Correlated and non-correlated growth kinetics of pentacene in the sub-monolayer regime

We present a study of the growth kinetics of pentacene monolayer islands on SiO₂ in the submonolayer regime by using Atomic Force Microscopy (AFM). Two distinct growth modes, namely correlated growth (CG) and non-correlated growth (NCG), have been identified by Voronoi tesselation. These two modes are characterized by different island growth kinetics. In the case of correlated growth, the average island size 〈A〉 scales with deposition time t i.e. 〈A〉 ∝ t whereas for non-correlated growth, 〈A〉 ∝ t². The CG and NCG regimes are defined by the level of re-evaporation which determines the capture zones around the islands: Wigner-Seitz cells for CG and coronas of width λ_D (λ_D is the mean diffusion distance on SiO₂ before re-evaporation) for NCG. A simple model is proposed to reproduce the experimental growth kinetics in both modes.     

Investigation of gate current in nano-scale MOSFETs by Monte Carlo solution of quantum Boltzmann equation

This paper investigates gate current through ultra-thin gate oxide of nano-scale metal oxide semiconductor field effect transistors (MOSFETs), using two-dimensional (2D) full-band self-consistent ensemble Monte Carlo method based on solving quantum Boltzmann equation. Direct tunnelling, Fowler--Nordheim tunnelling and thermionic emission currents have been taken into account for the calculation of total gate current. The 2D effect on the gate current is investigated by including the details of the energy distribution for electron tunnelling through the barrier. In order to investigate the properties of nano scale MOSFETs, it is necessary to simulate gate tunnelling current in 2D including non-equilibrium transport.     

Complete coverage of reduced graphene oxide on silicon dioxide substrates

Reduced graphene oxide(RGO) has the advantage of an aqueous and industrial-scale production route. No other approaches can rival the RGO field effect transistor platform in terms of cost(相似文献   

n型金属氧化物半导体场效应晶体管噪声非高斯性研究

基于n型金属氧化物半导体场效应晶体管（nMOSFET）噪声的数涨落模型,采用高阶统计量双相干系数平方和研究了nMOSFET噪声的非高斯性.通过对nMOSFET实际测试噪声的分析,发现nMOSFET器件噪声存在非高斯性;小尺寸器件噪声的非高斯性强于大尺寸器件;在器件的强反型线性区,其非高斯性随着漏压的增加而增加.文中还通过蒙特卡罗模拟和中心极限定理理论对nMOSFET噪声的非高斯性作了深入的探讨. 关键词： 噪声 非高斯性 n型金属氧化物半导体场效应晶体管 氧化层陷阱     

A novel partial SOI LDMOSFET with a trench and buried P layer for breakdown voltage improvement

In this paper for the first time, a partial silicon-on-insulator (PSOI) lateral double-diffused metal-oxide-semiconductor-field-effect-transistor (LDMOSFET) is proposed with a novel trench which improves breakdown voltage. The introduced trench in the partial buried oxide enhances peak of the electric field and is positioned in the drain side of the drift region to maximize breakdown voltage. We demonstrate that the electric field is modified by producing two additional electric field peaks, which decrease the common peaks near the drain and gate junctions in the trench-partial-silicon-on-insulator (T-PSOI) structure. Hence, a more uniform electric field is obtained. Two dimensional (2D) simulations show that the breakdown voltage of T-PSOI is nearly 64% higher in comparison with partial silicon on insulator (PSOI) structure and alleviate self heating effect approximately 9% and 15% in comparison with its conventional PSOI (C-PSOI) and conventional SOI (C-SOI) counterparts respectively. In addition the current of the T-PSOI, C-PSOI, conventional SOI (C-SOI), and fully depleted conventional SOI (FC-SOI) structures are 90, 82, 74, and 44 μA, respectively for a drain–source voltage V_DS = 30 V and gate–source voltage V_GS = 10 V.     

