银薄膜对光学基底表面粗糙度及光散射的影响

为了研究金属银薄膜与光学基底表面粗糙度和光散射的关系,提出了通过对光学薄膜矢量散射公式积分来获得界面粗糙度完全相关模型和完全非相关模型下其表面的总反射散射的方法．理论计算了光学基底上两种模型在不同厚度银膜下的总反射散射和双向反射分布函数．结果表明,当沉积在光学基底上的银薄膜的厚度大于80nm后．两种模型下计算的银薄膜的表面总反射散射都等于基底的总积分散射,银薄膜能较好地复现出基底的粗糙度轮廓．实验研究表明为了复现基底的粗糙度,银薄膜的最佳厚度应在80～160nm之间．     

银薄膜对光学基底表面粗糙度及光散射的影响

为了研究金属银薄膜与光学基底表面粗糙度和光散射的关系,提出了通过对光学薄膜矢量散射公式积分来获得界面粗糙度完全相关模型和完全非相关模型下其表面的总反射散射的方法.理论计算了光学基底上两种模型在不同厚度银膜下的总反射散射和双向反射分布函数.结果表明,当沉积在光学基底上的银薄膜的厚度大于80 nm后,两种模型下计算的银薄膜的表面总反射散射都等于基底的总积分散射,银薄膜能较好地复现出基底的粗糙度轮廓.实验研究表明为了复现基底的粗糙度,银薄膜的最佳厚度应在80~160 nm之间.     

超二代微光像增强器多碱光电阴极膜厚测量研究

介绍了多碱光电阴极的光学性能和光谱反射率特性,测量了多碱阴极的光谱反射率曲线.该曲线与普通光学膜层光谱反射率曲线相比,形状较不规则,原因是多碱阴极膜层存在光吸收.光谱反射率曲线上的干涉峰是入射光在玻璃与阴极膜层界面反射和在阴极膜层与真空的界面反射的两束光发生干涉的结果.根据干涉的原理,如果阴极膜层所反射的两束光的光程差为二分之一波长的偶倍数时,光谱反射将出现干涉加强峰;如果阴极膜层所反射的两束光的光程差为二分之一波长的奇倍数时,光谱反射将出现干涉减弱峰.根据超二代像增强器光谱反射干涉峰对应的波长,可以计算出其阴极膜层的厚度约为191 nm,比二代像增强器阴极膜层的厚度增加了38％.多碱阴极膜层厚度是影响多碱阴极灵敏度的一个关键参量,仅仅靠人眼观察阴极膜层颜色的方法不准确.实践证明,利用光谱反射的方法来计算阴极膜层厚度的方法简单有效.如果在多碱阴极的制作过程中进行光谱反射率的监控,那么将可以精确控制阴极膜层的厚度,对多碱阴极的研究将会更加深入,多碱阴极的灵敏度也将会得到进一步的提升.     

Effect of Density and Surface Roughness on Optical Properties of Silicon Carbide Optical Components

The effect of density and surface roughness on the optical properties of silicon carbide optical components is investigated. The density is the major factor of the total reflectance while the surface roughness is the major factor of the diffuse reflectance. The specular reflectance of silicon carbide optical components can be improved by increasing the density and decreasing the surface roughness, in the form of reducing bulk absorption and surface-related scattering, respectively. The contribution of the surface roughness to the specular reflectance is much greater than that of the density. When the rms surface roughness decreases to 2.228nm, the specular reflectance decreases to less than 0. 7% accordingly.     

X-ray scattering by nano-particles within granular thin films, investigation by grazing angle X-ray reflectometry

It is shown here that the observation of the phenomenon of like small angle scattering of X-rays in very thin heterogeneous films, can be made comparatively easily by using grazing angle reflectometry of X-rays. The feasibility was achieved with co-sputtered thin films of approximately 600 ? thickness, made up by crystalline platinum clusters embedded in an amorphous alumina matrix. The experimental reflectivity profiles are simulated by the intensity superposition of two components: (i) the specular part caused by the usual interference phenomenon between the partial waves reflected from the air-film and film-substrate interfaces, and (ii) the like-small angle scattering part due to diffraction by platinum clusters. It is found that the shape of such clusters is spherical characterized by mean values of diameter and inter-cluster distance of the order 29 ? and 45 ? respectively with standard deviations and of the order of 3 ?. Such an observation of both the interference and diffraction phenomena indicates that the thin granular film exhibits both its continuous and heterogeneous aspects together. Received: 19 February 1998 / Accepted: 25 August 1998     

