Polymer waveguides from alicyclic methacrylate copolymer fabricated by deep-UV exposure

We have investigated the fabrication of waveguides from alicyclic methacrylate copolymer based on refractive-index modification by deep-UV exposure. By optimizing the UV-exposure process, we were able to obtain single-mode waveguides with a propagation loss of 0.8 dB/cm at 1550 nm, which is due only to material losses in this wavelength range. The loss obtained here is comparable with that of poly(methyl methacrylate) (PMMA) waveguides fabricated by deep-UV exposure. The fabricated waveguide is also single mode at 808 nm, and its propagation loss is 0.6 dB/cm. This alicyclic methacrylate copolymer is a promising material for the fabrication of polymer waveguides by use of deep-UV exposure.     

Polymer-based waveguides with low propagation loss and polarization-dependent loss

Polymeric optical waveguides based on a new synthesized bisphenol A–aldehyde polymer (PA-1 resin) have been fabricated using photolithography and reactive ion etching technique. The polymer is novel with relatively high refractive index, low birefringence and absorption at the optical communication wavelengths. The single-mode channel waveguides exhibit a propagation loss of 0.41±0.05 dB/cm at a wavelength of and 0.5±0.05 dB/cm at for both the TE and TM polarizations. The polarization-dependent loss of the waveguides is 0.1±0.05 dB/cm at these wavelengths.     

Low-loss amorphous Si waveguides with gradient refractive index cladding structure

Amorphous Si waveguides with gradient refractive index cladding structure are proposed and fabricated using plasma-enhanced chemical vapor deposition method.Compared with 6 dB/cm for ridge waveguide without gradient cladding,the propagation loss of the gradient cladding waveguides is less than 1 dB/cm with both TE and TM polarizations.     

Geometry Parameter Optimization of Large Cross-Sectional S-Shaped Bent Rib Waveguides for Silicon Based Optical Switches

By using a genetic algorithm, geometry parameters of large cross-sectional S-bend rib waveguides are optimized aiming at the least total loss when the propagation loss is considered. Optimized results axe presented as an example of S-bend rib waveguides based on silicon-on-insulator （SOI） 4 × 4 optical switches. The value of 2 dB/cm is given to the propagation loss according to the experimental results. The simulation results indicate that the total loss drops from 1.0002rib down to 0.4375dB without considering a lateral offset. If the offset is adopted, the total loss reduces from 0.5463dB to 0.2365dB. In addition, the effect of the rib height ratio on the loss is analysed, and the optimal ratio is obtained to be 0.55.     

制备多模聚硅氧烷光波导关键技术的改进

本文利用浇铸法,使用M&N胶和OE6450两种聚硅氧烷制备光波导.通过改进制备光波导的多个关键技术, 解决了波导制备过程中的气泡问题、脱模问题、芯层不固化问题、芯层和覆盖层产生化学反应等难题,提出了 比较完备和科学的聚硅氧烷波导制备工艺流程,从而使得波导的制备成品率从原来低于40%提高到高于80%, 波导的最大长度从原来的21 cm增加到22.5 cm,波导的损耗(截断法测量结果)从最初的0.3dB/cm(850 nm)降低到了 0.21dB/cm(850nm).本文在波导制备技术方面具有重要的实际意义和价值.     

Low-loss waveguides written with a femtosecond laser for flexible interconnection in a planar light-wave circuit

We describe a low-loss single-mode waveguide in planar light-wave circuit (PLC) glass doped with boron and phosphorus, which is more difficult to write than pure-silica glass. The written waveguide has a rectangular core, a symmetric near-field pattern, and a propagation loss of 0.35 dB/cm. The loss that originates from the mode-field mismatch between the mode-field diameters of the written and the PLC waveguides is less than 0.1 dB/point. In addition, we successfully connected PLC waveguides with a 500-microm-long waveguide written with a laser. The laser-written waveguide can flexibly connect PLC waveguides with a low coupling loss.     

BESOI光波导的研制

本文通过大量实验,采用键合及背腐蚀方法研制成功 SOI 光波导,传输损耗仅0.85dB/cm.     

