75GHz ECR等离子体

A Simple Mirror Ion Source with 75GHz pumping(SMIS 75)has been created.The confinement system is a mirror trap with magnetic field in the plug up to 5T,variable length 15—20cm and mirror ratio 3—5.Plasma heating is performed by the microwave radiation of a gyrotron(frequency 75GHz,power up to 200kW,pulse duration up to 150μs).The first results on plasma creation,heating and confinement are presented.Gas discharge conditions and charge state distributions are investigated.The main features of the plasma are high density and short confinement time.Plasma is confined in the trap in quasi-gas-dynamic regime.This means very short rising time and very dense plasma flux.     

高频ECR离子源的最新进展

As they are first optimized for their ion losses,ECRISs are always under a fundamental compromise: having high losses and strong confinement at the same time.To help ECR ion source developers in the design or improvement of existing machines,general comments are presented in a review article being soon published. In this 160 pages contribution,fundamental aspects of ECRISs are presented,with a discussion of electron temperature and confinement and ion confinement.Then,as microwaves play a key role in these machines, a chapter presents major guidelines for microwave launching and coupling to ECR plasma.Moreover,once ECR plasma is created,understanding this plasma is important in ion sourcery;and a section is dedicated to plasma diagnostics with an emphasis on the determination of electron and ion density and temperature by vacuum ultraviolet(VUV)spectroscopy.Another chapter deals with the role of magnetic confinement and presents updated scaling laws.Next chapter presents different types of ECRISs designed according to the main parameters previously described.Finally,some industrial applications of ECRISs and ECR plasmas in general are presented like ion implantation and photon lithography.Some hints taken from this review article are presented in the following article.     

第四代ECR离子源的主要概念(摘要)

To go beyond the present and planned third generation ECR ion sources operating at microwave frequencies between 20 and 30GHz to a fourth generation of sources operating above 50GHz offers new oppor- tunities and challenges.Based on the experimentally demonstrated frequency scaling,a doubling in operating frequency could provide more intense high charge state beams with higher charge states.The technical chal- lenges include the development of magnetic structures capable of producing 8T solenoid field and 4T sextupole fields,production and coupling of high power microwave power to heat the plasma,extraction of intense mul- tiple charge ion beams from a region of strong magnetic field and shielding of bremstrahlung from the hot electrons.In this paper,the status of high field superconducting magnets now under development for acceler- ator applications,gyrotrons for microwave power and other technical aspects that would be incorporated into a fourth generation ECR ion source are explored and applied to a conceptual design.     

GUIDING OF PLASMA BY ELECTRIC FIELD AND MAGNETIC FIELD

The relationship between the transported ion current and the cathodic arc current is determined in a vacuum arc plasma source equipped with a curved magnetic filter. Our results suggest that the outer and inner walls of the duct interact with the plasma independently. The duct magnetic field is a critical factor of the plasma output. The duct transport efficiency is to maximize at a value of bias plate voltage in the range +10 V to +20 V, and independent (within our limit of measurement) of the magnetic field strength in the duct. The plasma flux is composed of two components: a diffusion flux in the transverse direction due to particle collisions, and a drift flux due to the ion inertia. The inner wall of the magnetic duct sees only the diffusion flux while the outer wall receives both fluxes. Thus, applying a positive potential to the outer duct wall can reflect the ions and increase the output current. Our experimental data also show that biasing both sides of the duct is more effective than biasing the outer wall alone.     