Novel Indium Arsenide double gate and gate all around nanowire MOSFETs for diminishing the exchange correlation effect: A quantum study

In this paper we present novel double gate (DG) metal oxide semiconductor field effect transistor (MOSFET) and gate all around (GAA) nanowire metal oxide semiconductor field effect transistor (NWT) with a diminished exchange-correlation (Ex-Corr) effect. The key idea in this work is to use Indium Arsenide (InAs) semiconductor instead of Si. We have evaluated and compared different parameters of DG-MOSFET and GAA-NWTs such as threshold voltage, sub-threshold slope, drain induced barrier lowering and ON and OFF state currents from quantum view. Quantum mechanical transport approach based on non-equilibrium green’s function (NEGF) has been performed in the frame work of effective mass theory in consideration with Ex-Corr effect. This simulation method consists of three dimensional Poisson’s equation in which a Schrodinger equation is first solved in each slice of the device to find Eigen energies and Eigen functions. Then, a transport equation of electrons moving in the sub-bands is solved. This fully quantum method treats such effects as source-to-drain tunneling, ballistic transport, and quantum confinement on equal footing. The results show that only a few lowest Eigen sub-bands are occupied and the upper sub-bands can be safely neglected. Also, the interaction between electrons and Ex-Corr effect is diminished in the proposed structure.     

Deposition of hybrid structures of reduced graphene oxide and tin dioxide thin films,and persistent photoconductivity observation

Reduced graphene oxide (rGO) is deposited on glass substrate by dripping and sol-gel-coating methods giving rise to nanostructures. When in combination with thin films of SnO₂, they form a heterostructure SnO₂:2 at% Eu/rGO, which alters the surface electrical conductivity. SnO₂ and rGO were also combined as a composite, with conductivity strongly affected by ultraviolet excitation, and shows persistent photoconductivity (PPC) phenomenon even very close to room temperature. Both sort o hybrid structures can be applied in electronic devices. The SnO₂ films are deposited via chemical route by sol-gel or by a mixed technique that combines powders generated by drying the sol-gel solution with resistive evaporation of this powder. Resistivity measured as a function of temperature show that the SnO₂:2 at%Eu sample behaves very similarly to the SnO₂:2 at%Eu/rGO heterostructure sample, with the same energy level for the dominant defect, 172 meV, coincident with ionization of oxygen vacancies. Despite not changing the position of this level, the presence of rGO on the surface of the SnO₂ film induces a decrease in conductivity in vacuum, demonstrating the surface interaction.     

Deposition of zinc oxide thin films by reactive pulsed laser ablation

Thin films of zinc oxide have been deposited by reactive pulsed laser ablation of Zn and ZnO targets in presence of a radio frequency (RF) generated oxygen plasma. The gaseous species have been deposited at several substrate temperatures, using the on-axis configuration, on Si (1 0 0). Thin films have been characterized by scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and infrared spectroscopy. A comparison among conventional PLD and reactive RF plasma-assisted PLD has been performed.     

Electronic state observation of inner organic thin films beneath electrodes: Fluorescence-yield X-ray absorption spectra of pentacene derivative films

The electronic states of inner organic thin films have been investigated by X-ray absorption spectroscopy (XAS) in a bulk-sensitive fluorescence-yield (FY) mode with theoretical analysis. The thin films of the synthesized pentacene derivative, i.e., 6,13-dihydrodiazapentacence (C₂₀N₂H₁₄), on SiO₂-covered Si substrates were fabricated and their morphology and crystallinity were characterized by atomic force microscopy (AFM) and X-ray diffraction (XRD) analysis, respectively. The observed N K-edge FY-XAS spectra were different from the surface-sensitive XAS spectra measured in a partial-electron-yield (PEY) mode. The peaks on the FY-XAS spectra were well reproduced by the theoretical calculation of the unoccupied states of an HAPn molecule. In addition, the incident angle dependence of the FY-XAS spectra was consistent with the expected molecular orientation in the thin films. As a result, we successfully obtained the N and C K-edge FY-XAS spectra of the inner HAPn thin films even beneath Au electrodes.     

Albumin adsorption on oxide thin films studied by spectroscopic ellipsometry

Thin films of tantalum, niobium, zirconium and titanium oxides were deposited by reactive magnetron sputtering and their wettability and surface energy, optical properties, roughness, chemical composition and microstructure were characterized using contact angle measurements, spectroscopic ellipsometry, profilometry, X-ray photoelectron spectroscopy and X-ray diffraction, respectively. The purpose of the work was to correlate the surface properties of the films to the Bovine Serum Albumin (BSA) adsorption, as a first step into the development of an initial in vitro test of the films biocompatibility, based on standardized protein adsorption essays. The films were immersed into BSA solutions with different protein concentrations and protein adsorption was monitored in situ by dynamic ellipsometry; the adsorption-rate was dependent on the solution concentration and the immersion time. The overall BSA adsorption was studied in situ using spectroscopic ellipsometry and it was found to be influenced by the wettability of the films; larger BSA adsorption occurred on the more hydrophobic surface, the ZrO₂ film. On the Ta₂O₅, Nb₂O₅ and TiO₂ films, hydrophilic surfaces, the overall BSA adsorption increased with the surface roughness or the polar component of the surface energy.     

