Photoelectron spectroscopy of nanocrystalline anatase TiO2 films

Nanocrystalline TiO₂ (anatase) films were prepared using either colloidal suspensions or a sol-gel route. The electronic structure of these films was analyzed using X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). Apart from pristine films, films containing defects introduced by annealing under ultra-high vacuum conditions or by ion bombardment were investigated. Generally, annealing in the temperature range up to 720 K results in no significant changes in the XPS and UPS spectra as compared to the pristine state, indicating that the amount of defect formation is too low to be observable by these techniques. On the other hand, ion irradiation causes the appearance of distinct defect states; these could be identified in agreement with previous data from photoemission studies on rutile and anatase single crystals. From UPS, a valence-band width of ∼4.6 eV was determined for the nanocrystalline anatase films.     

Investigation of evolution hydrocarbon species on a Si surface during methane plasma with and without substrate bias, using infrared spectroscopy in multiple internal reflection geometry

We investigated evolution of hydrocarbon species on a Si surface during methane plasma both with and without substrate bias, using infrared spectroscopy in multiple internal reflection geometry (MIR-IRAS). We found that the relative density of the sp³-CH or sp³-CH₂ species to the sp³-CH₃ species was low in the low exposure regions, but that the relative density of the sp³-CH or sp³-CH₂ species increased as the exposure was higher. Substrate temperatures rose as the plasma exposure was higher. The changes of ratios would be ascribed to the substrate heating effect by plasma exposure, which would enhance the etching and/or hydrogen abstraction effects. We also found the change of CH_1-2/CH₃ ratios was enhanced when the high substrate bias was applied. The enhancement of the ratio was due to ion effects.     

Surface XPS characterization of NiTi shape memory alloy after advanced oxidation processes in UV/H2O2 photocatalytic system

Surface structure of NiTi shape memory alloy (SMA) was modified by advanced oxidation processes (AOP) in an ultraviolet (UV)/H₂O₂ photocatalytic system, and then systematically characterized with x-ray photoelectron spectroscopy (XPS). It is found that the AOP in UV/H₂O₂ photocatalytic system leads to formation of titanium oxides film on NiTi substrate. Depth profiles of O, Ni and Ti show such a film possesses a graded interface structure to NiTi substrate and there is no intermediate Ni-rich layer like that produced in conventional high temperature oxidation. Except TiO₂ phase, some titanium suboxides (TiO, Ti₂O₃) may also exist in the titanium oxides film. Oxygen mainly presents in metal oxides and some chemisorbed water and OH⁻ are found in titanium oxides film. Ni nearly reaches zero on the upper surface and relatively depleted in the whole titanium oxides film. The work indicates the AOP in UV/H₂O₂ photocatalytic system is a promising way to favor the widespread application of biomedical NiTi SMA by improving its biocompatibility.     

On the use of a O2:SF6 plasma treatment on GaAs processed surfaces for molecular beam epitaxial regrowth

Preparation of processed GaAs surface cleaning in view of molecular beam epitaxy regrowth by means of a O₂SF₆ microwave plasma has been investigated. Photoemission, Auger electron spectroscopy, atomic force microscopy and secondary ion mass spectrometry have been used for characterization. The O₂SF₆ plasma treatment was found to be very efficient for decontaminating the GaAs surface and leads to the formation of an oxide layer that can be taken off by a thermal or low-temperature H-plasma-assisted deoxidation. The levels of oxygen and carbon contaminants at the regrowth interface were measured to be in the range of a standard homoepitaxial layer-epiready substrate interface. Fluorine was observed to be eliminated upon deoxidation while sulphur is present, particularly in the case of low temperature grown layers. This plasma treatment was found to be efficient for preparation of processed GaAs surfaces for molecular beam epitaxial regrowth.     

Compression behavior of nanocrystalline anatase TiO2

We present a synchrotron X-ray diffraction study of pressure-induced changes in nanocrystalline anatase (with a crystallite size of 30-40 nm) to 35 GPa. The nanoanatase was observed to a pressure above 20 GPa. Direct transformation to the baddeleyite-TiO₂ polymorph was seen at 18 GPa. A fit of the pressure versus volume data to a Birch-Murnaghan equation yielded the following parameters: zero-pressure volume, V₀=136.15 Å³, bulk modulus, K_T=243(3) GPa, and the pressure derivative of bulk modulus, K′=4 (fixed). The bulk modulus value obtained for the nanocrystalline anatase is about 35% larger than that of the macrocrystalline counterpart.     