Simulation of electron behavior in PIG ion source for 9 MeV cyclotron

In this paper, we focus on a PIG source for producing intense H-ions inside a 9 MeV cyclotron. The properties of the PIG ion source were simulated for a variety of electric field distributions and magnetic field strengths using a CST particle studio. After analyzing the secondary electron emission (SEE) as a function of both magnetic and electric field strengths, we found that for the modeled PIG geometry, a magnetic field strength of 0.2 T provided the best results in terms of the number of secondary electrons. Furthermore, at 0.2 T, the number of secondary electrons proved to be greatest regardless of the cathode potential. Also, the modified PIG ion source with quartz insulation tubes was tested in a KIRAMS-13 cyclotron by varying the gas flow rate and arc current, respectively. The capacity of the designed ion source was also demonstrated by producing plasma inside the constructed 9 MeV cyclotron. As a result, the ion source is verified as being capable of producing an intense H^- beam and high ion beam current for the desired 9 MeV cyclotron. The simulation results provide experimental constraints for optimizing the strength of the plasma and final ion beam current at a target inside a cyclotron.     

Mitigation of energetic ion debris from Gd plasma using dual laser pulses and the combined effect with ambient gas

For the next-generation beyond extreme ultraviolet lithography(EUVL) sources, gadolinium(Gd) plasma with emission wavelength at 6.7 nm seems to be the leading candidate. Similar to the Sn target 13.5 nm light source, ion debris mitigation is one of the most important tasks in the laser-produced Gd plasma EUV source development. In this paper,a dual-laser-pulse scheme, which uses a low energy pulse to produce a pre-plasma and a main pulse after a time delay to shoot the pre-plasma, is employed to mitigate the energetic ion generation from the source. Optimal conditions(such as pre-pulse energy and wavelength, and the time delay between the pre-pulse and the main pulse for mitigating the ion energy) are experimentally obtained, and with the optimal conditions, the peak of the ion energy is found to be reduced to1/18 of that of a single laser pulse case. Moreover, the combined effect by applying ambient gas to the dual-pulse scheme for ion debris mitigation is demonstrated, and the result shows that the yield of Gd ions is further reduced to around 1/9 of the value for the case with dual laser pulses.     

ORNL-HRIBF 6GHzECR离子源的最新结果

Experimental studies were conducted to characterize and improve the performance of the flat-B ECR ion source.The emittance of the source was investigated for the first time.The output beam currents of high-charge-states of Ar(q>8)were nearly doubled by increasing the plasma electrode aperture from 4mm to 6mm in diameter.To investigate possible enhancements with broadband microwave radiation,a"white"Gaussian noise generator was employed with a TWT amplifier to generate microwave radiation with a bandwidth of～200MHz.The performance of the flat-B ECR ion source was found to be much better with narrow bandwidth radiation when the source was operated in the flat-B region.However,the ion beam intensities and charge state distributions were improved with the broadband radiation when the source was tuned off the flat-B region.     

Discharge characteristics of the DUHOCAMIS with a high magnetic bottle-shaped field

For the purpose of producing high intensity, multiply charged metal ion beams, the dual hollow cathode ion source for metal ions （DUHOCAMIS） was derived from the hot cathode Penning ion source combined with the hollow cathode sputtering experiments in 2007. To investigate the behavior of this discharge geometry in a stronger magnetic bottle-shaped field, a new test bench for DUHOCAMIS with a high magnetic bottle-shaped field up to 0.6 T has been set up at the Peking University. The experiments with magnetic fields from 0.13 T to 0.52 T have indicated that the discharge behavior is very sensitive to the magnetic flux densities. The slope of discharge curves in a very wide range can be controlled by changing the magnetic field as well as regulated by adjusting the cathode heating power; the production of metallic ions would be much greater than gas ions with the increased magnetic flux density; and the magnetic field has a much higher influence on the DHCD mode than on the PIG mode.     

6.4 GHz ECR ion source at VECC

The 6.4 GHz ECR ion source that was indigenously developed a few years ago has been operating continuously for injecting oxygen and neon beams to the cyclotron since 1997. VEC-ECR is a single stage high magnetic field ion source provided with a negatively biased electron repeller placed on the axis, near the injection mirror point. The supply of cold electrons and use of low mass mixing gas improve the stability of ECR plasma. Very recently, the effect of aluminum oxide coating on the copper plasma chamber wall has been studied. The plasma chamber wall was coated with aluminum by vacuum evaporation method and then exposed to oxygen gas to form aluminum oxide. It was noticed that the process substantially shifts the charge state distribution to the higher charge state with an enhancement of ion current by an order of magnitude. With the aluminized plasma chamber, the VEC-ECR can now produce 12 μA of O⁷⁺, 6.5 μA of Ar¹²⁺, 1.5 μA of Kr²⁰⁺ and 1.0 μA of Xe³¹⁺.     

