Ti掺杂ZnTe体材料的优化光致发光光谱

针对光致发光光谱法研究ZnTe:Ti的困难,对包括激发能量、激发功率与激发光斑大小、水汽干扰和测量温度等实验条件进行了细致的优化.发现: (1)低于ZnTe禁带宽度的激发能量能给出相对强的光致发光光谱; (2) 水汽干扰既影响谱线的相对强度又增大谱线能量的测定误差; (3)相对强的激光聚焦有利于获得较好的光致发光光谱.可靠地观察到位于3903.5和3905.9cm^-1能量位置处的零声子光致发光谱线. 根据两谱线的能量间距和相对强度随 温度的变化关系,并借助于晶体场理论对四面体晶体场中 关键词： Ti掺杂 ZnTe 光致发光     

CdSe/CdZnSe超晶格的激子光学性质的研究

用分子束外延法在GaAs衬底上生长了CdSe/Cd0.65Zn0.35Se超晶格结构。利用X射线衍射（XRD）、77K下变密度激发的光致发光光谱和变温度光致发光光谱研究了CdSe/CdZnSe超晶格结构和激光复合特性，在该材料中观测到激子－激子散射发射峰，变密度激发光致发光光谱和谱温度光致发光光谱证实了这一现象，激子发射峰的线宽随着温度的升高而展宽，低温时发光峰的宽度主要是由合金组分和阱垒起伏引起的，没温时激子线宽展宽是由于激子与纵光学声子和离化的施主杂质间的散射作用引起的，光致发光的强度随着温度的升高而降低，这主要是由激子的热离化造成的，也就是说，热激发使得电子或空穴由阱中跃迁至垒上。     

温度对CdSe/znS量子点吸收光谱和光致发光谱的影响

测量了分散于正己烷溶液和甲苯溶液中的CdSe/ZnS量子点在室温到近溶液沸点温度间的吸收与光致发光光谱,比较了两种不同的CdSe/ZnS量子点的光谱特性,讨论了温度对吸收和光致发光光谱峰值波长以及相对强度的影响。结果表明:在25~100℃范围内,CdSe/ZnS量子点激子吸收峰波长有微小红移,最大约为4nm;光致发光光谱峰值波长略有红移,但最大不超过6nm。根据光致发光光谱测量的结果,确定了Varshni定律中关于CdSe/ZnS量子点禁带宽度的两个经验参数:α=(2.0±0.2)×10^-4eV/K和β=(200±30)K。温度对CdSe/ZnS量子点吸收强度影响不大,荧光发射强度与温度呈线性关系增强。     

CdSe/ZnS量子点白光器件的热稳定性

测量了一种绿色和红色CdSe/ZnS量子点/硅胶复合薄膜的吸收光谱和光致发光光谱。结果表明,量子点薄膜在不同的激发波长下,拥有稳定的光致发光光谱,峰值波长分别为527 nm和628 nm。将量子点/硅胶复合薄膜与YAG\:Ce~(3+)黄色荧光粉结合,制备了两种不同结构的白色发光二极管(WLED),测量了其在不同驱动电流下的光学性能和表面温度。在350 mA的驱动电流下,Ⅱ号WLED的表面温度比Ⅰ号WLED低26.5℃。在55℃温度和55%相对湿度条件下进行老化实验。结果表明,在不同的驱动电流下两种WLED的光学性能基本一致且稳定性良好。     

氧化锌量子点浅施主能级增强绿色光致发光光谱的实验证明（英文）

利用溶胶-凝胶法制备了粒径在5nm左右的氧化锌量子点,通过测量氧化锌量子点光致发光光谱、吸收光谱以及荧光寿命得到氧化锌量子点绿光光谱可分为两种且对应不同发光机理。较高能量的绿光光谱是电子由导带底跃迁至氧空穴辐射产生的,而较低能量的则归因于电子由浅施主能级跃迁到氧空位,这种浅施主能级能够增强绿光发射且激发光能量稍小于带隙时绿光光谱相对强度达到最大。其次,实验得到氧化锌量子点的蓝光光谱是由于激发电子从锌间隙能级跃迁至价带产生。该研究提出并分析了氧化锌量子点绿光光谱的两种发光机制,可为其在光学方面的应用提供参考。     