Photocatalytic property of TiO2 thin films sputtered-deposited on unheated substrates

TiO₂ films deposited on unheated substrates of alumina silicate glass by rf. (13.56 MHz) magnetron sputtering in the mixture of O₂ and Ar gases have been studied with X-ray diffraction (XRD), Atomic Force Microscopy (AFM) and optical spectroscopy. Structural and optical properties of TiO₂ films deposited at different O₂ concentrations and total pressures have been analyzed. Photocatalytic properties of TiO₂ films were characterized by following the degradation of methylene blue molecules under UV irradiation. It was found that the rate of methylene blue decomposition strongly depends on morphology and crystallinity of the deposited films, namely on the content of the anatase phase and on the size of the anatase grains. The best photocatalytic activity was found on TiO₂ films consisting of pure anatase phase with the size of grains of about 450 Å. With the help of those films a thin film reactor for water purification has been designed and tested.     

Photocatalytic and superhydrophilicity properties of N-doped TiO2 nanothin films

Pure TiO₂ and nitrogen doped titanium dioxide (N-TiO₂) thin films were prepared by sol-gel method through spin coating on soda lime glass substrates. TiCl₄ and urea were used as Ti and N sources in the sol. XRD results showed nitrogen doping has retarded anatase to rutile phase transformation. The doping also leads to a decrease in roughness of the samples from 4 nm (TiO₂) to 1 nm (N-TiO₂). However, surface analysis by statistical methods reveals that both surfaces have self-affine structure. Optical band gap of thin films was shifted from 3.65 eV (TiO₂) to 3.47 eV (N-TiO₂). Hydrophilic conversion and photocatalytic degradation properties of thin films were investigated and exhibited that N-TiO₂ thin film has more preferable hydrophilicity and photocatalytic properties under UV illumination.     

Deposition of duplex Al2O3/aluminum coatings on steel using a combined technique of arc spraying and plasma electrolytic oxidation

Plasma electrolytic oxidation (PEO) is a cost-effective technique that can be used to prepare ceramic coatings on metals such as Ti, Al, Mg, Nb, etc., and their alloys, but this promising technique cannot be used to modify the surface properties of steels, which are the most widely used materials in engineering. In order to prepare metallurgically bonded ceramic coatings on steels, a combined technique of arc spraying and plasma electrolytic oxidation (PEO) was adopted. In this work, metallurgically bonded ceramic coatings on steels were obtained using this method. We firstly prepared aluminum coatings on steels by arc spraying, and then obtained the metallurgically bonded ceramic coatings on aluminum coatings by PEO. The characteristics of duplex coatings were analyzed by X-ray diffractometer (XRD) and scanning electron microscopy (SEM). The corrosion and wear resistance of the ceramic coatings were also studied. The results show that, duplex Al₂O₃/aluminum coatings have been deposited on steel substrate after the combined treatment. The ceramic coatings are mainly composed of α-Al₂O₃, γ-Al₂O₃, θ-Al₂O₃ and some amorphous phase. The duplex coatings show favorable corrosion and wear resistance properties. The investigations indicate that the combination of arc spraying and plasma electrolytic oxidation proves a promising technique for surface modification of steels for protective purposes.     

Photocatalytic activity of Eu-doped TiO2 ceramic films prepared by microplasma oxidation method

Mesoporous TiO₂ ceramic films have been fabricated on titanium plates by the microplasma oxidation method. To increase the photocatalytic activity of the films, Eu(NO₃)₃ of different concentrations are added to the H₂SO₄ electrolyte solution. X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy, scanning electron microscopy techniques, reused and regenerated experiments are applied to characterize the modified films. Rhodamine B is used to evaluate the photocatalytic activity of the modified films. The results show that Eu ions are found in the porous TiO₂ films, and the film has high photocatalytic activity, good adherence to substrate, better reuse and regeneration properties.     

Femtosecond Z-scan measurement of third-order optical nonlinearities in anatase TiO2 thin films

Anatase phase TiO₂ films have been grown on fused silica substrate by pulsed laser deposition technique at substrate temperature of 750 °C under the oxygen pressure of 5 Pa. From the transmission spectra, the optical band gap and linear refractive index of the TiO₂ films were determined. The third-order optical nonlinearities of the films were measured by Z-scan method using a femtosecond laser (50 fs) at the wavelength of 800 nm. The real and imaginary parts of third-order nonlinear susceptibility χ⁽³⁾ were determined to be −7.1 × 10⁻¹¹esu and −4.42 × 10⁻¹²esu, respectively. The figure of merit, T, defined by T=βλ/n₂, was calculated to be 0.8, which meets the requirement of all-optical switching devices. The results show that the anatase TiO₂ films have great potential applications for nonlinear optical devices.     

