Microstructural investigations of Y2O3 thin films deposited by laser ablation on MgO

The epitaxial relationships and the microstructure of thin Y₂O₃ film, in situ grown by laser ablation at 700 °C under 0.5 mbar oxygen pressure on MgO substrate, are studied by X-ray and HRTEM investigations. X-ray φ-scanexperiments show that Y₂O₃ exhibits two different crystallographic growing directions <111> and <100> on (100) single-crystalline MgO substrate. The <111> growing direction appears with four different epitaxial relationships where the <110> Y₂O₃ in-plane direction is parallel to the <110> in-plane direction of MgO. The <100> growing direction appears with one epitaxial relationship, cube Y₂O₃ on cube MgO. The HRTEM experiments show the columnar aspect of the Y₂O₃ thin film. Both (111) and (100) Y₂O₃-oriented grains are observed in good agreement with the X-ray experiments. Received: 16 May 2000 / Accepted: 22 May 2000 / Published online: 13 September 2000     

Influence of the laser wavelength on the epitaxial growth and electrical properties of La0.8Sr0.2MnO3 films grown by excimer laser-assisted MOD

Epitaxial La_1−xSr_xMnO₃ (LSMO) films were prepared by excimer laser-assisted metal organic deposition (ELAMOD) at a low temperature using ArF, KrF, and XeCl excimer lasers. Cross-section transmission electron microscopy (XTEM) observations confirmed the epitaxial growth and homogeneity of the LSMO film on a SrTiO₃ (STO) substrate, which was prepared using ArF, KrF, and XeCl excimer lasers. It was found that uniform epitaxial films could be grown at 500 °C by laser irradiation. When an XeCl laser was used, an epitaxial film was formed on the STO substrate at a fluence range from 80 to 140 mJ/cm² of the laser fluence for the epitaxial growth of LSMO film on STO substrate was changed. When the LaAlO₃ (LAO) substrate was used, an epitaxial film was only obtained by ArF laser irradiation, and no epitaxial film was obtained using the KrF and XeCl lasers. When the back of the amorphous LSMO film on an LAO substrate was irradiated using a KrF laser, no epitaxial film formed. Based on the effect of the wavelength and substrate material on the epitaxial growth, formation of the epitaxial film would be found to be photo thermal reaction and photochemical reaction. The maximum temperature coefficient of resistance (TCR) of the epitaxial La_0.8Sr_0.2MnO₃ film on an STO substrate grown using an XeCl laser is 4.0%/K at 275 K. XeCl lasers that deliver stabilized pulse energies can be used to prepare LSMO films with good a TCR.     

Synthesis of LaAlO3 by metal organic decomposition on SrTiO3 substrates

LaAlO₃ (LAO) films on SrTiO₃ (STO) substrates have been produced by metal organic decomposition using La(C₅H₇O₂)₃ and Al(C₅H₇O₂)₃ as precursors dissolved in propionic acid. The process consists of growing thin layers through dip coating and subsequent annealing. After testing different cationic ratios of La and Al, it was determined that an optimal ratio leads to a single LAO phase film that grows epitaxially (cube on cube) on top of the STO. This was shown by X-ray diffraction (XRD) and transmission electron microscopy (TEM) analyses. These analyses, as well as additional X-ray reflectivity analysis, also revealed that the LAO's thickness obtained in one dip ranges from 8 nm to 16 nm. Taking advantage of the epitaxial conditions, several layers can be stacked by successive dip coatings and annealing to form an epitaxial structure.     

The growth and domain structure of YBa2Cu3Ox films on neodymium gallate substrates with a deviation of the normal to the surface from the [110] direction in NdGaO3

The growth, crystal structure, and electrophysical properties of YBa₂Cu₃O_x (YBCO) epitaxial films grown with and without a CeO₂ epitaxial sublayer on NdGaO₃ (NGO) substrates with the normal to the surface deviating from the [110] axis by 5° to 26.6° around the [001] axis are investigated. It is shown that the orientation of YBCO epitaxial films grown on such substrates is determined by the existence of symmetry-equivalent directions in the substrate and in the CeO₂ layer, as well as by the rate of film deposition. For a high deposition rate, YBCO films grow on the CeO₂ sublayer in the [001] orientation irrespective of the orientation of the substrate and the sublayer. It was found that when the angle of deviation of the substrate plane is from the (110) NGO plane, twinning of one or both twinning complexes in YBCO may be suppressed.     