溶胶-凝胶法制备SiO2-TiO2平板光波导工艺研究

采用溶胶-凝胶法制备了SiO₂-TiO₂平板光波导,计算了平板光波导通光条件,分析了硅/钛溶胶-凝胶材料的热性能,观测了平板光波导的结构形貌,并测试了其通光损耗。结果表明：经过200℃,30 min干燥处理的凝胶薄膜呈疏松多孔状态,对于非对称平板波导,存在芯层通光截止厚度,而且当SiO₂-TiO₂芯层厚度为0.5 μm时,SiO₂下包层厚度至少有6 μm才能防止1550 nm波长光泄露入单晶硅衬底中。制备的光波导对于1550 nm波长光传输损耗最小值为0.34 dB/cm。     

Low-loss germanium strip waveguides on silicon for the mid-infrared

Mid-infrared photonics in silicon needs low-loss integrated waveguides. While monocrystalline germanium waveguides on silicon have been proposed, experimental realization has not been reported. Here we demonstrate a germanium strip waveguide on a silicon substrate. It is designed for single mode transmission of light in transverse magnetic (TM) polarization generated from quantum cascade lasers at a wavelength of 5.8 μm. The propagation losses were measured with the Fabry-Perot resonance method. The lowest achieved propagation loss is 2.5 dB/cm, while the bending loss is measured to be 0.12 dB for a 90° bend with a radius of 115 μm.     

低偏振相关损耗聚合物光波导

表征了新合成的热光聚合物bisphenol A-aldehyde resin (BPA-resin)的独特性质。并且利用光刻和反应离子刻蚀技术(RIE)制备成功BPA-resin 聚合物的单模条波导.实验结果表明,对于TE和TM偏振,该聚合物波导在1.31 μm和1.55 μm波长下分别有低达0.43 dB/cm和0.51 dB/cm的传播损耗.在上述波长下,波导的低偏振相关损耗 (PDL)小于0.1 dB/cm.因此,是制备可调热光器件的良好导波模快.     

聚硅氧烷改性及多模光波导制备

采用含氢聚硅氧烷(HPSO)和二乙烯基苯(DVB)的交联体掺入聚二甲基硅氧烷(PDMS)中,使改性的聚二甲基硅氧烷(M-PDMS)折射率发生1%～1.8%的改变。M-PDMS及PDMS薄膜具有良好的光透射率和低的传输损耗,是低成本制备用于高速芯片间光互连聚合物光波导的理想材料。采用软成型和图案转移法,用M-PDMS及PDMS分别作波导的芯层和包层制备了截面为50μm×50μm,长度大于20cm的聚硅氧烷多模光波导。用数字化散射法测量了所制备波导的传输损耗,测得输入光波长为633nm时平均传输损耗为0.137dB/cm。     

Silver/polystyrene-coated hollow glass waveguides for the transmission of terahertz radiation

We have applied techniques developed for IR waveguides to fabricate Ag/polystyrene (PS) -coated hollow glass waveguides (HGWs) for transmission of terahertz radiation. A loss of 0.95 dB/m at 119 microm (2.5 THz) was obtained for a 2 mm bore, 90 cm long Ag/PS HGW. We found that TE modes are supported in HGWs with thin PS films, while hybrid (HE) modes dominate when PS film thickness increases. The lowest losses are obtained for the thicker PS films and the propagation of the HE modes.     

有机-无机复合ZrO2-SiO2平面光波导

采用溶胶-凝胶法合成ZrO2-SiO2有机一无机复合光波导材料,通过改变其中ZrO2的含量来调节材料的折射率,使材料分别适用于平面光波导的导光层(ng≈1．497)和衬底层、包层(mb=nc≈1．479)。采用旋转涂膜工艺和相应的热处理,在单晶硅基片上制备衬底层、导光层和包层等薄膜,其中导光层介质因具有感光性而可通过紫外光刻来制备光路图案。所得有机一无机复合ZrO2-SiO2板型平面光波导(衬底层 导光层),用棱镜耦合截断法测试其光损耗在632．8nm波长处约为0．8dB／cm。对板型平面波导的导光层薄膜进行紫外光刻和异丙醇淋洗,制备出脊状光波导通道,在覆盖包层后,即获得埋层沟道式平面光波导。采用端耦合截断法测试了埋层沟道式平面光波导的光损耗(小于0．1dB／cm),并观察了其近场图像以及导光材料在近红外窗口的吸收光谱。     

Low-loss chalcogenide waveguides on lithium niobate for the mid-infrared

We demonstrate low-loss chalcogenide (As(2)S(3)) waveguides on a LiNbO(3) substrate for the mid-IR wavelength (4.8 μm). Designed for single-mode propagation, they are fabricated through photolithography and dry-etching technology and characterized on a mid-IR measurement setup with a quantum cascade laser. For straight waveguides, propagation loss as low as 0.33 dB/cm is measured and low-loss bends on the order of 100 μm are simulated, with measurement results showing <3 dB for a 250 μm bend radius. The coupling efficiency is estimated to be 81%. In addition, the influences of variations in width and bend radius are also investigated.     

