纯LaAlO3和Ce3+:LaAlO3单晶的吸收谱和透过谱研究

本文采用中频感应提拉法成功生长了LaAlO3和Ce3+:LaAlO3晶体.沿生长方向即α轴方向切割、抛光后得到实验样品.测试了氢气退火前后纯LaAlO3和Ce3+:LaAlO3从190nm到2500nm的吸收谱和透过谱.测试结果表明:纯LaAlO3晶体在196～220nm处出现宽带吸收,氢气退火后此一波段的吸收系数明显降低;未退火的Ce:LaAlO3晶体在196～209nm,246nm,314nm出现明显的吸收波段,氢气退火后其吸收谱发生显著变化,在198,206,214,246和314nm处出现对应于Ce3+的4f-5d的跃迁吸收;Ce:LaAlO3晶体较之纯LaAlO3晶体在红外区的透过率要高;氢气退火后,Ce:LaAlO3晶体和纯LaAlO3晶体在红外区的透过率下降.     

纯LaAlO_3和Ce~(3 )∶LaAlO_3单晶的吸收谱和透过谱研究

本文采用中频感应提拉法成功生长了LaAlO3 和Ce3 ∶LaAlO3 晶体。沿生长方向即a轴方向切割、抛光后得到实验样品。测试了氢气退火前后纯LaAlO3 和Ce3 ∶LaAlO3 从 190nm到 2 5 0 0nm的吸收谱和透过谱。测试结果表明 :纯LaAlO3 晶体在 196～ 2 2 0nm处出现宽带吸收 ,氢气退火后此一波段的吸收系数明显降低 ;未退火的Ce∶LaAlO3晶体在 196～ 2 0 9nm ,2 4 6nm ,314nm出现明显的吸收波段 ,氢气退火后其吸收谱发生显著变化 ,在 198,2 0 6 ,2 14 ,2 4 6和 314nm处出现对应于Ce3 的 4f- 5d的跃迁吸收 ;Ce∶LaAlO3 晶体较之纯LaAlO3 晶体在红外区的透过率要高 ;氢气退火后 ,Ce∶LaAlO3 晶体和纯LaAlO3 晶体在红外区的透过率下降     

Ca2+离子对Y3+∶PbWO4晶体辐照硬度的影响

与其它三价稀土离子(La3+、Lu3+等)掺杂相比较,Y3+的掺杂表现出特殊的低剂量辐照行为:光产额辐照后升高,同时伴随着晶体在380nm～500nm波段透过率的变化,并且辐照硬度对退火温度较敏感.以往认为光输出升高的幅度是晶体顶端大于晶体晶种端,因此推测该现象与晶体中有效分凝系数小于1的Na+、K+和Si4+等杂质有关.本文对全尺寸晶体的顶端、中段和晶种端的分段晶体测试了退火温度对晶体透过率和辐照硬度的影响,结果发现:辐照后光产额升高的现象同时存在于晶体的晶种端和晶体顶端;在一定条件下辐照后光产额升高的幅度是晶体晶种端大于晶体顶端,结合我们铅空位补偿型掺杂剂的实验结果,初步推断这可能是由于Ca2+离子含量较高而引起Y3+离子电荷补偿方式的改变.     

高能电子辐照和退火对磷锗锌晶体红外光学性质的影响

对采用改进的垂直布里奇曼法生长出的磷锗锌(ZnGeP2)单晶体样品,在300 K,10 MeV高能电子束下进行辐照实验,测试辐照前后其红外透过率.同时,对样品进行同成分粉末包裹退火处理,对比两种工艺对磷锗锌晶体红外透过率的影响.实验结果表明,退火和高能电子辐照都能对磷锗锌晶体的红外光学性质产生影响,提高其红外透过率.在本文的实验条件下,退火工艺对磷锗锌晶体红外透过率的提高更为明显.     

CdGeAs2晶体退火与红外光学均匀性分析

采用AIM-8800红外显微镜观察了CdGeAs2晶体的面扫描红外透过图像,分别在2.3～4μm、4～8 μm和8～18μm三个波段对退火前后的CdGeAs2晶片红外透过率和面扫描红外透过图像进行了对比分析,研究了晶体的红外均匀性.结果表明,CdGeAs2晶体在多晶粉末包裹下经450℃退火150 h后,其红外透过率和红外透过均匀性都得到较大程度的改善,其中在2.3 ～4μm和4～8μm波段的改善效果尤为显著;分析了影响晶体红外透过率和均匀性的主要因素,探讨了改善晶体均匀性的可能途径.研究结果对于快速评判CdGeAs2晶片质量具有重要的实用价值.     

