Redox and complexation chemistry of the Cr(VI)/Cr(V)-D-galacturonic acid system

The oxidation of d-galacturonic acid by Cr(VI) yields the aldaric acid and Cr(III) as final products when a 30-times or higher excess of the uronic acid over Cr(VI) is used. The redox reaction involves the formation of intermediate Cr(IV) and Cr(V) species, with Cr(VI) and the two intermediate species reacting with galacturonic acid at comparable rates. The rate of disappearance of Cr(VI), Cr(IV) and Cr(V) depends on pH and [substrate], and the slow reaction step of the Cr(VI) to Cr(III) conversion depends on the reaction conditions. The EPR spectra show that five-coordinate oxo-Cr(V) bischelates are formed at pH < or = 5 with the uronic acid bound to Cr(V) through the carboxylate and the alpha-OH group of the furanose form or the ring oxygen of the pyranose form. Six-coordinated oxo-Cr(V) monochelates are observed as minor species in addition to the major five-coordinated oxo-Cr(V) bischelates only for galacturonic acid : Cr(VI) < or =10 : 1, in 0.25-0.50 M HClO(4). At pH 7.5 the EPR spectra show the formation of a Cr(V) complex where the vic-diol groups of Galur participate in the bonding to Cr(V). At pH 3-5 the Galur-Cr(V) species grow and decay over short periods in a similar way to that observed for [Cr(O)(alpha-hydroxy acid)(2)](-). The lack of chelation at any vic-diolate group of Galur when pH < or = 5 differentiates its ability to stabilise Cr(V) from that of neutral saccharides that form very stable oxo-Cr(V)(diolato)(2) species at pH > 1.     

Microstructural evolution of protective La–Cr–O films studied by transmission electron microscopy

Transmission Electron Microscopy (TEM) and Electron Energy Loss Spectroscopy (EELS) were performed to study the microstructural evolution of La–Cr–O thin films deposited by radio frequency (RF)-magnetron sputtering on stainless steel substrates. Chromium L edges and oxygen K edges are analyzed to determine the valence states of the chromium and elucidate the phase evolution of the thin film. The as-deposited amorphous thin film crystallized to LaCrO₄ and finally transformed to the LaCrO₃ stable phase during annealing at 800°C. An intermediate Cr/Mn oxide layer was formed in all annealed samples. The thickness of this oxide layer stabilizes after 700°C, which indicates that the LaCrO₃ thin film plays a role in inhibiting the growth of an oxide layer on the metal surface.     

Chemical effect on total mass attenuation coefficients of V, Cr, Mn, Co and Ni

Detailed interpretation of data obtained from X-ray transmission measurements usually depends on the assumption that the contribution of each element is additive. This assumption yields the mixture rule for X-ray attenuation coefficients which is valid if molecular and chemical effects are negligible. We measured the total mass attenuation coefficients of V, Cr, Mn, Co and Ni in various their compounds. Absorption corrections were carried on data for ligands in the compounds. We found that V, Cr, Mn, Co and Ni have different total mass attenuation coefficients in the different compounds. We compared our results with theoretical values of Hubbell and Seltzer.     

1-丁基-3-甲基咪唑硫酸氢盐与乙酸钠混合电解液中三价铬电镀的研究

本文研究了Cr³⁺在1-丁基-3-甲基咪唑硫酸氢盐（[BMIM]HSO₄）电解液中的电沉积反应以及添加剂NaOAc对电镀铬的影响. 含Cr³⁺电解液的循环伏安结果表明,Cr(III)还原为Cr(II)的峰电位是-1.5 V (vs. Pt), 峰电位和峰电流均满足Rendle-Sevcik扩散方程,由该方程计算得到Cr³⁺的扩散系数为1.6 × 10^-8 cm²·s^-1. 铬镀层的X射线衍射和扫描电子显微镜表征结果表明镀层由纳米球状的单质铬颗粒聚集而成,其平均粒径为0.87μm. 在电解液中添加NaOAc后,Cr³⁺的还原峰电位正移了约0.25 V. 同时EDS结果表明,在NaOAc的作用下镀层中Cr/O摩尔比由4.48增加至6.28,这说明OAc^-有利于单质铬的电沉积. 当电解液中NaOAc-[BMIM]HSO₄-CrCl₃-H₂O的摩尔比为0.075:1:0.5:6时,所得的镀层最厚(63 μm)与电流效率最高(33.5%).     

