ECR等离子体的磁电加热研究

在ECR等离子体装置上进行了磁电加热研究,利用离子灵敏探针(ISP)测量了磁电加热前后离子温度的变化,研究了电极环偏压、磁场强度、气压等参数对磁电加热过程以及加热效率的影响.结果表明:等离子体的整体加热是通过离子在电极环鞘层中的磁电加热及被加热的离子沿径向的输运来完成的.轴心处离子温度随电极环偏压的升高呈非线性增加.磁电加热效率随偏压的增大而增大,在电极环偏压为1000 V时,磁电加热效率为2%-2.5%,ECR等离子体中的离子温度能够提高20 eV以上.磁场强度在磁电加热过程中对离子的限制和加热起到重要作用,当磁场强度在6.3×10^-2-8.7×10^-2T之间变化时,磁电加热的效率随磁场强度的增大而增大.气压在0.02-0.8 Pa范围内,磁电加热的效率随气压的减小而增大. 关键词： ECR等离子体 磁电加热 离子温度     

氧等离子体刻蚀CVD金刚石膜的影响机理

采用电子回旋共振（ECR）等离子体在不同的磁场位形和工作气压下刻蚀化学气相沉积（CVD）金刚石膜,运用双探针和离子灵敏探针法对等离子体进行了诊断,研究了等离子体参数对刻蚀效果的影响。结果表明：磁场由发散场向收敛场转变时,离子温度、电子温度和等离子体密度都随之增大,刻蚀效果逐渐增强;当工作气压由低气压向高气压变化时,等离子体参数先增大后减小,CVD金刚石膜表面粗糙度降低程度也出现了相同的趋势。     

氧等离子体刻蚀CVD金刚石膜的影响机理

采用电子回旋共振(ECR)等离子体在不同的磁场位形和工作气压下刻蚀化学气相沉积(CVD)金刚石膜,运用双探针和离子灵敏探针法对等离子体进行了诊断,研究了等离子体参数对刻蚀效果的影响。结果表明:磁场由发散场向收敛场转变时,离子温度、电子温度和等离子体密度都随之增大,刻蚀效果逐渐增强;当工作气压由低气压向高气压变化时,等离子体参数先增大后减小,CVD金刚石膜表面粗糙度降低程度也出现了相同的趋势。     

Low-pressure plasma cleaning of Au and PtIr noble metal surfaces

The effect of low-pressure hydrogen and oxygen plasma cleaning of Au and PtIr was investigated by X-ray photoelectron spectroscopy. Hydrocarbon contamination was efficiently removed by hydrogen and oxygen plasma. Hydrogen plasma additionally reduces oxygen compounds, especially metal oxides, while oxygen plasma results in the formation of a surface layer of Au₂O₃ and PtO, respectively. Both noble metal oxides are unstable and decompose with time. The decomposition of metal oxides occurs in parallel with the recontamination of the surface. Metal oxides can be removed completely for Au and partially for PtIr by an additional cleaning with hydrogen plasma. Hydrogen plasma treatment is very promising for noble metal surface cleaning.     

Cleaning of SiC surfaces by low temperature ECR microwave hydrogen plasma

N-type 4H-SiC (0 0 0 1) surfaces were cleaned by low temperature hydrogen plasma in electronic cyclotron resonance (ECR) microware plasma system. The effects of the hydrogen plasma treatment (HPT) on the structure, chemical and electronic properties of surfaces were characterized by in situ reflection high energy electron diffraction (RHEED) and X-ray photoelectron spectroscopy (XPS). The RHEED results indicate that the structures of the films are strongly dependent on the treatment temperature and time. Significant improvements in quality of 4H-SiC films can be obtained with the temperature ranging from 200 °C to 700 °C for an appropriate treatment period. The XPS results show that the surface oxygen is greatly reduced and the carbon contamination is completely removed from the 4H-SiC surfaces. The hydrogenated SiC surfaces exhibit an unprecedented stability against oxidation in the air. The surface Fermi level moves toward the conduction band in 4H-SiC after the treatment indicating an unpinning Fermi level with the density of surfaces states as low as 8.09 × 10¹⁰ cm⁻² eV⁻¹.     

