a-Si:H/a-SiCx:H超晶格的界面特性

报道等离子体化学汽相沉积法制备的ａ－Ｓｉ：Ｈ／ａ－ＳｉＣ：Ｈ超晶格的蓝移现象，用小角度Ｘ射线衍射确定超晶格的界面陡度。通过红外测量和常数光电流测量发现，超晶格界面附近存在较高浓度的Ｈ和较多的Ｓｉ－Ｃ键，界面Ｈ的热稳定性较差，界面缺陷态密度为１．２×１０^１１ｃｍ^-2。 关键词：     

低压-金属有机物汽相外延生长的Ga1-xInxAs/InP激光器中深能级的研究

应用深能级瞬态谱（ＤＬＴｓ）技术详细研究低压－金属有机物汽相外延（ＬＰ－ＭＯＶＰＥ）生长的Ｇａ_０．４７Ｉｎ_０．５３Ａｓ／Ｉｎｐ量子阱、宽接触和质子轰击条形异质结激光器中的深能级。样品的ＤＬＴＳ表明，在宽接触激光器的ｉ－Ｇａ_０．４７Ｉｎ_０．５３Ａｓ有源层里观察到Ｈ１（Ｅ_ｖ＋０．０９ｅＶ）和Ｅ１（Ｅ_ｃ－０．３５ｅＶ)陷阱，它们可能分别与样品生长过程中扩散到ｉ－Ｇａ_{０．４ 关键词：}     

a－Si：H／a－SiC＿x：H超晶格的界面特性

报道等离子体化学汽相沉积法制备的ａ－Ｓｉ：Ｈ／ａ－ＳｉＣ：Ｈ超晶格的蓝移现象，用小角度Ｘ射线衍射确定超晶格的界面陡度。通过红外测量和常数光电流测量发现，超晶格界面附近存在较高浓度的Ｈ和较多的Ｓｉ－Ｃ键，界面Ｈ的热稳定性较差，界面缺陷态密度为１．２×１０￣（１１）ｃｍ￣（－２）。     

低压－金属有机物汽相外延生长的Ga＿（1－x）In＿xAs／InP激光器中深能级的研究

应用深能级瞬态谱（ＤＬＴｓ）技术详细研究低压－金属有机物汽相外延（ＬＰ－ＭＯＶＰＥ）生长的Ｇａ＿（０．４７）Ｉｎ＿（０．５３）Ａｓ／Ｉｎｐ量子阱、宽接触和质子轰击条形异质结激光器中的深能级。样品的ＤＬＴＳ表明，在宽接触激光器的ｉ－Ｇａ＿（０．４７）Ｉｎ＿（０．５３）Ａｓ有源层里观察到Ｈ１（Ｅ＿ｖ＋０．０９ｅＶ）和Ｅ１（Ｅ＿ｃ－０．３５ｅＶ）陷阱，它们可能分别与样品生长过程中扩散到ｉ－Ｇａ＿（０．４７）Ｉｎ＿（０．５３）Ａｓ有源层的Ｚｎ和材料本身的原生缺陷有关。而条形激光器的ｉ－Ｇａ＿（０．４７）Ｉｎ＿（０．５３）Ａｓ有源层的Ｈ２（Ｅ＿ｖ＋０．１１ｅＶ）和Ｅ２（Ｅ＿ｖ－０．４２ｅＶ）陷阱则可能是Ｈ１和Ｅ１与质子轰击引起的损伤相互作用的产物。     

取代环戊二烯基铬,钼或钨羰基物和有机铁硫砷簇合物UV—VIS…

通过对三种类型十个有机族合物在十种有机溶剂中紫外－可见光谱的测试及计算机辅助处理，得到了族合物在一些溶剂中ＵＶ－ＶＩＳ谱ＣＴ带的ｖｍａｘ／ｃｍ＾－１和溶剂极性参数（ｎ＾２－１）／（２ｎ＾２＋１），Ｚ值之间存在着好的性关系，其相关系分别到了０．９８４－０．９９０。本文还对ＣＴ带的ｖ／ｃｍ＾－１和（ｎ＾２－１）／（２ｎ＾２＋），Ｅｔ（３０）进行了二元线性回归处理，得到了更好的线性关系，相关系数为０．９     

