Effect of laser irradiation on the electrical properties of dysprosium doped LiCo-Ferrite

The effect of laser irradiation on the electrical properties of Li_0.5+z Co _z Dy _x Fe_2.5?2z?x O₄ ferrite (0.0 ≤ x ≤ 0.2, z = 0.1) has been studied in the temperature range 300 K ≤ T ≤ 750 K at frequencies of 10 kHz?5 MHz, using a LIMO-IR laser diode, at a wavelength of 808 nm. It was found that laser irradiation increases the polarization, the resistivity and the paramagnetic region. As the result of electronic rearrangement and lattice defects, small polorons and clusters were created. The doping of LiCo-Ferrite by Dy³⁺ increases both the AC and DC resistance of the investigated material. The variation of the AC and DC resistance with the Dy-content (x) obeys the following correlations R _ac/100 = 50x ²+4x+0.005 and R _dc/1000 = 31x ²+0.099x+0.09, respectively. A peculiar behaviour was obtained for the sample with Dy-content x = 0.075, as the resistance notably decreases. The applicable result is that laser irradiation increases the resistance of LiCo-ferrite by about 17% while its doping by dysprosium at x = 0.15 increases the resistance by about 23%. Its value is nearly stable for the temperature range from 340 to 480 K.     

Effect of UV irradiation on the structural,optical and electrical properties of platinum

Investigations are performed on thermal, optical and electrical response of UV laser-irradiated platinum (Pt). 4N pure, annealed and fine polished samples are exposed to the KrF Excimer laser (248 nm, 20 ns, 50 mJ) under vacuum ～10^?6 torr at different laser fluences (0.5–2.5 J/cm²). Space-resolved plasma plume dynamics is studied by analyzing the captured plume images with the help of a computer controlled image-grabbing system. The irradiated targets are characterized for surface morphology, structural, optical and electrical investigations using the diagnostics; scanning electron microscopy, X-ray diffraction, rotating compensator auto-aligned ellipsometer and four-point probe, respectively. The value of maximum intensity emitted by Pt plasma plume is 250 grey scales. Surfaces of the target metals are modified by craters, moltens and redeposited material. Laser-induced periodic surface structures are produced at low laser fluence. Irradiation of Pt causes changes in diffracted X-rays intensity and grain sizes, dislocation in line densities and strain in the target materials. Considerable changes occur in optical parameters as well. A decrease in electrical conductivity of the irradiated targets also takes place in an exponential way with the change in laser fluence.     

Effect of annealing on structural, optical and electrical properties of nanostructured Ge thin films

Ge thin films with a thickness of about 110 nm have been deposited by electron beam evaporation of 99.999% pure Ge powder and annealed in air at 100-500 °C for 2 h. Their optical, electrical and structural properties were studied as a function of annealing temperature. The films are amorphous below an annealing temperature of 400 °C as confirmed by XRD, FESEM and AFM. The films annealed at 400 and 450 °C exhibit X-ray diffraction pattern of Ge with cubic-F structure. The Raman spectrum of the as-deposited film exhibits peak at 298 cm⁻¹, which is left-shifted as compared to that for bulk Ge (i.e. 302 cm⁻¹), indicating nanostructure and quantum confinement in the as-deposited film. The Raman peak shifts further towards lower wavenumbers with annealing temperature. Optical band gap energy of amorphous Ge films changes from 1.1 eV with a substantial increase to ∼1.35 eV on crystallization at 400 and 450 °C and with an abrupt rise to 4.14 eV due to oxidation. The oxidation of Ge has been confirmed by FTIR analysis. The quantum confinement effects cause tailoring of optical band gap energy of Ge thin films making them better absorber of photons for their applications in photo-detectors and solar cells. XRD, FESEM and AFM suggest that the deposited Ge films are composed of nanoparticles in the range of 8-20 nm. The initial surface RMS roughness measured with AFM is 9.56 nm which rises to 12.25 nm with the increase of annealing temperature in the amorphous phase, but reduces to 6.57 nm due to orderedness of the atoms at the surface when crystallization takes place. Electrical resistivity measured as a function of annealing temperature is found to reduce from 460 to 240 Ω-cm in the amorphous phase but drops suddenly to 250 Ω-cm with crystallization at 450 °C. The film shows a steep rise in resistivity to about 22.7 KΩ-cm at 500 °C due to oxidation. RMS roughness and resistivity show almost opposite trends with annealing in the amorphous phase.     