氧化锌量子点浅施主能级增强绿色光致发光光谱的实验证明

利用溶胶-凝胶法制备了粒径在5 nm左右的氧化锌量子点,通过测量氧化锌量子点光致发光光谱、吸收光谱以及荧光寿命得到氧化锌量子点绿光光谱可分为两种且对应不同发光机理。较高能量的绿光光谱是电子由导带底跃迁至氧空穴辐射产生的,而较低能量的则归因于电子由浅施主能级跃迁到氧空位,这种浅施主能级能够增强绿光发射且激发光能量稍小于带隙时绿光光谱相对强度达到最大。其次,实验得到氧化锌量子点的蓝光光谱是由于激发电子从锌间隙能级跃迁至价带产生。该研究提出并分析了氧化锌量子点绿光光谱的两种发光机制,可为其在光学方面的应用提供参考。     

硅中稀土掺杂层的光致发光研究及其关键问题

利用离子注入技术,对稀土掺杂到半导体单晶硅中的光致发光行为进行了研究。室温下得到了La,Ce和Nd稀土掺杂层的蓝紫色光致发光光谱,并首次观测到硅中稀土掺杂层室温下的光致上转换发光现象。光致发光强度随着稀土掺杂量的增加和热处理温度的上升急剧增强。在紫外光激发下,发光强度随着激发光波长的减小而增大;在光致上转换过程中,发光强度随着激发波长的增加而上升。这表明光致发光强度与稀土元素的掺杂量、掺杂层的结构与热处理温度有密切的关系。文章对在室温下这些稀土掺杂层的光致发光行为进行了分析,并提出了硅中稀土掺杂层光致发光行为研究今后需要重点解决的几个主要问题。     

退火对a-SixC1-x:H薄膜带尾态的影响

本文研究了退火后的a-Si_xC_1-x:H薄膜的光致发光光谱,采用发光光谱的峰值能量与测量温度之间的关系判别带尾宽度的大小。实验表明,发光峰值能量随退火温度的升高而移向低能。用指数带尾模型计算了带尾宽度。结果表明,随着退火温度的上升带尾变小。文中对这些结果进行了讨论。 关键词：     

非掺杂GaN的黄光发射模型确定

提出了一种新的光谱———吸收归一化光致发光激发谱,并用这种光谱研究了非掺杂GaN的黄光发射.实验上首次直接测量出了黄光发射的初始态的共振吸收峰位,从而解决了长期争论的有关黄光发射的发光模型问题 关键词： GaN薄膜 黄光发射 吸收归一化光致发光激发谱     

高浓度Er/Yb共掺ZnO薄膜的结构及室温光致发光特性

采用射频磁控溅射方法制备了Er/Yb共掺ZnO薄膜,研究了退火处理对高浓度Er/Yb共掺ZnO薄膜的结构演化和光致发光(PL)特性的影响。X射线衍射分析结果表明:Er/Yb掺杂导致ZnO薄膜的晶粒细化及择优取向性消失,ZnO晶粒随退火温度的增加而逐渐长大。900℃退火时,出现Er3 、Yb3 偏析,退火温度高于1000℃时,薄膜与基体间发生了界面反应,1200℃时,ZnO完全转变为Zn2SiO4相。光致发光测量结果表明:高于900℃退火处理后,Er/Yb共掺ZnO薄膜在1540 nm附近具有明显的光致发光,发光强度在退火温度为1050℃时达到最大值;光致发光光谱呈现典型的晶体基质中Er3 离子发光光谱所具有的明锐多峰结构特征。此外,探讨了薄膜结构演化及其对光致发光光谱的影响。     

Structural and optical properties of Fe-doped hydrogenated amorphous carbon films prepared from trans-2-butene by plasma enhanced metal organic chemical vapor deposition

