Effect of oxide thickness on the capacitance and conductance characteristics of MOS structures

In this work, the investigation of the interface states density and series resistance from capacitance–voltage (C–V) and conductance–voltage (G–V) characteristics in Au/SnO₂/n-Si (MOS) structures prepared at various SnO₂ layer thicknesses by spray deposition technique have been reported. It is fabricated five samples depending on deposition time. The thicknesses of SnO₂ films obtained from the measurement of the oxide capacitance in the strong accumulation region for MOS Schottky diodes are 37, 79, 274, 401, and 446 Å, for D1, D2, D3, D4, and D5 samples, respectively. The C–V and G–V measurements of Au/SnO₂/n-Si MOS structures are performed in the voltage range from −6 to +10 V and the frequency range from 500 Hz to 10 MHz at room temperature. It is observed that peaks in the forward C–V characteristics appeared because of the series resistance. It has been seen that the value of the series resistance R_s of samples D1 (47 Ω), D2 (64 Ω), D3 (98 Ω), D4 (151 Ω), and D5 (163 Ω) increases with increasing the oxide layer thickness. The interface state density D_it ranges from 2.40×10¹³ cm⁻² eV⁻¹ for D1 sample to 2.73×10¹² cm⁻² eV⁻¹ for D5 sample and increases with increasing the oxide layer thickness.     

Analysis of frequency-dependent series resistance and interface states of In/SiO2/p-Si (MIS) structures

In this work, the investigation of the interface state density and series resistance from capacitance–voltage (C–V) and conductance–voltage (G/ω−V) characteristics in In/SiO₂/p-Si metal–insulator–semiconductor (MIS) structures with thin interfacial insulator layer have been reported. The thickness of SiO₂ film obtained from the measurement of the oxide capacitance corrected for series resistance in the strong accumulation region is 220 Å. The forward and reverse bias C–V and G/ω−V characteristics of MIS structures have been studied at the frequency range 30 kHz–1 MHz at room temperature. The frequency dispersion in capacitance and conductance can be interpreted in terms of the series resistance (R_s) and interface state density (D_it) values. Both the series resistance R_s and density of interface states D_it are strongly frequency-dependent and decrease with increasing frequency. The distribution profile of R_s–V gives a peak at low frequencies in the depletion region and disappears with increasing frequency. Experimental results show that the interfacial polarization contributes to the improvement of the dielectric properties of In/SiO₂/p-Si MIS structures. The interface state density value of In/SiO₂/p-Si MIS diode calculated at strong accumulation region is 1.11×10¹² eV⁻¹ cm⁻² at 1 MHz. It is found that the calculated value of D_it (≈10¹² eV⁻¹ cm⁻²) is not high enough to pin the Fermi level of the Si substrate disrupting the device operation.     

Electrical characterization of low temperature deposited TiO2 films on strained-SiGe layers

Thin films of titanium dioxide have been deposited on strained Si_0.82Ge_0.18 epitaxial layers using titanium tetrakis-isopropoxide [TTIP, Ti(O-i-C₃H₇)₄] and oxygen by microwave plasma enhanced chemical vapor deposition (PECVD). The films have been characterized by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR). Dielectric constant, equivalent oxide thickness (EOT), interface state density (D_it), fixed oxide charge density (Q_f/q) and flat-band voltage (V_FB) of as-deposited films were found to be 13.2, 40.6 Å, 6×10¹¹ eV⁻¹ cm⁻², 3.1×10¹¹ cm⁻² and −1.4 V, respectively. The capacitance–voltage (C–V), current–voltage (I–V) characteristics and charge trapping behavior of the films under constant current stressing exhibit an excellent interface quality and high dielectric reliability making the films suitable for microelectronic applications.     

Ti/Al p-GaN Schottky barrier height determined by C–V measurements

Data are presented on the rigorous method of capacitance–voltage (C–V) measurements to the barrier height of Ti/Al p-GaN Schottky junction. For a sample with Hall concentration of 5.5 × 10¹⁶/cm³ the upper limit of the modulation frequency leading the full response of the activated carriers is defined as 1.5 kHz from the capacitance versus modulation frequency (C–f) plot. The activation energy of the Mg acceptors determined from the temperature-dependent C–f plot is 0.12 eV. The barrier height estimated with this activation energy and the intercept voltage of the 1/C²–V plot drawn with the 1.5 kHz C–V data is 1.43 eV at 300 K and 1.41 eV at 500 K. This is the most reliable barrier height ever reported. A reliable room temperature C–V doping profile is demonstrated using the 1.5 KHz modulation, which is sensitive enough to resolve the presence of a 15 nm thin highly doped (8 × 10¹⁸/cm³) layer formed near the surface.     