Epitaxial growth of yttria-stabilised zirconia buffer layers on X-cut LiNbO3 for superconducting electrodes

We report on the epitaxial growth of yttria-stabilised zirconia (YSZ) buffer layers on X-cut LiNbO₃ (LNO) single crystals by pulsed laser deposition. Despite the low chemical stability of the substrates at high temperature, high quality fully reproducible films were obtained over a relatively broad range of processing conditions. The films were (00h) out-of-plane single oriented and the in-plane edge of the YSZ unit cell was aligned with the polar axis of the LNO. However, the YSZ deposition also promoted the formation of the compound LiNb₃O₈. This compound is epitaxial and located at the interface. The homogeneous YSZ film presents a uniform surface, free of outgrowths and with a low roughness. These characteristics are suitable for the epitaxial growth of other oxides, as has been demonstrated with the preparation of YBa₂Cu₃O₇/CeO₂/YSZ/LNO heterostructures. The superconducting YBa₂Cu₃O₇ films were epitaxial, with the c axis perpendicular to the surface and single in-plane orientation, and presented good transport properties (critical temperatures around 86 K and critical current densities close to 10⁶ A/cm² at 77 K). Received: 5 April 2001 / Accepted: 30 July 2001 / Published online: 30 October 2001     

Optical absorption by Nd<Superscript>3+</Superscript> and Gd<Superscript>3+</Superscript> ions in epitaxial films grown on Gd<Subscript>3</Subscript>Ga<Subscript>5</Subscript>O<Subscript>12</Subscript> substrates from a lead-containing solution melt

Epitaxial films of composition (Gd,Nd)₃Ga₅O₁₂ or (Gd,Y,Nd)₃Ga₅O₁₂ with a neodymium content varying from 0.3 to 15 at. % are grown by liquid-phase epitaxy from a supercooled PbO-B₂O₃-based solution melt on Gd₃Ga₅O₁₂(111) substrates. The optical absorption spectra of the epitaxial films grown are measured in the wavelength range 0.2–1.0 µm. The results of interpreting the absorption bands observed in the spectra are used to construct the energy level diagrams of Nd³⁺ and Gd³⁺ ions in the matrices of the epitaxial films.     

SUPERCONDUCTING PROPERTIES AND STRUCTURAL PERFECTION OF EPITAXIAL YBa2Cu3O7-x THIN FILMS

High quality epitaxial YBa₂Cu₃O_7-x thin films have been succcessfully prepared by dc magnetron sputtering deposition, on (100) and (110) aligned SrTiO₃, LaAlO₃ and yttria-stabilized zirconia (YSZ) substrates. The films showed zero resistance around 90 K and had a J_c (at 77 K, H=0) over 10⁶A/cm². It was found that superconducting properties and structures of the films were strongly dependent on oxygen pressure and substrate temperature. The epitaxial structure of the films have been studied by X-ray diffraction. Rutherford backscattering and channeling spectroscopy, X-ray double-crystal diffraction and transmission election microscopy. The experimental results demonstrated that the epitaxial YBa₂Cu₃O_7-x films had excellent superconducting properties and quite perfect structure.     

Room-temperature epitaxial growth of V2O3 films

Herein we report the room-temperature epitaxial growth of V2O3 films by laser molecule beam epitaxy. X-ray diffraction profiles show the room-temperature epitaxial V2O3 films orient in the [110] direction on α-Al2O3(0001) substrates. Atomic force microscopy measurements reveal that the ultra-smooth surfaces with root-mean-square surface roughness of 0.11 nm and 0.28 nm for 10-nm-thick and 35-nm-thick V+2O3 film, respectively. X-ray photoelectron spectroscopy results indicate the V3 oxidation state in the films. Typical metal-insulator transition is observed in films at about 135 K. The resistivities at 300 K are approximately 0.8 mΩ cm and 0.5 mΩ cm for 10-nm-thick and 35-nm-thick V2O3 film, respectively.     

La0.5Sr0.5CoO3薄膜的外延生长及其机理研究

利用脉冲激光制膜法,在多种衬底和温度条件下,系统研究了La_0.5Sr_0.5CoO₃(LSCO)薄膜的结构和外延生长特性,在LaAlO₃,SrTiO₃和MgO衬底上实现了LSCO薄膜的外延生长.外延生长的薄膜具有低的电阻率和金属性导电特征.研究表明,外延生长的最佳温度范围为700—800℃,最佳衬底为LaAlO₃.并着重探讨了衬底材料和淀积温度等多种因素对LSCO薄膜的生长与性 关键词：     

Enhanced magnetoresistance in La0.82Sr0.18MnO3-π-conjugated semiconducting polymer heterostructure

We report a large enhancement (∼90%) in magnetoresistance in La_0.82Sr_0.18MnO₃ (LSMO) layers by incorporating a π-conjugated semiconducting polymer layer in between them. The epitaxial LSMO layers were deposited by DC magnetron sputtering on SrTiO₃ single crystal substrates and have FM transition temperature (T_C)∼310 K. A semiconducting polymer poly(3-octylthiophene) (P3OT) layer was deposited over the epitaxial LSMO layer by solution dip coating technique and with subsequent deposition of another epitaxial LSMO layer, forming a LSMO-P3OT-LSMO heterostructure. The effect of P3OT incorporation on magnetotransport properties of this heterostructure has been examined in the temperature range 77-350 K. Large MR enhancement observed near room temperature in the FM regime is explained in terms of efficient magnetic field dependent carrier injection at LSMO/P3OT interface.     

