Improvement of R0A product of type-II InAs/GaSb superlattice MWIR/LWIR photodiodes

The effects of atomic hydrogen and polyimide passivation on R₀A product of type-II InAs/GaSb superlattice photo detectors for cut-off wavelength of both 6.5 μm and 12 μm were investigated. Low temperature current–voltage measurement shows that the use of atomic hydrogen during molecular beam epitaxy growth can improve R₀A product by 260% for 6.5 μm cut-off superlattice diodes and by 50% for 12 μm cut-off ones. The R₀A product of polyimide-passivated diodes with 12 μm cut-off is about 80% higher than those un-passivated ones. Wannier–Stark oscillations at higher reverse bias were observed for polyimide-passivated superlattice diodes with 12 μm cut-off. No Wannier–Stark oscillations were observed for un-passivated superlattice diodes, indicating that surface leakage current dominates in un-passivated diodes, while intrinsic dark current mechanisms such as tunneling and diffusion current dominate in polyimide-passivated diodes.     

Pushing the envelope to the maximum: Short-period InAs/GaSb type-II superlattices for mid-infrared detectors

Using a newly developed envelope function approximation model that includes interface effects, several InAs/GaSb type-II superlattices (SL) for the 4 μm (around 310 meV) detection threshold were designed. The model predicts that a given threshold can be obtained with progressively thinner SL periods and the thinner designs can have higher mobility and longer Auger lifetime over the thicker designs. The proposed SL structures were grown by molecular-beam epitaxy. The band gaps of SLs determined by low-temperature photoluminescence (PL) remained constant PL peak energy around 340–320 meV with distinctively different designs in the period range from 50.2 to 21.2 Å. Correlation between SL material quality and the full-width at half-maximum (FWHM) of the luminescence peak were made. In situ annealing after SL growth improved surface morphologies and the FWHM of the emission peak for the annealed SL samples were slightly narrower than those of non-annealed SLs.     

Optimization of InAs/GaSb type-II superlattices for high performance of photodetectors

The optimum growth conditions and strain balancing processes have been studied using molecular beam epitaxy (MBE) grown 51 Å InAs/40 Å GaSb type-II superlattices (SLs) designed to have cut-off wavelength of 10 μm. The most dominant factor in reducing the defect level in the SL structure was buffer growth temperature evidenced by transmission electron microscopy. In the study of the strain balancing process, the SLs could be lattice matched to the GaSb substrate by increasing the thickness of the InSb interfaces (IFs) from a nominal value of 1.0 to 1.4 ML, however, the structural quality degraded dramatically when the thickness of IFs reached beyond 1.0 ML. By optimizing the growth condition and MBE shutter sequences, micron thick InAs/GaSb SLs with a reduced lattice mismatch were routinely obtained with the full-width half-maximum of 18 arcsec, and the root mean square values of surface roughness of 2 Å in 5 μm area scan of atomic force microscopy demonstrating high quality. Correlation between material quality and photoresponse signal strength in photoconductivity measurements was made on SL samples with cut-off wavelength on the order of 10 μm.     

Growth and structure of MBE grown TiO2 anatase films with rutile nano-crystallites

We have explored the systematics of TiO₂ polymorph nucleation during film growth by molecular beam epitaxy on perovskite substrates. The accidental lattice match between anatase (0 0 1) and LaAlO₃(0 0 1) or SrTiO₃(0 0 1) typically results in anatase nucleation at the interface. However, the growth conditions dictate whether or not rutile also nucleates, and the associated morphological and structural properties of the composite film. Four symmetry equivalent epitaxial orientations of rutile on anatase are observed when rutile nucleates as discrete particles on LaAlO₃(0 0 1). Such films constitute model systems for studying the anatase/rutile interface, which is of considerable current interest in photochemistry.     

NIR, MWIR and LWIR quantum well infrared photodetector using interband and intersubband transitions

This paper presents the design, fabrication and characterization of a QWIP photodetector capable of detecting simultaneously infrared radiation within near infrared (NIR), mid wavelength infrared (MWIR) and long wavelength infrared (LWIR). The NIR detection was achieved using interband transition while MWIR and LWIR were based on intersubband transition in the conduction band. The quantum well structure was designed using a computational tool developed to solve self-consistently the Schrödinger–Poisson equation with the help of the shooting method. Intersubband absorption in the sample was measured for the MWIR and LWIR using Fourier transform spectroscopy (FTIR) and the measured peak positions were found at 5.3 μm and 8.7 μm which agree well with the theoretical values obtained 5.0 μm and 9.0 μm for the two infrared bands which indicates the accuracy of the self-consistent model. The photodetectors were fabricated using a standard photolithography process with exposed middle contacts to allow separate bias and readout of signals from the three wavelength bands. The measured photoresponse gave three peaks at 0.84 μm, 5.0 μm and 8.5 μm wavelengths with approximately 0.5 A/W, 0.03 A/W and 0.13 A/W peak responsivities for NIR, MWIR and LWIR bands, respectively. This work demonstrates the possibility of detection of widely separated wavelength bands using interband and intersubband transitions in quantum wells.     