Characterization of metal/GaN Schottky interfaces based on I–V–T characteristics

Interface properties of metal/n- and p-GaN Schottky diodes are studied by I–V–T and C–V–T measurements, and simulation of their characteristics. On the basis of the previously proposed “surface patch” model, the gross behavior of I–V–T characteristics, which includes Richardson plots together with temperature dependence of the effective Schottky barrier heights (SBHs) and n-values, can be well reproduced. Furthermore, the dependence of the true SBH on the metal work function was also deduced from high-temperature I–V curves, giving S-values of 0.28 and 0.20 for n- and p-GaN samples, respectively, and the interface Fermi level tends to be pinned at a characteristic energy of about two-third of the bandgap.     

Effects of oxygen flow rate on the properties of HfO2 layers grown by metalorganic molecular beam epitaxy

The investigations on the properties of HfO₂ dielectric layers grown by metalorganic molecular beam epitaxy were performed. Hafnium-tetra-tert-butoxide, Hf(C₄H₉O)₄ was used as a Hf precursor and pure oxygen was introduced to form an oxide layer. The grown film was characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), high-resolution transmission electron microscopy (HRTEM), and capacitance–voltage (C–V) and current–voltage (I–V) analyses. As an experimental variable, the O₂ flow rate was changed from 2 to 8 sccm while the other experimental conditions were fixed. The XPS spectra of Hf 4f and O 1s shifted to the higher binding energy due to the charge transfer effect and the density of trapped charges in the interfacial layer was increased as the oxygen flow rate increased. The observed microstructure indicated the HfO₂ layer was polycrystalline, and the monoclinic phases are the dominant crystal structure. From the C–V analyses, k = 14–16 and EOT = 44–52 were obtained, and the current densities of (3.2–3.3) × 10⁻³ A/cm² were measured at −1.5 V gate voltage from the I–V analyses.     

Dilatometry of the high-temperature proton conductor Ba3Ca1.18Nb1.82O9 − δ

Firstly, the production of solid bulk specimens of the proton conductor Ba₃Ca_1.18Nb_1.82O_{9 − gd} (BCN18) of known water content up to [H^.] = n_H/n_Ba = 0.16 is described. Secondly, measuring the length change of such samples versus water content [H^.] demonstrated that the sample lengths increased linearly with a slope of (Δl/l)/[H^.] = (2.13 ±0.07) × 10⁻². Thirdly, the density of bulk samples was found to decrease linearly with water content [H^.]. This decrease was in good agreement with the above values derived from the length change. Fourthly, high temperature dilatometry showed that samples reach the thermodynamic solubility values in water vapor atmospheres only at temperatures above 700 °C. Two time scales were observed for the time-dependence of the elongation upon exposure to water vapor. A fast process occurred within minutes above 700 °C, a slow one took several hours. The fast one was identified as the chemical diffusion of the diffusion pair H^. and V_o^. which is required for the water uptake and loss of BCN18. The chemical diffusivity of water is described by the parameters D₀ = (0.022 ± 0.002) cm²/s and ΔH* = (0.79 ± 0.05) eV.     

Photoluminescence and capacitance–voltage characterization of GaAs surface passivated by an ultrathin GaN interface control layer

A novel surface passivation technique for GaAs using an ultrathin GaN interface control layer (GaN ICL) formed by surface nitridation was characterized by ultrahigh vacuum (UHV) photoluminescence (PL) and capacitance–voltage (C–V) measurements. The PL quantum efficiency was dramatically enhanced after being passivated by the GaN ICL structure, reaching as high as 30 times of the initial clean GaAs surface. Further analysis of PL data was done by the PL surface state spectroscopy (PLS³) simulation technique. PL and C–V results are in good agreement indicating that ultrathin GaN ICL reduces the gap states and unpins the Fermi level, realizing a wide movement of Fermi level within the midgap region and reduction of the effective surface recombination velocity by a factor of 1/60. GaN layer also introduced a large negative surface fixed charge of about 10¹² cm⁻². A further improvement took place by depositing a Si₃N₄ layer on GaN ICL/GaAs structure.     