In vitro corrosion behavior of electrodeposited calcium phosphate coatings on Ti6Al4V substrates

Calcium phosphate coatings on titanium alloy substrates are synthesized by pulsed electrodeposition and characterized by scanning electron microscopy associated to energy dispersive X-ray spectroscopy and by X-ray diffraction. The corrosion behavior of CaP/Ti6Al4V systems and uncoated Ti6Al4V are investigated using electrochemical methods in three physiological solutions and simulated with an equivalent circuit. The results reveal that the calcium phosphate coatings act as a protective layer especially when electrodeposition is carried out in the presence of hydrogen peroxide into the electrolyte which is used to control the chemical composition of the coatings and which implies a control of the corrosion behavior of the prosthetic material.     

Redox reactions of V(III) and Cr(III)picolinate complexes in aqueous solutions

Reactions of e_aq⁻, H-atoms, OH, (CH₃)₂COH, and CO₂⁻ radicals with V(III)picolinate and Cr(III)picolinate have been studied by the pulse radiolysis technique. The spectra of V(II)picolinate, V(IV)picolinate, Cr(II)picolinate, OH adduct of Cr(III)picolinate and Cr(IV)picolinate have been obtained and the rate constants of the reactions of various radicals with V(III) and Cr(III)picolinate have been determined. The implications of these results to the chemical decontamination of nuclear reactor systems are discussed.     

Interfacial Studies for improving the adhesion of Cr/Al films on composites

The composites, such as CFRP and GFRP, have been widely applied in spaceflight, for their low specific gravity, low cost, and additional structural stability. However, the high resistivity of the composites severely inhibits their further applications. Therefore, Cr/Al films with low resistivity and high adhesion were deposited on composites by cathodic arc technique. The films were characterized by pull test, Dektak 8 Stylus Profilometer, SEM, XPS, XRD and Z‐82 standard four probes. Results show that the aluminum film of fcc structure is compact and uniform, with resistivity as low as bulk Al. The adhesion between Cr buffer layer and composite substrate was greatly enhanced because of the formation of the chemical bonds, such as Cr? C, Cr? O and Cr? N, at the Cr/composite interface. Copyright © 2011 John Wiley & Sons, Ltd.     

Influence of Cr on the Electronic Properties of Passive Film on B30 Alloy in NaOH Solution

The influence of Cr on the electronic properties of the passive film on B30 alloy in NaOH solution was studied via electrochemical impedance spectra(EIS), potentiodynamic curve and Mott-Schottky plot. The Cr doped in the passive film on B30 alloy was detected by X-ray photoelectron spectroscopy(XPS). XPS results show that Cr₂O₃ appeared on the passive film, which implied the enhanced anti-corrosion of B30 alloy. The passive film showed a p-type semi-conductive character. The acceptor density(N_A) was in an order of magnitude of 10²² cm^-3, and N_A decreased with the increment of Cr. EIS results show that the film resistance(R_f) increased with increasing the amount of Cr. The diffusion coefficient(D₀) was calculated to be in a range of 10^-16-10^-17 cm^-2/s on the basement of point defect model(PDM).     

Theoretical investigation on transformation of Cr(II) to Cr(V) complexes bearing tetra-N-heterocyclic carbene and group transfer reactivity

The mechanism for the transformation among a series of Cr(II) to Cr(V) complexes bearing tetra-N-heterocyclic carbene macrocycle is investigated. The oxidation and aziridination of Cr(II) monomer are studied by local density functional M06L. The former generates Cr(IV) oxo and further oxidizes to cationic Cr(V) oxo. The latter proceeds via two paths with different multiplicity, forming Cr(IV) imide. The Cr(IV) oxo cannot transfer its oxygen atom neither to phosphine nor to alkene because of the high energy barrier and endothermic process. The group transfer reactions are explored for Cr(V) oxo and Cr(IV) imide. The doublet Cr(V) oxo can also exist as quartet Cr(IV)-oxyl radical and promote oxygen transfer to phosphine, resulting in phosphine oxide in one exergonic step. The macrocyclic ligand effect of imido group transfer from Cr(IV) imide is verified by Multiwfn analysis. For 18-ringed imide, the matched orbital type and same-phase overlap reduce the barrier of its 16-ringed analog and facilitate the formation of phosphorus imine.     