Managing disorder in random GaAs/AlGaAs superlattices

The artificial random Gaussian-type potential built in the GaAs/AlGaAs superlattices grown by molecular beam epitaxy was explored by various methods. The effect of the intentional disorder was shown to dominate intrinsic superlattice imperfections and its impact on the electronic properties was found to be in good agreement with the theoretical predictions. It was demonstrated that the modern state of the molecular beam epitaxy allows for a growth of the superstructured materials with well-defined disorder strength.     

Modulation-doping in 3–5 μm GaAs/AlAs/AlGaAs double barrier quantum well infrared photodetectors: an alternative to achieve high photovoltaic performance and high temperature detection

In this work we propose new detector designs, which allow achieving mid-infrared photovoltaic (PV) detection at temperatures as high as 180 K. The devices, which are grown by molecular beam epitaxy, are modulation-doped (MD) double barrier quantum well infrared photodetectors (QWIPs) based on AlGaAs/AlAs/GaAs. As the photocurrent spectra and I–V characteristics (in the dark and under infrared illumination) show that the dopant location is a relevant design parameter regarding the performance of PV QWIPs, we begin our work with a comparison of the performance of a set of MD samples (where we have varied the dopant location in the AlGaAs barriers) with respect to a well-doped sample of nominally the same structure. We find that the responsivity and detectivity of the MD devices seem to be higher than those of the well-doped detector, specially when the dopant is located in the substrate-sided barrier. Then, in order to improve the dark current-limited performance, we designed a new set of substrated-sided MD detectors that exhibit an extremely low dark current, even at high temperatures, otherwise no drop in the zero bias peak responsivity. Therefore, the association of the notable PV signal detection in the 3–5 μm range of these MD detectors together with the dark current reduction of the new structures has allowed us to achieve a 140 K zero bias peak responsivity of 0.015 A/W and a 180 K zero bias peak responsivity of 0.01 A/W at 4.4 μm.     

Interface effect on superlattice quality and optical properties of InAs/GaSb type-II superlattices grown by molecular beam epitaxy

We systematically investigate the influence of InSb interface (IF) engineering on the crystal quality and optical properties of strain-balanced InAs/GaSb type-II superlattices (T2SLs). The type-II superlattice structure is 120 periods InAs (8 ML)/GaSb (6 ML) with different thicknesses of InSb interface grown by molecular beam epitaxy (MBE). The high-resolution x-ray diffraction (XRD) curves display sharp satellite peaks, and the narrow full width at half maximum (FWHM) of the 0th is only 30-39 arcsec. From high-resolution cross-sectional transmission electron microscopy (HRTEM) characterization, the InSb heterointerfaces and the clear spatial separation between the InAs and GaSb layers can be more intuitively distinguished. As the InSb interface thickness increases, the compressive strain increases, and the surface "bright spots" appear to be more apparent from the atomic force microscopy (AFM) results. Also, photoluminescence (PL) measurements verify that, with the increase in the strain, the bandgap of the superlattice narrows. By optimizing the InSb interface, a high-quality crystal with a well-defined surface and interface is obtained with a PL wavelength of 4.78 μ, which can be used for mid-wave infrared (MWIR) detection.     

Photocapacitance study of GaSb: In,As for defect analysis in InAs/GaSb type-II strained layer superlattices

Steady-state photocapacitance measurements were used to characterize GaSb incorporated with In, As, and a control sample. Evidence of a trap level at 0.55 eV was observed for all samples. The change in the capacitance for the sample with indium was about half the change for the other samples, indicating that the addition of indium modified the near-mid-gap trap levels. Another change in capacitance starting at 0.71 eV was attributed to electrons from the valence band filling levels close to the conduction band.     