Fe-doped hydrogenated amorphous carbon (a-C:H:Fe) films were deposited from a gas mixture of trans-2-butene/ferrocene/H₂ by plasma enhanced metal organic chemical vapor deposition. X-ray photoelectron spectroscopy, Fourier transform infrared spectra and Raman spectra were used to characterize the composition and the bonding structure of the a-C:H:Fe and a-C:H films. Optical properties were investigated by the UV–visible spectroscopy and the photoluminescence (PL) spectra. The Fe-doped films contain more aromatic structures and C=C bonds than the undoped films. The sp ² carbon content and sp ² clustering of the films increase, and aromatic-like rings’ structures become richer after Fe-doping. The Tauc optical gap of the a-C:H:Fe films become narrower by 0.3 eV relative to the value of the a-C:H films. The PL peak shifts from 2.35 eV of the a-C:H films to 1.95 eV of the a-C:H:Fe films, and the PL intensity of the a-C:H:Fe films is greatly enhanced. A deep level emission peak around 2.04 eV of the a-C:H:Fe films is observed.     

Temperature dependent surface and spectral modifications of nano V<Subscript>2</Subscript>O<Subscript>5</Subscript> films

Nanocrystalline V₂O₅ films have been deposited on glass substrates at 300°C substrate temperature using thermal evaporation technique and were subjected to thermal annealing at different temperatures 350, 400, and 550°C. X-ray diffraction (XRD) spectra exhibit sharper and broader characteristic peaks respectively indicating the rearrangement of nanocrystallite phases with annealing temperatures. Other phases of vanadium oxides started emerging with the rise in annealing temperature and the sample converted completely to VO₂ (B) phase at 550°C annealing. FESEM images showed an increase in crystallite size with 350 and 400°C annealing temperatures followed by a decrease in crystallite size for the sample annealed at 550°C. Transmission spectra showed an initial redshift of the fundamental band edge with 350 and 400°C while a blue shift for the sample annealed at 550°C, which was in agreement with XRD and SEM results. The films exhibited smart window properties as well as nanorod growth at specific annealing temperatures. Apart from showing the PL and defect related peaks, PL studies also supported the observations made in the transmission spectra.     

退火温度对Er/Yb共掺Al2O3薄膜的光致荧光光谱的影响

通过对不同退火条件下Er/Yb共掺Al_２O_３薄膜光致荧光(PL)光谱的 系统分析，研究了高Er/Yb掺杂浓度所导致的晶体场变化对薄膜PL光谱的影响，并结合薄膜结构分析，探讨了Al_２O_３薄膜的结晶状态在Er^３＋激活、PL光谱宽化 中的作用及可能的物理机理.研 究结果表明：退火处理所导致的Er^３＋ PL光谱的变化与薄膜的微观状态之 间有着密 切的联系.在600—750℃范围内，薄膜呈非晶态结构，薄膜荧光强度的增加主要是薄膜内缺 陷减少所致；在800—900℃范围内，γ-Al_２O_３相的出现是导致荧 光强度明显增加的主 要原因；当退火温度为1000℃时，Er，Yb的大量析出致使荧光强度的急剧下降.此外，对PL 光谱线形分析表明，各子能级跃迁的相对强度变化是导致荧光光谱宽化的主要因素. 关键词： Er/Yb共掺 ２O_３薄膜')" href="#">Al_２O_３薄膜 光致荧光     

Photoluminescent properties of silicon carbide and porous silicon carbide after annealing

Photoluminescent (PL) p-type 6H porous silicon carbides (PSCs), which showed a strong blue-green photoluminescence band centered at approximately 490 nm, were annealed in Ar and vacuum conditions. The morphological, optical, and chemical states after annealing are reported on electrochemically etched SiC semiconductors.The thermal treatments in the Ar and vacuum environments showed different trends in the PL spectra of the PSC. In particular, in the case of annealing in a vacuum, the PL spectra showed both a weak red PL peak near 630 nm and a relatively intense PL peak at around 430 nm in the violet region. SEM images showed that the etched surface had spherical nanostructures, mesostructures, and islands. With increasing annealing temperature it changes all spherical nanostructures. The average pore size observed at the surface of the PSC before annealing was of the order of approximately 10 nm.In order to investigate the surface of a series of samples in detail, both the detection of a particular chemical species and the electronic environments at the surface are examined using X-ray photoelectron spectroscopy (XPS). The chemical states from each XPS spectrum depend differently before and after annealing the surface at various temperatures. From these results, the PL spectra could be attributed not only to the quantum size effects but also to the oxide state.     

