Managing disorder in random GaAs/AlGaAs superlattices

The artificial random Gaussian-type potential built in the GaAs/AlGaAs superlattices grown by molecular beam epitaxy was explored by various methods. The effect of the intentional disorder was shown to dominate intrinsic superlattice imperfections and its impact on the electronic properties was found to be in good agreement with the theoretical predictions. It was demonstrated that the modern state of the molecular beam epitaxy allows for a growth of the superstructured materials with well-defined disorder strength.     

Pushing the envelope to the maximum: Short-period InAs/GaSb type-II superlattices for mid-infrared detectors

Using a newly developed envelope function approximation model that includes interface effects, several InAs/GaSb type-II superlattices (SL) for the 4 μm (around 310 meV) detection threshold were designed. The model predicts that a given threshold can be obtained with progressively thinner SL periods and the thinner designs can have higher mobility and longer Auger lifetime over the thicker designs. The proposed SL structures were grown by molecular-beam epitaxy. The band gaps of SLs determined by low-temperature photoluminescence (PL) remained constant PL peak energy around 340–320 meV with distinctively different designs in the period range from 50.2 to 21.2 Å. Correlation between SL material quality and the full-width at half-maximum (FWHM) of the luminescence peak were made. In situ annealing after SL growth improved surface morphologies and the FWHM of the emission peak for the annealed SL samples were slightly narrower than those of non-annealed SLs.     

Modulation-doping in 3–5 μm GaAs/AlAs/AlGaAs double barrier quantum well infrared photodetectors: an alternative to achieve high photovoltaic performance and high temperature detection

In this work we propose new detector designs, which allow achieving mid-infrared photovoltaic (PV) detection at temperatures as high as 180 K. The devices, which are grown by molecular beam epitaxy, are modulation-doped (MD) double barrier quantum well infrared photodetectors (QWIPs) based on AlGaAs/AlAs/GaAs. As the photocurrent spectra and I–V characteristics (in the dark and under infrared illumination) show that the dopant location is a relevant design parameter regarding the performance of PV QWIPs, we begin our work with a comparison of the performance of a set of MD samples (where we have varied the dopant location in the AlGaAs barriers) with respect to a well-doped sample of nominally the same structure. We find that the responsivity and detectivity of the MD devices seem to be higher than those of the well-doped detector, specially when the dopant is located in the substrate-sided barrier. Then, in order to improve the dark current-limited performance, we designed a new set of substrated-sided MD detectors that exhibit an extremely low dark current, even at high temperatures, otherwise no drop in the zero bias peak responsivity. Therefore, the association of the notable PV signal detection in the 3–5 μm range of these MD detectors together with the dark current reduction of the new structures has allowed us to achieve a 140 K zero bias peak responsivity of 0.015 A/W and a 180 K zero bias peak responsivity of 0.01 A/W at 4.4 μm.     

Optimization of InAs/GaSb type-II superlattices for high performance of photodetectors

The optimum growth conditions and strain balancing processes have been studied using molecular beam epitaxy (MBE) grown 51 Å InAs/40 Å GaSb type-II superlattices (SLs) designed to have cut-off wavelength of 10 μm. The most dominant factor in reducing the defect level in the SL structure was buffer growth temperature evidenced by transmission electron microscopy. In the study of the strain balancing process, the SLs could be lattice matched to the GaSb substrate by increasing the thickness of the InSb interfaces (IFs) from a nominal value of 1.0 to 1.4 ML, however, the structural quality degraded dramatically when the thickness of IFs reached beyond 1.0 ML. By optimizing the growth condition and MBE shutter sequences, micron thick InAs/GaSb SLs with a reduced lattice mismatch were routinely obtained with the full-width half-maximum of 18 arcsec, and the root mean square values of surface roughness of 2 Å in 5 μm area scan of atomic force microscopy demonstrating high quality. Correlation between material quality and photoresponse signal strength in photoconductivity measurements was made on SL samples with cut-off wavelength on the order of 10 μm.     

