A high mobility C60 field-effect transistor with an ultrathin pentacene passivation layer and bathophenanthroline/metal bilayer electrodes

C₆₀ field-effect transistor (OFET) with a mobility as high as 5.17 cm²/V·s is fabricated. In our experiment, an ultrathin pentacene passivation layer on poly-(methyl methacrylate) (PMMA) insulator and a bathophenanthroline (Bphen)/Ag bilayer electrode are prepared. The OFET shows a significant enhancement of electron mobility compared with the corresponding device with a single PMMA insultor and an Ag electrode. By analysing the C₆₀ film with atomic force microscopy and X-ray diffraction techniques, it is shown that the pentacene passivation layer can contribute to C₆₀ film growth with the large grain size and significantly improve crystallinity. Moreover, the Bphen buffer layer can reduce the electron contact barrier from Ag electrodes to C₆₀ film efficiently.     

CuI/Al双层电极的有机场效应晶体管

制备了CuI/Al为源极和漏电极的并五苯基场效应晶体管.相对于纯金属(Al, Au)电极的晶体管,所研制的晶体管的迁移率、阈值电压VT、开关电流比I_on/I_off等参数都有明显改善.研究发现,在Al电极与并五苯半导体之间引入CuI作为空穴注入层,能够明显降低Al电极与并五苯之间的空穴注入势垒.紫外-可见光谱和X射线光电子能谱数据表明,这种空穴注入势垒的降低源自并五苯和Al向CuI的电子转移. 关键词： 有机场效应晶体管 CuI/Al双层源漏电极 电子转移     

Properties of transistor based C60 thin film on polystyrene

This paper reports that the n-type organic thin-fihn transistors have been fabricated by using C60 as the active layer and polystyrene as the dielectric. The properties of insulator and the growth characteristic of C60 film were carefully investigated. By choosing different source/drain electrodes, a device with good performance can be obtained. The highest electron field effect mobility about 1.15 cm2/（V. s） could reach when Barium was introduced as electrodes. Moreover, the C60 transistor shows a negligible ＇hysteresis effect＇ contributed to the hydroxyl-free of insulator. The result suggests that polymer dielectrics are promising in applications among n-type organic transistors.     

V2O5电极修饰对C60/Pentacene双层异质结场效应晶体管性能的影响

制备了用过渡金属氧化物V₂O₅修饰Al源、漏电极的C₆₀/Pentacene双层异质结有机场效应管.该构型器件与未修饰器件相比,呈现出典型的双极型晶体管传输特性.电子迁移率和空穴迁移率分别达到8.6×10^-2cm²/V·s^-1和6.4×10^-2cm²/V·s^-1,阈值电压分别为25 V和-25 V.器件性能改善的原因主要是由于插入V₂O₅修饰层后,可以明显降低Al电极与Pentacene之间的接触势垒,提高空穴的有效注入,从而使电子和空穴的注入接近平衡.研究表明,采用V₂O₅修饰电极方法,是制备低成本、高性能的双极型有机场效应管并实现其商业应用的有效途径.     

Enhanced charge carrier injection in heterojunction organic field-effect transistor by inserting an MoO3 buffer layer

A top-contact organic field-effect transistor(OFET) is fabricated by adopting a pentacene/1,1’-bis(di-4tolylaminophenyl) cyclohexane(TAPC) heterojunction structure and inserting an MoO3 buffer layer between the TAPC organic semiconductor layer and the source/drain electrode.The performances of the heterojunction OFET,including output current,field-effect mobility,and threshed voltage,are all significantly improved by introducing the MoO3 thin buffer layer.The performance improvement of the modified heterojunction OFET is attributed to a better contact formed at the Au/TAPC interface due to the MoO3 thin buffer layer,thereby leading to a remarkable reduction of the contact resistance at the metal/organic interface.     

Electron mobility in the linear region of an AlGaN/AlN/GaN heterostructure field-effect transistor

We simulate the current-voltage （I-V） characteristics of AlGaN/AlN/GaN heterostructure field-effect transistors （HFETs） with different gate lengths using the quasi-two-dimensional （quasi-2D） model. The calculation results obtained using the modified mobility model are found to accord well with the experimental data. By analyzing the variation of the electron mobility for the two-dimensional electron gas （213EG） with the electric field in the linear region of the AlGaN/AlN/GaN HFET I-V output characteristics, it is found that the polarization Coulomb field scattering still plays an important role in the electron mobility of AlGaN/AlN/GaN HFETs at the higher drain voltage and channel electric field. As drain voltage and channel electric field increase, the 2DEG density reduces and the polarization Coulomb field scattering increases, as a result, the 2DEG electron mobility decreases.     