Low loss optical channel waveguides for the infrared range using niobium based hybrid sol-gel material

In this work, we report the fabrication of single-mode Nb₂O₅ based hybrid sol-gel channel waveguides. Nb₂O₅ based hybrid sol-gel material has been deposited by spin-coating on silicon substrate and channel waveguides have been fabricated by a UV direct laser writing process. Optical guided modes have been observed to confirm single-mode conditions and optical propagation loss measurements have been performed using the cut-back technique. Optical propagation losses were measured to be 0.8 dB/cm and 2.4 dB/cm at 1.31 μm and 1.55 μm respectively. These experimental results demonstrate low loss optical waveguiding within the infrared range and are very promising in view of material choice for the development of integrated optical devices for telecommunication.     

Optical channel waveguides with trapezoidal-shaped cross sections in KTiOPO4 crystal fabricated by ion implantation

Optical channel waveguides were fabricated in KTiOPO₄ crystal by He⁺-ion implantation using photoresist masks with wedged-shaped cross sections. Semi-closed barrier walls with reduced refractive indices inside the crystal constructed the enclosed regions to be channel waveguides with trapezoidal-shaped cross sections. The m-line as well as end-fire coupling arrangements were performed to characterize the waveguides with light at wavelength of 632.8 nm. The propagation loss of the channel waveguides was determined to be as low as ∼2 dB/cm after simple post-irradiation thermal annealing treatment in air.     

Toward low-loss photonic crystal waveguides in InP/InGaAsP heterostructures

Line-defect photonic crystal waveguides exhibit severe propagation losses if they are implemented in semiconductor heterostructures with a weak refractive index contrast. We present, for what we believe is the first time, experimental structures for which we have evidence that fabrication imperfections are not the limiting factor in terms of propagation losses. We demonstrate a loss figure of 335±5 dB/cm, which is an improvement by a factor of about 2 with respect to state-of-the-art values. Simulations show that even lower losses can be obtained with different waveguide geometries. In other words, the dominant loss mechanism is related to the waveguide design, and losses are not expected to decrease upon further optimization of the fabrication process.     

PECVD SiC optical waveguide loss and mode characteristics

We report the fabrication of single mode SiC (silicon carbide) waveguides and the measurement of their propagation loss. By studying the effect of sidewalls scattering loss due to surface roughness and by reducing it, minimal propagation loss of 2.3 dB/cm for the TM polarization is measured in the visible at 0.633 μm. This loss can be used as a benchmark for further development of SiC microphotonic components and circuit for sensor systems in harsh environment.     

Fabrication of ultralow-loss Si/SiO(2) waveguides by roughness reduction

We demonstrate 0.8-dB/cm transmission loss for a single-mode, strip Si/SiO(2) waveguide with submicrometer cross-sectional dimensions. We compare the conventional waveguide-fabrication method with two smoothing technologies that we have developed, oxidation smoothing and anisotropic etching. We observe significant reduction of sidewall roughness with our smoothing technologies, which directly results in reduced scattering losses. The rapid increase in the scattering losses as the waveguide dimension is miniaturized, as seen in conventionally fabricated waveguides, is effectively suppressed in the waveguides made with our smoothing technologies. In the oxidation smoothing case, the loss is reduced from 32 dB/cm for the conventional fabrication method to 0.8 dB/cm for the single-mode waveguide width of 0.5 microm . This is to our knowledge the smallest reported loss for a high-index-difference system such as a Si/SiO(2) strip waveguide.     

K-Na离子交换单模平面波导的制备及其表征

通过K-Na离子交换技术制备了多模玻璃平面波导.采用棱镜耦合技术测量了波导的有效折射率,用IWKB方法拟合得到K-Na离子交换波导的折射率分布符合高斯分布,由色散曲线得到单模波导的制备条件(即扩散深度范围),从而得出单模波导的离子交换时间范围,制备出单模波导,并通过求解WKB色散方程得出单模波导的表面折射率.用普通数码相机,通过对离子交换平面玻璃光波导传输线进行数字成像,根据传输线上的光强分布拟合出光强传输衰减曲线,计算出单模波导的传输损耗大约为0.4 dB/cm.