Time-dependent response of interface states determined by using differential isothermal transient spectroscopy

A method based on the differential analysis of the isothermal transients is proposed to study the dynamical properties of the charging and discharging of interface states, and several possibilities of using this method are shown. The results obtained in SiO₂/Si and Si₃N₄/SiO₂/Si samples are in agreement with the existence of a spatial and energy distribution of interface states within the insulator. From the experimental data, the concentration of traps within the insulator at 35 Å is estimated to be 5×10⁹ cm^-2 eV^-1, with a tunneling cross section 10^-19 cm², at E_c-E ≈ 0.2 eV.     

Fixed charge and interface traps at heterovalent interfaces between Si(1 0 0) and non-crystalline Al2O3–Ta2O5 alloys

Characterization by Auger electron spectroscopy (AES) and Fourier transformation infrared spectroscopy (FTIR) confirms (Ta₂O₅)_x(Al₂O₃)_1−x alloys are homogeneous pseudo-binary alloys with increased thermal stability with respect to end member oxides, Ta₂O₅ and Al₂O₃. Capacitance–voltage (C–V) and current density–voltage (J–V) data as a function of temperate show that the Ta d-states of the alloys act as localized electron traps, and are at an energy approximately equal to the conduction band offset of Ta₂O₅ with respect to Si.     

Gated photoluminescence study of oxide-free InP MIS structure having an ultrathin silicon interface control layer

In order to investigate the effectiveness of a novel oxide-free surface passivation approach for InP, using an ultrathin silicon interface control layer (Si ICL), gated photoluminescence characteristics of the Si₃N₄/Si ICL/n-InP metal–semiconductor–insulator (MIS) structure were studied at room temperature. As compared with gated PL spectra of Si₃N₄/n-InP MIS without Si ICL, PL intensities of the sample with Si ICL were much more strongly modulated by the gate voltage. The interface state density distribution was estimated by an optical analog of the Terman’s C–V analysis and a good agreement with the C–V analysis was obtained. The result indicates complete removal of Fermi level pinning over the entire bandgap in the novel oxide-free MIS structure.     

Nonergodicity and dynamical approach to the anharmonic oscillator

General lower bounds for the time average C^AA(∞)≡lim_T→∞(1/T)∝^T₀ C^AA(t) dt of the correlation C^AA(t)≡A(t)A(0)−A² of an arbitrary variable A are derived, which depend only on the temperature derivatives of the canonical averages of A and the Hamiltonian of the system. The bounds may be used to give good estimations for C^AA(∞) which is different from zero when A is nonergodic. It is important to take care of these terms when dynamical theories made for interacting systems are applied to isolated systems. We show explicitely that our recently developed dynamical approach to phonon systems with quartic anharmonicity yields excellent results for the corresponding isolated system, the anharmonic single well oscillator, when nonvanishing time averages are taken into account.     

The angular intensity correlation functions C(1) and C(10) for the scattering of light from randomly rough dielectric and metal surfaces

We study the statistical properties of the scattering matrix S(q|k) for the problem of the scattering of light of frequency ω from a randomly rough one-dimensional surface, defined by the equation x₃=ζ(x₁), where the surface profile function ζ(x₁) constitutes a zero-mean, stationary, Gaussian random process. This is done by studying the effects of S(q|k) on the angular intensity correlation function C(q,k|q',k')=〈I(q|k)I(q'|k')〉-〈I(q|k)〉〈I(q'|k')〉, where the intensity I(q|k) is defined in terms of S(q|k) by I(q|k)=L^-1₁(ω/c)|S(q|k)|², with L₁ the length of the x₁ axis covered by the random surface. We focus our attention on the C⁽¹⁾ and C⁽¹⁰⁾ correlation functions, which are the contributions to C(q,k|q',k') proportional to δ(q-k-q'+k') and δ(q-k+q'-k'), respectively. The existence of both of these correlation functions is consistent with the amplitude of the scattered field obeying complex Gaussian statistics in the limit of a long surface and in the presence of weak surface roughness. We show that the deviation of the statistics of the scattering matrix from complex circular Gaussian statistics and the C⁽¹⁰⁾ correlation function are determined by exactly the same statistical moment of S(q|k). As the random surface becomes rougher, the amplitude of the scattered field no longer obeys complex Gaussian statistics but obeys complex circular Gaussian statistics instead. In this case the C⁽¹⁰⁾ correlation function should therefore vanish. This result is confirmed by numerical simulation calculations.     