少子陷阱特性和铍硅共注半绝缘GaAs空穴陷阱

用深能级瞬态谱（ＤＬＴＳ）技术测量了高温退火的Ｂｅ和Ｓｉ共注入的ＬＥＣ半绝缘ＧａＡｓ（无掺杂）。在多子脉冲作用下的Ａｌ／Ｂｅ－Ｓｉ共注ＬＥＣＳＩＧａＡｓ肖特基势垒中，观测到Ｅ₀₁（０．２９８），Ｅ₀₂（０．３４１），Ｅ₀₃（０．５５５）和Ｅ₀₄（０．８２１）等四个电子陷阱以及两个主要的少子（空穴）陷阱Ｈ＇₀₃（０．５４）和Ｈ″₀₃（０．５７）。两少子陷阱的ＤＬＴＳ信号具有若干特点，比如它们的ＤＬＴＳ·峰难于通过增宽脉冲达到最大高度；以及峰的高度强烈地依赖于温度等。这些现象可以用少子陷阱的少子俘获和热发射理论进行合理地解释。鉴于用ＤＬＴＳ技术测量这种陷阱的困难，我们用恒温电容瞬态技术测定它们的空穴表观激活能分别为０．５４和０．５７ｅＶ。它们是新观测到的和Ｂｅ－Ｓｉ共注ＳＩＧａＡｓ有关缺陷。 关键词：     

BF+2注入加固硅栅PMOSFET的研究

系统地研究了ＢＦ＋２ 注入硅栅Ｐｃｈａｎｎｅｌ ｍｅｔａｌｏｘｉｄｅｓｅｍｉｃｏｎｄｕｃｔｏｒ ｆｉｅｌｄｅｆｆｅｃｔ ｔｒａｎｓｉｓｔｏｒ（ＰＭＯＳＦＥＴ） 阈值电压漂移与γ辐照总剂量之间的关系,深入地探讨了ＢＦ＋２ 注入抗γ辐射加固的机理．结果表明,ＢＦ＋２ 注入对硅栅Ｐｃｈａｎｎｅｌ ｍｅｔａｌｏｘｉｄｅｓｅｍｉｃｏｎｄｕｃｔｏｒ（ＰＭＯＳ） 在γ辐照下引起的阈值电压漂移具有很强的抑制作用,ＢＦ＋２ 注入加固硅栅ＰＭＯＳ 的最佳注入剂量范围为５ ×１０１４ —２ ×１０１５ ｃｍ － ２ ,分布在ＳｉＯ２／Ｓｉ 界面的Ｆ 原子抑制了γ辐照下在ＳｉＯ２／Ｓｉ 界面产生的氧化物陷阱电荷和界面陷阱电荷可能是ＢＦ＋２ 注入加固硅栅ＰＭＯＳＦＥＴ 的主要原因     

CEMS和慢正电子束研究ZrO2(Y)中Fe的热动力学行为

用内转换电子穆斯堡尔谱（ＣＥＭＳ）和慢正电子束研究了含３％Ｙ₂Ｏ₃的ＺｒＯ₂中⁵⁷Ｆｅ离子（１００ｋｅＶ，３×１０¹⁶ａｔ．／ｃｍ²）注入态及其在氢气氛中退火的热力学行为．注入态以Ｆｅ³⁺，Ｆｅ²⁺和Ｆｅ⁰存在，它们分别是Ｆｅ³⁺-Ｖ（空位）复合体、二聚体和超顺磁颗粒．经４００，５００℃退火后，Ｆｅ³⁺-Ｖ分解，分别出现了α-Ｆｅ的前期相和α-Ｆｅ纳米颗粒．含Ｆｅ的ＺｒＯ₂（Ｙ）混合导电的出现可能是和Ｆｅ的不同价态及其相对含量有关 关键词：     

ArCN三原子准分子的研究(Ⅰ)——电子态的量子化学计算

分别采用６－３１Ｇ＊，６－３１Ｇ?＊基组对线性ＡｒＣＮ分子的X²∑⁺，Ａ²∏_i，Ｂ²∑⁺，Ｃ²∏_i，Ｄ²∑⁺和Ｅ²∏_r ６个电子态进行了从头计算法开壳自旋限制Ｈａｒｔｒｅｅ－Ｆｏｃｋ（ＲＯＨＦ）计算。计算结果表明线性ＡｒＣＮ分子的电子态具有典型的准分子结构，从而可以肯定ＣＮ与稀有气体原子Ｒｇ（Ａｒ，Ｋｒ，Ｘｅ）能够形成自由基准分子。对Ｘ²∑⁺，Ａ²∏_i的自旋非限制Ｈａｒｔｒｅｅ－Ｆｏｃｋ（ＵＨＦ）计算证实较大的自旋污染不影响势能曲线的形状。 关键词：     