Performance improvement in pentacene organic thin film transistors by inserting a C60 ultrathin layer

The contact effect on the performances of organic thin film transistors is studied here. A C₆₀ ultrathin layer is inserted between Al source--drain electrode and pentacene to reduce the contact resistance. By a 3 nm C₆₀ modification, the injection barrier is lowered and the contact resistance is reduced. Thus, the field-effect mobility increases from 0.12 to 0.52 cm²/(V·s). It means that inserting a C₆₀ ultra thin layer is a good method to improve the organic thin film transistor (OTFT) performance. The output curve is simulated by using a charge drift model. Considering the contact effect, the field effect mobility is improved to 1.15 cm²/(V·s). It indicates that further reducing the contact resistance of OTFTs should be carried out.     

New 4H silicon carbide metal semiconductor field-effect transistor with a buffer layer between the gate and the channel layer

A new 4H silicon carbide metal semiconductor field-effect transistor (4H-SiC MESFET) structure with a buffer layer between the gate and the channel layer is proposed in this paper for high power microwave applications. The physics-based analytical models for calculating the performance of the proposed device are obtained by solving one- and two-dimensional Poisson's equations. In the models, we take into account not only two regions under the gate but also a third high field region between the gate and the drain which is usually omitted. The direct-current and the alternating-current performances for the proposed 4H-SiC MESFET with a buffer layer of 0.2 μ m are calculated. The calculated results are in good agreement with the experimental data. The current is larger than that of the conventional structure. The cutoff frequency (f_T) and the maximum oscillation frequency (f_max) are 20.4 GHz and 101.6 GHz, respectively, which are higher than 7.8 GHz and 45.3 GHz of the conventional structure. Therefore, the proposed 4H-SiC MESFET structure has better power and microwave performances than the conventional structure.     

New 4H silicon carbide metal semiconductor field-effect transistor with a buffer layer between the gate and the channel layer

A new 4H silicon carbide metal semiconductor field-effect transistor (4H-SiC MESFET) structure with a buffer layer between the gate and the channel layer is proposed in this paper for high power microwave applications.The physics-based analytical models for calculating the performance of the proposed device are obtained by solving one-and two-dimensional Poisson’s equations.In the models,we take into account not only two regions under the gate but also a third high field region between the gate and the drain which is usually omitted.The direct-current and the alternatingcurrent performances for the proposed 4H-SiC MESFET with a buffer layer of 0.2 μm are calculated.The calculated results are in good agreement with the experimental data.The current is larger than that of the conventional structure.The cutoff frequency (fT) and the maximum oscillation frequency (f max) are 20.4 GHz and 101.6 GHz,respectively,which are higher than 7.8 GHz and 45.3 GHz of the conventional structure.Therefore,the proposed 4H-SiC MESFET structure has better power and microwave performances than the conventional structure.     

Interface engineering with an MOCVD grown ZnO interface passivation layer for ZrO2-GaAs metal-oxide-semiconductor devices

This work deals with the fabrication of a GaAs metal-oxide-semiconductor device with an unpinned interface environment. An ultrathin (∼2 nm) interface passivation layer (IPL) of ZnO on GaAs was grown by metal organic chemical vapor deposition to control the interface trap densities and to prevent the Fermi level pinning before high-k deposition. X-ray photoelectron spectroscopy and high resolution transmission electron microscopy results show that an ultra thin layer of ZnO IPL can effectively suppress the oxides formation and minimize the Fermi level pinning at the interface between the GaAs and ZrO₂. By incorporating ZnO IPL, GaAs MOS devices with improved capacitance-voltage and reduced gate leakage current were achieved. The charge trapping behavior of the ZrO₂/ZnO gate stack under constant voltage stressing exhibits an improved interface quality and high dielectric reliability.     

