大面积金纳米线光栅的制备

利用激光干涉光刻和金纳米颗粒胶体溶液制备了宽度在100 nm以下且总面积达到平方厘米量级的金纳米线光栅结构.制备过程中,首先在表面镀有厚度约为200 nm的铟锡氧化物薄膜的面积为1 cm×1 cm的玻璃基片表面旋涂光刻胶,然后利用紫外激光干涉光刻制备光刻胶纳米光栅结构.有效控制干涉光刻过程中的曝光量、显影时间,获得小占...     

波导耦合纳米光栅结构的光学滤波和角分辨调谐特性

利用干涉光刻技术制备了波导耦合纳米光栅结构,系统研究了其波导共振模式的角分辨调谐特性及其对光栅参数、入射光偏振特性的依赖关系,并作了相应的理论模拟.特别研究了光栅周期和厚度对波导共振模式角分辨调谐速率的影响.实验结果对于器件进一步应用于滤波、生物传感技术具有重要的指导意义. 关键词： 波导耦合光栅 干涉光刻 角分辨 调谐速率     

金光栅/金纳米颗粒SERS基底的设计、制备及其性能

表面等离子激元（SPP）和局域表面等离子共振（LSPR）耦合产生的电场增强显著高于单纯LSPR引起的电场增强。因此一种新型高效的表面增强拉曼散射（SERS）基底是寄希望于在一种复合基底中实现SPP-LSPR耦合获得的。基于SPP-LSPR耦合机理,提出一种针对633 nm激光使用的金光栅/金纳米颗粒SERS基底的设计思路以及光栅和纳米颗粒的具体结构参数。为了验证设计方法的正确性,利用电子束光刻法和化学合成法分别制备了具有相应几何尺寸特征的金光栅和金纳米颗粒,并将它们复合在一起得到了光栅/纳米颗粒SPP-LSPR耦合型复合SERS基底,这个基底相比仅有金纳米颗粒制备的LSPR型SERS基底,在检测R6G溶液时浓度可以降低2个数量级,增强因子是后者的72倍,实验结果和时域有限差分（FDTD）法理论拟合的结果基本一致。     

利用干涉光刻技术制备LED表面微纳结构

为了制备大面积周期性微纳米结构以提高LED的发光效率,建立了劳厄德(Lloyd)干涉光刻系统。简单分析了该干涉光刻系统的工作原理,并介绍了利用干涉曝光工艺制备一维光栅、二维点阵、孔阵列等纳米结构图形的具体实验过程。最后对纳米图形进行结构转移,制备出了金属纳米结构。实验结果表明:利用劳厄德干涉光刻系统,可以在20 mm×20 mm大小的ITO衬底上稳定制备出周期为450 nm的均匀光栅或二维点阵列图形结构,它们的占空比也是可以调节变化的。     

基于硅纳米线波导的两级光子晶体缩束器

鉴于在微观领域光波的缩束对实现光电集成的重要意义,提出了基于硅纳米线波导的两级光子晶体缩束器。其中一级压缩基于W5型和W1型光子晶体波导间的高效耦合。二级压缩则由宽为0.1μm,长为3.06μm的纳米线波导和W1型光子晶体波导构成,通过二者的高效耦合实现光束压缩。当W1型光子晶体波导和纳米线波导间介质柱的半径为0.04μm时,对于1550nm波长的电磁波,缩束器的通光效率可达93.4%,压缩比为16.08,出射光束半峰全宽仅为0.148μm。     

复合Ag/SiO_2正弦光栅基底SERS特性分析

当前微流控表面增强拉曼散射(SERS)检测领域常用的贵金属纳米颗粒溶胶单位体积内热点区域数量有限且热点区域范围较小,而贵金属纳米三维阵列结构加工时间长,成本高昂并存在"记忆效应"。本文提出了集成到微流道的复合Ag/SiO_2正弦光栅SERS基底结构,可以利用激光干涉光刻技术进行制备,无需预制掩膜版,可实现大面积、低成本SERS基底简易快速制备。利用严格耦合波分析方法(RCWA)建立了复合正弦光栅表面电场增强数学评估模型,推导了表面等离子体共振(SPP)耦合吸收率数学模型,分析了入射光、复合正弦光栅结构与外界环境介电常数的优化匹配关系,得到了入射光785 nm条件下的最佳复合正弦光栅结构。通过制备加工并实验验证了复合正弦光栅的SERS性能,SERS增强因子(EF)能够达到10~4。     

飞秒激光光刻波导偏振器

飞秒激光诱导折射率变化提供了一种灵活的三维光子器件制作手段.飞秒激光光刻的Ⅱ类波导具有偏振导光特性,可以作为波导偏振器,但是对于要保留的偏振分量损耗太大.本文阐述了一种利用飞秒激光在熔融石英中制作的新型低损耗波导偏振器.它由中间的一根Ⅰ类波导及两侧的两根Ⅱ类纳米光栅轨迹构成.基于飞秒激光诱导的纳米光栅的偏振依赖散射特性...     