Fabrication of p-Si/β-FeSi2 balls/n-si structures by MBE and their electrical and optical properties

We report on the formation technique of single-crystalline β-FeSi₂ balls (<100 nm) embedded in a Si p–n junction region by Si molecular beam epitaxy (MBE). β-FeSi₂ films grown on Si (0 0 1) by reactive deposition epitaxy (RDE) aggregated into islands after annealing at 850°C in ultrahigh vacuum. The islands of β-FeSi₂ aggregated further into a ball shape by following the Si MBE overgrowth at 750°C. It was found from X-ray diffraction (XRD) patterns that the epitaxial relationship between the two materials, and single-crystalline nature were preserved even after the annealing and the Si overgrowth. Capacitance–voltage (C–V) characteristics and transmission electron microscope (TEM) images revealed that a lot of defects were introduced around the embedded β-FeSi₂ balls with an increase of embedded β-FeSi₂ quantity.     

Zero-modes and thermodynamics of disordered spin-1/2 ladders

The influence of non-magnetic doping on the thermodynamic properties of two-leg S = 1/2 spin ladders is studied in this paper. It is shown that, for a weak interchain coupling, the problem can be mapped onto a model of random mass Dirac (Majorana) fermions. We investigate in detail the structure of the fermionic states localized at an individual mass kink (zero-modes) in the framework of a generalized Dirac model. The low-temperature thermodynamic properties are dominated by these zero-modes. We use the single-fermion density of states, known to exhibit the Dyson singularity in the zero-energy limit, to construct the thermodynamics of the spin ladder. In particular, we find that the magnetic susceptibility χ diverges at T → 0 as 1/T ln²(1/T), and the specific heat behaves as C 1/ln³(1/T). The predictions on magnetic susceptibility are consistent with the most recent results of quantum Monte Carlo simulations on doped ladders with randomly distributed impurities. We also calculate the average staggered magnetic susceptibility induced in the system by such defects.     

Outer curvature and conformal geometry of an imbedding

The differential geometry of an imbedded (e.g. string or membrane world sheet) surface in a higher-dimensional background is shown to be conveniently describable (except in the null limit case) in terms of what are designated as its first, second, and third fundamental tensors, which will have the respective symmetry properties η_μν = η_(μν) as a trivial algebraic identity, K_μν^ρ = K_(μν)^ρ as the “generalised Weingarten identity”, which is the (Frobenius type) integrability condition for the imbedding, and Ξ_λμν^ρ = Ξ_(λμν)^ρ as a “generalised Codazzi equation”, which depends on the background geometry being flat or of constant curvature, needing replacement by a more complicated expression for a generic value of the background curvature B_κλ^μ_ν. The “generalised Gauss equation” expressing the dependence on this background curvature of the internal curvature tensor R_κλ^μ_ν of the imbedded surface is converted into terms of the first and second fundamental tensors, and it is thereby demonstrated that the vanishing of the (conformally invariant) “conformation tensor”, i.e. the trace free part C_μν^ρ of the second fundamental tensor K_μv^ρ, is a sufficient condition for conformal flatness of the imbedded surface (and thus in particular for the vanishing of its (Weyl type) conformal curvature tensor C_κλ^μ_ν) provided the background is itself conformally flat. In a trio of which the first two members are the generalised Gauss and Codazzi equations, the “third” member is shown to give an expression in terms of C_μν^ρ for the (trace free, conformally invariant) “outer curvature” tensor Ω_κλ^μ_ν whose vanishing is the condition for feasibility of the natural generalisation of the Walker frame transportation ansatz. The vanishing of C_μν^ρ is shown to be sufficient in a conformally flat background for the vanishing also of Ω_κλ^μ_ν.     