Epitaxial strain effects on the metal-insulator transition in V2O3 thin films

Effects of epitaxial stress on the metal-insulator transition of V₂O₃ have been studied for in the form of epitaxial thin films grown on α-Al₂O₃ (0001) and LiTaO₃ (0001) substrates. A metallic phase is stabilized down to 2 K in the V₂O₃ thin film on α-Al₂O₃ (0001), where the a-axis is compressed by 4% owing to large epitaxial stress. On the other hand, the transition temperature T_MI is raised by 20 K from the value of 170 K in bulk samples in the film on LiTaO₃ (0001), where the a-axis is expanded. These results suggest an intimate relationship between the a-axis length and T_MI in V₂O₃. The conductivity of the metallic ultrathin films shows logarithmic temperature dependence below 20 K, probably due to the Anderson localization in two-dimensional systems.     

Polarization-enhanced bulk photovoltaic effect of BiFeO3 epitaxial film under standard solar illumination

In this Letter, we report the polarization-enhanced bulk photovoltaic effect (BPV) in pristine BiFeO₃ (BFO) epitaxial film under standard 1 sun AM 1.5 G illumination. High-quality epitaxial BFO films are grown on (001)-oriented niobium doped-SrTiO₃ substrates by pulsed laser deposition. The best BFO film based photovoltaic device achieves a power conversion efficiency of 0.0062% under standard illumination. Besides, it is found that the number of bipolar pulses plays a key role in improving the short-circuit current density and open-circuit voltage. These results are beneficial for further understanding of physical origin of the photovoltaic properties in ferroelectric oxides.     

Investigation of BiFeO3 Multiferroic thin films prepared by metalloorganic chemical vapor deposition

BiFeO₃ thin oriented films are grown on SrTiO₃(001) and ZrO₂(Y₂O₃)(001) substrates by metalloorganic chemical vapor deposition (MOCVD) in the temperature range T= 500–800°C. Iron dipivaloylmethanate Fe(thd)₃ and triphenylbismuth Bi(C₆H₅)₃ are used as volatile precursors. It is shown that the high thermal stability of Bi(C₆H₅)₃ leads to significant deviations of the Bi: Fe ratio in the film from their ratio in the precursor flow. An increase in the residence time of the precursor flow in the reactor makes this ratio close to unity. The film-substrate epitaxial relations are determined. It is found that the film orientation on the ZrO₂(Y₂O₃)(001) substrate changes with increasing temperature. Optical second harmonic generation (SHG) measurements show the presence of ferroelectric ordering in the films. A significant decrease in the Curie temperature due to epitaxial stress is found. At the same time, the magnetization noticeably increases as compared to a BiFeO₃ single crystal.     

Multiferroic behaviour of epitaxial NiFe2O4--BaTiO3 heterostructures

Multiferroic NiFe2O4 （NFO）-BaTiO3 （BTO） bilayered thin films are epitaxially grown on （001） Nb-doped SrTiO3 （STO） substrates by pulsed-laser deposition （PLD）. Different growth sequences of NFO and BTO on the substrate yield two kinds of epitaxial heterostructures with （001）-orientation, i.e. （001）-NFO/（001）-BTO/substrate and （001）- BTO/（001）-NFO/substrate. Microstructure studies from x-ray diffraction （XRD） and electron microscopies show differences between these two heterostructures, which result in different multiferroic behaviours. The heterostructured composite films exhibit good coexistence of both ferroelectric and ferromagnetic properties, in particular, obvious magnetoelectric （ME） effect on coupling response.     