具有部分本征GaN帽层新型AlGaN/GaN高电子迁移率晶体管特性分析

为了优化传统Al GaN/GaN高电子迁移率晶体管(high electron mobility transistors,HEMTs)器件的表面电场,提高击穿电压,本文提出了一种具有部分本征GaN帽层的新型Al GaN/GaN HEMTs器件结构.新型结构通过在Al GaN势垒层顶部、栅电极到漏电极的漂移区之间引入部分本征GaN帽层,由于本征GaN帽层和Al GaN势垒层界面处的极化效应,降低了沟道二维电子气(two dimensional electron gas,2DEG)的浓度,形成了栅边缘低浓度2DEG区域,使得沟道2DEG浓度分区,由均匀分布变为阶梯分布.通过调制沟道2DEG的浓度分布,从而调制了Al GaN/GaN HEMTs器件的表面电场.利用电场调制效应,产生了新的电场峰,且有效降低了栅边缘的高峰电场,Al GaN/GaN HEMTs器件的表面电场分布更加均匀.利用ISE-TCAD软件仿真分析得出:通过设计一定厚度和长度的本征GaN帽层,Al GaN/GaN HEMTs器件的击穿电压从传统结构的427 V提高到新型结构的960 V.由于沟道2DEG浓度减小,沟道电阻增加,使得新型Al GaN/GaN HEMTs器件的最大输出电流减小了9.2%,截止频率几乎保持不变,而最大振荡频率提高了12%.     

基于蛋清栅绝缘层的高性能C_(60)有机场效应晶体管(英文)

采用生物材料(蛋清)作为栅绝缘层制备了基于C60为有源层的有机场效应晶体管。器件展现出了合理的电学特性,场效应迁移率和阈值电压分别为2.59 cm2·V-1·s-1和1.25 V。有机场效应晶体管展现良好性能的原因是蛋清具有较高的介电常数及热退火后形成的光滑表面形貌。实验结果表明,对于制备有机场效应晶体管来说,蛋清是一种有前途的绝缘层材料。     

A novel Si-rich SiN bilayer passivation with thin-barrier AlGaN/GaN HEMTs for high performance millimeter-wave applications

We demonstrate a novel Si-rich SiN bilayer passivation technology for AlGaN/GaN high electron mobility transistors (HEMTs) with thin-barrier to minimize surface leakage current to enhance the breakdown voltage. The bilayer SiN with 20-nm Si-rich SiN and 100-nm Si$_{3}$N$_{4}$ was deposited by plasma-enhanced chemical vapor deposition (PECVD) after removing 20-nm SiO$_{2}$ pre-deposition layer. Compared to traditional Si$_{3}$N$_{4}$ passivation for thin-barrier AlGaN/GaN HEMTs, Si-rich SiN bilayer passivation can suppress the current collapse ratio from 18.54% to 8.40%. However, Si-rich bilayer passivation leads to a severer surface leakage current, so that it has a low breakdown voltage. The 20-nm SiO$_{2}$ pre-deposition layer can protect the surface of HEMTs in fabrication process and decrease Ga-O bonds, resulting in a lower surface leakage current. In contrast to passivating Si-rich SiN directly, devices with the novel Si-rich SiN bilayer passivation increase the breakdown voltage from 29 V to 85 V. Radio frequency (RF) small-signal characteristics show that HEMTs with the novel bilayer SiN passivation leads to $f_{\rm T}/f_{\rm max}$ of 68 GHz/102 GHz. At 30 GHz and $V_{\rm DS} = 20$ V, devices achieve a maximum $P_{\rm out}$ of 5.2 W/mm and a peak power-added efficiency (PAE) of 42.2%. These results indicate that HEMTs with the novel bilayer SiN passivation can have potential applications in the millimeter-wave range.     

新型Si3N4层部分固定正电荷AlGaN／GaNHEMTs器件耐压分析

为了优化传统AlGaN／GaNhighelectronmobilitytransistors结构表面电场分布,提高器件击穿电压和可靠性,本文利用不影响AlGaN／GaN异质结极化效应的Si3N4钝化层电荷分布,提出了一种sbN4钝化层部分固定正电荷AIGaN／GaNhighelectronmobilitytransistors新结构．SiaN4钝化层中部分固定正电荷通过电场调制效应使表面电场分布中产生新的电场峰而趋于均匀．新电场峰使得新结构栅边缘和漏端高电场有效降低,器件击穿电压从传统结构的296V提高到新结构的650V,而且可靠性改善．通过Si3N4与AlGaN界面横、纵向电场分布,说明了产生表面电场峰的电场调制效应,为设计SiaN4层部分固定正电荷新结构提供了科学依据．Si3N4钝化层部分固定正电荷的补偿作用,使沟道二维电子气浓度增加,导通电阻减小,输出电流提高．     

