Properties of boron and phosphorous incorporated tetrahedral amorphous carbon films grown using filtered cathodic vacuum arc process

This paper reports the electrical, mechanical, structural and field emission properties of as grown and also boron and phosphorous incorporated tetrahedral amorphous carbon (ta-C) films, deposited using a filtered cathodic vacuum arc process. The effect of varying boron and phosphorous content (up to 2.0 at.% in to ta-C) on the conductivity (σ_D), activation energy (ΔE₁), hardness, microstructure, emission threshold (E_turn-ON) and emission current density (J) at 12.5 V/μm of ta-C: B and ta-C: P films deposited at a high negative substrate bias of −300 V are reported. It is observed that both boron and phosphorous incorporation leads to a nearly an order increase in σ_D and corresponding decrease in ΔE₁ and a slight increase in hardness as compared to as grown ta-C films. In the case of field assisted electron emission, it is observed that E_turn-ON increases and J decreases. The changes are attributed to the changes in the sp³/sp² ratio of the films due to boron and phosphorous incorporation. The effect of boron on ta-C is to give a p-type effect whereas the effect of phosphorous gives n-type doping effect.     

Influence of the boundary conditions on the fermi energy and density of states in a free-electron solid of sub-micron dimensions

Asymptotic expressions for the distribution of the eigenvalues of the Helmholtz-Schrödinger equation are used to anlyze the dependence of the Fermi energy, E_F, and the density of states, ρ(E), on sample size, shape, and electron density, in a free-electron model with Dirichlet boundary conditions. It is found that for very small samples E_F is increased relative to its asymptotic (i.e., bulk) value and ρ(E) is decreased relative to its bulk value. These effects are more pronounced for samples with low electron density and with a large surface-to-volume ratio. In general E_F and ρ(E_F) deviate significantly from their bulk values only for systems with fewer than 50,000 electrons and/or with linear dimensions of 100 Å or less. The use of smoothing functions to represent the density of states obtained from the exact eigenvalue distribution is also discussed. It is shown that an oscillating density of states leads to small cusps in the plot of E_F as a function of sample size. This is in qualitative agreement with the results of experiments on size-dependent oscillations in field emission from thin metallic films. Comparison is also made between photoemission experiments from thin films and other results obtained in this study.     

Effects of gas composition on the growth of multi-walled carbon nanotube

This paper studies the effects of different gas compositions on the growth of multi-walled carbon nanotube (MWCNT) films by using an electron cyclotron resonance chemical vapor deposition (ECR-CVD) method. The Raman spectrum was employed to explore the composition of the MWCNT films grown under different mixtures of C₃H₈ and H₂. The results showed that the optimum relative intensity ratio of the D band to G band (i.e., I_D/I_G) is 2 for the cases considered in this study. In addition, the morphology and microstructure of the MWCNTs were examined by field emission scanning electron microscopy (FE-SEM) and field emission gun transmission electron microscopy (FEG-TEM). Furthermore, atomic force microscopy (AFM) and scanning thermal microscopy (SThM) were used to study the surface topography and thermal properties of the MWCNTs.     

Influence of plasma pressure on the growth characteristics and ferroelectric properties of sputter-deposited PZT thin films

PZT thin films of thickness (320-1040) nm were synthesized on Si/SiO₂/Ti/Pt multilayered substrates by radio frequency magnetron sputtering. The influence of plasma pressure in the range of (0.24-4.9) Pa, during deposition, on the structural, electrical and ferroelectric properties of the PZT films was systematically studied. X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and cross-sectional transmission electron microscopy (XTEM) were employed for structural study. Nano-probe Energy Dispersive (EDX) line scanning was employed to investigate the elemental distribution across the film-bottom electrode interface. I-V characteristics and polarization-electric field (P-E) hysteresis loop of the films were measured. The study reveals that the plasma pressure has a strong influence on the evolution and texture of the ferroelectric perovskite phase and microstructure of the films. At an optimum plasma pressure of 4.1 Pa, PZT films are grown with 93% perovskite phase with (1 1 1) preferred orientation and uniform granular microstructure. These films show a saturation polarization of 67 μC/cm², remnant polarization of 30 μC/cm² and coercive field of 28 kV/cm which, according to the literature, seem to be suitable for device applications.Transmission electron microscopy (TEM) study shows that at a plasma pressure of 4.1 Pa, the PZT/bottom Pt interface is sharp and no amorphous interlayer is formed at the interface. At a higher plasma pressure of 4.9 Pa, poor I-V and P-E hysteresis loop are observed which are interpreted as due to an amorphous interlayer at the film-bottom electrode interface which is possibly enriched in Pb, Zr, O and Pt.     