薄膜非均匀性及其对增透膜性能的影响

基于非均匀膜理论提出的折射率分层模型,将非均匀膜层分为N个均匀子层,应用光学薄膜特征矩阵对其进行理论分析。应用膜系设计软件模拟ZrO2和CeO2的负非均匀性对增透膜光谱特性的影响。研究结果表明:负非均匀性使多层增透膜的反射率增大,在参考波长处的光谱特性变差,使整个反射光谱曲线朝长波方向漂移,从而导致整个膜系的光谱特性偏离理想情形。     

Optical diagnostics of nanoscale dielectric layers on interference films by polarization-dependent differential reflectivity

The small change in the reflectance (differential reflectance) of s- or p-polarized light from an interference film as a result of the deposition of a nanoscale insulating layer on it is investigated theoretically. Analytical relations describing the contribution of nanoscale layers to the reflectance from an interference film as function of film thickness are obtained in the long-wavelength approximation. It is shown that the utilization of interference films in reflection diagnostics through differential measurements allows a significant enhancement of the sensitivity of these techniques and also opens up new possibilities for resolving the inverse problem of determining simultaneously the optical constant and thickness of nanoscale dielectric layers.     

金属微粒-半导体薄膜中小胶粒的光吸收和散射

金属微粒-半导体薄膜具有特殊的电学、光学及光电特性。本文讨论了埋藏于半导体基体中金属小胶粒光吸收和光散射公式。这些胶粉可以是球形,也可以是长球或扁球形。本文以银胶粒-氧化铯半导体为例,讨论了胶粒大小、椭球的偏心率对相对光吸收系数和光散射系数的影响,并给出这些系数随波长改变的曲线。 关键词：     

Enhanced scattering from a thin film with one-dimensional disorder

This paper deals with a TE plane wave scattering from a thin film with one-dimensional disorder by means of the stochastic functional approach. The thin film is one-dimensionally inhomogeneous in the horizontal direction with infinite extent, and is homogeneous in the vertical direction with finite thickness. Based on an approximate wavefield representation in terms of a Wiener–Hermite expansion in a preceding paper (Tamura et al., 2004, Waves in Random Media, 14, 435–465), the first- and second-order incoherent scattering cross-sections are presented in explicit forms and scattering properties are discussed. The scattering properties vary entirely with the film thickness. In a case where the thickness is smaller than a few wavelengths in the thin film, enhanced scattering and associated enhanced scattering may appear as sharp peaks or dips on the second-order incoherent scattering distribution if the thin film has guided wave modes. When the thickness becomes sufficiently larger than the wavelength inside the film, a new enhanced scattering phenomenon appears as gentle peaks on the second-order incoherent scattering distribution in four special directions. Such four directions are the directions of forward scattering, specular reflection, backscattering, and the symmetrical direction of forward scattering with respect to the normal of the film surface.The first-order incoherent scattering occurs distinctly in four such directions. Such enhanced scattering is independent of the existence of the guided wave modes inside the thin film, and deeply relates to the structure of the thin film with one-dimensional disorder that has infinite correlation in the vertical direction. For SiC and glass thin films having one-dimensional disorder with a Gaussian correlation and three types of exponential correlation, the first- and second-order incoherent scattering cross-sections are illustrated in figures. The narrow enhanced scattering peaks appear for the glass film in a thin case. The gentle enhanced peaks turn up for both the SiC and glass films in a thick case. Furthermore, the optical theorem is calculated for several cases. It is then found that the error of the optical theorem decreases and the performance of the wavefield is improved by taking into account the second-order incoherent scattering.     