退火和电子辐照复合处理对ZnGeP2单晶性能的改进研究

采用退火和电子辐照相结合的复合工艺方法,对ZnGeP2晶体进行生长后处理.采用傅里叶红外光谱仪(FTIR)和高阻仪(HRM)等,对经不同次序的复合工艺处理前后样品的红外透过率和电阻率进行了测试.结果表明,采用先退火后电子辐照的复合处理工艺,样品的红外透过率能得到明显的提高.     

γ辐射及退火MgAl2O4透明陶瓷光谱特性研究

本文用不同剂量的γ射线辐照镁铝尖晶石透明陶瓷,并对辐照后的样品进行等时退火,UV-VIS和FI-IR测试表明,辐照前3360cm-1处有吸收峰,它是由V-1OH心吸收引起的.经γ辐射,样品在370nm处产生吸收带,它是由辐照产生的V型色心吸收引起的.通过退火可以使V型色心吸收带消除.结果表明:较低剂量的γ辐照能降低陶瓷紫外到红外的透过率;大剂量的γ辐照能在陶瓷中产生退火效应,能增加陶瓷红外透过率.     

CdSiP2单晶退火研究

以高纯(6N) Cd、Si、P单质为原料,采用双温区气相输运法和改进的垂直布里奇曼法合成生长出等径尺寸为φ17 mm×65 mm的CdSiP2单晶锭,经切割抛光得到CdSiP2晶片.将样品分别置于真空、镉气氛、磷气氛和在同成分粉末包裹中进行了退火试验.采用X射线能量色散谱仪(EDS)和傅里叶红外分光光度计(FTIR)对退火前后的晶片组分及红外透过谱进行了测试分析.结果表明:四种氛围退火前后样品的组分变化不大,原子比接近理想的化学计量比;镉气氛下退火对晶片的红外透过率改善较为显著,在1600 ～ 4500 cm-1范围内的红外透过率由46;～52;提高到51; ～57;,接近CdSiP2晶体红外透过率的理论值.     

坩埚下降法生长的大尺寸BaF2∶Y闪烁晶体的闪烁性能及辐照损伤研究

本文使用垂直坩埚下降法制备了40 mm×40 mm×350 mm的BaF₂∶5%Y(摩尔分数)晶体，并对晶体样品进行了掺杂含量、闪烁性能、光学性能和辐照损伤的研究。距离籽晶端0～300 mm范围内的Y³⁺掺杂浓度(摩尔分数)为5.1%±0.9%。晶体样品的平均光输出为2 100 ph/MeV,在662 keV处的最优能量分辨率为10.1%。经⁶⁰Co放射源辐照累积剂量1 Mrad后，样品在波长220 nm处的透过率由辐照前的87.3%下降至83.5%,在波长300 nm处的透过率由91.8%下降至89.9%。BaF₂∶Y晶体的抗辐照性能差于BaF₂晶体，经过累积剂量辐照后，BaF₂∶Y晶体对波长300 nm光的吸收明显增强。     

高温退火工艺对直流反应磁控溅射制备蓝宝石基氮化铝模板的影响

采用直流反应磁控溅射与高温退火工艺大批量制备了膜厚为200 nm、400 nm及800 nm的2英寸蓝宝石基氮化铝模板,并对高温退火前后不同膜厚模板使用各种表征手段进行对比分析.结果 表明:采用磁控溅射制备膜厚为200 nm的模板经高温退火后晶体质量得到显著提升,退火前后整片(0002)面和(10-12)面高分辨率X射线衍射摇摆曲线半高宽分别从632 ～ 658 arcsec和2 580 ～2 734 arcsec下降至70.9 ～ 84.5 arcsec和273.6 ～ 341.6 arcsec;模板5 μm×5μm区域内均方根粗糙度小于1 nm;紫外波段260 ～280 nm吸收系数为14 ～20 cm-1;高温退火前后拉曼图谱E2(high)声子模特征峰半高宽从13.5 cm-1降至5.2 cm-1,峰位从656.6 cm-1移动至657.6 cm-1,表明氮化铝模板内的拉应力经高温退火后得到释放,接近无应力状态.     