Discharge characteristics of the DUHOCAMIS with a high magnetic bottle-shaped field

For the purpose of producing high intensity, multiply charged metal ion beams, the dual hollow cathode ion source for metal ions (DUHOCAMIS) was derived from the hot cathode Penning ion source combined with the hollow cathode sputtering experiments in 2007. To investigate the behavior of this discharge geometry in a stronger magnetic bottle-shaped field, a new test bench for DUHOCAMIS with a high magnetic bottle-shaped field up to 0.6 T has been set up at the Peking University. The experiments with magnetic fields from 0.13 T to 0.52 T have indicated that the discharge behavior is very sensitive to the magnetic flux densities. The slope of discharge curves in a very wide range can be controlled by changing the magnetic field as well as regulated by adjusting the cathode heating power; the production of metallic ions would be much greater than gas ions with the increased magnetic flux density; and the magnetic field has a much higher influence on the DHCD mode than on the PIG mode.     

Generation of a high-current beam of multiply charged ions from a dense plasma produced by high-power millimeter-wave gyrotron radiation under ECR conditions

Experimental data for generating intense beams of multiply charged heavy gas ions are reported. The beams are extracted from the dense plasma of an ECR discharge with quasi-gasdynamic confinement provided by the powerful microwave radiation of a gyrotron in a magnetic trap. The axisymmetric magnetic trap makes it possible to extract uniform (in transverse coordinates) plasma fluxes from it, and the use of a multiple-aperture extraction system makes it possible to increase the beam current by more than an order of magnitude compared with the ECP sources currently available. Multiply charged nitrogen ion beams with a current of 150 mA and a normalized emittance of 0.9π mm mrad are obtained.     

LECR2离子源的改造及初步运行结果

The Latest developed LECR2M (Lanzhou ECR No.2 Modified)source is the updated one of LECR2(Lanzhou ECR No.2)source at IMP.It has been assembled on the low energy ion beam experimental platform to produce MCI beams for atomic physics and material pllysics experimental research.In our updating program,the structure of injection and extraction components has been modified to make the source structure more simple and effective.The hexapole magnet has also been replaced by a new hexapole magnet with higher radial field and larger inner diameter.With this updating,stronger magnetic field confinement of the ECR plasma is possible and better base vacuum condition is also achieved.LECR2M was designed to be operated at 14.5GHz.During the preliminary test.1.3emA O6 beam was extracted with the injected rf power of 1.1kW.The source has been used to deliver intense MCI beams for different experiments.After some discussion of the main features of this newly updated source,some of the typical commissioning test results of LECR2M will be presented.     

宽带微波馈入对于具有常规磁场构型的ECR离子源性能的提高

As clearly demonstrated at several laboratories,the performances of electron-cyclotron resonance (ECR)ion sources can be enhanced by increasing the physical sizes(volumes)of embedded ECR zones.En- larged ECR zones have been achieved by engineering the central magnetic field region of these sources so they are uniformly-distributed"volumes"in resonance with single-frequency rf power.Alternatively,the number of ECR surfaces in conventional minimum-B geometry sources can be increased by heating their plasmas with multiple,discrete frequency microwave radiation.Broadband rf power offers a simple,low cost and arguably more effective means for increasing the physical sizes of the ECR zones within the latter source type.In this article,theoretical arguments are made in support of the volume effect and the charge-state enhancing ef- fects of broadband microwave radiation(bandwidth:200MHz)plasma heating are demonstrated by comparing the high-charge-states of Ar ion beams,produced by powering a conventional minimum-B geometry,6.4GHz ECR ion source,equipped with a biased disk,with those produced by conventional bandwidth(bandwidth:～1.5MHz)radiation.     