飞秒激光在6H SiC晶体表面制备纳米微结构

激光诱导周期性纳米微结构在多种材料包括电介质、半导体、金属和聚合物中观察到。研究了800nm和400nm飞秒激光垂直聚焦于6H SiC晶体表面制备纳米微结构。实验观察到800nm和400nm线偏光照射样品表面分别得到周期为150nm和80nm的干涉条纹,800nm圆偏振激光单独照射样品表面得到粒径约100nm的纳米颗粒。偏振相互垂直的800nm和400nm激光同时照射晶体得到粒径约100nm的纳米颗粒阵列,该纳米阵列的方向随400nm激光强度增加而向400nm偏振方向偏转。利用二次谐波的观点对以上纳米结构的形成给出了解释。     

一种简单高效的制备硅纳米孔阵结构的方法

本文介绍了一种简单高效的制备硅纳米孔阵结构的方法. 利用激光干涉光刻技术, 结合干法和湿法刻蚀工艺, 直接将光刻胶点阵刻蚀为硅纳米孔阵结构, 省去了图形反转工艺中的金属蒸镀和光刻胶剥离等必要步骤, 在2英寸的硅 (001) 衬底上制备了高度有序的二维纳米孔阵结构. 利用干法刻蚀产生的氟碳有机聚合物作为湿法刻蚀的掩膜, 以及在干法刻蚀时对样品进行轻微的过刻蚀, 使SiO₂点阵图形下形成一层很薄的硅台面, 是本方法的两个关键工艺步骤. 扫描电子显微镜图片结果表明制备的孔阵图形大小均匀, 尺寸可控, 孔阵周期为450 nm, 方孔大小为200–280 nm. 关键词： 激光干涉光刻 纳米阵列 刻蚀 氟碳有机聚合物     

TE0导模干涉刻写周期可调亚波长光栅理论研究

通过棱镜耦合激发非对称金属包覆介质波导结构中的TE₀导波模式, 利用两束TE₀模的干涉从理论上实现了周期可调的亚波长光栅刻写. 分析了TE₀模式的色散关系, 刻写亚波长光栅的周期与激发光源、棱镜折射率、光刻胶薄膜厚度及折射率之间的关系. 用有限元方法数值模拟了金属薄膜、光刻胶薄膜和空气多层结构中TE₀导模的干涉场分布. 研究发现, 激发光源波长越短, TE₀ 模干涉刻写的亚波长光栅周期越小; 光刻胶越厚, 刻写的亚波长光栅周期越小; 高折射率光刻胶有利于更小周期亚波长光栅的刻写. 相较于表面等离子体干涉光刻, 基于TE₀ 模的干涉可在厚光刻胶条件下通过改变激发光源、棱镜折射率、光刻胶材料折射率、特别是光刻胶薄膜的厚度等多种方式实现对亚波长光栅周期的有效调控.     

The three-dimensional photonic crystals coated by gold nanoparticles

We report on the fabrication of metallodielectric photonic crystals by means of interference lithography and subsequent coating by gold nanoparticles. The grating is realized in a SU-8 photoresist using a He-Cd laser of wavelength 442 nm. The use of the wavelength found within the photoresist low absorption band enables fabricating structures that are uniform in depth. Parameters of the photoresist exposure and development for obtaining a porous structure corresponding to an orthorhombic lattice are determined. Coating of photonic crystals by gold nanoparticles is realized by reduction of chloroauric acid by a number of reductants in a water solution. This research shows that the combination of interference lithography and chemical coating by metal is attractive for the fabrication of metallodielectric three-dimensionally periodic microstructures.     

Plasmonic structure generation by laser illumination of silica colloid spheres deposited onto prepatterned polymer-bimetal films

Plasmonic structures are prepared on bimetal films evaporated onto glass substrates applying a multi-step process, and atomic force microscopy is utilized to study the structures after each step. Sub-micrometer gratings are generated on polycarbonate films spin-coated onto silver-gold bimetal layers by interference lithography (IL) applying the fourth harmonics of a Nd:YAG laser. These polymer gratings are used as prepatterned templates in order to deposit silica colloid spheres by spin-coating. It is shown that the conditions of periodic silica sphere-array formation along the template valleys are sufficiently large grating modulation depth, appropriate ratio of silica sphere diameter to grating period, and optimized speed of spinning. The periodic silica sphere arrays are illuminated by a homogeneous KrF excimer laser beam, and periodically arrayed sub-wavelength holes are drilled into bimetal films via colloid sphere lithography (CSL). The characteristic dimensions of the resulted plasmonic structures are defined by the polymer grating period and by the silica colloid sphere diameter. Attenuated total reflection spectroscopy is performed exciting plasmons on different metal-dielectric interfacial structures by the second harmonic of a continuous Nd:YAG laser. The polar and azimuthal angle dependent grating-coupling and scattering effects of the complex periodic structures on the resonance characteristic of plasmons is demonstrated.     

