Synchrotron X‐ray tests of an L‐shaped laterally graded multilayer mirror for the analyzer system of the ultra‐high‐resolution IXS spectrometer at NSLS‐II

Characterization and testing of an L‐shaped laterally graded multilayer mirror are presented. This mirror is designed as a two‐dimensional collimating optics for the analyzer system of the ultra‐high‐resolution inelastic X‐ray scattering (IXS) spectrometer at National Synchrotron Light Source II (NSLS‐II). The characterization includes point‐to‐point reflectivity measurements, lattice parameter determination and mirror metrology (figure, slope error and roughness). The synchrotron X‐ray test of the mirror was carried out reversely as a focusing device. The results show that the L‐shaped laterally graded multilayer mirror is suitable to be used, with high efficiency, for the analyzer system of the IXS spectrometer at NSLS‐II.     

Tests and characterization of a laterally graded multilayer Montel mirror

Multilayers are becoming an increasingly important tool in X‐ray optics. The essential parameters to design a pair of laterally graded multilayer mirrors arranged in a Montel‐type configuration for use as an X‐ray collimating device are provided. The results of X‐ray reflectometry tests carried out on the optics in addition to metrology characterization are also shown. Finally, using experimental data and combined with X‐ray tracing simulations it is demonstrated that the mirror meets all stringent specifications as required for a novel ultra‐high‐resolution inelastic X‐ray scattering spectrometer at the Advanced Photon Source.     

Collimating Montel mirror as part of a multi‐crystal analyzer system for resonant inelastic X‐ray scattering

Advances in resonant inelastic X‐ray scattering (RIXS) have come in lockstep with improvements in energy resolution. Currently, the best energy resolution at the Ir L₃‐edge stands at ～25 meV, which is achieved using a diced Si(844) spherical crystal analyzer. However, spherical analyzers are limited by their intrinsic reflection width. A novel analyzer system using multiple flat crystals provides a promising way to overcome this limitation. For the present design, an energy resolution at or below 10 meV was selected. Recognizing that the angular acceptance of flat crystals is severely limited, a collimating element is essential to achieve the necessary solid‐angle acceptance. For this purpose, a laterally graded, parabolic, multilayer Montel mirror was designed for use at the Ir L₃‐absorption edge. It provides an acceptance larger than 10 mrad, collimating the reflected X‐ray beam to smaller than 100 µrad, in both vertical and horizontal directions. The performance of this mirror was studied at beamline 27‐ID at the Advanced Photon Source. X‐rays from a diamond (111) monochromator illuminated a scattering source of diameter 5 µm, generating an incident beam on the mirror with a well determined divergence of 40 mrad. A flat Si(111) crystal after the mirror served as the divergence analyzer. From X‐ray measurements, ray‐tracing simulations and optical metrology results, it was established that the Montel mirror satisfied the specifications of angular acceptance and collimation quality necessary for a high‐resolution RIXS multi‐crystal analyzer system.     

Design and performance of an X‐ray scanning microscope at the Hard X‐ray Nanoprobe beamline of NSLS‐II

A hard X‐ray scanning microscope installed at the Hard X‐ray Nanoprobe beamline of the National Synchrotron Light Source II has been designed, constructed and commissioned. The microscope relies on a compact, high stiffness, low heat dissipation approach and utilizes two types of nanofocusing optics. It is capable of imaging with ～15 nm × 15 nm spatial resolution using multilayer Laue lenses and 25 nm × 26 nm resolution using zone plates. Fluorescence, diffraction, absorption, differential phase contrast, ptychography and tomography are available as experimental techniques. The microscope is also equipped with a temperature regulation system which allows the temperature of a sample to be varied in the range between 90 K and 1000 K. The constructed instrument is open for general users and offers its capabilities to the material science, battery research and bioscience communities.     