Ge/Si异质键合半/绝接触界面态对异质结光电输运特性的影响研究

Ge/Si异质键合技术作为一种新型的通用材料制备工艺,在制备高质量Si基Ge薄膜方面展现出巨大的潜力,是研制高性能Ge/Si光电器件的备选方案之一。现阶段主流的直接键合和等离子体键合方法在制备Ge/Si薄膜时都容易在Ge/Si键合界面处引入纳米氧化锗层(GeO₂),导致Ge/GeO₂及GeO₂/Si半/绝接触界面存在界面态,从而器件性能受影响。基于载流子三大输运方程、非局域隧穿模型及半经典量子解法,构建了低温Ge/Si异质键合界面,研究了键合界面的界面态密度(ISD)对Ge/Si异质结的载流子电学输运、光吸收、复合及高频响应等性能的影响。结果表明,随着ISD的增加,Ge/Si异质结的暗电流增大,同时界面态对载流子的俘获能力加强,导致总电流减小,光谱响应减弱。另外,ISD的增加导致Ge层内的电场减小,高频特性变差。为获得性能良好的键合Ge/Si异质结,ISD必须低于1×10¹² cm^-2。该研究结果为高质量Si基Ge薄膜及高性能Ge/Si光电器件的制备提供了理论指导。     

Chiral perturbation theory for fDS/FD and BBS/BB

The decay constants for D and D_s mesons, denoted f_D and f_DS respectively, are equal in the SU(3)_V limit, as are the hadronic amplitudes for and mixing. The leading SU(3)_V violating contribution to (F_DS/F_D) and to the ration of hadronic matrix elements relevant for and mixing amplitudes are calculated in chiral perturbatiion theory. We discuss the formalism needed to include both meson and anti-meson fields in the heavy quark effective theory.     

Near-infrared bands of S2: 3Πgi-3Σu+ system

Vibrational and rotational analyses of the near-infrared bands of S₂ lying in the region 7440–8085 Å are reported. They form a new band system involving a ${}^3\text{Π}{}_{\mathrm{gi}}\text{-}{}^3\text{Σ}{}_{\mathrm{u}}{}^{\mathrm{+}}$ transition and arise from the same initial ³Π_gi state of the ³Π_gi-³Δ_ui band system reported earlier. The analyses of the bands of this system due to the isotopic molecules ³²S³⁴S and ³⁴S₂ are also reported.     

Magnetism in nanometer-thick TiOx/Co/TiOx/TiN/Si multilayered structures

Most studies on Co-doped TiO₂ system were focused on thin films grown by MBE-based methods. In this work we report the ferromagnetism of nanometer-thick-layered TiO₂/Co/TiO₂/TiN film grown on Si substrate by conventional magnetron sputtering. For the growth of TiO₂ on silicon, a non-oxide thermally stable material, TiN, was introduced to prevent Ti penetration into the Si substrate. Structural, magnetic, and transport measurements respectively by Raman, SQUID and Hall effect show that our samples are n-type semiconductors and exchange bias effect due to exchange coupling between Co and interfacial CoO. For the rapid vacuum annealed specimen, we found an enhanced loss and a Perminvar-type constricted hysteresis loop, which attributed to pinning of domain walls due to an induced anisotropy by the pair ordering in the metallic alloy of Co-Ti-Si.     

The decay process 11ΛB → π− + 11C

The branching ratios are calculated for ¹¹_ΛB decay to the ¹¹C ground and excited states below 8 MeV for two possible spin values of ¹¹_ΛB. It is found that the decay rate to the ¹¹C^★ state at E^★ = 6.48 MeV is comparable in magnitude to that leading to the ¹¹C ground state if $\text{J(}{}^{11}{}_{\mathrm{\Lambda }}\text{B}\text{) =}\text{5}\text{2}$ is assumed. This result, unlike the branching ratios calculated for the $\text{J(}{}^{11}{}_{\mathrm{\Lambda }}\text{B}\text{) =}\text{7}\text{2}$ case, is in accord with experiment and lends support to the assumption that $\text{J =}\text{5}\text{2}$ holds for ¹¹_ΛB. The necessity of the reinterpretation of some of the so-called ¹³_ΛC events in terms of ${}^{11}{}_{\mathrm{\Lambda }}\text{B}\text{→ π}{}^{\mathrm{?}}\text{+}{}^{11}\text{C}{}^1$ is indicated.     