价态和结构对VO2薄膜热致相变光电性能的影响

本文通过合理控制真空还原时间和真空还原温度,利用真空还原V2O5的方法制备出具有优良热致相变性能的VO2薄膜;通过研究不同真空还原时间及真空退火温度对VO2薄膜结构和热致相变过程中光电性能的影响,得到最佳真空还原参数;制备的薄膜高／低温电阻变化最大达3个数量级;900nm波长光透过率在相变前后改变了40％左右,光学特性相变响应参数较大,热致相变性能优良,利用XPS,XRD对不同条件制备薄膜的化学状态和结晶状态进行了研究,结果表明较低温度退火有利于V^5 离子的还原,而升高退火温度可改善结晶状态,退火时间对VO2中结晶状况和V离子价态有显著影响,讨论了离子价态和样品结晶状态对VO2薄膜热相变过程中热滞回线的宽度,相变温度点的影响。     

Optical properties of thermally evaporated CdS thin films

CdS thin films of varying thicknesses were deposited on cleaned glass substrates at room temperature by thermal evaporation technique in a vacuum of about 2 x 10^‐5 torr. UV‐VIS spectra of the films were studied using the optical transmittance measurements which were taken in the spectral region from 300 nm to 1100 nm. The absorbance and reflectance spectra of the films in the UV‐VIS region were also studied. Optical constants such as optical band gap, extinction coefficient, refractive index, optical conductivity and complex dielectric constant were evaluated from these spectra. All the films were found to exhibit high transmittance (∼ 60 ‐ 93 %), low absorbance and low reflectance in the visible/near infrared region from ∼ 500 nm to 1100 nm. The optical band gap energy was found to be in the range 2.28 – 2.53 eV. All the films annealed at 300°C for 4 hours in vacuum (∼ 10^‐2 torr) showed a decrease in the optical transmittance with its absorption edge shifted towards the longer wavelength, leading to the result that the optical band gap decreases on annealing the films. Also, on annealing crystallinity of the films improves, resulting in decrease in the optical transmittance. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Annealing temperatures induced optical constant variations of methyl violet 2B thin films manufactured by the spin coating technique

Spin coating technique has been successfully applied to deposit uniform methyl violet 2B (MV2B) thin films. X-ray diffraction and Fourier-transform infrared techniques were used to study the crystal and molecular structure of MV2B. The optical properties of the films have been studied by spectrophotometer measurements of transmittance and reflectance at normal incidence of light in the spectral range of 200–2500 nm. The absorption and refractive indices are independent of the film thickness. The absorption parameters such as molar extinction coefficient, oscillator strength and electric dipole strength have been reported before and after annealing. The type of electronic transition is indirect allowed transition with onset energy gap of 1.82 eV and optical energy gap of 3.65 eV. Annealing temperatures reduce structure disorder, remove trap level, increase values of the onset and optical energy gaps and decrease refractive index. The single oscillator model has been applied for calculating the dispersion parameters. The oscillator energy, the dispersion energy, the high frequency dielectric constant, the lattice dielectric constant and the ratio of free charge carriers' concentration to its effective mass were evaluated before and after annealing. The dielectric properties of the films were also determined.     

微波水热法合成硅酸钇纳米晶

以硝酸钇、硅酸钠和氢氧化钠为主要原料,采用一种新方法-微波水热法可控合成了硅酸钇纳米晶.研究了起始溶液配比,合成温度及退火温度对硅酸钇的影响.采用X射线衍射仪(XRD)和透射电子显微镜(TEM)对粉体进行了表征.结果表明:随着合成温度的升高,Y_2SiO_5的含量增加.低温退火处理有助于提高硅酸钇微晶的结晶程度.选不同配比的溶液体系,经微波水热150 ℃作用10 min后,得到的前驱体于900 ℃下保温2 h,最终可获颗粒尺寸分别为400~600 nm、200~400 nm和400~600 nm的Y_2SiO_5、Y_(4.67)(SiO_4)_3O和Y_2Si_2O_7三种晶型的纳米晶,且其晶型最佳.     

X-ray microscopy of track membranes and biological objects in the soft-and hard-wavelength ranges

The methods used to obtain X-ray images of track membranes and various biological objects in the soft (20 nm) and hard (0.2–0.02 nm) wavelength ranges have been considered. In the range of soft X-rays, the images were obtained in a Schwarzshild microscope. In the spectral range of hard X-ray radiation, various methods were used including the use of Fresnel zone plates, asymmetric reflecting crystals, X-ray microradiography and microtomography.     