Quantitative analysis of surface amine groups on plasma-polymerized ethylenediamine films using UV-visible spectroscopy compared to chemical derivatization with FT-IR spectroscopy, XPS and TOF-SIMS

A quantitative analysis of the surface density of amine groups on a plasma-polymerized ethylenediamine thin film deposited on a platinum surface using inductively coupled plasma chemical vapor deposition method is described. UV-visible spectroscopy together with a chemical derivatization technique using Fourier transform infrared (FT-IR) spectroscopy was used to obtain the quantitative information. Chemical tags of pentafluorobenzaldehyde were hybridized with the surface amine groups and were easily detected due to the characteristic absorption bands of C-F stretching, aromatic ring and CN stretching vibrations in the reflection-absorption FT-IR spectra. The surface amine density was reproducibly controlled as a function of deposition plasma power and quantified using UV-visible spectroscopy. A good linear correlation was observed between the FT-IR intensities of the characteristic absorption bands and the surface amine densities, suggesting the possibility of using this chemical derivatization technique to quantify the surface densities of specific functional groups on an organic surface. Chemical derivatization was also used with X-ray photoelectron spectroscopy on the same samples, and the results were compared with those obtained from FT-IR and time-of-flight secondary ion mass spectrometry. Although each analysis technique has different probing depths from the surface, the three different data sets obtained from the chemical tags correlated well with each other since each analysis technique measured the chemical tags on the sample surface.     

Photocatalytic abilities of gel-derived P-doped TiO2

P-doped TiO₂ nanoparticles were synthesized through hydrolysis and condensation of Ti(OC₂H₅)₄ with H₃PO₄ additions. Effects of [H₃PO₄]/[Ti(OC₂H₅)₄] molar ratios on the anatase-to-rutile phase transformation, crystallite sizes, surface areas, and photocatalytic abilities of the gel-derived P-doped TiO₂ were investigated. The P-doped TiO₂ nanoparticles prepared by [H₃PO₄]/[Ti(OC₂H₅)₄]=0.03 were composed of anatase monophase even at 900 ^oC and possessed very strong photocatalytic ability. Kinetic studies on the P-doped TiO₂ to photocatalytically decompose methylene blue under irradiation of 365 nm UV light found that the P-doped TiO₂ prepared by [H₃PO₄]/[Ti(OC₂H₅)₄]=0.03 and calcined at 800 ^oC had the specific reaction rates, at 25 °C, k_A,m=0.76 m³/(kg min) (based on the mass of P-doped TiO₂) and k_A,BET=46.2×10⁻⁶ m/min (based on the BET surface area of P-doped TiO₂), which is superior to the performance of a commercial product, P25 (k_A,m=0.22 m³/(kg min) and k_A,BET=4.8×10⁻⁶ m/min).     

Secondary ion mass spectrometry and X-ray photoelectron spectroscopy studies on TiO2 and nitrogen doped TiO2 thin films

Anatase phase TiO₂ and nitrogen (N) doped TiO₂ thin films were synthesized by an ultrasonic spray pyrolysis technique on c-Si (100) substrates in the temperature range 300-550 °C. The former used a precursor solution of titanium oxy acetylacetonate in methanol whereas the later used a titanium oxy acetylacetonate hexamine mixture in methanol. Homogeneity across the film’s thickness and the nature of the film-substrate interface were studied by dynamic depth profiling acquired using secondary ion mass spectrometry SIMS. The stoichiometry and bonding state of various species present in the films were studied using X-ray photoelectron spectroscopy (XPS). N-doping was confirmed by both SIMS and XPS. XPS studies revealed that the nitrogen content of the films synthesized at 300 °C (3.2%) is high compared to that of films made at 350 °C (1.3%).     

Photocatalytic activity of dc magnetron sputter deposited amorphous TiO2 thin films

For photocatalytic thin film applications TiO₂ is one of the most important materials. The most studied TiO₂ crystal phase is anatase, though also rutile and brookite show good photoactivity. Usually anatase or a mixture of rutile and anatase is applied for powder or thin film catalysts. It has been claimed that amorphous films do not exhibit any or only a very low photocatalytic activity.We have deposited amorphous thin films by dc magnetron sputtering from sub-stoichiometric TiO_2−x targets. The coatings are transparent and show a photocatalytic activity half of that of a thin layer of spin-coated reference photocatalyst powder. Annealing the thin films to yield anatase crystallization more than doubles their photocatalytic activity. At the same film thickness these thin films show the same activity as a commercially available photocatalytic coating.The dependence of the photocatalytic activity on deposition parameters like gas pressure and sputter power is discussed. A decrease in film density, as deduced from the refractive index and the microstructure, resulted in an increase in photocatalytic activity. Film thickness has a marked influence on the photocatalytic activity, showing a strong increase up to 300-400 nm, followed by a much shallower slope.     