具有p-GaN岛状埋层耐压结构的横向AlGaN/GaN高电子迁移率晶体管

GaN基高电子迁移率晶体管(HEMT)相对较低的击穿电压严重限制了其大功率应用.为了进一步改善器件的击穿特性,通过在n-GaN外延缓冲层中引入六个等间距p-GaN岛掩埋缓冲层(PIBL)构成p-n结,提出一种基于p-GaN埋层结构的新型高耐压AlGaN/GaN HEMT器件结构.Sentaurus TCAD仿真结果表明,在关态高漏极电压状态下,p-GaN埋层引入的多个反向p-n结不仅能够有效调制PIBL AlGaN/GaN HEMT的表面电场和体电场分布,而且对于缓冲层泄漏电流有一定的抑制作用,这保证了栅漏间距为10μm的PIBL HEMT能够达到超过1700 V的高击穿电压(BV),是常规结构AlGaN/GaN HEMT击穿电压(580 V)的3倍.同时,PIBL结构AlGaN/GaN HEMT的特征导通电阻仅为1.47 m?·cm~2,因此获得了高达1966 MW·cm~(-2)的品质因数(FOM=BV~2/R_(on,sp)).相比于常规的AlGaN/GaN HEMT,基于新型p-GaN埋岛结构的HEMT器件在保持较低特征导通电阻的同时具有更高的击穿电压,这使得该结构在高功率电力电子器件领域具有很好的应用前景.     

掺C60/C70和沥青薄膜的光谱特性

本文研究了醇酸清漆本征膜的紫外———可见吸收光谱特性、沥青的红外光谱和紫外———可见吸收光谱特性、C6 0 /C70 掺入醇酸清漆后所得薄膜的紫外———可见吸收光谱特性、沥青掺入醇酸清漆后所得薄膜的紫外———可见吸收光谱特性、C6 0 /C70 和沥青掺入醇酸清漆后所得薄膜的紫外———可见吸收光谱特性。实验证明 ,醇酸清漆对C6 0 /C70 具有很强的漂白作用 ,即醇酸清使C6 0 /C70 原紫外———可见吸收光谱的吸收峰消失 ,吸收曲线紫移 ,而对沥青吸收光谱则无影响。将C6 0 /C70 和沥青同时掺入醇酸清漆中 ,聚合后薄膜的吸光度在350～ 760nm波段随波长的增加而呈非线性下降 ,同时薄膜的强度也有所提高。     

Charge‐transfer‐induced doping at an electron donor (α‐sexithiophene)/acceptor (C60) interface and mobility improvement

We studied various aspects relating to surface charge‐transfer‐induced doping at an organic/organic interface using in situ electrical measurements with a field‐effect transistor (FET) during the formation of the electron donor/acceptor interface. Adsorption of the electron‐accepting molecules (C₆₀) on top of the electron donating molecules (α‐6T) led to an increase in the FET hole mobility in an α‐6T film. Under illumination, the FET hole mobility in the α‐6T film with C₆₀ deposition was significantly increased in comparison with that in the dark due to exciton dissociation at the C₆₀/α‐6T interface, resulting in a large threshold voltage shift. The origin of the mobility increase is explained by the multiple trapping and release (MTR) model in which the mobility is determined by the carrier density. Various phenomena relevant to charge transfer and charge transport at the organic/organic interface are reported and their origins are discussed. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Correlation between electronic states and optical properties in indirect GaAsP/GaP quantum wells with insertion of an ultrathin AlP layer

The optical properties of indirect semiconductor quantum wells (QWs), were studied in relation to their electronic states controlled by an ultrathin AlP layer. The insertion of 1 ML of AlP at the center of a 60 Å GaAsP/GaP QW drastically increased the photoluminescence (PL) intensity and the efficiency of the no-phonon (NP) transition. The NP intensity relative to its TO phonon replica was found to greatly depend on the structural parameters and decreased by decreasing the width of the AlP layer or by increasing the arsenic composition of the GaAsP QW. The comparison with numerical calculation clarified that the efficiency of the NP transition is improved when the X_z electrons rather than X_xy electrons are involved in the radiative recombination. This can be qualitatively understood that the X_z electrons are more strongly localized to the AlP layer, leading to the efficient relaxation of the selection rule. The Arrhenius behavior of the PL intensity was also studied and the quenching of the PL intensity was interpreted as being due to the thermally activated escape of carriers from the well region into the GaP barrier.