电活性质点Fe^2^+离子在六氰亚铁钒薄膜中的传输

电活性质点Fe^3^+可穿透六氰亚铁钒薄膜在玻璃碳基体电极表面于较负电位处直接氧化, 也可经VHF膜中氧化还原点位的媒介在较正电位处理膜-溶液界面及膜内部发生催化氧化. 两个过程分别在用VHF修饰过的旋转GC电极上的伏安曲线中产生, 可明确分辨的第一波和第二波. 第一波的极限电流受Fe^2^+离子在溶液中和膜中的扩散速率控制.VHF薄膜对Fe^2^+离子的透过能力, kDm/d, 为10^-^3-10^-^2cm.s^-^1数量级, 随膜厚度增大而减小, 不随溶液中Fe^2^+离子浓度改变.     

Co(III)离子在二氧化铅电极上的阳极形成

文献上曾报导过Co(Ⅱ)离子具有加速PbO_2电极上氧阳极析出过程的作用,并表明当Co(Ⅱ)离子存在时,氧的析出过程有可能通过表面吸附的高价钴氧化物氧化水分子而形成.本文通过浓硫酸溶液中Co(Ⅱ)阳极氧化为Co(Ⅲ)以及O_2阳极析出动力学的研究,表明了O_2的析出和Co(Ⅲ)的形成是通过吸附在电极表面的高价钴(Ⅳ)的OH 基配合物分别氧化水分子和Co(Ⅱ)离子形成的,它与Cr(Ⅲ)、Mn(Ⅱ)离子的阳极氧化过程相类似,而不是通过Co(Ⅱ)离子直接放电形成的.本文利用文献所述的研究方法.在固定硫酸浓度(3.4mol·kg~(-1))下,研究CoSO_4浓度(0.05—0.35mol·drn~(-3))对于O_2和Co(Ⅲ)阳极形成过程分别的影响.在固定CoSO_4(0.2mol·     

钛表面二氧化钛膜中氧空位点缺陷传输性能的电化学研究

"钛/TiO2氧化膜/溶液"界面电极体系的电化学性能主要决定于钛表面的TiO2氧化物膜.本文利用多种电化学技术,结合半导体物理的Mott-Schottky分析和Einstein方程,研究了金属钛在1.0mol·L-1HClO4溶液中表面半导体TiO2氧化膜的生长及氧化膜中氧空位点缺陷在外加电场作用下的传输性能,并根据离子性电荷传输与电子性电荷传输对电场变化响应时间之不同特点,确定氧化膜中点缺陷扩散系数.结果表明,电极电位或阳极析氧反应对稳态电流(iss)、氧化膜的阳极化常数(α)、膜中电场强度()、以及膜中氧空位点缺陷的扩散系数(D0)等重要物理化学参数,均有显著影响,并依据氧化膜中的结构变化进行分析.     

三维蜂窝状配位聚合物{[Ni(tn)][Ni(CN)4]·2H2O}n的合成、晶体结构及磁性质

将Ni(tn)(CIO4)2的水溶液和K2[Ni(CN)4]·H2O的水溶液在U形管中通过扩散反应,得到了一种结构新颖的三维蜂窝状配位聚合物{[Ni(tn)][Ni(CN)4]·2H2O}n(tn为1,3-丙二胺).该化合物属单斜晶系,空间群为C2/c,晶胞参数为n=1.2014(2)nm,b=0 8942(2)nm,c=1.2645(3)nm,α=90°,β=108.76(2)°,γ=90°,V=1.2863(5)nm3和Z=4.该化合物由四配位Ni与六配位Ni通过氰根离子桥联而形成三维无限伸展的蜂窝状结构,其中四配位的Ni(2)离子为C配位平面四方构型,六配位的Ni(1)离子为N配位八面体构型.变温磁化率测定表明,在分子内部存在弱的反铁磁相互作用.     