Model of hot-carrier induced degradation in ultra-deep sub-micrometer nMOSFET

The degradation produced by hot carrier(HC) in ultra-deep sub-micron n-channel metal oxide semiconductor field effect transistor(nMOSFET) has been analyzed in this paper. The generation of negatively charged interface states is the predominant mechanism for the ultra-deep sub-micron nMOSFET. According to our lifetime model of p-channel MOFET(pMOFET) that was reported in a previous publication, a lifetime prediction model for nMOSFET is presented and the parameters in the model are extracted. For the first time, the lifetime models of nMOFET and pMOSFET are unified. In addition, the model can precisely predict the lifetime of the ultra-deep sub-micron nMOSFET and pMOSFET.     

高功率微波作用下金属氧化物半导体场效应管响应

采用基于半导体漂移扩散模型的数值模拟软件对高功率微波（HPM）作用下金属氧化物半导体场效应管（MOSFET）的响应进行了数值模拟研究。对MOSFET在HPM作用下的输出特性以及器件内部响应进行了数值模拟。计算结果表明,在MOSFET栅极加载HPM后,随着注入HPM幅值的增大,会使得器件的正向电压小于开启电压,从而使得输出电流的波形发生形变。在器件内部,导电沟道靠近源极一端的电场强度最大,热量产生集中在这一区域。在脉冲正半周期时,温度峰值位于沟道源极一端,负半周期时,器件内部几乎没有电流,器件内的温度峰值在热扩散效应的影响下趋向于导电沟道中部。     

Optical and electrical properties of In-doped CdO thin films fabricated by pulse laser deposition

Transparent indium-doped cadmium oxide (In-CdO) thin films were deposited on quartz glass substrates by pulse laser deposition (PLD) from ablating Cd-In metallic target at a fixed pressure 10 Pa and a fixed substrate temperature 300 °C. The influences of indium concentrations in target on the microstructure, optical and electrical performances were studied. When the indium concentration reaches to 3.9 wt%, the as-deposited In-CdO film shows high optical transmission in visible light region, obviously enhanced direct band gap energy (2.97 eV), higher carrier concentration and lower electric resistivity compared with the undoped CdO film, while a further increase of indium concentration to 5.6 wt% induces the formation of In₂O₃, which reverse the variation of these parameters and performance.     

Modeling of the drain-induced barrier lowering effect and optimization for a dual-channel 4H silicon carbide metal semiconductor field effect transistor

A new analytical model to describe the drain-induced barrier lowering (DIBL) effect has been obtained by solving the two-dimensional (2D) Poisson's equation for the dual-channel 4H-SiC MESFET (DCFET). Using this analytical model, we calculate the threshold voltage shift and the sub-threshold slope factor of the DCFET, which characterize the DIBL effect. The results show that they are significantly dependent on the drain bias, gate length as well as the thickness and doping concentration of the two channel layers. Based on this analytical model, the structure parameters of the DCFET have been optimized in order to suppress the DIBL effect and improve the performance.     

溶胶-凝胶法制备纳米多孔SiO2薄膜

以正硅酸乙酯(TEOS)为原料，采用旋转涂敷的方法，结合溶胶-凝胶技术在硅衬底上制备超低介电常数多孔SiO₂薄膜.采用两种不同的改性方法对薄膜表面进行改性，傅里 叶变换红外光谱分析发现改性后薄膜中含有大量的—CH₃键，从而减少了孔洞塌陷.用扫 描电子显微镜观察薄膜的表面形貌，发现薄膜内孔洞尺寸在70—80 nm之间.调节溶胶pH值，发现pH值越小凝胶时间越长.对改性样品热处理的结果表明，在300 ℃时介电常数最低达2.05. 关键词： 2')" href="#">多孔SiO₂ 低介电常数 溶胶-凝胶     

Fabrication and characterization of Mn-doped Cu2O thin films grown by RF magnetron sputtering