Speciation of Cr(VI)/Cr(III) by electrothermal atomisation AAS after electrodeposition on a L'vov platform

Summary The pyrolysed graphite L'vov platform of a tube furnace is considered as an electrode for the electrodeposition and speciation of chromium by electrothermal atomisation atomic absorption spectrometry (ETA-AAS). Firstly, a preliminary study of the Cr(VI)/Cr(III) voltammetric behavior at pH 4.70 on a glassy-carbon electrode is carried out. Secondly, the L'vov platform is used as a cathodic macro-electrode for the selective preconcentration of Cr(VI)/Cr(III) on a mercury film. Speciation of Cr(VI)/Cr(III) is carried out on the basis of the electrolysis potential (E_e): at pH 4.70 and E_e=–0.30 V, only Cr(VI) is reduced to Cr(III) and accumulated as Cr(OH)₃ by adsorption on a mercury film; at E_e=–1.80 V both Cr(VI) and Cr(III) are accumulated forming an amalgam with added mercury(II) ions. Once the film has been formed, the platform is transferred to a graphite tube to atomise the element. The reliability of the method was tested for the speciation of chromium in natural waters and it proves to be highly sensitive thanks to the electroanalytical step. In all samples, the Cr(VI) concentration was less than the detection limit (0.15 ng ml^–1), and the concentration of Cr(III) agrees with those of total chromium. The analytical recovery of Cr(VI) added to water samples [3.50 ng ml^–1 of Cr(VI)] was 105±6.2%.     

Comparison of the influence of titanium and chromium adhesion layers on the properties of sol–gel derived NKN thin films

Lead-free (Na_0.5K_0.5)NbO₃ (NKN) thin films were prepared on Pt/X/SiO₂/Si substrates (with the adhesion promoters X = Ti, Cr) by a sol–gel process with and without post-annealing treatment. The effect of the diffusion of the adhesion layer elements Ti and Cr into the NKN film was analysed by secondary ion mass spectrometry, scanning electron microscopy pictures, X-ray diffraction (XRD), and leakage current measurements. It turned out that Cr diffuses into the films to a higher extent than Ti. The high amount of Cr diffusion led to the formation of a secondary phase, as seen in the XRD pattern, and to pore formation on the surface of the NKN films. In contrast, the films with Ti adhesion layer were single phase NKN without pore formation. Also, the leakage current measurements showed a strong influence of the Cr diffusion. The leakage current of the films with Cr adhesion layer was about four orders of magnitude higher than that of the films with Ti adhesion layer. The study shows the strong influence of the adhesion layer of the substrate on the properties of NKN films.     

系列三核铬钒羧酸配合物的FAB-MS研究

进行了系列三核羧酸配合物 [M3O(O2 CCH3) 6(THF) 3]X (M3=Cr3,X =ClO4;M3=Cr2 V ,CrV2 ,V3,X =M Cl5(M 统计为 2 /3Cr+1 /3V) ,etc)的快原子轰击质谱 (FAB MS)研究 ,在V3和Cr3两个同三核配合物中 ,V配合物易脱RCO ,而Cr配合物更易脱RCO2 。在Cr2 V和CrV2 两个异三核配合物中观察到重组反应 :Cr2 V除 [Cr2 V]还生成含有 [Cr3]重组生成的碎片离子 ,CrV2 除 [CrV2 ]则生成含有 [Cr3],[Cr2 V],[V3]等其它三种重组碎片离子。充实了前文所探讨得重组原因和规律 ,根据重组反应 ,确定了金属离子反应速率顺序为Cr >V。根据所脱落的碎片 ,初步探讨了此类三核羧酸配合物催化羧酸脱羧成酮的机理。     