磁控溅射制备横向梯度分布的Mo/Si周期多层膜

采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构,在基板65 mm长度范围内,多层膜周期从8.21 nm线性减小到6.57 nm,周期梯度为0.03 nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明：该横向梯度分布周期多层膜上不同位置,能反射在13.3~15.9 nm波段范围内不同波长的极紫外光,反射率为60%~65%。     

A sagittally focusing double‐multilayer monochromator for ultrafast X‐ray imaging applications

The development of a sagittally focusing double‐multilayer monochromator is reported, which produces a spatially extended wide‐bandpass X‐ray beam from an intense synchrotron bending‐magnet source at the Advanced Photon Source, for ultrafast X‐ray radiography and tomography applications. This monochromator consists of two W/B₄C multilayers with a 25 Å period coated on Si single‐crystal substrates. The second multilayer is mounted on a sagittally focusing bender, which can dynamically change the bending radius of the multilayer in order to condense and focus the beam to various points along the beamline. With this new apparatus, it becomes possible to adjust the X‐ray beam size to best match the area detector size and the object size to facilitate more efficient data collection using ultrafast X‐ray radiography and tomography.     

磁控溅射制备横向梯度分布的Mo/Si周期多层膜

 采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构,在基板65 mm长度范围内,多层膜周期从8.21 nm线性减小到6.57 nm,周期梯度为0.03 nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明：该横向梯度分布周期多层膜上不同位置,能反射在13.3~15.9 nm波段范围内不同波长的极紫外光,反射率为60%~65%。     

Comparative study of multilayers used in monochromators for synchrotron‐based coherent hard X‐ray imaging

A systematic study is presented in which multilayers of different composition (W/Si, Mo/Si, Pd/B₄C), periodicity (from 2.5 to 5.5 nm) and number of layers have been characterized. In particular, the intrinsic quality (roughness and reflectivity) as well as the performance (homogeneity and coherence of the outgoing beam) as a monochromator for synchrotron radiation hard X‐ray micro‐imaging are investigated. The results indicate that the material composition is the dominating factor for the performance. By helping scientists and engineers specify the design parameters of multilayer monochromators, these results can contribute to a better exploitation of the advantages of multilayer monochromators over crystal‐based devices; i.e. larger spectral bandwidth and high photon flux density, which are particularly useful for synchrotron‐based micro‐radiography and ‐tomography.     

Performance calculations of the X‐ray powder diffraction beamline at NSLS‐II

The X‐ray Powder Diffraction (XPD) beamline at the National Synchrotron Light Source II is a multi‐purpose high‐energy X‐ray diffraction beamline with high throughput and high resolution. The beamline uses a sagittally bent double‐Laue crystal monochromator to provide X‐rays over a large energy range (30–70 keV). In this paper the optical design and the calculated performance of the XPD beamline are presented. The damping wiggler source is simulated by the SRW code and a filter system is designed to optimize the photon flux as well as to reduce the heat load on the first optics. The final beamline performance under two operation modes is simulated using the SHADOW program. For the first time a multi‐lamellar model is introduced and implemented in the ray tracing of the bent Laue crystal monochromator. The optimization and the optical properties of the vertical focusing mirror are also discussed. Finally, the instrumental resolution function of the XPD beamline is described in an analytical method.     

Investigation of multilayer X‐ray optics for the 6 keV to 20 keV energy range

The X‐ray optics group at the Swiss Light Source in co‐operation with RIT (Rigaku Innovative Technologies) have investigated seven different multilayer samples. The goal was to find an ideal multilayer structure for the energy range between 6 keV and 20 keV in terms of energy resolution and reflectivity. Such multilayer structures deposited on substrates can be used as X‐ray monochromators or reflecting synchrotron mirrors. The measured reflectivities agree with the simulated ones. They cover a reflectivity range from 45% to 80% for energies between 6 keV and 10 keV, and 80% to 90% for energies between 10 keV and 20 keV. The experimentally measured energy resolution of the samples lies between 0.3% and 3.5%.     