电活性铁氰化镍膜电极对稀土钇的电控离子分离

通过电沉积方法分别在镀铂石英晶片和铂基底上制备了电活性铁氰化镍膜,并考察了膜电极在含钇离子溶液中的电控离子交换性能. 在0.1 mol·L^-1的硝酸钇溶液中,使用循环伏安法及石英晶体微天平技术测试考察了铁氰化镍膜对钇离子的置入释放性能及对应的质量变化,同时比较了铁氰化镍膜电极在Y(NO₃)₃和Sr(NO₃)₂溶液中的电化学性能. 在0.1 mol·L^-1 [Y(NO₃)₃ + Sr(NO₃)₂]混合溶液中,通过循环伏安法分析了薄膜对Y³⁺/Sr²⁺离子的选择性. 用扫描电子显微镜观察了铁氰化镍膜的表面形貌,并通过X射线光电子能谱仪测定了膜在氧化和还原状态下的元素组成. 结果表明,铁氰化镍膜在含Y³⁺溶液中具有良好的离子交换行为,其中氧化过程薄膜质量减少,对应着钇离子的释放;还原过程薄膜质量增加,对应钇离子的置入;在0.0 V或0.9 V调控膜电极的氧化还原状态实现对钇离子的有效分离.     

酸性介质中碘离子在铂电极上的电化学氧化行为

采用循环伏安法研究了酸性介质中碘离子在铂电极上不同电位区间, 不同酸度下的电化学反应行为. 结果表明, 当极化电位较低(小于0.6 V(vs Hg/Hg2SO4))时, 碘离子在铂电极上发生2I--2e→I2电氧化反应, 反应产物通过I2+I-=I-3被进一步溶解, 整个反应属于E-C(electrochemical-chemical)模式. 电氧化过程中可以形成碘膜, 其也可以被碘离子溶解. 当极化电位升高至0.6 V(vs Hg/Hg2SO4)或以上时, 碘离子会直接电氧化为高价态碘化合物, I-+3H2O→IO-3+6H++6e, 而析出的碘膜并不发生再氧化反应; 在电化学还原过程中, 出现了两个还原峰, 分别对应于I2、I-3的还原反应; 在无碘膜时, 碘离子电氧化过程受溶液中碘离子的液相扩散步骤控制; 碘膜形成后, 主要受碘膜中碘离子的固相扩散控制; 酸度对于碘离子的电化学氧化过程有很大的影响, 其线性极化曲线的起峰电位及电流峰值电位均随酸浓度升高而负移.     

声发射和激光拉曼研究镍氧化机制中的稀土元素效应

对纯镍及其表面离子注钇样品在1000℃空气中的恒温氧化和循环氧化行为进行了研究。用扫描电镜(SEM)和透射电镜(TEM)对氧化膜的表面形貌及结构进行了观测。研究表明离子注钇极大地提高了金属镍的抗氧化性能。此外,用声发射(AE)技术研究了氧化膜／基体界面上缺陷的分布情况,并用激光拉曼(Raman)谱对注钇引起的膜内应力变化进行了测量。结果表明,离子注钇降低了NiO氧化膜的生长速率,减小了表面NiO的晶粒尺寸,降低了膜内压应力水平。同时,离子注钇还减小了氧化膜／基体界面缺陷的平均尺寸和数目,因此,极大地提高了镍表面NiO氧化膜的粘附性和保护性。     

钴-杂环偶氮试剂配合物中钴存在型体的研究

2-(5-溴-2-噻唑偶氮)-5-二乙氨基苯酚(HL)或2-(2-苯并噻唑偶氮)-5-磺丙氨基苯酚(H_2L’)与钴(Ⅱ)反应和氧化形成的Co(Ⅱ)L_2和CO(Ⅲ)L_2·Cl或Co(Ⅱ)L_2’·(TBA)2和Co(Ⅱ)L_2’·TBA在C_(18)硅氧烷键合相和乙醇-氯仿或乙腈-水流动相之间分配。不同实验条件下取得的HPLC图上的不同色谱峰表明,最初形成的是不稳定的钻(Ⅱ)配合物,但很快被溶液中的氧氧化为稳定的钴(Ⅲ)配合物,KIO_4等强氧化剂和加热均可加速氧化。与迅速制备钴配合物所得的可见吸收光谱相比,放置一段时间或加热或加入强氧化剂所得的吸收光谱明显红移,由此确证配合物中不稳定的钴(Ⅱ)型体和稳定的钴(Ⅲ)型体的存在。电泳实验中配合物向正或负电极的移动也确证了两种钴型体的存在。     

