铜蒸气激光器等离子体阻抗动态特性研究

给出了铜蒸气激光器放电电路各参数的表达式及取值。与铜蒸气激光器动力学模型相结合,讨论了铜蒸气激光器动力学过程中由于放电管内等离子体参数的变化引起等离子体阻抗动态演变过程,并与采用固定等离子体参数的等离子体阻抗进行了比较。     

大口径铜蒸气激光器的动力学分析

通过建立调整大口径铜蒸气激光器的动力学模拟过程中的有关动力学参数,得到一适用于不同输出功率的大口径铜蒸气激光器动力学模型.在此基础上对大口径铜蒸气激光器的径向动力学参量进行了计算,包括激励电场和亚稳态铜粒子密度等动力学参量的径向分布.给出了大口径铜蒸气激光器的径向电子温度及发光强度分布.尔后得到在不同充电电压及缓冲气压条件下铜蒸气激光器的输出功率,此程序对Φ=65cm的大口径铜蒸气激光器的计算结果与实验符合得相当好. 关键词：     

铜蒸气激光器计算机辅助设计

在已有的各种输出功率、激励条件参数和实际模拟程序基础上,对铜蒸气激光器计算机辅助设计进行改进,获得了适合于宽广参数条件下的模拟程序及实用曲线组。可在一定的激光输出功率条件下确定器件的激活体积;当口径选定后,可得铜蒸气激光器对应的电功率输入密度、激励电场、最佳重复频率和放电管壁温度值。     

铜蒸气激光器计算机辅助设计

 在已有的各种输出功率、激励条件参数和实际模拟程序基础上,对铜蒸气激光器计算机辅助设计进行改进,获得了适合于宽广参数条件下的模拟程序及实用曲线组。可在一定的激光输出功率条件下确定器件的激活体积;当口径选定后,可得铜蒸气激光器对应的电功率输入密度、激励电场、最佳重复频率和放电管壁温度值。     

射频放电阻抗测量用于等离子体诊断研究

利用自行研制的传感器和测量装置,通过对射频放电电压、电流以及其相位角的精确测定,算出放电管的总阻抗,结合放电管的等效电路模型与Godyak等建立的射频放电模型,对射频激励铜离子激光管在氦气中的放电特性进行了研究,得出射频激励铜离子激光器不同气压及电流密度下的等离子体电阻、容抗、鞘层厚度及电子密度 关键词： 射频放电 阻抗测量 等离子体诊断     

自加热式铜蒸气激光器的热气体透镜研究

本文分析了自加热式铜蒸气激光器放电管内的热气体透镜效应,并指出不同的铜蒸气激光器在稳定工作时可能等效为正透镜,也可能等效为负透镜。在实验部分,本文给出了热气体透镜焦距与输入功率、缓冲气体压强的关系,描绘了热气体透镜从负透镜变化到正透镜的动态过程。     

铷蒸气激光器3D理论模型的建立及阈值特性模拟

基于三能级速率方程理论,结合惠更斯-菲涅尔衍射积分公式,利用分步光束传播方法建立了半导体泵浦碱金属蒸气激光器(DPAL)端面泵浦3D理论计算模型,用于模拟研究铷蒸气激光器的泵浦阈值特性。该模型将光束传播、光与物质相互作用独立考虑,利用迭代算法求解。考虑激光器腔内模式与泵浦光模式匹配对阈值特性的影响,模拟了单端泵浦铷蒸气激光器内部的三维动力学过程。在具体算例中研究了模式匹配最佳时,在阈值工作状态下铷蒸气室中的三维粒子数分布,以及沿不同轴线的增益分布。仿真了在最佳模式匹配位置附近,泵浦光模式变化对阈值特性的影响。根据蒸气池中粒子数分布和光场分布具体分析了模式匹配影响阈值特性的机理。同时还模拟了不同长度蒸气池对阈值特性的影响。结果表明,腔参数与泵浦光模式之间存在一定的关系,对于特定的泵浦光模式,存在恰当的腔参数,使得阈值达到最小。     

铷蒸气激光器3D理论模型的建立及阈值特性模拟

基于三能级速率方程理论,结合惠更斯-菲涅尔衍射积分公式,利用分步光束传播方法建立了半导体泵浦碱金属蒸气激光器(DPAL)端面泵浦3D理论计算模型,用于模拟研究铷蒸气激光器的泵浦阈值特性。该模型将光束传播、光与物质相互作用独立考虑,利用迭代算法求解。考虑激光器腔内模式与泵浦光模式匹配对阈值特性的影响,模拟了单端泵浦铷蒸气激光器内部的三维动力学过程。在具体算例中研究了模式匹配最佳时,在阈值工作状态下铷蒸气室中的三维粒子数分布,以及沿不同轴线的增益分布。仿真了在最佳模式匹配位置附近,泵浦光模式变化对阈值特性的影响。根据蒸气池中粒子数分布和光场分布具体分析了模式匹配影响阈值特性的机理。同时还模拟了不同长度蒸气池对阈值特性的影响。结果表明,腔参数与泵浦光模式之间存在一定的关系,对于特定的泵浦光模式,存在恰当的腔参数,使得阈值达到最小。     