Finite‐element modelling of multilayer X‐ray optics

Multilayer optical elements for hard X‐rays are an attractive alternative to crystals whenever high photon flux and moderate energy resolution are required. Prediction of the temperature, strain and stress distribution in the multilayer optics is essential in designing the cooling scheme and optimizing geometrical parameters for multilayer optics. The finite‐element analysis (FEA) model of the multilayer optics is a well established tool for doing so. Multilayers used in X‐ray optics typically consist of hundreds of periods of two types of materials. The thickness of one period is a few nanometers. Most multilayers are coated on silicon substrates of typical size 60 mm × 60 mm × 100–300 mm. The high aspect ratio between the size of the optics and the thickness of the multilayer (10⁷) can lead to a huge number of elements for the finite‐element model. For instance, meshing by the size of the layers will require more than 10¹⁶ elements, which is an impossible task for present‐day computers. Conversely, meshing by the size of the substrate will produce a too high element shape ratio (element geometry width/height > 10⁶), which causes low solution accuracy; and the number of elements is still very large (10⁶). In this work, by use of ANSYS layer‐functioned elements, a thermal‐structural FEA model has been implemented for multilayer X‐ray optics. The possible number of layers that can be computed by presently available computers is increased considerably.     

Phase‐space analysis and experimental results for secondary focusing at X‐ray beamlines

Micro‐focusing optical devices at synchrotron beamlines usually have a limited acceptance, but more flux can be intercepted if such optics are used to focus secondary sources created by the primary optics. Flux throughput can be maximized by placing the secondary focusing optics close to or exactly at the secondary source position. However, standard methods of beamline optics analysis, such as the lens equation or matching the mirror surface to an ellipse, work poorly when the source‐to‐optics distance is very short. In this paper the general characteristics of the focusing of beams with Gaussian profiles by a `thin lens' are analysed under the paraxial approximation in phase space, concluding that the focusing of a beam with a short source‐to‐optics distance is distinct from imaging the source; slope errors are successfully included in all the formulas so that they can be used to calculate beamline focusing with good accuracy. A method is also introduced to use the thin‐lens result to analyse the micro‐focusing produced by an elliptically bent trapezoid‐shaped Kirkpatrick–Baez mirror. The results of this analysis are in good agreement with ray‐tracing simulations and are confirmed by the experimental results of the secondary focusing at the 18‐ID Bio‐CAT beamline (at the APS). The result of secondary focusing carried out at 18‐ID using a single‐bounce capillary can also be explained using this phase‐space analysis. A discussion of the secondary focusing results is presented at the end of this paper.     

Characterization of an X‐ray mirror mechanical bender for the European XFEL

One of the classical devices used to tune a mirror on an X‐ray optical setup is a mechanical bender. This is often designed in such a way that the mirror is held with clamps on both ends; a motor is then used to put a torque on the clamps, inducing a cylindrical shape of the mirror surface. A mechanical bender with this design was recently characterized, to bend a 950 mm‐long mirror up to a radius of curvature of 10 km. The characterization was performed using a large‐aperture Fizeau interferometer with an angled incidence setup. Some particular and critical effects were investigated, such as calibration, hysteresis, twisting and long‐term stability.     

Feasibility of in‐line instruments for high‐resolution inelastic X‐ray scattering

Inelastic X‐ray scattering instruments in operation at third‐generation synchrotron radiation facilities are based on backreflections from perfect silicon crystals. This concept reaches back to the very beginnings of high‐energy‐resolution X‐ray spectroscopy and has several advantages but also some inherent drawbacks. In this paper an alternate path is investigated using a different concept, the `M⁴ instrument'. It consists of a combination of two in‐line high‐resolution monochromators, focusing mirrors and collimating mirrors. Design choices and performance estimates in comparison with existing conventional inelastic X‐ray scattering instruments are presented.     

X‐ray fluorescence induced by standing waves in the grazing‐incidence and grazing‐exit modes: study of the Mg–Co–Zr system

