_D/I_G ratio increased with the increase of target power density in the fixed DC bias voltage. This was the result of the structural change in the a-C film that resulted with the increase in sp² bonding fraction. Also, the maximum hardness of the a-C film was 23 GPa, the friction coefficient was 0.1, and the critical load was 25.9 N on the Si wafer. In addition, the compressive residual stress of the film increased a little with increasing target power density. Consequently, the various properties of a-C films, with an increase of the target power density, were associated with the increase of cross-linked sp² bonding fraction and the cluster size. The tribological properties of a-C film showed clear dependence on the energy of ion bombardment with the increase of plasma density during film growth.     

High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method

Hydrogenated amorphous silicon germanium (a-Si_1?xGe_x:H) alloy thin films were deposited in a rf (13.56 MHz) powered plasma CVD system from a mixture of silane, germane and hydrogen. The rf power was pulsed at a frequency of 1356 Hz with the duty cycle (Q) ranging from 50% to 100%. The Ge content in the films, found in the range 40–45%, was deduced from Raman spectra. The band gaps E_g of the films were in between 1.44 and 1.48 eV. We find a good correlation between the ambipolar diffusion length (L_d) and the microstructure factor ($R^1$) for different duty cycles. At Q = 75% the $R^1$ value is lowest (0.14) which correlates well with the maximum value of L_d (100 nm), the highest L_d value reported for a-Si_1?xGe_x:H films with E_g = 1.44 eV. It was also found to be very stable under light soaking. Powder incorporation within the films was also studied. Quality of the films is determined by two opposing effects viz. size of the powders incorporated into the films from the plasma and the bombardment of energetic ions and neutrals. Best transport properties were found at an optimum duty cycle of 75%.     

SiOx films prepared using RF magnetron sputtering with a SiO target

In this study, SiO_x thin films were prepared using reactive radio frequency magnetron sputtering at room temperature with a SiO sintered target. The obtained SiO_x films were identified using X-ray diffraction, transmission electron microscopy, infrared absorption spectroscopy, X-ray photoelectron spectroscopy and ultraviolet-visible transmittance measurement. The x in SiO_x film was controlled from 0.98 to 1.70 by changing the oxygen flow ratio at deposition. Increasing the oxygen flow ratio increased the optical gap of the SiO_x films from 3.7 to greater than 6 eV.     

Characterization of pure ZnO thin films prepared by a direct photochemical method

In this paper, amorphous ZnO thin films were obtained by direct UV irradiation of β-diketonate Zn(II) precursor complexes spin-coated on Si(1 0 0) and fused silica substrates. ZnO films were characterized by means of XPS, X-ray diffraction (XRD) and Atomic Force Microscopy (AFM). These analyses revealed that as-deposited films are amorphous and have a rougher surface than thermally treated films. Optical characterization of the films showed that these are highly transparent in the visible spectrum with an average transmittance of up to 95% over 400 nm, and an optical band-gap energy of 3.21 eV for an as-deposited film, and 3.27 eV for a film annealed at 800 °C. Low resistivity values were obtained for the ZnO films (1.0 × 10⁻² Ω cm) as determined by Van der Pauw four-point probe method.     

The effect of thermal annealing on the structural and mechanical properties of a-C:H thin films prepared by the CFUBM magnetron sputtering method

a-C:H films were prepared by closed-field unbalanced magnetron (CFUBM) sputtering on silicon substrates using argon (Ar) and acetylene (C₂H₂) gases, and the effects of post-annealing temperature on structural and mechanical properties were investigated. Films were annealed at temperatures ranging from 300 °C to 700 °C in increments of 200 °C using rapid thermal annealing equipment in vacuum ambient. Variations in microstructure were examined using Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). Surface and mechanical properties were investigated by atomic force microscopy (AFM), nano-indentation, residual stress tester, and nano-scratch tester. We found that the mechanical properties of a-C:H films deteriorated with increased annealing temperature.     

Studies on zirconium nitride films deposited by reactive magnetron sputtering

This paper deals with the preparation of Zirconium Nitride films by DC reactive magnetron sputtering. Films were deposited on silicon substrates at room temperature. Nitrogen partial pressure was varied from 4 × 10⁻⁵ to 10 × 10⁻⁵ m bar and the effect on the structural, electrical, optical properties of the films was systematically studied. The films formed at a nitrogen pressure of 6 × 10⁻⁵ mbar showed low electrical resistivity of 1.726 × 10⁻³ Ω.cm. The deposited films were found to be crystalline with refractive index and extinction coefficient 1.95 and 0.4352 respectively. (© 2003 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Orientation control of LaNiO3 thin films by RF magnetron sputtering with different oxygen partial pressure

Highly (1 1 0)- and (1 0 0)-oriented LaNiO₃ (LNO) thin films were successfully grown on Si (1 0 0) substrate using radio frequency (RF) magnetron sputtering at room temperature (RT). Effects of oxygen partial pressures on the orientation, film composition, surface morphology, and electrical properties of the films were investigated. The nearly complete (1 0 0) orientation was first achieved with oxygen partial pressure beyond 15% in the sputtering gas. The preferred (1 0 0) orientation of growing films is determined by uniform distribution of Ni³⁺ and La/Ni ratio in the films caused by oxygen during sputtering, as well as the lowest surface energy of the films in the crystalline process. LNO films with controlled orientation have low resistivity of 7.0×10⁻⁶ Ω m which is a good basis for integrating ferroelectric capacitors.     

Structural and optical properties of single-crystal ZnMgO thin films grown on sapphire and ZnO substrates by RF magnetron sputtering

High-quality ZnMgO films were grown by the radio frequency (RF) magnetron sputtering technique in pure oxygen ambient. Single-crystal films were obtained, when the Mg concentration was Zn_0.87Mg_0.13O or lower in the case of ZnMgO/Al₂O₃ and when it was Zn_0.65Mg_0.35O or lower in the case of ZnMgO/ZnO. Polycrystalline films were obtained when the growth temperature was lower than 500 °C, regardless of the Mg concentration. Position of the photoluminescence (PL) ultraviolet (UV) peak of the ZnMgO film shifted with the addition of Mg, from 3.33 eV (ZnO) to 3.51 eV (Zn_0.87Mg_0.13O) and 3.70 eV (Zn_0.65Mg_0.35O). It was also observed that growth of the ZnMgO films at higher temperature resulted in higher band-gap energy. It was proposed that this phenomenon is because concentration of the substitutional Mg atoms occupying Zn site is increased as the growth temperature increases.