非对称磁镜场电子回旋共振氧等离子体刻蚀化学气相沉积金刚石膜

分别应用郎缪尔双探针和离子灵敏探针对非对称磁镜场电子回旋共振氧等离子体的电子参数、空间分布和离子参数进行了测量,分析了气压对等离子体参数及空间分布的影响。利用该等离子体在优化的气压条件下对化学气相沉积金刚石膜进行了刻蚀,并研究了刻蚀机理。结果表明:电子温度为5~10 eV,离子温度为1 eV左右,而等离子体数密度在1010cm-3数量级。随气压的升高,电子和离子温度降低,而电子数密度先增大后减小。在低气压下等离子体数密度空间分布更均匀,优化的刻蚀气压为0.1 Pa。刻蚀过程中,离子的回旋运动特性得到了加强,有利于平行于金刚石膜表面的刻蚀,有效地保护了金刚石膜的晶界和缺陷。     

丙酮环境下ECR微波等离子体辅助化学气相沉积类金刚石薄膜研究

利用电子回旋共振（ECR）微波等离子体辅助化学气相沉积技术、工作气氛为丙酮，在光学玻璃衬底上得到了光滑、致密、均匀的类金刚石薄膜.在工艺研究中，对等离子体中氧的存在及其作用进行了分析.原子力显微镜分析表明，薄膜的表面粗糙度小于10nm，晶粒 尺寸约为100nm.拉曼光谱和中红吸收谱研究发现，薄膜具有强烈的荧光效应，含有sp1，sp2，sp3杂化C—C，sp3杂化CH3，羰基CO、含氧多元 环以及—COOH基等.利用纳米力学探针以 及近红区红外透射谱分析了薄膜的力学及光学性能，结果表明，薄膜的显微硬度接近4 关键词： 类金刚石薄膜 ECR微波等离子体 丙酮气氛 红外光谱     

非对称磁镜场电子回旋共振氧等离子体刻蚀化学气相沉积金刚石膜

分别应用郎缪尔双探针和离子灵敏探针对非对称磁镜场电子回旋共振氧等离子体的电子参数、空间分布和离子参数进行了测量,分析了气压对等离子体参数及空间分布的影响。利用该等离子体在优化的气压条件下对化学气相沉积金刚石膜进行了刻蚀,并研究了刻蚀机理。结果表明：电子温度为5～10 eV,离子温度为1 eV左右,而等离子体数密度在1010 cm-3数量级。随气压的升高,电子和离子温度降低,而电子数密度先增大后减小。在低气压下等离子体数密度空间分布更均匀,优化的刻蚀气压为0.1 Pa。刻蚀过程中,离子的回旋运动特性得到了加强,有利于平行于金刚石膜表面的刻蚀,有效地保护了金刚石膜的晶界和缺陷。     

Particle saltation removal in laser-induced plasma shockwave cleaning

A new particle saltation removal model in laser-induced plasma shockwave cleaning is presented due to the drawbacks in other particle removal models. Considering the elastic energy stored in the adhered particle during shockwave-particle interaction, the threshold of the particle elastic deformation height, leading to the particle removal, is obtained. With taking the collision between gas molecules in plasma shockwave rear and adhered particle into account, the threshold of the plasma shockwave Mach number is also obtained which is a requirement to the shockwave strength. It is found that the smaller particle needs stronger shockwave than the larger particle. The gas pressure distribution characteristics in the plasma shockwave rear offer a saltation surrounding to the particle, and it is another requirement to the shockwave strength for a successful particle saltation. Finally, particle-cleaning experiment using laser-induced plasma shockwave proves the correctness of the particle saltation model.     

MW-ECR PE-UMS等离子体特性及对Zr-N薄膜结构性能的影响

采用静电探针技术对微波电子回旋共振(MW-ECR) 等离子体进行了诊断,利用等离子体增强 非平衡磁控溅射(PE-UMS)法在常温下制备了Zr-N薄膜, 通过EPMA，XRD，显微硬度对膜的 结构和性能进行评价.实验结果表明，随氮气流量增加，总的等离子体密度从807×10⁹c m^-3增加到831×10⁹cm^-3然后逐渐减小为752×10 ⁹cm^-3；而N₂⁺密度则从312×10^{8< /sup>cm-3线性递增到335×109cm-3；电子温度变化 不大.对薄膜而言，随N₂+密度增大，样品中氮含量增加，而晶粒逐 渐变小，当样品中N/ Zr原子比达到14时，薄膜中出现亚稳态的Zr₃N₄相以及非晶相， 在更高氮流量下，整 个薄膜转变为非晶态.与此相应，薄膜硬度由最初的225GPa增大到2678GPa 然后逐渐减 小到1982GPa. 关键词： 氮化锆薄膜 ECR等离子体 磁控溅射 诊断}     