Optical properties of nickel(II)-azo complexes thin films for potential application as high-density recordable optical recording media

Smooth thin films of three kinds of nickel(II)-azo complexes were prepared by the spin-coating method. Absorption spectra of the thin films on K9 glass substrate in the 300-600 nm wavelength region were measured. Optical constants (complex refractive index ) and thickness of the thin films prepared on single-crystal silicon substrate in the 300-600 nm wavelength region were investigated on rotating analyzer-polarizer type of scanning ellipsometer, and dielectric constants , absorption coefficients α as well as reflectance R of thin films were then calculated at 405 nm. In addition, in order to examine the possible use of nickel(II)-azo complex thin film as an optical recording medium, one of the nickel(II)-azo complex thin film prepared on K9 glass substrate with an Ag reflective layer was also studied by atomic force microscopy and static optical recording. The results show that the nickel(II)-azo complex thin film is smooth and has a root mean square surface roughness of 2.25 nm, and the recording marks on the nickel(II)-azo complex thin film are very clear and circular, and their size can reach 200 nm or less.     

电子束蒸发和离子束溅射HfO_2紫外光学薄膜

HfO2薄膜在紫外光学中具有十分重要的地位,不同方法制备的HfO2薄膜特性不同,可以满足不同的实际应用需求。本文分别利用电子束蒸发和离子束溅射方法制备了用于紫外光区域的HfO2薄膜,并对薄膜的材料和光学特性进行了表征与比较。通过对单层HfO2薄膜的实测透射和反射光谱进行数值反演,得到了HfO2薄膜在230～800 nm波段的折射率和消光系数色散曲线,结果表明两种方法制备的HfO2薄膜在250nm的消光系数均小于2×10-3。在此基础上,制备了两种典型的紫外光学薄膜元件(紫外低通滤波器和240nm高反射镜),其光谱性能测试结果表明,两种不同方法制备的器件均具有较好的光学特性。     

Solution of the optical parameters of the thin film systems and interfaces

We report on the optical parameters of the semiconductor thin films determination. The method is based on the dynamical modeling of the spectral reflectance function combined with the genetic optimization of the initial model. The spectral dependency of the thin film optical parameters computation is based on the optical transitions modeling. The combination of the dynamical modeling and the genetic optimization enable comfortable analysis of the spectral dependences of the optical parameters and incorporation of the microstructure effects on the multilayer system optical properties. The results of the optical parameters of i-a-Si thin films determination are presented.     

Photoluminescence study of nitrogen-doped p-type Mg x Zn1−x O nanocrystalline thin film grown by plasma-assisted molecular beam epitaxy

Tin sulfide thin films have been grown on glass substrates by chemical bath deposition technique (CBD) at room temperature and irradiated with UV light source of wavelength 355 nm. The effect of UV illumination on the physical properties of the films was compared with that of the as-prepared film. Though the thickness of the films was unaltered after illumination, the structural, optical and electrical properties changed considerably. Structural studies showed the polycrystalline nature of the UV-illuminated sample, whereas the as-prepared film was mono crystalline. Both films were orthorhombic structure with Sn₂S₃ phase. The optical properties of the films were systematically studied using the optical absorbance and reflection spectra. Studies on the reflection spectra showed higher reflectance in visible and infrared region for the UV-illuminated films and lower reflectance in the infrared region for the as-prepared one. The variation of the refractive index of the samples was also analyzed. The optical absorption coefficient and the optical band gap energy of the films were evaluated. The irradiated film exhibited lower band gap of 1.74 eV than the value of as-prepared film, i.e., 1.77 eV. The measured resistivity of the tin sulfide thin films was found to be of the order of 10⁸ and 10⁹ Ωcm for UV-illuminated and as-prepared films, respectively. The SEM images showed the presence of worm-like nanostructures with almost similar appearance in both the films.     

A novel determination method of thin film optical parameters with least dependence on photometric measurement systematic errors

We present a novel determination method of thin film optical parameters based on partial derivatives selection, which is with least impact of photometric measurement systematic errors on the characterization accuracy of thin film optical parameters. The spectral measurement data used in our numerical simulations are the single wavelength photometric data of P-polarization light measured at different incident angles. It is shown that, under the same level of systematic errors in the measurement data, the deviations of the fitted optical parameters values from real ones in spectral bands with opposite signs of partial derivatives for most incident angles at which measurement data are collected are much smaller than other spectral regions. The theoretical explanations are discussed. It is advisable to select spectrophotometric data from the recommended spectral bands and to remove the dangerous spectral bands according to derivatives information for optical characterization of thin films with best accuracy.     