质子辐射损伤对单结GaAs/Ge太阳电池暗特性参数的影响

基于p-n结暗特性双指数模型,对经质子辐射后的单结GaAs/Ge太阳电池的暗特性I-V曲线进行数值拟合,确定了单结GaAs/Ge太阳电池在辐射前后的四个暗特性特征参数,即串联电阻R_s、并联电阻R_(sh)、扩散电流I_(s1)和复合电流I_(s2).研究结果表明,质子辐射后单结GaAs/Ge太阳电池的R_s,R_(sh),I_(s1)和I_(s2)四个暗特性参数均发生显著变化.经低能质子辐射后,单结GaAs/Ge太阳电池的R_(sh)随位移损伤剂量的增加而减小,而R_s,I_(s1)和I_(s2)三个参数随位移损伤剂量的增加而增大,其中串联电阻随位移损伤剂量线性增加而与辐射质子能量无关.理论分析表明,上述参数的变化与质子辐射损伤区域分布有关.基区和发射区的损伤主要引起单结电池串联电阻和扩散电流的增加;结区的损伤导致并联电阻减小,复合电流增大.     

Effect of γ irradiation on the low-temperature electrical conductivity and dielectric properties of TlGaSe2 crystals

Electrical conductivity and dielectric properties of single-crystal TlGaSe₂ have been studied as a function of γ irradiation dose in the 100–280 K range including the existence of an incommensurate phase. Anomalies in the form of maxima have been observed in the σ=f(T), tan δ=f(T), and ɛ=f(T) curves at the points of transition from the paraphase to incommensurate (IC) phase, T _i, and from the IC to commensurate phase, T _c. The increase in the quantities σ, tan δ, and ɛ observed initially with increasing irradiation dose is followed by their strong decrease and disappearance of the anomalies. It has been established that γ irradiation does not affect the phase transition temperatures T _i and T _c. Fiz. Tverd. Tela (St. Petersburg) 40, 1328–1331 (July 1998)     

中子辐照对AlGaN/GaN高电子迁移率晶体管器件电特性的影响

本文采用能量为1 MeV的中子对SiN钝化的AlGaN/GaN HEMT(高电子迁移率晶体管)器件进行了最高注量为1015cm-2的辐照.实验发现:当注量小于1014cm-2时,器件特性退化很小,其中栅电流有轻微变化(正向栅电流IF增加,反向栅电流IR减小),随着中子注量上升,IR迅速降低.而当注量达到1015cm-2时,在膝点电压附近,器件跨导有所下降.此外,中子辐照后,器件欧姆接触的方块电阻退化很小,而肖特基特性退化却相对明显.通过分析发现辐照在SiN钝化层中引入的感生缺陷引起了膝点电压附近漏电流和反向栅泄漏电流的减小.以上结果也表明,SiN钝化可以有效地抑制中子辐照感生表面态电荷,从而屏蔽了绝大部分的中子辐照影响.这也证明SiN钝化的AlGaN/GaN HEMT器件很适合在太空等需要抗位移损伤的环境中应用.     

Effect of nanopatches on electrical behavior of Ni/n-type Si Schottky diode

Topological surface measurement of thin metal film using a conducting probe atomic force microscope (C-AFM) shows that thin metal film deposited on Ni/n-Si Schottky diode (SD) consists of patches. These patches are sets of parallel connected and electrically cooperating nano-contacts of size between 50 and 100nm. Every individual patch acts as an individual diode with different I-V curve, barrier height (BH) and ideality factor (n). Between these diodes or patches, there are spot field distributions; the patches with different local work functions are in direct electric contact with surrounding patches. As a result, a potential difference between surfaces of patches, the so-called electrostatic spot field E_f, is formed. It is shown that in real metal-semiconductor (MS) contacts, patches with quite different configurations, various geometrical sizes and local work functions are randomly distributed on the surface of metal; hence direction and intensity of spot field are non-uniformly distributed along the surface of metal. There is a linear dependence between barrier height and ideality factor, which is the consequence of reduction of distance of the maximum of BH from the interface. This dependency is the sign of reduction of contribution of a peripheral current.     