阳极氧化膜WO3（Ⅱ）：电显色的介质效应

用循环计时电量法、循环伏安法、电化学现场(in-situ)紫外可见反射光谱技术和光电流谱技术研究了溶剂和阳离子(H~+,Li~+)对阳极氧化膜WO_3电显色稳定性和过程的影响。从循环计时电量图可以测定表征膜稳定性的氢或锂的累积量和暂态周期数。实验发现W/WO_3/LiCLO_4乙腈溶液体系具有高的电显色稳定性。引起WO_3膜可逆电显色的H~+和Li~+离子的嵌-脱过程的界面电化学机理不同。着色态WO_3膜的色心是自由电子,其密度超过10~(21)/cm~3,生色机理是等离子体振荡。     

钴氢氧化物修饰玻碳电极的镀膜/循环伏安法制备及其电化学行为

采用一种新方法镀膜 /循环伏安法成功制备了钴氢氧化物修饰玻碳电极 .考察了影响钴氢氧化物膜电催化活性的因素 ,确定最佳富集时间为 2min ,最佳活性单元浓度为 9 90× 10 -4mol·L-1.讨论了成膜过程及机理 .膜氧化峰电流 (i0pa)与扫描速率 (v <0 60V·s-1)成正比 ,具有表面吸附反应特征 ,表面覆盖量约相当于 0 5个单层的氧化还原活性物质 .制得的钴氢氧化物膜修饰电极具有相当的稳定性 ,并对H2 O2 氧化表现出较高的电催化活性 .线性回归方程为 :Δipa( μA) =-2 10 3 6+2 3 72 0× 10 4CH2 O2 (mol·L-1) (R =0 9990 ,n =18) ,线性范围为 :1 43× 10 -5～ 1 80× 10 -2 mol·L-1,检出限为 :9 5 9× 10 -6mol·L-1( 3S/k) .     

纳米TiO_2膜修饰电极异相电催化还原马来酸

通过电化学合成前驱体和溶胶-凝胶法在Ti表面修饰一层纳米TiO_2膜，SEM， XRD测试表明晶型为锐钛矿型，晶粒平均尺寸为25 nm。采用循环伏安法、循环方波 伏安法和电解合成法研究了纳米TiO_2膜电极在硫酸介质中的氧化还原行为以及对 马来酸（maleic acid）还原的电催化活性。结果表明，纳米TiO_2膜电极在阴极扫 描时有两对可逆氧化还原峰，可逆半波电位E_(1/2)~r分别为-0.53 V和-0.92 V（ sv. SCE，扫描速度0.05 V·s~(-1)），对应于TiO_2/Ti_2O_3和TiO_2/Ti(OH)_3两 个氧化还原电对的可逆电极过程。其中TiO_2/Ti_2O_3电对对马来酸具有异相电催 化还原活性，纳米TiO_2膜中的Ti~(IV)/Ti~(III)氧化还原电对作为媒质间接电还 原马来酸为丁二酸（butane diacid），反应机理为电化学偶联随后化学催化反应 （EC'）机理。     

阳极氧化膜WO3（Ⅰ）：电显色和自褪色

用循环伏安法、交流阻抗技术和光电流谱技术研究了阳极氧化膜WO_3电显色和自褪色过程的机理,电显色时,氢原子先在WO_3表面吸附,其后从WO_3表面向晶格内部传输,电褪色时,H_xWO_3晶格中填隙H原子先传输到W表面脱附生成填隙H~+,然后再在电场驱动下在膜中迁移,自褪色过程可能是由膜中所含的少量水和部分填隙H原子的羟基化作用引起的。     

WO_3 Anodic Oxide Film——I.Electrochromism and Auto-bleaching mechanism

Electrochromic and auto-bleaching processes at the WO2 anodic film in 0. 5 mol/L H2SO4 solution were investigated by cyclic voltammetry, a. c. impedance technique and photocurrent spectrometry. The colouration mechanism consists of hydrogen adsorption on the WO2 surface and the transport of H atoms in the WO, lattice. The bleaching process involves at least two steps: transport of interstitial H atoms and hydrogen desorption on the W surface, resulting in interstitial H+ ions; then extration of the H+ ions driven by the external electric field. The auto-bleaching arises from the hydroxylation due to both partial interstitial H atoms and a little of water contained in the film.     