Synthesis and characterization of LaB6 thin films on tungsten, rhenium, silicon and other substrates and their investigations as?field emitters

The paper deals with the comparative study of nanocrystalline Lanthanum hexaboride (LaB₆) thin films grown on various substrates by Pulsed laser deposition and Arc plasma method. Field emission studies were carried out on LaB₆ films deposited on various substrates show metallic behavior of the emitters. The high value of field enhancement factors, indicating that the electron emission from LaB₆ nanoscale protrusions deposited on emitter surface. The post field emission surface morphology of the emitters showed no significant erosion of the films during continuous operation. The observed behavior indicates that it is linked with the growth of LaB₆ films on substrate crystal structure. The LaB₆ nanocrystallites/nanowires films were synthesized using arc plasma method shows good emission current stability. The LaB₆ micro/nanocrystallites were also obtained by picosecond laser irradiation which gives high enhancement β factor, and good emission current stability along with high current density. The results reveal that nanocrystalline LaB₆ films, exhibit high resistance to ion bombardment and excellent structural stability and are more promising emitters for practical applications in field emission based new generation devices.     

Electron emission characteristics of Al-AlN granular films

An electron conduction emitter of Al-AlN granular films was proposed for surface conduction electron emission device in this paper. The Al-AlN granular films with thickness of 30 nm were prepared between two co-planar electrodes with gap of 10 μm by magnetron sputtering. After electroforming the Al-AlN granular films, the films’ structure could be recovered by applying the periodic device voltage (V_f). Stable and uniform electron emission was observed with turn-on voltage of 5.3 V and threshold voltage of 9 V. The emitter emission current (I_e) of 4.84 μA for 36 cells was obtained with the anode voltage of 2.5 kV and the device voltage of 12 V. In addition, Fowler-Nordheim plots for I_e-V_f properties showed that the electron emission mechanism should be field emission.     

Enhanced field emission characteristics of boron doped diamond films grown by microwave plasma assisted chemical vapor deposition

Boron doped diamond films were synthesized on silicon substrates by microwave plasma chemical vapor deposition (MPCVD) technique. The effect of B₂O₃ concentration varied from 1000 to 5000 ppm on the field emission characteristics was examined. The surface morphology and quality of films were characterized by scanning electron microscope (SEM) and Raman spectroscopy. The surface morphology obtained by SEM showed variation from facetted microcrystal covered with nanometric grains to cauliflower of nanocrystalline diamond (NCD) particles with increasing B₂O₃ concentration. The Raman spectra confirm the formation of NCD films. The field emission properties of NCD films were observed to improve upon increasing boron concentration. The values of the onset field and threshold field are observed to be as low as 0.36 and 0.08 V/μm, respectively. The field emission current stability investigated at the preset value of ∼1 μA is observed to be good, in each case. The enhanced field emission properties are attributed to the better electrical conductivity coupled with the nanometric features of the diamond films.     

Pre-stressing effect on DC breakdown in low-density polyethylene

Polyethylene is widely used in electrical wires and power cables. The pre-stressing effect, which restricts the applications of polyethylene, has not yet been investigated in depth. We studied the breakdown of low-density polyethylene (LDPE) films pre-stressed by direct current (DC) electric field. The results showed some conformity, as reported in many other papers, that the DC breakdown strength E_B+ with the same polarity to that of the pre-stressing field was higher than the DC breakdown strength E_B of thin LDPE films without pre-stressing, while the DC breakdown strength E_B? with the opposite polarity was lower than E_B. Such phenomena could be explained by the hetero effects of accumulating space charges, which enhanced the electrical field when the polarity was reversed. However, as a further increase in pre-stressing electrical field, both E_B+ and E_B? were found higher than E_B. We investigated the space charge behavior in LDPE films and found that when applied with a higher electrical field, space charge packet initialized and traveled through the specimen. The results suggest that the space charge packet behavior may contribute to the pre-stressing effects on electrical breakdown in LDPE films.     

Field emission from a-GaN films deposited on Si (100)

Amorphous gallium nitride (a-GaN) films have been deposited on Si (100) substrates using ion-assisted deposition. The deposited films were characterised by X-ray diffraction (XRD) and atomic force microscopy (AFM). XRD confirms the amorphous nature of the films and AFM showed nanostructures in the films. The field electron emission from the film was obtained in a probe-hole field emission microscope, and the current-voltage (I-V) characteristics were studied. The corresponding Fowler-Nordheim (F-N) plots showed a linear behaviour. A current density of 0.1 A/cm² has been obtained for 1.2 V/μm electric field. The field emission current-time (I-t), curves were recorded at a current level of 500 nA for 3 h. The field emission behaviour is compared with that of crystalline GaN as reported in literature.     