The decay processes Λ8Li → π− + 8Be1 (∼ 17 MeV)

The branching ratio is calculated for _Λ⁸Li decay to the (2⁺) ⁸Be¹ states near 17 MeV, using intermediate coupling wave functions for _Λ⁸Li and for the relevant ⁸Be¹ states. It is pointed out that this ratio is sensitive primarily to a mixing angle ? in the _Λ⁸Li wave function. Within one standard deviation, the data allow two ranges (+0.05 to +0.25 rad and +1.10 to +1.25 rad) for the value of ?. The further requirement that there also be acceptable agreement between the angular distribution expected for the subsequent ${}^8\text{Be}{}^1\text{(? 17}\text{MeV → 2}{}^4\text{He}$ decay and the data, shifts these allowed ranges for ?, to (+0.13 to 0.40) rad and (+0.9 to +1.2) rad. It is predicted that the dominant transition should be to ⁸Be¹ (16.6 MeV), as is observed to be the case, rather than to ⁸Be¹ (16.9 MeV). The interpretation of these values for ? is discussed in some detail and their implications for intermediate coupling shell-model calculations of Λ-hypernuclear wave functions are considered.     

The 5T2g → 5Eg absorption in MgO: Fe2+

At helium temperatures two sharp lines at 9350 and 9510 cm^?1 have been observed for the first tune on the low-energy side of the broad double-peaked absorption corresponding to the ${}^5\text{T}{}_{\mathrm{2g}}\text{→}{}^5\text{E}{}_{\mathrm{g}}$ transition in Fe²⁺ at the octahedral site in MgO. The lower energy line has a half width of 4 cm^?1; Zeeman measurements show that it is of magnetic dipole origin. The Zeeman spectra are consistent with those expected for a pure electronic transition from the (⁵T_2g)T_2g ground state to the ⁵E_g excited state. The second line, with a halfwidth of ~ 35 cm^?1, a vibrational sideband.     

Electrical property of HfOxNy-HfO2-HfOxNy sandwich-stack films

The effects of HfO_xN_y on the electrical property of HfO_xN_y-HfO₂-HfO_xN_y sandwich-stack (signed as SS) films were investigated. Excellent electrical performances were achieved in SS films, with a high dielectric constant of 16 and a low leakage current of ∼2 × 10⁻⁸ A/cm² at 1 MV/cm. Schottky (SK) emission and Frenkel-Poole (PF) emission are found to be the dominant mechanisms for the current conduction behavior. After a long time stress, the flat-band voltage shift in the SS film is much smaller than that in a pure HfO_xN_y film indicating fewer charge traps existed in the SS film. Based on the experiments, the new SS structure is more favorable for the improvement of electrical performances than a pure HfO_xN_y or HfO₂ structure.     

Spinor techniques for calculating pp → W±/Z0 + jets

We present techniques which enable one to calculate quickly the amplitudes for many scattering processes in the high-energy limit. As an illustration of the method, these are applied to the diagrams for $\text{p}\text{p}\text{→}\text{V}\text{+ 0, 1}\text{or}\text{2}\text{jets}$, where V = W^± or Z⁰. The form of the results lends itself to immediate numerical evaluation.     

Etude par diffraction neutronique des solutions solides K1−xBixF1+2xetRb1−xBixF1+2x

Bragg neutron diffraction studies have been carried out on the fluorite type solid solutions K_1?xBi_xF_1+2x (0.50 ? × ? 0.70) and Rb_1?xBi_xF_1+2x (0.50 ? × ? 0.60). The distribution of the fluorine atoms between normal and interstitial sites is given as a function of substitution rate. A substition mechanism is proposed. Electrical and NMR results on one side and structural data on the other side are correlated. A study of the background as a function of temperature has allowed to determine the static origin of its modulation. By inelastic neutron diffusion, it has been shown that the number of carriers is weak, which involves a high mobility.     

Electronic and magnetic structures of V-doped zinc blende Zn1-xVxNyO1-y and Zn1-xVxPyO1-y

Electronic and magnetic structures of zinc blende ZnO doped with V impurities are studied by first-principles calculations based on the Korringa-Kohn-Rostoker (KKR) method combined with the coherent potential approximation (CPA).Calculations for the substitution of O by N or P are performed and the magnetic moment is found to be sensitive to the N or P content.Furthermore,the system exhibits a half-metallic band structure accompanied by the broadening of vanadium bands.The mechanism responsible for ferromagnetism is also discussed and the stability of the ferromagnetic state compared with that of the paramagnetic state is systematically investigated by calculating the total energy difference between them by using supercell method.