铬掺杂对V2O5/TiO2催化氧化3-甲基吡啶合成烟酸性能的影响

为进一步提高V2O5/TiO2催化剂对气相一步催化合成烟酸反应的活性和选择性.通过浸渍法制备一系列掺杂过渡金属铬的V2O5/TiO2催化剂,并对催化剂进行了BET、XRD、H2-TPR、NH3-TPD表征.结果表明,掺杂Cr后催化剂产生了新晶相CrVO4,减小了V2O5晶粒尺寸,并提高了催化剂的酸性,可较大地提高催化剂...     

Characterization of Fe/Cr multilayers by analytical transmission electron microscopy

Different techniques of analytical TEM were used to investigate Fe/Cr multilayers. These multilayers show a dependence of their electrical resistance as a function of the magnetic field. This effect called giant magnetoresistance can be utilized for example in magnetic recording heads. Typical dimensions of the single layer thickness are in the nanometer region. Therefore the microstructure of this material has been investigated by transmission electron microscopy (TEM). To get additional analytical information energy dispersive X-ray spectroscopy (EDXS) and electron energy loss spectroscopy (EELS) can be used. Received: 15 July 1997 / Revised: 5 February 1998 / Accepted: 6 February 1998     

HPLC analysis of Cr, V and Mo using pre- in combination with on-column derivatisation by oxine, bipyridine and H2O2

Summary The HPLC behaviours of Cr(VI), Mo(VI) and V(V) peroxo complexes in a H₂O₂-8-hydroxyquinolinebipyridine system were studied by using pre-column in combination with on-column derivatisation. The chromatograms of Cr(VI), Mo(VI) and V(V) show them to be CrO^2– ₄, oxine-Mo peroxo and oxine-V-bipyridine peroxo complexes, respectively, and were used for the separation, identification and determination of Cr(VI), Mo(VI) and V(V) using acetonitrile-water as mobile phase. The calibration curves obtained for 20 l injections were linear for 1.4–7.0 mg/l Cr, 1.3–6.5 mg/l Mo and 0.7–3.4 mg/l V. The relative standard deviations were between 6 and 10%.

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HPLC-Analyse von Cr, V und Mo unter Verwendung von Vorsäulen- in Kombination mit Säulenderivatisierung durch Oxin, Bipyridin und H₂O₂

     

22Cr双相不锈钢钝化膜组成及其半导体性能研究

借助于Mott-Schottky方程分析了成膜电位、成膜时间、成膜温度以及氯离子等因素对22Cr双相不锈钢在碳酸氢钠/碳酸钠缓冲溶液中所成钝化膜半导体性能的影响, 同时借助于X射线光电子能谱(XPS)技术分析了所成钝化膜的组成. 结果表明: 22Cr双相不锈钢在碳酸氢钠/碳酸钠缓冲溶液中所成钝化膜呈n-p型半导体结构, 钝化膜内施主/受主密度随成膜电位增加、成膜时间延长、成膜温度降低、以及介质中氯离子浓度的降低而减小, 同时膜对基体保护作用随这些因素变化而增强. 钝化膜的XPS分析表明, 钝化膜呈现双层结构, 外层膜主要由三价铁的氧化物(Fe2O3)组成, 内层膜主要由三价铬氧化物(Cr2O3)以及少量二价铁氧化物(FeO)组成.     

Compositional and electrical properties of Cr,Nb, Cr/Nb,CrNbN, and CrN/NbN multilayers grown using the d.c. magnetron sputtering technique

Cr, Nb, Cr/Nb, CrN_x, NbN_x, CrNbN, and (CrN/NbN)_n structures were produced on Si and glass substrates, using the d.c. magnetron sputtering technique. Compositional analysis, based on binding energies of Cr, Nb, and N, was carried out by means of X-ray photoelectron spectroscopy (XPS). Through Auger electron spectroscopy (AES), depth profiles were obtained, allowing to demonstrate the multilayers production. Surface morphological characteristics, as roughness and grain size, were evaluated by atomic force microscopy (AFM), revealing very smooth surfaces, that is a consequence of the deposition parameters used in the synthetization experiments. Finally, for different configurations, conductivity measurements were carried out, revealing the influence of nitrogen content and temperature on electron transport. It was found that substoichiometric nitrides (CrN_0.35 and NbN_0.12) exhibited the highest conductivity, because the nitrogen atoms act as donor of electrons.     