考虑栅片烧蚀金属蒸气的栅片切割空气电弧仿真与实验研究

基于磁流体动力学理论(MHD)建立了考虑栅片烧蚀金属蒸气的三维空气电弧模型,对模型灭弧室内的的电弧跑动及切割过程进行了数值仿真与实验研究.在传统的质量,动量,能量守恒方程中引入了金属蒸气浓度方程耦合求解用于描述灭弧室内金属蒸气的对流与扩散.在计算中考虑了金属蒸气对于电弧等离子体热力学参数和输运参数的影响.通过计算获得了电弧运动及切割过程的电弧电压,温度分布,金属蒸气浓度分布,灭弧室内流场变化等,分析了由于金属蒸气存在引起的电弧等离子体电导率的变化在切割过程中对于电弧行为的影响.为了验证仿真模型的有效性,进 关键词： 金属蒸气 空气电弧 仿真分析 电弧切割     

铜蒸气激光泵浦的高效脉冲若丹明6G染料激光器(英文)

本文给出了铜蒸气激光泵浦的脉冲染料激光器性能的理论预测.根据这个理论,设计了一台用铜蒸气激光泵浦的、具有纵向泵浦结构和喷流的高功率高效率若丹明6G染料激光器.对若丹明6G染料,得到了0.86W的平均输出功率,效率为31%.     

Internal attenuation of laser radiation in the CuCl laser

A double-pulsed neutral copper vapor laser, based on a Cu/CuCl discharge, was placed in tandem with a ZnCl₂ discharge cell in a common optical cavity. The ZnCl₂ in the separately heated discharge tube acted as a source of Cl-based plasma by- products which are also likely constituents of the Cu/CuCl laser plasma. The timing of the two discharges was varied relative to one another and the Cu laser emission at λ = 510 nm was monitored to test the optical absorption losses in the combined cavity in relation to time. The experiments provide some insight into the chemical effects in the laser plasma that may limit the energy output of a Cu/CuCl laser.     

Optimal design for a copper vapor laser with a maximum output by using a genetic algorithm

To obtain the maximum output of a copper vapor laser (CVL), 8 parameters of the CVL system including the length and radius of the laser tube, the peak voltage, the repetition frequency, the wall temperature and the LC parameters of the discharge circuit are optimized by using a genetic algorithm. The optimization has increased the laser power by 89% from primary 91 W (corresponding to the empirical configuration for the CVL system used in an experiment) to 172 W (the efficiency has also been increased from primary 1 to 1.16%).     

The Experimental Study of a 100W Copper Vapor Laser

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Modeling the plasma kinetics mechanisms of CuBr laser with neon–hydrogen additives

A mathematical model describing the discharge kinetics and lasing characteristics of copper bromide vapor laser with neon and hydrogen additives has been developed. The suggested model is based on a “zero-dimensional” model and offers simple mechanisms to explain discharge kinetics mechanisms, different physical processes and hydrogen additive effects on the copper bromide vapor laser.The model estimates the temporal evolution of discharge voltage and current, population densities, laser beam density, electron temperature and radial distribution of pressure and buffer gas temperature. The suggested mechanism assumes that the electron detachment from negative hydrogen ions does not contribute to the copper ionization process.Numerical solutions of a nonlinear rate equation system predict the generation of nanosecond pulses. The calculated maximum values of discharge voltage, current, average output laser power, electron temperature, etc. are in good agreement with other reported calculated and experimental data.     

Prospects for Further Development of Self-Heated Lasers on the Self-Contained Transitions of a Copper Atom

An analysis of the causes restricting the frequency–energy characteristics of a copper vapor laser is carried out. The principal cause of the restriction is shown to be the high deexcitation rate of the higher laser levels into the ionized state. This involves a strong increase in the expenditures of energy for the population inversion with a rise in the electron density before the pulse and a high $Q$ factor of the discharge circuit at the end of the exciting pulse. The high Q factor of the discharge circuit is responsible for the oscillatory process of energy dissipation within the time spacing between pulses. This energy is stored in the reactive component of impedance of the discharge tube during the excitation pulse. The oscillatory dissipation defines a slow relaxation of the lower laser levels within the time spacing between the pulses. Analysis of the conditions of population inversion formation in a copper vapor laser shows that the active medium should be pumped in a two-pulse excitation mode to realize the energy potential of the laser of 1–2 kW/liter. The advantages of such an excitation mode over the traditional single-pulse excitation are confirmed.     

百瓦级铜蒸汽激光器的热设计

通过对百瓦级铜蒸汽激光器电管内气体温度的分析计算，给出百瓦级器件的为防止“黑心”现象输入功率密度的最佳值，分析计算了在此输入功率密度下，为达到最佳工作温度所需的保温层厚度，理论计算和实验结果吻合较好，从而建立了一套确定放电管内气体温度，保温层厚度的方法。     

Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films

Physical vapor processes using glow plasma discharge are widely employed in microelectronic industry. In particular magnetron sputtering is a major technique employed for the coating of thin films. This paper addresses the influence of direct current (DC) plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper (Cu) thin films coated on silicon substrates. The influence of the sputtering parameters including DC plasma power and argon working gas pressure on the electrical and structural properties of the thin Cu films was investigated by means of surface profilometer, four-point probe and atomic force microscopy.