钛基氧化物电极的性能及电化学行为

本文研究了某些氧化物中间层对Ti/PbO_2、Ti/MnO_2、Ti/Co_3O_4和Ti/CuCo_2O_4电极性能及电化学行为的影响。结果表明,Ti/MnO_2或Ti/PbO_2电极在加入Co_3O_4、PdO_x、SnO_2或Sb_2O_3中间层后,界面电阻大大降低。在低于出现电阻极化电流密度时,极化曲线符合Tafel规律(无论对于O_2或Cl_2,低极化区的Tafel斜率为厶b_1=2.303RT/(1+β)F;高极化区为b_2=2,303RT/βF,其中β=0.5)这时主要为电化学极化。对有中间层Sb_2O_3+PdO_x的Ti/PbO_2电极和具有中间层SnO_2+PdO_x的Ti/Co_3O_4电极,其阳极析Cl_2的反应活性与工业用的Ti/RuO_2+TiO_2电极相近,而氧的过电位则高于Ti/RuO_2+TiO_2电极。     

Ag(I)与Co(II)离子对阳极析氧过程的电催化作用

Influence of Ag(Ⅰ), Co(Ⅱ) and Ni(Ⅱ) ions on oxygen anodic evolution at Pt and Ti/Pt/PbO2 electrodes was investigated in surphuric acid solutions. The oxygen evolution reaction at Ti/Pt/PbO2 electrode in surphuric acid solutions is characterized by two linearφ~ lgi relationships. At low c.d. it is close to 2.303RT/(1+β)F, whereas at high c.d. it is close to 2.303RT/βF. In the presence of Ag(Ⅰ) or Ni(Ⅱ) ions in the electrolytic solution the Tafel slope of oxygen evolution tends to be low, 2.303RT/(1+β)F (withβ=0.5). However, the oxygen evolution reaction at Pt electrodes in H2SO4 or CoSO4﹢H2SO4 solutions is characterized by one linearφ~ lgi relationship. The Tafel slope is close to 2.303RT/βF. In the presence of Ag(Ⅰ) or Ni(Ⅱ) ions in the electrolytic solution the Tafel slope of oxygen evolution tends to be low, 2.303RT/(1+β)F. The oxygen anodic evolution reactions are catalyzed by Ag(Ⅰ), Co(Ⅱ) and Ni(Ⅱ) ions in the electrolytic solution. When Ag(Ⅰ) or Ni(Ⅱ) was mixed with Co(Ⅱ), a promising catalyst for oxygen anodic evolution with higher catalyst activity than either of them alone was found. A comparison of the PbO2 electrode and the Pt electrode has also been given.     

海绵状纳米结构TiO2膜的制备及其光催化活性

采用电化学阳极氧化法在钛表面构筑了海绵状纳米结构TiO2膜. 应用扫描电子显微镜(SEM)和X射线衍射(XRD)对膜层的形貌和晶型进行了分析和表征, 考察了阳极氧化时间对膜层厚度的影响, 并通过海绵状纳米结构TiO2膜对甲基橙的光催化降解研究了膜层厚度与光催化活性的关系. 结果表明, 海绵状纳米结构TiO2膜对甲基橙具有光催化降解作用, 而且随着膜层厚度的增加, 光催化降解速率显著增大, 厚度为2.2 μm的海绵状纳米结构TiO2膜对甲基橙的光催化降解速率是厚度为480 nm的6.4倍.     

Internalization of Foreign Ions into Meta-stable Lattices:a Case Study of Transition-metal-doped Brookite

The connections between the building units of meta-stable lattice were generally considered to be easily disturbed during the doping process, causing serious hindrances blocking the development of functional doped materials. In this work, the synthesis of doped brookite, a typical meta-stable phase of TiO_2, has been explored novelly by in-situ adding of cations of VIIIB and IB,IIB elements in the 3rd period(Fe, Co, Ni, Cu, Zn) during the urea-lactate aided low-basicity hydrothermal process. The results showed that only Cu-doped brookite could be successfully synthesized with trace amount of copper intensively internalized into the brookite lattice, while the other dopants lead to the formation of anatase TiO_2. Extensive characterizations indicated a two-step doping process, where copper ions were firstly dispersed in an amorphous layer on the lattice surface and then they were internalized into brookite lattice. Cu-doped brookite exhibited significantly enhanced photocatalytic activity in the phenol degradation under visible light compared to bare brookite. The enhancement of catalytic performance was assigned to the impurity band gap and the reduction of charge carriers' recombination introduced by the internalization of Cu ions. The investigation reported herein contributes to the understanding of complex ion-doping effects on the structures of meta-stable materials, and provides hints for obtaining other functional doped materials.     