N型掺杂应变Ge发光性质

应变锗材料具有准直接带特性,而且与标准硅工艺兼容,成为实现硅基发光器件重要的候选材料之一.本文基于vandeWalle形变势理论,计算了应变情况下半导体Ge材料的能带结构以及载流子在导带中的分布;通过分析载流子直接带和间接带间的辐射复合以及俄歇复合、位错等引起的非辐射复合的竞争,计算了N型掺杂张应变Ge材料直接带跃迁的内量子效率和光增益等发光性质.结果表明,张应变可有效增强Ge材料直接带隙跃迁发光.在1.5%张应变条件下,N型掺杂Ge的最大内量子效率可以达到74.6%,光增益可以与III-V族材料相比拟.     

The electrical properties of Ge4+ substituted copper ferrite

The electrical resistivity () and thermoelectric power () were measured in the temperature range from 300 K to 750 K on the system Cu_1+xGe_xFe_2–2xO₄ with x=0.05, 0.1, 0.15, 0.2 and 0.3. The dependence of electrical properties with temperature showed three regions. In the first region the conduction is due to impurities whereas in the second and third it is due to polaron hopping. The temperature dependence of and suggests that the transport properties measured may be interpreted on the basis of polaron hopping. The activation energy in paramagnetic region is found to be less than that in ferrimagnetic region. This behaviour therefore can be stated to be anomalous.One of the authors (BLP) is grateful to UGC (Delhi) for granting teacher fellowship for Ph.D. course.     

Magnetic and electrical properties of Ge/Co bilayer films

We present the results from experimental studies of the magnetic and electrical properties of doublelayered films in a cobalt-germanium system. An intermediate magnetic layer was found to form at the interface and effect the films–magnetic behavior and magnetoresistive effect.     

Structural and electrical properties of laser-crystallized nanocrystalline Ge films and nanocrystalline Ge/SiN_x multilayers

Nanocrystalline Ge （nc-Ge） single layers and nc-Ge/SiNx multilayers are prepared by laser annealing amorphous Ge （a-Ge） films and a-Ge/SiNx multilayers. The microstructures as well as the electrical properties of laser-crystallized samples are systematically studied by using various techniques. It is found that the optical band gap of nc-Ge film is reduced compared with its amorphous counterpart. The formed nc-Ge film is of p-type, and the dark conductivity is enhanced by 6 orders for an nc-Ge single layer and 4 orders for a multilayer. It is suggested that the carrier transport mechanism is dominant by the thermally activation process via the nanocrystal, which is different from the thermally annealed nc-Ge sample at an intermediate temperature. The carrier mobility of nc-Ge film can reach as high as about 39.4 cm2.V ^-1 .s^-1, which indicates their potential applications in future nano-devices.     

Influence of proton irradiation on electrical properties of Y-Ba-Cu-O thin films

One of the authors (P. K.) wishes to express his gratitude to Dr. O. Meyer and his technical staff for providing him with the experimental facilities in the Institut für Nukleare Festkörperphysik, Karlsruhe.     

Effect of indium doping on the electrical switching behaviour of Ge–Te glasses

Bulk Ge₁₅Te_85?x In _x (1?≤?x?≤?11) series of glasses have been found to exhibit a threshold switching behaviour for an input current of 2?mA. An initial decrease is seen in the switching voltages (V _T) with the addition of indium, which is due to the higher metallicity of indium. An increase is seen in V _T above 3 at.% of indium, which proceeds until 8 at.%, with a change in slope (lower to higher) seen around 7 at.%. Beyond x?=?8, a reversal in trend is exhibited in the variation of V _T, with a well-defined minimum around x?=?9 at.%. Based on the composition dependence of V _T, it is proposed that Ge₁₅Te_85?x In _x glasses exhibit an extended rigidity percolation threshold. The composition, x?=?3, at which the V _T starts to increase and the composition, x?=?7, at which a slope change is exhibited correspond to the onset and completion, respectively, of the extended stiffness transition. Thermal studies and photoconductivity measurements also support the idea of an extended rigidity percolation in Ge₁₅Te_85?x In _x glasses. In addition, the minimum seen in V _T at x?=?9 is associated with the chemical threshold (CT) of this glassy system.     