氧气放电等离子体温度测量研究

为了考察电激励氧碘激光器中放电腔内的宏观气体温度,由两片蚌形铜电极和一根长30 cm内径1.65 cm的耐热玻璃管构成放电腔装置,用一台最高功率500 W,频率13.56 MHz的射频装置对压力1 330Pa的纯氧气体进行了介质阻挡放电研究。利用O2(b,ν=0)的P支发射光谱,分别采用波尔兹曼直线作图法和计算机模拟发射光谱法,测量了氧气射频放电等离子体的宏观气体温度。对于低分辨率光谱,利用高斯拟合进行了分峰处理,利用峰面积表征发光强度,通过波尔兹曼作图法得到了宏观气体温度。利用氦氖激光器测得的光谱仪狭缝函数获得了计算1机模拟发射光谱,以最小二乘法作为判据,通过比较计算机模拟发射光谱和实测光谱获得了宏观气体温度。     

Improvement and mechanism of interfacial adhesion in PBO fiber/bismaleimide composite by oxygen plasma treatment

The improved interfacial adhesion of PBO fiber-reinforced bismaleimide composite by oxygen plasma processing was investigated in this paper. After treatment, the maximum value of interlaminar shear strength was 57.5 MPa, with an increase of 28.9%. The oxygen concentration of the fiber surface increased, as did the surface roughness, resulting in improvement of the surface wettability. The cleavage and rearrangement of surface bonds created new functional groups OCO, NCO and NO, thereby activating the fiber surface. And long-time treatment increased the reaction degree of surface groups while destroyed the newly-created physical structures. The enhancement of adhesion relied primarily on the strengthening of chemical bonding and mechanical interlocking between the fiber and the matrix. The composite rupture planes indicated that the fracture failure shifted from the interface to the matrix or the fiber.     

氮化铝单晶薄膜的ECR PEMOCVD低温生长研究

采用电子回旋共振等离子体增强金属有机物化学气相沉积（ECR－PEMOCVD）技术，在c轴取向的蓝宝石即α Al2O3（0001）衬底上，以氮化镓（GaN）缓冲层和外延层作为初始层，分别以高纯氮气（N2）和三甲基铝(TMAl)为氮源和铝源低温生长氮化铝（AlN）薄膜.并利用反射高能电子衍射（RHEED）、原子力显微镜（AFM）和x射线衍射（XRD）等测量结果，研究了氢等离子体清洗、氮化和GaN初始层对六方AlN外延层质量的影响，从而获得解理性与α Al2O3衬底一致的六方相AlN单晶薄膜，其XRD半高宽为1 关键词： AlN 氢等离子体清洗 氮化 GaN     

Controllable wettability of poly(ethylene terephthlate) film modified by oxygen combined inductively and capacitively coupled radio-frequency plasma

Poly(ethylene terephthalate) (PET) film was modified by using oxygen combined inductively coupled radio-frequency plasma (ICP) and capacitively coupled radio-frequency plasma (CCP) at the radio-frequency (RF) power of 200 W and 100 W, respectively, for a treatment time up to 300 s. The RF plasma modification under the combined ICP and CCP mode with the controllable oxygen plasma density and oxygen ion-flux energy significantly improved the wettability of PET film, due to the creation of the polar functional groups containing oxygen, such as C-O and O-CO, and the increase of the surface roughness. At a low surface roughness, the polar functional groups on the PET film affected both the advancing contact angles and receding contact angles. When the surface roughness increased over a threshold, the advancing contact angles mainly depended on the polar functional groups, and the receding contact angles were particularly dependent on the surface roughness. Therefore, the controllable advancing contact angles and receding contact angles on the plasma-modified PET film were independently determined by plasma functionalization and plasma etching under the combined ICP and CCP mode.     