Anodic film formation on binary Al?Mg and Al?Ti alloys in nitric acid

Nitric acid is commonly used for surface treatments of aluminium alloys. It is used to clean the surfaces after alkaline etching; it has application in chemical polishing and is also used for electrograining. The majority of these treatments undergo the application of anodic polarisation that results in formation of anodic oxide film. However, little is known about the behaviour of aluminium containing magnesium or titanium in solid solution under such conditions. To reveal the effects of magnesium and titanium alloying additions on anodic film formation in nitric acid, Al‐1800 ppm Mg and Al‐800 ppm Ti alloys were investigated. It was found that porous alumina film developed on the surfaces with reduced efficiency of 40%, due to the reactive nature of nitric acid to alumina. The presence of magnesium and titanium in aluminium had little influence on the efficiency of film growth, as confirmed by the relatively similar thicknesses of oxide formed on binary alloys and aluminium. However, incorporation of magnesium ions into the alumina film led to development of a high‐population density of localised voids near the alloy/film interface. An increased titanium content was found in the film regions close to the alloy/film interface, indicating its oxidation. Copyright © 2009 John Wiley & Sons, Ltd.     

氮掺杂二氧化钛-氧化镍双层薄膜的光电致色特性

以金属钛为靶材、O2/N2/Ar混合气氛为溅射气体,在导电玻璃(ITO)表面磁控溅射一层薄膜,再经300-500℃退火处理制备了氮掺杂TiO2薄膜.采用X射线衍射(XRD)、X光电子能谱(XPS)、扫描电子显微镜(SEM)和紫外-可见吸收光谱等对薄膜的微观结构、光学特性和光电化学性能等进行了研究.进而采用化学沉积的方法在TiO2-xNx薄膜表面沉积上一层多孔NiO薄膜,研究表明,制备的ITO/TiO2-xNx/NiO双层薄膜具有明显的光电致色特性,400℃退火处理的氮掺杂TiO2薄膜具有最高的光电流响应,经氙灯照射1h后,薄膜从无色变成棕色,500nm波长处光透过率从79.0%下降至12.6%.     

The influence of fluoride on the physicochemical properties of anodic oxide films formed on titanium surfaces

The influence of fluoride (and its concentration) on the electrochemical and semiconducting properties of anodic oxide films formed on titanium surfaces was investigated by performing electrochemical measurements (potentiodynamic/pontiostatic polarization, open circuit potential (OCP), and capacitance measurements) for a titanium/oxide film/solution interface system in fluoride-containing 1.0 M HClO(4) solution. On the basis of the Mott-Schottky analysis, and with taking into account both the surface reactions (or, say, the specifically chemical adsorption) of fluoride ions at the oxide film surface and the migration/intercalation of fluoride ions into the oxide film, the changes in the electrochemical behavior of titanium measured in this work (e.g., the blocked anodic oxygen evolution, the increased anodic steady-state current density, the positively shifted flat band potential, and the positively shifted film breakdown potential) were interpreted by the changes in the surface and the bulk physicochemical properties (e.g., the surface charges, surface state density, doping concentration, and the interfacial potential drops) of the anodic films grown on titanium. The fluoride concentrations tested in this work can be divided into three groups according to their effect on the electrochemical behavior of the oxide films: < or =0.001 M, 0.001-0.01 M, and >0.01 M. By tracing the changes of the OCP of the passivated titanium in fluoride-containing solutions, the deleterious/depassive effect of fluoride ions on the titanium oxide films was examined and evaluated with the parameter of the film breakdown time. It was also shown that the films anodically formed on titanium at higher potentials (>2.5 V) exhibited significantly higher stability against the fluoride attack than that either formed at lower potentials (<2.5 V) or formed natively in the air.