Two series of Mn-doped Cu₂O diluted-magnetic-semiconductor thin films were prepared by radio-frequency (RF) magnetron sputtering. One is prepared at different deposition temperature with the same Mn doping concentration; the other is deposited at the same temperature but with varying Mn concentration. They were used to find out the ferromagnetic-order zone for the Mn-doped Cu₂O systems. Most of the samples show high (1 1 1) orientation, except low doping concentration (<6 at%). No impurities were found by X-ray diffraction and electron diffraction measurement. The doped Mn ions substituted Cu ions in the Cu₂O lattice and there were about 1.5% cation vacancies. The grains shown in the transmission electron microscopy (TEM) images for all the samples were tiny, i.e. just 5 nm in diameter. A rough phase diagram for the ferromagnetic order existing in the Mn-doped Cu₂O thin films was given with varying Mn doping concentration and deposition temperature.     

Effects of electron-beam irradiation on structural,electrical, and optical properties of amorphous indium gallium zinc oxide thin films

High-energy electron-beam irradiation of indium gallium zinc oxide (IGZO) films improved the short-range arrangement. The increase in band gap was used as an indication of such improvement. X-ray diffraction confirmed that the films treated with a DC voltage of 2–4.5 kV for duration of up to 35 min are in the amorphous state or nanocrystalline phase. Higher energy electron-beam irradiation led to increased conductivity, which mainly comes from the drastic increase in electron concentration. Electron-beam treatment could be a viable route to improve the contact resistance between the source/drain and channel layer in thin-film transistor devices.     

Chemical and structural properties of ternary post-transition metal oxide thin films: InZnO,InGaO and GaZnO

The chemical states of ternary post-transition metal oxide thin films of InGaO, GaZnO and InZnO were investigated using X-ray photoelectron spectroscopy. Detailed binding energy (BE) analyses revealed certain evolution in chemistry in the ternary oxides compared to the reference binary oxides of In₂O₃, ZnO, or Ga₂O₃. In particular, O 1s BEs were changed with the compositions, which suggests that the charge transfer (CT) between In³⁺/Ga³⁺/Zn²⁺ and O²⁻ ions is significant. Results of extended X-ray absorption fine structure analyses further showed that the first shell coordination (cation–O bond) is roughly maintained even though the ternary oxide films were structurally disordered. This implies that the CT process via O²⁻ ions can influence the charge reconstructions in the ternary oxide systems.     

Characterization of zirconium thin films deposited by pulsed laser deposition

Zirconium(Zr) thin films deposited on Si(100) by pulsed laser deposition(PLD) at different pulse repetition rates are investigated. The deposited Zr films exhibit a polycrystalline structure, and the X-ray diffraction(XRD) patterns of the films show the α Zr phase. Due to the morphology variation of the target and the laser–plasma interaction, the deposition rate significantly decreases from 0.0431 /pulse at 2 Hz to 0.0189 /pulse at 20 Hz. The presence of droplets on the surface of the deposited film, which is one of the main disadvantages of the PLD, is observed at various pulse repetition rates. Statistical results show that the dimension and the density of the droplets increase with an increasing pulse repetition rate. We find that the source of droplets is the liquid layer formed under the target surface. The dense nanoparticles covered on the film surface are observed through atomic force microscopy(AFM). The root mean square(RMS) roughness caused by valleys and islands on the film surface initially increases and then decreases with the increasing pulse repetition rate.The results of our investigation will be useful to optimize the synthesis conditions of the Zr films.     

CdTe纳米晶及层状纳米晶薄膜的生长及其光荧光性质

用湿化学法在水溶液中合成了单分散的、大小尺寸可控的、巯基包裹的胶体CdTe纳米晶体,并利用CdTe纳米晶体和双功能分子poly（diallyldimethylammonium chloride）（PDDA）在Si衬底表面自组织生长了有序的层状纳米晶薄膜,荧光光谱研究了层状纳米晶体之间的共振能量迁移过程.结果表明：层状自组织生长的样品中纳米晶粒的间隔几乎一样,表明它们是有序排列的;而用直接干燥形成的样品中,小尺寸和大尺寸的纳米晶体之间间隔较短,发生荧光共振能量迁移,较小尺寸的纳米晶粒荧光峰（即波长较短处的晶 关键词： CdTe纳米晶体 量子限制效应 共振能量迁移