High-resolution X-ray diffraction analysis of SnTe/Sn1−xEuxTe superlattices grown on (1 1 1) BaF2 substrates

A set of SnTe/Sn_1−xEu_xTe superlattice (SL) samples with increasing nominal Eu content x up to 0.28 was successfully grown on (1 1 1) BaF₂ substrates by molecular beam epitaxy. A complete structural characterization was performed by triple-axis X-ray diffractometry and reciprocal space mapping. The X-ray results showed that, despite the phase separation that normally occurs for unstrained Sn_1−xEu_xTe layers with x0.02, an SL stack with homogeneous individual layers can be formed for SL samples with a nominal Eu content up to 0.16. No SL satellite peak structure could be identified for samples with x values higher than 0.24. The structural parameters of the individual layers that compose the SL were determined using a best-fit simulation procedure which compared the calculated X-ray spectra to the measured (2 2 2) ω/2Θ scans. The strain information used in the simulation was obtained from the reciprocal space maps measured around the (2 2 4) lattice point.     

Narrow spectral band monolithic lead-chalcogenide-on-Si mid-IR photodetectors

Narrow spectral band infrared detectors are required for multispectral infrared imaging. We review the first photovoltaic resonant cavity enhanced detectors (RCED) for the mid-IR range. The lead-chalcogenide (PbEuSe) photodetector is placed as a very thin layer inside an optical cavity. At least one side is terminated with an epitaxial Bragg mirror (consisting of quarter wavelength PbEuSe/BaF₂ pairs), while the second mirror may be a metal. Linewidths are as narrow as 37 nm at a peak wavelength of 4400 nm, and peak quantum efficiencies up to above 50% are obtained.     

Molecular beam epitaxy growth of HgCdTe for high performance infrared photon detectors

Significant progresses have been made in the molecular beam epitaxy (MBE) growth of HgCdTe for high performance infrared photon detectors with the aid of in situ and ex situ characterization techniques. Superlattice interfacial layers compensate in part for the influence of non-ideal CdZnTe substrates and hence improved the material quality as well as yield. They result in photoconductive carrier recombination lifetimes approaching theoretical limits set by the intrinsic radiative and Auger recombination mechanisms for 8–14 μm long-wavelength infrared HgCdTe. Very high composition and thickness uniformities have also been achieved. However, the Urbach tail energy, which is associated with structural disorder, was found to be non-uniform for both large wafer (up to 20 × 20 mm²) and very small area (down to 200 × 200 μm²). After several years of improvements in MBE HgCdTe growth techniques, substrates once again have become a bottleneck to further improvements.     

Growth and structure of MBE grown TiO2 anatase films with rutile nano-crystallites

We have explored the systematics of TiO₂ polymorph nucleation during film growth by molecular beam epitaxy on perovskite substrates. The accidental lattice match between anatase (0 0 1) and LaAlO₃(0 0 1) or SrTiO₃(0 0 1) typically results in anatase nucleation at the interface. However, the growth conditions dictate whether or not rutile also nucleates, and the associated morphological and structural properties of the composite film. Four symmetry equivalent epitaxial orientations of rutile on anatase are observed when rutile nucleates as discrete particles on LaAlO₃(0 0 1). Such films constitute model systems for studying the anatase/rutile interface, which is of considerable current interest in photochemistry.     

The 6.1 Å family (InAs, GaSb, AlSb) and its heterostructures: a selective review

The three semiconductors InAs, GaSb, and AlSb form an approximately lattice-matched set around 6.1 Å, covering a wide range of energy gaps and other properties. Of particular interest are heterostructures combining InAs with one or both of the antimonides, and they are emphasized in this review. In addition to their use in conventional device types (FETs, RTDs, etc.), several heterostructure configurations with unique properties have been explored, especially InAs/AlSb quantum wells and InAs/GaSb superlattices.InAs/AlSb quantum wells are an ideal medium to study the low-temperature transport properties in InAs itself. With gate-induced electron sheet concentrations on the order 10¹² cm⁻², they exhibit a pronounced conductivity quantization. The very deep wells (1.35 eV) provide excellent electron confinement, and also permit modulation doping up to at least 10¹³ electrons cm⁻². Because of the very low effective mass in InAs, heavily doped wells are essentially metals, with Fermi energies around 200 meV, and Fermi velocities exceeding 10⁸ cm s⁻¹. Contacted with superconducting electrodes, such structures can act as superconductive weak links.InAs/GaSb-related superlattices with their broken-gap lineup behave like semimetals at large lattice periods, but if the lattice period is shortened, increasing quantization effects cause a transition to a narrow-gap semiconductor, making such structures of interest for infrared detectors, often combined with the deliberate addition of strain.     