Two-dimensional light diffraction from thin opal films

This paper reports on experimental and theoretical investigations of light diffraction from thin films of synthetic opal. The diffraction patterns have been studied visually and recorded in different scattering geometries with the films illuminated with white unpolarized light. The diffraction pattern obtained with the film illuminated with a light beam along the [111] axis, which is normal to the film surface, has C ₆ symmetry and consists of six strong reflections arranged symmetrically with respect to the incident beam. This pattern becomes substantially more complicated when the film is illuminated by white light at an arbitrary angle to the [111] axis. An experimental study of the spectral response and angular relations of the diffraction patterns has established a fairly full pattern of transformation of diffraction reflections obtained under variation of the angle of light incidence on an opal film. The remarkably good matching of experimental and calculated data provides compelling evidence for light diffraction from thin opal films being two-dimensional.     

多光束法布里-珀罗干涉实验的计算机模拟简

用计算机数值计算的方法,模拟了法布里-珀罗多光束干涉实验的光强分布,并与双光束等倾干涉条纹进行了比较,分析了薄膜反射率对法布里-珀罗干涉实验的波长分辨率影响。     

Self-mixing interference effects in tunable diode laser absorption spectroscopy

We report the effects of self-mixing interference on gas detection using tunable diode laser spectroscopy. For very weak feedback, the laser diode output intensity gains a sinusoidal modulation analogous to that caused by low finesse etalons in the optical path. Our experiments show that self-mixing interference can arise from both specular reflections (e.g. cell windows) and diffuse reflections (e.g. Spectralon^™ and retroreflective tape), potentially in a wider range of circumstances than etalon-induced interference. The form and magnitude of the modulation is shown to agree with theory. We have quantified the effect of these spurious signals on methane detection using wavelength modulation spectroscopy and discuss the implications for real gas detectors.     

Light scattering in nanocrystalline silicon-carbide (nc-SiC) films

Correlations between the optical and structural characteristics of nanocrystalline silicon-carbide (nc-SiC) films prepared by direct ion deposition onto sapphire substrates are studied. The effect of the scattering of electromagnetic radiation in nc-SiC films on their optical characteristics (transmittance, reflectance, and absorbance) is investigated. It is shown that in nc-SiC films deposited at temperatures <700°C scattering is minimum due to their morphological and structural homogeneity. The films deposited at >1000°C exhibit significant morphological and structural heterogeneity and therefore strongly scatter light. It is established that the account for light scattering leads to a blue shift of the fundamental absorption edge in the optical density spectra. The spectra of the scattering coefficients for the nc-SiC films are studied and calculated. The effect of high-temperature annealing on the film structure and scattering spectra is investigated. It is demonstrated that the structural variations induced by annealing are accompanied by a change of the initial mechanism of Rayleigh scattering in the nc-SiC films for the Mie scattering.     

Method of envelopes for studying a two-film system on a reflecting substrate

For determining the optical constants and the thickness of thin films (including strongly absorbing films) by the spectrophotometric method, we propose to deposit them on intermediate films formed on strongly reflecting substrates. Due to this, an interference pattern depending on the optical constants and the thickness of the film under study will be observed in the reflectance spectrum. The method of envelopes of the extrema in the reflectance spectrum that is based on the iterative approach is developed for studying two-film systems.     

膜厚对射频磁控溅射法制备的SnS薄膜结构和光学性质的影响

利用射频磁控溅射法在玻璃衬底上制备SnS薄膜,用X射线衍射(XRD)、能谱仪(EDS)、原子力显微镜(AFM)、场发射扫描电镜(FE-SEM)和紫外-可见-近红外分光光度计(UV-Vis-NIR)分别对所制备的薄膜晶体结构、组分、表面形貌、厚度、反射率和透过率进行表征分析。研究结果表明:薄膜厚度的增加有利于改善薄膜的结晶质量和组分配比,晶粒尺寸和颗粒尺寸随着厚度的增加而变大。样品的折射率在1 500~2 500 nm波长范围内随着薄膜厚度的增加而增大。样品在可见光区域吸收强烈,吸收系数达10⁵ cm^-1量级。禁带宽度在薄膜厚度增加到1 042 nm时为1.57 eV,接近于太阳电池材料的的最佳光学带隙(1.5 eV)。