采用Al/TaN叠层电极提高Si基Ge PIN光电探测器的性能

金属与Ge材料接触由于存在强烈的费米钉扎效应, 导致金属电极与n型Ge接触引入较大的接触电阻, 限制了Si基Ge探测器响应带宽. 本文报道了在SOI衬底上外延Ge单晶薄膜并制备了不同台面尺度的Ge PIN光电探测器. 对比了电极分别为金属Al和Al/TaN叠层的具有相同器件结构的SOI基Ge PIN光电探测器的暗电流、响应度以及响应带宽等参数. 发现在Al与Ge之间增加一薄层TaN可有效减小n型Ge的接触电阻, 将台面直径为24 μ的探测器在1.55 μ的波 长和-1 V偏压下的3 dB响应带宽提高了4倍. 同时, 器件暗电流减小一个数量级, 而响应度提高了2倍. 结果表明, 采用TaN薄层制作金属与Ge接触电极, 可有效钝化金属与Ge界面, 减轻费米钉扎效应, 降低金属与n-Ge接触的势垒高度, 因而减小接触电阻和界面复合电流, 提高探测器的光电性能.     

采用AI／TaN叠层电极提高Si基GePIN光电探测器的性能

金属与Ge材料接触由于存在强烈的费米钉扎效应,导致金属电极与n型Ge接触引入较大的接触电阻,限制了si基Ge探测器响应带宽．本文报道了在SOI衬底上外延Ge单晶薄膜并制备了不同台面尺度的GePIN光电探测器．对比了电极分别为金属Al和A1／TaN叠层的具有相同器件结构的SOI基GePIN光电探测器的暗电流、响应度以及响应带宽等参数．发现在Al与Ge之间增加一薄层TaN可有效减小n型Ge的接触电阻,将台面直径为24um的探测器在1．55um的波长和-1V偏压下的3dB响应带宽提高了4倍．同时,器件暗电流减小一个数量级,而响应度提高了2倍．结果表明,采用TaN薄层制作金属与Ge接触电极,可有效钝化金属与Ge界面,减轻费米钉扎效应,降低金属与n-Ge接触的势垒高度,因而减小接触电阻和界面复合电流,提高探测器的光电性能．     

Study of irradiation induced changes of electrical and functional characteristics in Ge doped Si diodes

P-on-n diodes fabricated on n-type Cz Si wafers with different Ge doping concentrations were irradiated with 2 MeV electrons and 1 MeV equivalent reactor neutrons using a wide range of fluences and examined by combining current and capacitance transient techniques.     

Effect of self-assembled Ge nanostructures on Si surface electronic properties

Incorporating self-assembled Ge islands on Si surfaces into electronic devices has been suggested as a means of forming small features without fine-scale litho- graphy. For use in electronic devices, the electrical properties of the deposited Ge and their relation to the underlying Si substrate must be known. This report presents the results of a surface photovoltage investigation of the surface energy barrier as increasing amounts of Ge are added to a Si surface by chemical vapor deposition. The results are interpreted in terms of band discontinuities and surface states. The surface barrier increases as a wetting layer is deposited and continues to increase as defect-free islands form. It saturates as the islands grow. As the amount of Ge continues increasing, defects form, and the surface barrier decreases because of the resulting allowed states at the Ge/Si interface. Qualitatively similar behavior is found for Si(001) and Si(111). Covering the Ge with Si reduces the surface-state density and possibly modifies the wetting layer, decreasing the barrier to one more characteristic of Si. Initial hydrogen termination of the surface decreases the active surface-state density. As the H desorbs, the surface barrier increases until it stabilizes as the surface oxidizes. The behavior is briefly correlated with scanning-tunneling spectroscopy data. Received: 13 November 2000 / Accepted: 14 November 2000 / Published online: 23 May 2001