On the growth conditions of 3–5 μm well-doped AlGaAs/AlAs/GaAs infrared detectors and its relation to the photovoltaic effect studied by transmission electron microscopy

In this work, we investigate the influence of the molecular beam epitaxy (MBE) growth conditions (substrate temperature and arsenic flux) on the photovoltaic (PV) behavior and asymmetric characteristics of nominally identical well-doped AlGaAs/AlAs/GaAs double-barrier quantum well infrared photodetectors. This PV effect, already studied and reported in the literature, has been attributed to unintentional asymmetries of the potential profile introduced during the MBE growth process; in particular, due to an inequivalence of the AlAs layer properties or, more plausibly, to local space-charge regions originating from silicon segregation. The different “unintended” asymmetries for the samples considered in this work, validated by both dark-current and responsivity measurements, point at first glance to the existence of structural dissimilarities affecting the PV response. Hence, in order to clarify the influence of the suggested AlAs barriers inequivalence or interface roughness and quality in the origin of the PV signal we have performed a direct layer structural characterization by cross-section high resolution transmission electron microscopy. The analysis yields that regardless of the different growth conditions, the layers properties are similar, suggesting they play a minor role in the origin of the PV effect. Also this characterization tool may provide a further evidence of Si segregation being the main responsible. Concerning its growth conditions dependence, it seems that the As flux, and not only the substrate temperature, may affect Si segregation and hence the PV response.     

Influence of In composition on the photoluminescence emission of In(Ga)As quantum dot bilayers

We discuss a novel approach to the optimisation of quantum dot bilayer structures grown by molecular beam epitaxy. Use of a kinetic segregation model has shown that a reduction of the In composition for the upper layer of a bilayer structure can be used to compensate for the excess In that exists on the surface prior to growth. Three samples have been grown with upper dot In compositions varying from 90% to 100% and have been investigated by means of optical spectroscopy and electron microscopy.     

Sb incorporation at GaAs(0 0 1)-(2 × 4) surfaces

We examine the Sb incorporation and resulting surface reconstructions of Sb and GaSb deposited on GaAs(0 0 1). These films exhibit a mixed surface reconstruction of α2(2 × 4) and α(4 × 3). Initially, Sb reacts with Ga on the surface to form 2D islands of GaSb with an α(4 × 3) surface reconstruction. The 2D islands grow to a critical size of 30 nm², beyond which the atomic surface structure of the 2D island transforms to a α2(2 × 4) reconstruction in order to reduce the strain induced surface energy. This transformation is limited by the availability of Ga, which is necessary in higher quantities for the α2(2 × 4) reconstruction than for the α(4 × 3). The transformation results in a mixed α2(2 × 4)-α(4 × 3) surface where the surface reconstruction is coupled to the surface morphology, which may in the future provide a pathway for self-assembly of structures.     

Electron spectrum and infrared transitions in semiconductor superlattices with a unit cell allowing for quasi-localised carrier states

We studied theoretically the electron spectrum and infrared transitions in a superlattice with a unit cell allowing for quasi-localised carrier states. The dispersion relation and the band structure of such a system have been found. We calculated the dipole matrix element for inter-subband carrier infrared transitions. The wave functions and the electron spectrum in this superlattice show a peculiarity when the energy of a band state approaches the energy of the quasi-localised state in the single cell. The absorption strength peaks up at the respective frequencies.     

Ordered growth of germanium dots induced by the strain field of tilt dislocations in molecular bonded silicon (0 0 1) thin films

Germanium dots have been grown on high twist angle (twist angle as high as 20°) molecular bonded silicon (0 0 1) substrates. We show that, depending on the thickness of the silicon film, the strain field generated by an ordered array of mixed edge interfacial tilt (miss-cut) dislocations may induce an ordered growth of germanium dots. We also show that in order to observe an influence of the mixed edge interfacial dislocations on the growth of germanium dots, the thickness of the film has to be much lower that the period of the mixed edge dislocations array. Germanium dots grown by molecular beam epitaxy on 10-15 nm thick silicon films with the period of tilt dislocation array of 43 nm show a high degree of self-ordering.