Fabrication of 50 nm period gratings with multilevel interference lithography

We have developed a multilevel interference lithography process to fabricate 50 nm period gratings using light with a 351.1 nm wavelength. In this process multiple grating levels patterned by interference lithography are overlaid and spatial-phase aligned to a common reference grating using interferometry. Each grating level is patterned with offset phase shifts and etched into a single layer to achieve spatial-frequency multiplication. The effect of the multilayer periodic structure on interference lithography is examined to optimize the fabrication process. This process presents a general scheme for overlaying periodic structures and can be used to fabricate more complex periodic structures.     

Modified solution-processible fabrication of metallic photonic crystals with template removal

High-temperature annealing and pre-annealing lift-off procedures are employed to improve the solutionproeessible technique for the fabrication of one- （1D） and two-dimensional （2D） metallic photonic crystals （MPCs） based on colloidal gold nanoparticles. This enables the successful fabrication of gold nanowires or nanocylinder array structures with the photoresist template removed completely, which is crucial for the application of MPCs in biosensors and optoelectronic devices. Microscopic measurements show homogeneous 1D and 2D photonic structures with an area as large as 100 mm2. Plasmonic resonance of the gold nanostructures and its coupling with the resonance mode of the planar waveguide underneath the photonic structures are observed, implying the excellent optical properties of this kind of MPCs based on the improved fabrication technique.     

软X射线位相型金透射光栅的设计与制作

根据衍射光栅的标量理论,计算并讨论了金透射光栅在软X波段衍射效率对光栅厚度和占宽比的依赖关系.结果表明,选择合适的光栅槽深和占宽比,高达 21.9%的衍射效率可能被获得,远高于振幅型光栅的+1级衍射效率10.14%.通过全息光刻与电镀转移技术制作的位相型金透射光栅由300nm的聚酰亚胺薄膜支撑,光栅槽深200nm,占宽比为0.55,周期为1μm,面积为20mm×5mm.在国家同步辐射装置上,测得其+1级透射衍射效率在波长λ=7.425nm时获得最大值,约为16%. 关键词： 透射位相光栅 全息光刻 电镀     

Lithography-free fabrication of large-area plasmonic nanostructures using colloidal gold nanoparticles

We report simple and efficient fabrication of large-area gold nanostructures using solution-processible gold nanoparticles, where lithography and vacuum evaporation techniques are not involved in the fabrication processes. These gold nanoisland structures exhibit strong particle plasmon resonance that is characterized by optical extinction spectroscopy in the visible spectral range. The tunability of the optical response is realized by controlling the annealing temperature and by changing the concentration of the colloidal solutions of gold nanoparticles. This enables a low-cost route for exploiting new photonic devices, biosensors, and optoelectronic devices with localized field-enhancement.     

一种控制矩形光刻胶光栅槽深和占宽比的方法

利用光刻胶的非线性效应可以制作出了矩形的全息光栅。制作矩形光栅时,对槽形的控制被简化为对槽深和占宽比这两个参量的控制。首先借助实时潜像监测技术获得最佳曝光量,然后根据显影监测曲线的特征找出光栅槽底的残胶厚度为零的显影时刻,就能得到槽底干净的矩形光栅,同时保证槽深近似等于光刻胶的初始厚度;如果此后继续显影,就能适度减小占宽比。实验结果和理论分析都证实了这种控制方法的可靠性。对1200lp／mm的光栅,目前工艺能精确调控的最大槽深为1μm,占宽比在0．2～0．6范围内。实验还揭示,为了提高对光栅槽形的调控能力,必须首先提高干涉条纹的稳定性。     

Enhanced surface plasmon interference lithography from cavity resonance in the grating slits

Surface plasmon interference lithography based on grating diffraction has been studied both theoretically and experimentally in recent years. In this paper, we demonstrate that the cavity resonance in the grating slits can improve the subwavelength interference, not only the intensity but also the uniformity of the pattern. Both the typical lithography structure which merely consists of periodic metallic gratings and the modified structure equipped with a reflection layer are studied. The finite element method has been performed to study the interference pattern. Numerical simulations show that the property of the interference pattern is the optimum when cavity resonance happens. This enhancement can be applied to all the lithography structures which are based on the grating diffraction.     

High performance diffraction gratings made by e-beam lithography

Gratings are essential components in different high performance optical set-ups such as spectrometers in space missions or ultrashort-pulse laser compression arrangements. Often such kinds of applications require gratings operating close to the technological accessible limits of today??s fabrication technology. Typical critical parameters are the diffraction efficiency and its polarization dependency, the wave-front error introduced by the grating, and the stray-light performance. Additionally, space applications have specific environmental requirements and laser application typically demand a high damage threshold. All these properties need to be controlled precisely on rather large grating areas. Grating sizes of 200?mm or even above are not unusual anymore. The paper provides a review on how such high performance gratings can be realized by electron-beam lithography and accompanying technologies. The approaches are demonstrated by different examples. The first example is the design and fabrication of the grating for the Radial-Velocity-Spectrometer of the GAIA-mission of the ESA. The second grating is a reflective pulse compression element with no wavelength resonances due to an optimized design. The last example shows a three level blazed grating in resonance domain with a diffraction efficiency of approximately 86?%.