The characterization of Mg–Co–Zr tri‐layer stacks using X‐ray fluorescence induced by X‐ray standing waves, in both the grazing‐incidence (GI) and the grazing‐exit (GE) modes, is presented. The introduction of a slit in the direction of the detector improves the angular resolution by a factor of two and significantly improves the sensitivity of the technique for the chemical characterization of the buried interfaces. By observing the intensity variations of the Mg Kα and Co Lα characteristic emissions as a function of the incident (GI mode) or detection (GE mode) angle, it is shown that the interfaces of the Si/[Mg/Co/Zr]_×30 multilayer are abrupt, whereas in the Si/[Mg/Zr/Co]_×30 multilayer a strong intermixing occurs at the Co‐on‐Zr interfaces. An explanation of this opposite behavior of the Co‐on‐Zr and Zr‐on‐Co interfaces is given by the calculation of the mixing enthalpies of the Co–Mg, Co–Zr and Mg–Zr systems, which shows that the Co–Zr system presents a negative value and the other two systems present positive values. Together with the difference of the surface free energies of Zr and Co, this leads to the Mg/Zr/Co system being considered as a Mg/Co_xZr_y bi‐layer stack, with x/y estimated around 3.5.     

X‐ray focusing by the system of refractive lens(es) placed inside asymmetric channel‐cut crystals

An X‐ray one‐dimensionally focusing system, a refracting–diffracting lens (RDL), composed of Bragg double‐asymmetric‐reflecting two‐crystal plane parallel plates and a double‐concave cylindrical parabolic lens placed in the gap between the plates is described. It is shown that the focal length of the RDL is equal to the focal distance of the separate lens multiplied by the square of the asymmetry factor. One can obtain RDLs with different focal lengths for certain applications. Using the point‐source function of dynamic diffraction, as well as the Green function in a vacuum with parabolic approximation, an expression for the double‐diffracted beam amplitude for an arbitrary incident wave is presented. Focusing of the plane incident wave and imaging of a point source are studied. The cases of non‐absorptive and absorptive lenses are discussed. The intensity distribution in the focusing plane and on the focusing line, and its dependence on wavelength, deviation from the Bragg angle and magnification is studied. Geometrical optical considerations are also given. RDLs can be applied to focus radiation from both laboratory and synchrotron X‐ray sources, for X‐ray imaging of objects, and for obtaining high‐intensity beams. RDLs can also be applied in X‐ray astronomy.     

Focusing synchrotron radiation using a polycapillary half‐focusing X‐ray lens for imaging

An imaging system based on a polycapillary half‐focusing X‐ray lens (PHFXRL) and synchrotron radiation source has been designed. The focal spot size and the gain in power density of the PHFXRL were 22 µm (FWHM) and 4648, respectively, at 14.0 keV. The spatial resolution of this new imaging system was better than 5 µm when an X‐ray charge coupled device with a pixel size of 10.9 × 10.9 µm was used. A fossil of an ancient biological specimen was imaged using this system.     

An alternative scheme of angular‐dispersion analyzers for high‐resolution medium‐energy inelastic X‐ray scattering

The development of medium‐energy inelastic X‐ray scattering optics with meV and sub‐meV resolution has attracted considerable efforts in recent years. Meanwhile, there are also concerns or debates about the fundamental and feasibility of the involved schemes. Here the central optical component, the back‐reflection angular‐dispersion monochromator or analyzer, is analyzed. The results show that the multiple‐beam diffraction effect together with transmission‐induced absorption can noticeably reduce the diffraction efficiency, although it may not be a fatal threat. In order to improve the efficiency, a simple four‐bounce analyzer is proposed that completely avoids these two adverse effects. The new scheme is illustrated to be a feasible alternative approach for developing meV‐ to sub‐meV‐resolution inelastic X‐ray scattering spectroscopy.     

Analysis of tapered front‐coupling X‐ray waveguides

The coupling and propagation of electromagnetic waves through planar X‐ray waveguides (WG) with vacuum gap and Si claddings are analyzed in detail, starting from the source and ending at the detector. The general case of linearly tapered WGs (i.e. with the entrance aperture different from the exit one) is considered. Different kinds of sources, i.e. synchrotron radiation and laboratory desk‐top sources, have been considered, with the former providing a fully coherent incoming beam and the latter partially coherent beams. It is demonstrated that useful information about the parameters of the WG can be derived, comparing experimental results with computer simulation based on analytical solutions of the Helmholtz equation which take into account the amplitude and phase matching between the standing waves created in front of the WG, and the resonance modes propagating into the WG.