AES studies on the Ti/N compositionally gradient film deposited onto Ti-6Al-4V alloy by reactive DC sputtering.

Deposition of Ti/N compositionally gradient film onto Ti-6Al-4V alloy substrates was carried out by reactive DC sputtering, not only to improve the blood compatibility of the alloy but also to relax the stress concentrated at the interface between the film and the alloy substrate. The compositional gradient was realized by varying continuously the nitrogen content in Ar-N2 sputter gas during deposition. In Auger electron spectroscopy (AES) analysis, Auger spectra were acquired in the N(E) mode using the beam brightness modulation (BBM) method to overcome the problem of the peak overlap of the principal Auger nitrogen transition peak (N-KLL) with one of titanium peaks (Ti-LMM). The deposited film appeared to be uniform and adhesive. TiN formation at the surface of the film was assumed, because of its yellow gold color and the X-ray diffraction (XRD) pattern for it. Under scanning electron microscopy, it was found that the surface had fine particles dispersed on a smooth accumulated deposit and that this depositing method improved the structural property of the film at the surface. According to AES in-depth profiles, the nitrogen (N) concentration in the film gradually decreased in the depth direction from the surface toward the alloy, confirming that a Ti/N compositionally gradient film had formed on the alloy substrate.     

Cr负载V2O5-WO3/TiO2催化剂的低温NH3-SCR脱硝活性

采用浸渍法制备了一系列不同Cr负载量的CrO_x-V₂O₅-WO₃/TiO₂催化剂, 研究了Cr改性对该催化剂脱硝活性及抗硫性能的影响. 结果表明, Cr的引入使V₂O₅-WO₃/TiO₂催化剂的低温NO_x去除效果和抗硫性能显著提升. Cr的负载量为3%(以Cr₂O₃计算质量分数)时, 催化剂具有最佳的低温脱硝活性和N₂选择性. 结构表征结果表明, 改性催化剂中Cr元素主要以Cr³⁺形式存在, Cr的引入使催化剂的氧化性能明显提升, 并使表面弱酸位点、 强酸位点和催化剂表面吸附氧数量增多. XPS分析结果表明, Cr能使催化剂中V⁵⁺/V⁴⁺比例降低, 促进催化剂中自由电子的迁移. In situ DRIFTs表征结果显示, Cr的引入能促进NO与吸附在Brönsted酸位点上的NH₃在低温条件下反应, 从而使催化剂具有更好的低温脱硝活性. UV-Vis光谱分析结果表明, CrO_x负载量提高会显著增加高价态Cr的烧结聚集. 同时, 提出了一种选择性催化还原(SCR)反应中Cr-V协同催化的机理.     

Synchrotron light scattering on nanostructured V/Ce oxide films intercalated with Li+ ions

Vanadium oxide and new V/Ce oxide films on a glass substrate were obtained by the sol-gel process. The morphology of these nanostructured and porous films was studied by grazing-incidence small-angle X-ray scattering (GISAXS) at the ELETTRA synchrotron (Italy, Trieste). The aim of performing GISAXS was to study changes, which might occur in the grain sizes and the porosity of vanadium oxide and V/Ce oxide at 38 and 55 atom % of V, upon the intercalation of Li+ ions. The average grain radius obtained by GISAXS varied with the layer thickness and upon the intercalation of Li+ ions. The layer structure in V/Ce oxides was revealed by the grazing-incidence X-ray reflectivity (GIXR) method. The average grain radius , obtained by GISAXS, was correlated with the intercalation of Li+ ions. The specific surface area of these films was also determined and generally varied from 0.5 nm(-1) to 0.03 nm(-1).