Bias-selectable mid-/long-wave dual band infrared focal plane array based on Type-II InAs/GaSb superlattice

In this paper, a mid-/long-wave dual-band detector which combined PπMN structure and unipolar barrier was developed based on type-II InAs/GaSb superlattice. A relevant 320 × 256 focal plane array (FPA) was fabricated. Unipolar barrier and PπMN structure in our dual band detector structure were used to suppress cross-talk and dark current, respectively. The two channels, with respective 50% cut-off wavelength at 4.5 μm and 10 μm were obtained. The peak quantum efficiency (QE) of mid wavelength infrared (MWIR) band and long wavelength infrared (LWIR) band are 53% at 3.2 μm under no bias voltage and 40% at 6.4 μm under bias voltage of −170 mV, respectively. And the dark current density under 0 and −170 mV of applied bias are 1.076 × 10⁻⁵ A/cm² and 2.16 × 10⁻⁴ A/cm². The specific detectivity of MWIR band and LWIR band are 2.15 × 10¹² cm·Hz^1/2/W at 3.2 μm and 2.31 × 10¹⁰ cm·Hz^1/2/W at 6.4 μm, respectively, at 77 K. The specific detectivity of LWIR band maintains above 10¹⁰ cm·Hz^1/2/W at the wavelength range from 4.3 μm to 10.2 μm under −170 mV. The cross-talk, selectivity parameter at 3.0 μm, about 0.14 was achieved under bias of −170 mV. Finally, the thermal images were taken by the fabricated FPA at 77 K.     

Gas source MBE grown wavelength extended 2.2 and 2.5 μm InGaAs PIN photodetectors

Using homo-junction structure and relative thin linear graded In_xGa_1−xAs as the buffer layer, extended wavelength InGaAs PIN photodetectors with cut-off wavelength of 2.2 and 2.5 μm at room temperature have been grown by using GSMBE, and their performance over a wide temperature range have been extensively investigated. For those 2.2 or 2.5 μm detectors with 100 μm diameter, the typical dark current (V_R = 10 mV) and R₀A are 57 nA/10.3 Ω cm² or 67 nA/12.7 Ω cm² at 290 K, and 84 pA/4.70 kΩ cm² or 161 pA/3.12 kΩ cm² at 210 K respectively. The thermal activation energies of the dark current are 0.447 eV or 0.404 eV for 2.2 or 2.5 μm detectors respectively.     

Growth of Si whiskers by MBE: Mechanism and peculiarities

We analyzed the stress-driven mechanism of MBE Si whisker growth. It is shown that the driving force for MBE whisker growth is determined by the relaxation of elastic energy stored in the overgrown layer L_s due to gold intrusion. In this case the supersaturation is determined by the interplay between elastic stresses and surface energy. The latter is considerably decreased due to decoration of the Si surface by gold resulting in formation of thin liquid Si/Au eutectic layer. This suggests that in our case the Si supersaturation is not an independent growth parameter as it is in the chemical vapor deposition growth method. Instead it is determined by stress in the overgrown Si layer. This approach allows us to explain quite well the growth kinetic and the relationship between the radius and the length of the whiskers. The whisker growth in our case can be considered as a stress relaxation mechanism, where the stress relaxation occurs due to transition from the two-dimensional system to the three-dimensional one.     

High-resolution X-ray diffraction analysis of SnTe/Sn1−xEuxTe superlattices grown on (1 1 1) BaF2 substrates

A set of SnTe/Sn_1−xEu_xTe superlattice (SL) samples with increasing nominal Eu content x up to 0.28 was successfully grown on (1 1 1) BaF₂ substrates by molecular beam epitaxy. A complete structural characterization was performed by triple-axis X-ray diffractometry and reciprocal space mapping. The X-ray results showed that, despite the phase separation that normally occurs for unstrained Sn_1−xEu_xTe layers with x0.02, an SL stack with homogeneous individual layers can be formed for SL samples with a nominal Eu content up to 0.16. No SL satellite peak structure could be identified for samples with x values higher than 0.24. The structural parameters of the individual layers that compose the SL were determined using a best-fit simulation procedure which compared the calculated X-ray spectra to the measured (2 2 2) ω/2Θ scans. The strain information used in the simulation was obtained from the reciprocal space maps measured around the (2 2 4) lattice point.     