离子注入掺杂锐钛矿TiO2薄膜的光学性能

在玻璃基体上,采用射频磁控溅射方法在不同的基体温度下制备了TiO2薄膜,然后在薄膜中注入注量分别为5×1016, 1×1017和5×1017/cm2的N离子以制备N掺杂的TiO2薄膜。X射线衍射结果表明：制备出的TiO2薄膜为锐钛矿型。X射线光电子能谱研究结果表明：注入的N离子与TiO2晶粒相互作用,形成了含氮的TiOxN2-x化合物,从而改变了TiO2薄膜的吸收边;随N离子注量增加,吸收边移动更明显;同时,由于氮离子注入产生的辐照缺陷使TiO2薄膜在紫外和可见光区的吸收也明显增强。     

Effect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD

Yttrium oxide thin films are deposited by microwave electron cyclotron resonance (ECR) plasma assisted metal organic chemical vapour deposition process using an indegeneously developed Y(thd)₃ {(2,2,6,6-tetramethyl-3,5-heptanedionate)yttrium} precursor. Depositions were carried out at two different argon gas flow rates keeping precursor and oxygen gas flow rate constant. The deposited coatings are characterized by X-ray photoelectron spectroscopy (XPS), glancing angle X-ray diffraction (GIXRD) and infrared spectroscopy. Optical properties of the films are studied by spectroscopic ellipsometry. Hardness and elastic modulus of the films are measured by load depth sensing nanoindentation technique. Stability of the film and its adhesion with the substrate is inferred from the nanoscratch test.It is shown here that, the change in the argon gas flow rates changes the ionization of the gas in the microwave ECR plasma and imposes a drastic change in the characteristics like composition, structure as well as mechanical properties of the deposited film.     

Dynamics of water adsorption on TiO2 monitored by work function spectroscopy

Water adsorption dynamics on two TiO₂ (1 1 0) rutile surfaces at room temperature has been investigated using the work function (WF) change as a function of time. The first surface was prepared in a standard way using sputtering/annealing cycles, whereas the second one was long term annealed at 620 K in moderate vacuum conditions (the residual gas pressure of about 1 × 10⁻⁷ mbar) and cleaned afterwards. The WF change show striking difference as compared to those obtained for highly reduced TiO₂ (1 1 0) rutile or the (2 × 1) reconstructed surfaces. For the first kind of surface we show that the observed adsorption dynamics can be qualitatively explained by the present understanding of the water adsorption on non-reconstructed TiO₂ (1 1 0) rutile surface according to which the bridging oxygen vacancies and Ti rows are the main adsorption sites. Although generally similar to the former results, water adsorption dynamics on the second kind of the surface has an additional feature that can be only explained by a new adsorption site, which we suggest to be due to (2 × 1) reconstructed regions coexisting with the non-reconstructed TiO₂ (1 1 0) surface.     

Growth and structure of MBE grown TiO2 anatase films with rutile nano-crystallites

We have explored the systematics of TiO₂ polymorph nucleation during film growth by molecular beam epitaxy on perovskite substrates. The accidental lattice match between anatase (0 0 1) and LaAlO₃(0 0 1) or SrTiO₃(0 0 1) typically results in anatase nucleation at the interface. However, the growth conditions dictate whether or not rutile also nucleates, and the associated morphological and structural properties of the composite film. Four symmetry equivalent epitaxial orientations of rutile on anatase are observed when rutile nucleates as discrete particles on LaAlO₃(0 0 1). Such films constitute model systems for studying the anatase/rutile interface, which is of considerable current interest in photochemistry.     

Optical and electric properties of Nb-doped anatase TiO2 single crystal

Nb-doped anatase TiO₂ single crystal has been grown by chemical vapour transport method. Raman spectra shows that the obtained crystal with Nb of 0.08 wt% has typical anatase structure. An absorption band was observed at around 2.2 eV, which seems to be due to the d-d transition in the conduction band. The electron paramagnetic resonance and electric resistivity measurements show that the doped niobium makes quite shallow donor level whose orbital is d_xy-like centered at the titanium position of anatase.