氢稀释制备的非晶碳膜的绿光和蓝光发射

在电容耦合式PECVD系统中,以CH4和H2为气源,通过控制H2的流量制备了一系列氢化非晶碳膜（a-C:H)样品。利用傅里叶变换红外光谱（FTIR）、光致发光谱（PL）和吸收谱对a-C:H膜的结构及光学性质进行了研究。结果表明：氢稀释可以在一定程度上减少碳的sp^2团簇的形成,增大它的光学带隙,并改变薄的微结构。与此同时,光致发光峰随郑 光学带隙的增大而蓝移;当光学带隙增大2．72eV时,出现了2．4eV（绿光）和2．97eV(蓝光）组成的发光峰。     

Photoluminescence evolution in self-ion-implanted and annealed silicon

Si⁺ ion-implanted silicon wafers are annealed at different temperatures from room temperature to 950~℃ and then characterized by using the photoluminescence (PL) technique at different recorded temperatures (RETs). Plentiful optical features are observed and identified clearly in these PL curves. The PL spectra of these samples annealed in different temperature ranges are correspondingly dominated by different emission peaks. Several characteristic features, such as an R line, S bands, a W line, the phonon-assistant W^\rm TA and Si^\rm TO peaks, can be detected in the PL spectra of samples annealed at different temperatures. For the samples annealed at 800~\du, emission peaks from the dislocations bounded at the deep energy levels of the forbidden band, such as D_1 and D₂ bands, can be observed at a temperature as high as 280~K. These data strongly indicate that a severe transformation of defect structures could be manipulated by the annealing and recorded temperatures. The deactivation energies of the main optical features are extracted from the PL data at different temperatures.     

氢化非晶碳薄膜的光致发光线型及其激发能量依赖关系

本文报道了氢化非晶碳薄膜在2.9-4.5eV光激发下的发光谱。它的光致发光谱是无结构的不对称宽带,半宽度约为0.8eV。在低于3.56eV的光激发下,谱带的峰值能量随激发能量的降低明显红移。在安德森带结构和指数分布的带尾态密度的基础上,考虑了尾态中粒子的两种跃迁过程,实验的PL谱就可得到解释。并用这个简单模型计算了这种材料的光致发光谱特征。     

Influence of post-deposition annealing on the structural,optical and electrical properties of Li and Mg co-doped ZnO thin films deposited by sol–gel technique

Lithium (Li) and magnesium (Mg) co-doped zinc oxide (ZnO) thin films were deposited by sol–gel method using spin coating technique. The films were deposited on glass substrates and annealed at different temperatures. The effects of annealing temperature on the structural, optical and electrical properties of the deposited films were investigated using X-ray diffraction (XRD), Ultraviolet–Visible absorption spectra (UV–VIS), photoluminescence spectra (PL), X-ray photo electron spectroscopy (XPS) and Hall measurements. XRD patterns indicated that the deposited films had a polycrystalline hexagonal wurtzite structure with preferred (0 0 0 2) orientation. All films were found to exhibit a good transparency in the visible range. Analysis of the absorption edge revealed that the optical band gap energies of the films annealed at different temperatures varies between 3.49 eV and 3.69 eV. Room temperature PL spectra of the deposited films annealed at various temperatures consist of a near band edge emission and visible emission due to the electronic defects, which are related to deep level emissions, such as oxide antisite (O_Zn), interstitial zinc (Zn_i), interstitial oxygen (O_i) and zinc vacancy (V_Zn) which are generated during annealing process. The influence of annealing temperature on the chemical state of the dopants in the film was analysed by XPS spectra. Ion beam analysis (Rutherford back scattering) experiments were performed to evaluate the content of Li and Mg in the films. Hall measurements confirmed the p-type nature of the deposited films.     

类金刚石a-C:H膜的热释氢和红外吸收研究

本文利用热释氢和红外吸收研究了H在非晶态碳(a-C:H)膜中的含量和组态。实验结果表明,随着样品制备时衬底温度的增大:1)H在a-C:H膜中的组态从两相结构过渡为单相结构;2)H在a-C:H膜中的含量单调减少;3)a-C:H膜中sP³/sP²键合比例单调增大。 关键词：