不同磁路电子回旋共振离子源引出实验

空间推进所用的电子回旋共振离子源(ECRIS)应具有体积小、效率高的特点. 本文研究的ECRIS使用永磁体环产生磁场, 有效减小了体积, 该离子源利用微波在磁场中加热电子, 电子与中性气体发生电离碰撞产生等离子体. 磁场在微波加热电子的过程中起关键作用, 同时影响离子源内等离子体的约束和输运. 通过比较四种磁路结构离子源的离子电流引出特性来研究磁场对10 cm ECRIS性能的影响. 实验发现: 在使用氩气的条件下, 特定结构的离子源可引出160 mA的离子电流, 最高推进剂利用率达60%, 最小放电损耗为120 W·A^-1; 所有离子源均存在多个工作状态, 工作状态在微波功率、气体流量、引出电压变化时会发生突变. 离子源发生状态突变时的微波功率、气体流量的大小与离子源内磁体的位置有关. 通过比较不同离子源的引出离子束流、放电损耗、气体利用率、工作稳定性的差异, 归纳了磁场结构对此种ECRIS引出特性的影响规律, 分析了其中的机理. 实验结果表明: 保持输入微波功率、气体流量、引出电压不变时, 增大共振区的范围、减小共振区到栅极的距离, 离子源能引出更大的离子电流; 减小共振区到微波功率入口、气体入口的距离能降低维持离子源高状态所需的最小微波功率和最小气体流量, 提高气体利用率, 但会导致放电损耗增大. 研究结果有助于深化对此类离子源工作过程的认识, 为其设计和性能优化提供参考.     

CEA/Saclay的ECR轻离子离子源

In the beginning of the 90s,T.Taylor and his collaborators demonstrated ECR sources operating at low frequency(i.e.2.45GHz)are able to produce very intense single charge light ion beams. At CEA/Saclay,the SILHI source developments started in 1995.Since 1997 more than 100mA proton or deuteron beams are routinely produced in pulsed or continuous mode.To comply with ADS reliability constraint,important improvements have been performed to increase the installation reliability.Moreover,to optimize the beam transport in the low energy beam line,the extraction system was carefully designed and space charge compensation studies were undertaken.An important step has been reached in 2005 with the development of a permanent magnet source able to produce a total beam of 109mA at 85kV. A new test bench named BETSI,especially dedicated to permanent magnet source developments,is presently under construction.It will allow analysing positive or negative extracted beams up to 50keV and 100mA. In addition,for several years work has been done to optimize the production of negative hydrogen ion beam with such an ECR source.Recent analysis pushed towards the construction of a new set up based on a multicusp magnetic configuration. After a brief overview of the CEA/Saclay source developments,this article will point out on the recent results and present status.     

Multicharged ion source based on the Tornado closed magnetic confinement system

It is proposed to use the Tornado closed magnetic confinement system with microwave plasma heating for creating a pulsed source of multicharged ions. The plasma losses in closed confinement systems are determined by the diffusion across the magnetic field, which substantially increases the plasma lifetime as compared to mirror confinement systems. A plasma heating scenario with the successive switching-on of two oscillators is proposed: an oscillator operating at a frequency of 2.45 GHz produces the initial plasma, which is then heated at a frequency of 15 or 53 GHz. It is shown that it is possible to achieve the distribution of ions over charge states with a maximum at Ar¹⁶⁺ at a plasma density of 2×10¹³ cm⁻³. The extracted ion current in this case can attain 1 A.     

ECR离子源束流发射度的实验研究

利用最新自行研制的电扫描发射度探测系统, 在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究. 这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上. 试验中, 通过测量相关参数, 研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响. 利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论, 分析推导了离子源各可调参数与ECR等离子体的直接关系, 这为分析探索ECR离子源的工作机制提供了一定的参考依据.