Non-Fermi liquid regimes in U1−xMxPd2Al3(M=Y,Th)

The temperature-composition (T–x) phase diagram and NFL characteristics in the electrical resistivity ρ(T), specific heat C(T), and magnetic susceptibility χ(T) at low temperatures for the systems U_1−xM_xPd₂Al₃ (M=Y,Th) are described. The T–x phase diagram, the NFL characteristics, and the underlying mechanism for the NFL behavior are distinctly different for M=Y³⁺ and Th⁴⁺, apparently reflecting the difference in valence of the M atom substituents, and suggesting that U is tetravalent in these two systems.     

Effective Ru moment in RuSr2Eu2−xCexCu2O10 from high-temperature magnetic susceptibility

We have made high-temperature (250 K<T<800 K) DC susceptibility measurements in the compounds RuSr₂Eu_2−xCe_xCu₂O₁₀ for x=0.6,0.8, and 1.0 in order to determine the Ru effective magnetic moment. After carefully subtracting all contributions to the magnetic susceptibility except that of the Ru ions, we have been able to fit the Ru susceptibility with a law χ_Ru=χ₀+C_Ru/(T−Θ_Ru). We have found that the Ru effective moment falls between the values expected for Ru⁵⁺ in spin states and . We have also found a dependence of μ_eff(Ru) and Θ_Ru with the Ce content x.     

Spectral intensities in the ν1 band of NH3

Intensities have been measured for individual transitions in the Q and R branches of the ν₁ band of NH₃ using a difference-frequency laser spectrometer. The data yield an integrated band strength of S⁰_v=219.36±1.03 cm^-2/MPa at 297 K, corresponding to a transition moment of μ_v = 8.535(20) × 10^-32 C·m, and a Herman-Wallis correction factor, (1 + _jm)², where _j = 0.0209(20). The intensities of a few lines for K 7 were noticeably perturbed by a perpendicular Coriolis interaction with 2ν₄ (E, L = 2), so were excluded from the fit. A small sample of ν₃ band lines occurring in the ν₁ band scans also yields a rough estimate of the ν₃ band intensity with evident irregular perturbations.     

Pressure–temperature studies on conductivity of TlX(X=Cl,Br,I) compounds:: I: phase diagram. II: ionic mobility

We have measured the conductivity σ of TlX(X=Cl, Br, I) compounds up to 5.3 GPa and between 300–823 K. The σ–T dependence for all compounds can be divided into three distinct regions: (i) low temperature (LT), <400 K, with unusual negative σ–T dependence, (ii) intermediate temperature (IT), 400<650 K, with positive σ–T dependence and (iii) high temperature (HT), T>650 K, with positive σ–T dependence. The σ–T isobars were used to construct the T–P solid phase diagram for each compound. The LT region data indicate a new meta-stable phase in the 1.0–3.5 GPa range. The LT→IT transition is characterized by an inverse σ–T dependence followed by normal Arrhenius behavior up to and including the HT region. The extrapolation to 1 atm of the P-dependent boundary between IT and HT regions above 3 GPa for each compound in the P–T plot yields a value close to its respective normal (1 atm) T_melt suggesting a solid order–disorder transition type paralleling -AgI behavior. The abrupt drop in conductivity in the LT region for P between 2.5–4.1 GPa of all compounds is at variance with the Arrhenius behavior observed for unperturbed ion migration implying the appearance of a second factor overriding the Arrhenius temperature dependence. Normal Arrhenius σ–T dependence prevails in both IT and HT regions with Q_c values of 85–100 kJ mol⁻¹ and 50–75 kJ mol⁻¹, respectively. The higher conductivities at 0.4 GPa for TlBr and TlI relative to their 1 atm data and the increasing σ with P are in strong contrast to the normal σ-P behavior of TlCl. The dependence of activation volume ΔV^‡ on T for TlCl, i.e. ΔV^‡>0, shows abnormally high values with a maximum at 500 K for P<3.0 GPa but reasonable ΔV^‡ values appear above 3.0 GPa. The ΔV^‡–T dependence for both TlBr and TlI with ΔV^‡<0 is incompatible with an ion transport mechanism suggesting an electronic conduction process and implying an ionic–metallic transition at higher pressures. These contrasting conductivity features are discussed and interpreted in terms of electronegativity differences and bonding character rather than structure.