Effects of microwave plasma treatment on the field emission properties of printed carbon nanotubes/Ag nano-particles films

The effects of Ar microwave plasma treatment on field emission properties of the printed carbon nanotubes (CNTs) cathode films using Ag nano-particles as binder were investigated. The field emission J-E characteristics were measured at varied plasma treatment time. Significant improvement in emission current density, emission stability and uniformity were achieved for the Ar treated CNTs films, even though the plasma treatment increased the turn on electric field slightly. High-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy revealed the microstructural changes of CNTs after the plasma treatment. The improved field emission properties of CNTs film can be attributed to the generation of a high density of structural defects after treatment, which increased greatly the possible emission active sites. Besides, the formation of the sharpened and open-ended CNTs tips is all helpful for improving the field emission properties of the treated CNTs.     

Effect of annealing atmosphere on microstructural and photoluminescence characteristics of multiferroic BiFeO3 thin films prepared by pulsed laser deposition technique

The effect of annealing atmosphere on microstructural and photoluminescence characteristics of multiferroic BiFeO₃ (BFO) thin films deposited by pulsed laser deposition (PLD) technique is reported. The films annealed in oxygen environment showed improved microstructure and photoluminescence (PL) characteristics. The PL spectra of oxygen-annealed BFO thin films at room temperature show a strong emission in the blue region. A plot of (αE)² vs. photon energy (E) (α-absorption coefficient) and the linear extrapolation to (αE)²=0 indicates a direct gap at 2.69±0.02 eV, which is in agreement with the previous reports. The results obtained in this study are accordingly expected to facilitate the understanding and optimization of BFO thin films for photovoltaic applications.     

The enhanced field-emission properties of screen-printed single-wall carbon-nanotube film by electrostatic field

In this work, we improved the field-emission properties of a screen-printed single-wall carbon-nanotube (SWCNT) film by applying a strong electrostatic field during the drying process after the printing. By applying the strong field, more tips of SWCNTs could emerge from the screen-printed film and turn somewhat toward the erecting direction because of the repulsive force among the SWCNTs. The field-emission properties of the film were thus improved obviously. The improved field emitters sample has low electron emission turn-on field (E_to = 1.22 V/μm), low electron emission threshold field (E_th = 2.32 V/μm) and high brightness with good uniformity and stability. The lowest operating field of the improved sample is below 1.0 V/μm and its optimum current density exceeds 3.5 mA/cm².     

Field electron emission from HfNxOy thin films deposited by direct current sputtering

HfN_xO_y thin films were deposited on Si substrates by direct current sputtering at room temperature. The samples were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray diffraction (XRD). SEM indicates that the film is composed of nanoparticles. AFM indicates that there are no sharp protrusions on the surface of the film. XRD pattern shows that the films are amorphous. The field electron emission properties of the film were also characterized. The turn-on electric field is about 14 V/μm at the current density of 10 μA/cm², and at the electric field of 24 V/μm, the current density is up to 1 mA/cm². The field electron emission mechanism of the HfN_xO_y thin film is also discussed.     

Area effect of patterned carbon nanotube bundle on field electron emission characteristics

Patterned carbon nanotube (CNT) bundles were fabricated using thermal chemical vapor deposition (CVD) method. Patterns of different diameters and distances were defined on Si(100) substrates using photolithography. CNT bundle height was controlled using different acetylene (C₂H₂) flow times. The inter-bundle distance of CNTs to CNT bundle height ratio was maintained at approximately 2, a number predicted to have a maximum field emission for CNT, and left the patterned CNT bundle area as a variable parameter. The relationship between CNT bundle area and the field electron emission characteristics was studied. The lowest threshold electric field (E_th) of 0.7 V/μm was obtained when the total area of patterned CNT bundles was approximately 46%. The result shows that there is an optimal CNT bundle area for electron field emission.     

Electrical and electronic properties of nitrogen doped amorphous carbon (a-CNx) thin films

Nitrogen-doped amorphous carbon thin films (a-CN_x) were prepared on silicon substrate by pulsed laser deposition process using methane (CH₄) and nitrogen (N₂) as source gas. The electrical properties of a-CN_x films changes with nitrogen concentration in the film structure. The intensity ratio of the D and G peak (I_D/I_G) increases with higher nitrogen concentration, which means that sp²-clusters were formed in these films and is responsible for the enhancement of conductivity of the a-CN_x films. We observed that the amorphous carbon (a-C) films becoming more graphitic in nature yielding higher conductivity/lower resistivity with increase of nitrogen concentration. Electron field emission result shows that the emission current density enhances with nitrogen doping that indicates the useful in electron field emission devices application.     