XPS and AFM studies of surface chemistry and morphology of In2O3 ultrathin films deposited by rheotaxial growth and vacuum oxidation after air exposure

In this paper we present the results of an XPS study of the surface chemistry of In₂O₃ (IO) ultrathin deposited by rheotaxial growth and vacuum oxidation after their air exposure and subsequent UHV annealing. For the freshly deposited RGVO IO ultrathin films the relative [O]/[In] concentration is equal to 1.17 ±0.05. After exposure to air it increases to 1.25 ±0.05. However, a strong C contamination appears, confirmed by the relative [C]/[In] concentration that is equal to 1.07 ±0.05. After subsequent UHV annealing at 200 °C the relative [O]/[In] concentration remains and only slightly increases to 1.30 ±0.05 after subsequent UHV annealing at 350 °C. After this process the relative [C]/[In] concentration decreases to 0.43 ±0.05. The additional AFM experiments showed that the RGVO IO ultrathin films exhibit the granular‐type surface morphology, with an average grain height and width in the range of 2–5 nm, and 10–50 nm, respectively, and an average roughness of 1.1 nm.     

Structural and optical properties of 6CaO·6SrO·7Al2O3 thin films derived by sol-gel dip coating process

The nanostructured 6CaO·6SrO·7Al₂O₃ (C6S6A7) thin films with cubic structure using calcium, strontium metals, aluminium isopropoxide and ethylene glycol monomethyl ether as stating materials has been fabricated via sol-gel route. Based on hydrolysis of Ca²⁺, Sr²⁺ and Al³⁺ in the sol-gel processing using ethylene glycol monomethyl ether as solvent have been employed as the precursor material. The films were coated on soda lime float glass by the dip coating technique and annealed at 450 °C in air atmosphere. The structure, morphology and composition of the films were investigated by Fourier transformed infrared spectroscopy, X-ray powder diffraction, scanning electron microscopy, atomic force microscopy and X-ray photoelectron spectroscopy indicating that the films were composed of C6S6A7 nanoparticles with cubic structure. The spectral transmittance of the films was measured in the wavelength range of 200-1100 nm using an UV-visible spectrometer. It has been found that the optical properties of the films significantly affected by precursor chemistry and annealing temperature due to the improvement of the crystallinity of the films with increasing annealing temperature and became stable when the annealing temperature is higher than 450 °C. The C6S6A7 films annealed at 450 °C had high transparency about 80% in wide visible range.     

Microstructural,optical and electrical properties of GeO2 thin films prepared by sol‐gel method

GeO₂ thin films were prepared by sol‐gel method on ITO/Glass substrate. The electrical and optical properties and the microstructures of these films were investigated with special emphasis on the effects of an annealing treatment in ambient air. The films were annealed at various temperatures from 500 °C to 700 °C. Structural analysis through X‐ray diffraction (XRD) and atomic force microscope (AFM) showed that surface structure and morphological characteristics were sensitive to the treatment conditions. The optical transmittance spectra of the GeO₂/ITO/Glass were measured using a UV‐visible spectrophotometer. All films exhibited GeO₂ (101) orientation perpendicular to the substrate surface where the grain size increased with increasing annealing temperature. The optical transmittance spectroscopy further revealed high transparency (over 70 %) in the wave range 400 – 800 nm of the visible region. At an annealing temperature level of 700 °C, the GeO₂ films were found to possess a leakage current density of 1.31×10^‐6A/cm² at an electrical field of 20 kV/cm. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

微观结构对Eu:Ti纳米材料光学性能的影响

以TiO_2∶Eu纳米颗粒为原材料,采取水热和高温(700 ℃)退火的方法合成了铕掺杂钛纳米棒(简写成Eu∶Ti 纳米棒).其结构和光学性能用场发射扫描电镜,显微共聚焦激光拉曼光谱,稳态荧光以及寿命谱进行表征.场发射扫描电镜图片显示纳米棒的直径大约为30 nm,长度大约为300~600 nm.显微共聚焦激光拉曼光谱测试结果表明纳米棒中含有部分锐钛矿结构.稳态荧光光谱显示纳米棒的发光强度明显比纳米颗粒的强度强,而且发光谱线也不同.检测Eu~(3+)的~5D_0→~7F_2跃迁(发光峰位在612 nm)的发光强度,采用394 nm激发,发现纳米棒的寿命比纳米颗粒的长120 μs.