Intertwisted fibrillar diamond-like carbon films prepared by electron cyclotron resonance microwave plasma enhanced chemical vapour deposition

In this paper, the structures, optical and mechanical properties of diamond-like carbon films are studied, which are prepared by a self-fabricated electron cyclotron resonance microwave plasma chemical vapour deposition method at room temperature in the ambient gases of mixed acetylene and nitrogen. The morphology and microstructure of the processed film are characterized by the atomic force microscope image, Raman spectra and middle Fourier transform infrared transmittance spectra, which reveal that there is an intertwisted fibrillar diamond-like structure in the film and the film is mainly composed of sp^3 CH, sp^3 C—C, sp^2 C═C, C═N and C_{60}. The film micro-hardness and bulk modulus are measured by a nano-indenter and the refractive constant and deposition rate are also calculated.     

Organic compounds removal in soil in a seven-needle-to-net pulsed discharge plasma system

A pulsed discharge plasma (PDP) system (a seven-needle-to-net electrode geometry) was built to degrade pyrene and p-nitrophenol in soil. Pulse discharge time, contents of the pollutants in the soil, the initial pH value of the soil, Kaolin and Cr⁶⁺ addition on removal of pollutants was investigated. The obtained results show that 60 min was the better treatment time; removal of organic compounds decreased with the increase of the contents; removal of pyrene was higher at neutral pH condition, while p-nitrophenol has more oxidation in the basic soil; Kaolin and Cr⁶⁺ addition has positive effect on the organic compounds degradation.     

Modification of the surface properties of polyimide films using polyhedral oligomeric silsesquioxane deposition and oxygen plasma exposure

Topographically rich surfaces were generated by spray-coating organic solutions of a polyhedral oligomeric silsesquioxane, octakis(dimethylsilyloxy)silsesquioxane (POSS), on Kapton^® HN films and exposing them to radio frequency generated oxygen plasma. Changes in both surface chemistry and topography were observed. High-resolution scanning electron microscopy indicated substantial modification of the POSS-coated polyimide surface topographies as a result of oxygen plasma exposure. Water contact angles varied from 104° for unexposed POSS-coated surfaces to ∼5° for samples exposed for 5 h. Modulation of the dispersive and polar contributions to the surface energy was determined using van Oss Good Chaudhury theory. Changes in surface energy are related to potential adhesive interactions with lunar dust simulant particles.     

Effects of oxygen plasma pre-treatments on the characteristics of n-ZnO/p-Si heterojunction diodes

We examine the effects of the oxygen plasma pre-treatments on the material properties of n-ZnO grown on p-Si and characterize the electrical properties of n-ZnO/p-Si heterojunction diodes. The lattice spacing of ZnO becomes larger when the ZnO thin film is grown on the oxygen plasma pre-treated Si substrate. This might be relevant to the growth of (101) ZnO onto the ultra-thin SiO₂ interfacial layer, which is formed during the oxygen plasma pre-treatment onto the Si substrate. The formation of SiO₂ gives rise to the increase in the donor-like defect Zn interstitial, and the increased grain size improves the carrier mobility. Because of all the above, the differential conductance at the on-state is increased for the n-ZnO/p-Si heterojunction diode.     

氧弹燃烧灰化分光光度法测定有机物中的硅

采用氧弹燃烧灰化进行样品预处理 ,亚铁还原硅钼蓝分光光度法测定有机物中微量硅。通过试样分析和回收率实验 ,结果表明 ,方法的回收率为 95 %— 10 2 % ,可用于有机样品中硅的定量测定。     

Surface cleaning of metal wire by atmospheric pressure plasma

In this study, the possible application of atmospheric pressure dielectric barrier discharge plasma for the annealing of metallic wire is examined and presented. The main purpose of the current study is to examine the surface cleaning effect for a cylindrical object by atmospheric pressure plasma. The experimental setup consists of a gas tank, plasma reactor, and power supply with control panel. The gas assists in the generation of plasma. Copper wire was used as an experimental cylindrical object. This copper wire was irradiated with the plasma, and the cleaning effect was confirmed. The result showed that it is possible to remove the tarnish which exists on the copper wire surface. The experiment reveals that atmospheric pressure plasma is usable for the surface cleaning of metal wire. However, it is necessary to examine the method for preventing oxidization of the copper wire.