Preparation and optical properties of ZnGa2O4:Cr thin films derived by sol-gel process

ZnGa₂O₄:Cr³⁺ thin films with bright red emission were synthesized using a sol-gel process, characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), Auger electron spectroscopy (AES) and UV-vis and fluorescence spectrophotometry measurements. Effects of calcining temperature, film thickness, calcining duration and substrates on the crystal structure and photoluminescent property have been investigated. It is found that the crystallinity, Ga/Zn ratio and band gap energy (E_g) are significant factors influencing optical characteristics, while the nature of substrates affect the surface morphologies of ZnGa₂O₄:Cr³⁺ thin films.     

Effect of substrate temperature on the structural and optical properties of ZnO and Al-doped ZnO thin films prepared by dc magnetron sputtering

ZnO and Al-doped ZnO(ZAO) thin films have been prepared on glass substrates by direct current (dc) magnetron sputtering from 99.99% pure Zn metallic and ZnO:3 wt%Al₂O₃ ceramic targets, the effects of substrate temperature on the crystallization behavior and optical properties of the films have been studied. It shows that the surface morphologies of ZAO films exhibit difference from that of ZnO films, while their preferential crystalline growth orientation revealed by X-ray diffraction remains always the (0 0 2). The optical transmittance and photoluminescence (PL) spectra of both ZnO and ZAO films are obviously influenced by the substrate temperature. All films exhibit a transmittance higher than 86% in the visible region, while the optical transmittance of ZAO films is slightly smaller than that of ZnO films. More significantly, Al-doping leads to a larger optical band gap (E_g) of the films. It is found from the PL measurement that near-band-edge (NBE) emission and deep-level (DL) emission are observed in pure ZnO thin films. However, when Al was doped into thin films, the DL emission of the thin films is depressed. As the substrate temperature increases, the peak of NBE emission has a blueshift to region of higher photon energy, which shows a trend similar to the E_g in optical transmittance measurement.     

Preparation and characterization of Cd2Nb2O7 thin films on Si substrates

Thin Cd₂Nb₂O₇ films were grown on single-crystal p-type SiO₂/Si substrates by the metallo-organic decomposition (MOD) technique. The films were investigated by X-ray diffraction, X-ray energy-dispersive spectroscopy, and field emission scanning electron microscopy, and showed a single phase (cubic pyrochlore), a crack-free spherical grain structure, and nanoparticles with a mean size of about 68 nm. A Cauchy model was also used in order to obtain the thickness and index of refraction of the stack layers (transparent layer/SiO₂/Si) by spectroscopic ellipsometry (SE). The dielectric constant (K) of the films was calculated to be about 25 from the capacitance-voltage (C-V) measurements.     

A simple method for surface and ultrathin film characterization

The method depends on monitoring variations of secondary electron emission as a function of changes in surface structure and composition. By measuring the crystal current i_cc and its variation with incident beam energy, E, surface changes can be measured rapidly and precisely. The principle of the method is already used qualitatively in secondary electron emission microscopy. If E is adjusted to give zero crystal current (E_zcc), and changes are followed from either variations in i_cc or E_zcc, then the measurements obtained during adorption are comparable to (but can be more precise than) those obtained from Auger spectroscopy. Results are presented for copper surfaces during cleaning cycles and during the adsorption of lead overlayers. Various applications can be envisaged, especially for rapid changes during segregation, diffusion or desorption.     

The electrical properties and phase transformation of PLZST 2/85/13/2 antiferroelectric thin films on different bottom electrode

Pb_0.97La_0.02(Zr_0.85Sn_0.13Ti_0.02)O₃ (PLZST 2/85/13/2) antiferroelectric thin films were deposited on Pt(111)/Ti/SiO₂/Si and LaNiO₃(LNO)/SiO₂/Si substrates through a modified sol-gel process. The phase structure and microstructure of PLZST 2/85/13/2 antiferroelectric thin films were analysed by x-ray diffraction (XRD), scanning electron microcopy (SEM) and field-emission SEM (FE-SEM). The antiferroelectric nature of the PLZST 2/85/13/2 thin films on two electrodes was demonstrated by the C-V (capacitance-voltage) and P-E (polarization-electric field) measurement. The maximum polarizations for PLZST 2/85/13/2 films on Pt and LNO electrodes were 42 and 18 μC/cm², respectively. The temperature dependence of the dielectric property of the PLZST 2/85/13/2 films was measured under different dc electric fields. Also, the phase transformation of the PLZST 2/85/13/2 films was studied in detail as a function of temperature and dc electric field.