Epitaxial growth of PbTiO3 thin film on (110) NdGaO3 substrate by metalorganic chemical vapor deposition

(001) preferentially oriented PbTiO₃ thin films have been grown on (110) NdGaO₃ substrates by metalorganic chemical vapor deposition (MOCVD) under reduced pressure at 650°C. Atomic force microscopy (AFM) surface morphology of the as-deposited film showed the evidence of layer-by-layer growth in the MOCVD process. By using a grazing-angle scattering technique, a highly resolved Raman spectrum of the epitaxial PbTiO₃thin film on perovskite substrate was first time recorded. Other microstructure of the film, such as the element composition, the c-domain percentage and the epitaxial nature, were investigated by Rutherford backscattering spectrometry (RBS), x-ray θ ? 2θ diffraction patterns and x-ray φ scans, respectively. All measurements indicate that NdGaO₃single crystal, which used to be a substrate for the growth of high-T_c superconducting thin films, is also suitable for the growth of high quality PbTiO₃ thin film. This indicates the promising use of the NdGaO₃ for the integration of ferroelectric thin films and superconducting electrodes.     

Study of the structural and magnetic characteristics of epitaxial Fe3Si/Si(111) films

The results of the structural and magnetic studies of the epitaxial structure prepared during the simultaneous evaporation from two iron and silicon sources on an atomically pure Si(111)7 × 7 surface at a substrate temperature of 150°C have been presented. The epitaxial structure has been identified as a single-crystal Fe₃Si silicide film with the orientation Si[111]‖Fe₃Si[111] using methods of the X-ray structural analysis, transmission electron microscopy, and reflection high-energy electron diffraction. It has been established that the epitaxial Fe₃Si film at room temperature has magnetic uniaxial anisotropy (H _a = 26 Oe) and a relatively narrow uniform ferromagnetic resonance line (ΔH = 11.57 Oe) measured at a pump frequency of 2.274 GHz.     

A comparative study of the BaTiO3 film and the BaTiO3/(Ba0.7Sr0.3)TiO3 superlattice using X-ray diffraction and raman spectroscopy

A comparative study of the BaTiO₃ epitaxial film and the BaTiO₃/(Ba_0.7Sr_0.3)TiO₃ superlattice prepared by pulsed laser deposition on MgO(100) substrates has been performed. The complete parallel orientation of the film and the substrate has been established and the modulation period of the superlattice ?? = 28 nm, the parameters of the unit cell averaged over the period of the superlattice ??, and the unit cell parameters of the layers forming the superlattice have been determined using the X-ray diffractometry data. According to the X-ray diffraction data, the unit cell of the BaTiO₃ single-component film and the unit cell averaged over the period of the superlattice ?? are pseudocubic; however, an analysis of the polarization characteristics of the Raman spectra has suggested that the film and the superlattice have monoclinic symmetry (P _x = P _y ?? 0, P _z ?? 0). The transformation of the components of the soft mode due to the deformation of the epitaxial layers forming the superlattice has been discussed.     

Tensile strain induced changes in the optical spectra of SrTiO3 epitaxial thin films

Effect of biaxial tensile strains on optical function and band edge transitions of ultra thin epitaxial films was studied using as an example a 13 nm thick SrTiO₃ films deposited on KTaO₃ (100) single-crystal substrates. Optical functions in the 200–1200 nm spectral range were determined by spectroscopic ellipsometry technique. It was found that tensile strains result in a shift of the low energy band gap optical transitions to higher energies and decrease the refractive index in the visible region. Comparison of the optical spectra for strained SrTiO₃ films and for homoepitaxial strain-free SrTiO₃: Cr (0.01 at %) films deposited on SrTiO₃ (100) single crystalline substrates showed that this “blue” shift of the band gap could not be related to technological imperfections or to reduced thickness. The observed effect is connected with changes in the lowest conduction and in the top valence bands that are due to increase of the in-plane lattice constant and/or onset of the polar phase in the tensile strain-induced ultra-thin epitaxial SrTiO₃ films.     

Strain induced phase separation on La0.5Ca0.5MnO3 thin films

The effect of epitaxial strain on La_0.5Ca_0.5MnO₃ films of various thicknesses grown on SrTiO₃, SrLaAlO₄, and SrLaGaO₄ substrates is studied by Raman spectroscopy, magnetic, and resistivity measurements. The transport and magnetic properties as well as Raman spectra of the films are affected by epitaxial strains. The energy of the A_g(2) mode and the tilting angle of the MnO₆ octahedra is affected by the strain imposed by the substrate. In the spectra of the films deposited on the (1 0 0) SrTiO₃ substrate strong Jahn-Teller (JT) modes appear, which couple with charge-ordering. In all other films these modes are suppressed and no additional Raman lines are present at low temperatures contrary to the bulk compound. The low frequency continuum scattering decreases at low temperatures indicating a coupling with both the charge and orbital transitions. Comparison of the Raman spectra with the magneto-transport properties suggests an interpretation in terms of a strain induced phase separation between ferromagnetic metallic and antiferromagnetic insulating states.