等离子辅助分子束外延技术研究生长在Si(111)衬底的氮化镓pn结

利用等离子辅助分子束外延系统研究了生长在硅(111)衬底的氮化镓pn结,并将其应用于光学器件．硅和镁分别用做n和p掺杂,反射高能电子衍射图像显示氮化镓pn结层具有良好的表面形貌,结层厚度约为0.705 nm,且为六方结构．室温下X射线衍射对称摇摆曲线中(0002)面的ω/2θ显示,半峰宽为0.340,说明氮化镓pn结质量高．另外,在硅和镁掺杂样品中没有A1峰淬灭．光致发光光谱表明pn结样品具有良好的光学性能．镍和铝作为分别作为正面和背面的电极接触应用于光学器件,该器件的电流电压特性显示了典型的异质结整流特性．正向接触镍经过氮气中退火处理10 min,结果表明,600 oC处理的样品比400 oC处理和未经处理的样品具有更高的增益．     

分子束外延生长赝配高电子迁移率超高速微结构功能材料里深中心识别

应用深能级瞬态谱(DLTS)技术研究分子束外延(MBE)生长的highelectronmobilitytransistors(HEMT)和Pseudomorphichighelectronmobilitytransistors(PHEMT)结构深中心行为.样品的DLTS谱表明,在HEMT和PHEMT结构的nAlGaAs层里存在着较大浓度(1015-1017cm-3)和俘获截面(10-16cm2)的近禁带中部电子陷阱.它们可能与AlGaAs层的氧含量有关.同时还观察到PHEMT结构晶格不匹配的AlGaAsInGaAsGaAs系统在AlGaAs里产生的应力引起DX中心(与硅有关)能级位置的有序移动.其移动量可作为应力大小的一个判据,表明DLTS技术是定性识别此应力的可靠和简便的工具. 关键词： 分子束外延生长 高电子迁移率超高速微结构功能材料 深中心     

Relation between interdiffusion and polarity for MBE growth of GaN epilayers on ZnO substrates

We report on GaN growth on Zn-polar ZnO substrates using plasma-assisted molecular-beam epitaxy (P-MBE). Before GaN growth, ZnO substrate annealing conditions were optimized. Reflection high-energy electron diffraction (RHEED) patterns after low-temperature GaN buffer layer annealing changed from streaky to spotty, suggesting that zinc and oxygen atoms interdiffuse from the ZnO substrate into the GaN epilayer. This interdiffusion results in a mix-polar GaN epilayer.     

High-quality MBE growth of AlχGa1-χ As-based THz quantum cascade lasers

High-quality GaAs-based quantum cascade laser (QCL) structures for the terahertz (THz) emission have been grown by solid source molecular-beam epitaxy. Ex-situ high-resolution x-ray diffraction shows that layer thickness and its control is the most critical growth aspect and that the lasing potential of the structure can be determined by the thickness accuracy of the layers. For our samples, the thickness tolerance for working lasing structures emitting approximately 100 μm was determined to be minimally above 1% for a 15 μm active region which was composed of 54.6 nm cascade cells. Increasing interface roughness adversely affects the lasing threshold and power. Presented at 5-th International Conference Solid State Surfaces and Interfaces, November 19–24, 2006, Smolenice Castle, Slovakia     

原子氢辅助分子束外延GaAs(331)A表面形貌演化

研究了GaAs高指数面(331)A在原子氢辅助下分子束外延形貌的演化.原子力显微镜测试表明：在常规分子束外延情况下,GaAs外延层台阶的厚度和台面的宽度随衬底温度的升高而增加,增加外延层厚度会导致台阶的密度和台面的宽度增加然后饱和.而在原子氢辅助分子束外延情况下,当GaAs淀积量相同时GaAs外延层台阶的密度增大宽度减小.认为这是由于原子氢的作用导致Ga原子迁移长度的减小.在GaAs(331)A台阶基底上生长出InAs自组织纳米线,用光荧光测试研究了其光学各项异性特征.     

Photodiode properties of molecular beam epitaxial InSb on a heavily doped substrate

Photodiodes of InSb were fabricated on an epitaxial layer grown using molecular beam epitaxy (MBE). Thermal cleaning of the InSb (0 0 1) substrate surface, 2° towards the (1 1 1) B plane, was performed to remove the oxide. Photodiode properties of МВЕ-formed epitaxial InSb were demonstrated. Zero-bias resistance area product (R₀A) measurements were taken at 80 K under room temperature background for a pixel size of 100 μm × 100 μm. Values were as high as 4.36 × 10⁴ Ω/cm², and the average value of R₀A was 1.66 × 10⁴ Ω/cm². The peak response was 2.44 (A/W). The epitaxial InSb photodiodes were fabricated using the same process as bulk crystal InSb diodes with the exception of the junction formation method. These values are comparable to the properties of bulk crystal InSb photodiodes.