硫酸根离子对草酸-硫酸混合酸中制备的多孔阳极氧化铝光致发光特性的影响

采用电化学阳极氧化法,分别在草酸、硫酸及两者不同浓度比的混合酸中制备了AAO薄膜样品,并分别观察了在250,296 nm光激发下的光致发光(PL)特性。结果表明:草酸和混合酸中制备的AAO薄膜,在250~550 nm范围内的光致发光与不同存在或分布形式的草酸杂质形成的发光中心相关。硫酸根离子对混合酸中制备的AAO薄膜的PL特性有很大影响,随硫酸根离子浓度的增加发光峰位逐渐蓝移。分析了出现上述实验现象的原因。     

乙醇对纳米多孔氧化铝薄膜光致发光特性的影响

采用二次阳极氧化法,用乙醇与草酸的混合溶液制备纳米多孔氧化铝薄膜。扫描电子微镜结果显示,乙醇与草酸混合溶液中制备的氧化铝薄膜形貌更规整,有序度更高。光致发光测试结果表明,该混合电解液制备的薄膜的光致发光强度有明显的提高,且随乙醇浓度的增加,发光强度逐渐增大。结合红外反射光谱及X光电子能谱对上述实验现象进行了分析,为多孔氧化铝薄膜掺杂和改善其发光特性提供了新的思路。     

多孔氧化铝膜的荧光研究

采用电化学方法在草酸溶液中制备铝基多孔阳极氧化铝膜,用原子力显微镜观察其形貌,得到平均孔径为 38 nm的有序排列.用F-4500型荧光分光光度计测量其三维荧光谱,与未经氧化的铝片作对比,发现前者的激发谱在280 nm~340 nm有一个较宽的谱带,并且在253.8 nm附近有一个肩峰,发射谱有一个以417.4 nm为峰值的较宽谱带,而后者却无任何明显的发射峰和激发峰.再分别用波长为248 nm的准分子激光器和波长355 nm的三倍频YAG激光器激发,得到明亮的蓝光光谱,在同样条件下激发未经阳极氧化的高纯铝片,将二者的光致发光谱进行对比处理.实验认为,这种发光机理可能是来源于薄膜中与氧空位有关的缺陷态,而且,在成膜过程中伴随着草酸根离子的介入,导致多孔阳极氧化铝膜中亦有与草酸根离子相关的发光中心,同时,量子限域效应也使氧化铝薄膜的光学性质发生了变化.     

退火温度对Er/Yb共掺Al2O3薄膜的光致荧光光谱的影响

通过对不同退火条件下Er/Yb共掺Al2O3薄膜光致荧光(PL)光谱的系统分析,研究了高Er/Yb掺杂浓度所导致的晶体场变化对薄膜PL光谱的影响,并结合薄膜结构分析,探讨了Al2O3薄膜的结晶状态在Er3+激活、PL光谱宽化中的作用及可能的物理机理.研究结果表明:退火处理所导致的Er3+ PL光谱的变化与薄膜的微观状态之间有着密切的联系.在600-750℃范围内,薄膜呈非晶态结构,薄膜荧光强度的增加主要是薄膜内缺陷减少所致;在800-900℃范围内,γ-Al2O3相的出现是导致荧光强度明显增加的主要原因;当退火温度为1000℃时,Er,Yb的大量析出致使荧光强度的急剧下降.此外,对PL光谱线形分析表明,各子能级跃迁的相对强度变化是导致荧光光谱宽化的主要因素.     

不同退火条件对纳米多孔氧化铝薄膜光致发光的影响

以草酸为电解液,采用二次阳极氧化法制备出了纳米多孔氧化铝薄膜,经不同退火温度和退火气氛处理氧化铝薄膜后,通过分析其光致发光光谱得出：相同的退火气氛中, 退火温度T≤600 ℃ 时,T=500 ℃具有最大的光致发光强度;退火温度T≥700 ℃时,随着退火温度的升高,样品的发光强度增大。在不同的退火气氛中,多孔氧化铝薄膜随着退火温度的升高,发光峰位改变不同,即在空气中退火处理后,随着退火温度的升高,发光峰位蓝移,而在真空中退火处理后,发光峰位并不随退火温度的升高而变化;通过对1 100 ℃高温退火处理后的氧化铝薄膜的光致发光曲线的高斯拟合,可以看出,经退火处理后的多孔氧化铝,主要存在三个发光中心,发光曲线在350～600 nm范围内对应三个发射峰, 发射波长分别为387,410,439 nm。相同的退火温度下,空气中退火得到的氧化铝薄膜的光致发光强度大于真空中退火处理后的氧化铝薄膜。基于实验结果,结合X射线色散能谱(EDS)、红外反射光谱等表征手段,探讨了多孔氧化铝薄膜的发光机制,并对经过不同退火条件得到的多孔氧化铝薄膜的光致发光特性的改变做出了合理的解释。     

氢等离子体气氛中退火多孔硅的表面和光荧光特性

用电化学腐蚀法制备了多孔硅(PS),在氢等离子体气氛中不同温度下对多孔硅样品进行了退火处理,并进行了光致发光(PL)谱和原子力显微镜(AFM)表面形貌的测量。不同退火温度给PS表面形态带来较大变化,也影响了其PL谱特性。在退火的样品中观察到的PL谱高效蓝光和紫光谱带,我们认为主要源于量子限制发光峰和非平衡载流子被带隙中浅杂质能级所俘获而引起的辐射复合所产生的。在420—450℃退火处理的多孔硅的PL谱上观察到了一个未见诸于报道的紫光新谱带(3．24eV,382nm),其发光机理有待于进一步研究。     

虹彩环形结构色氧化铝薄膜的制备与研究

在草酸电解液中, 利用一次电化学氧化法成功的制备了孔洞深度和孔径由薄膜中心向外呈对称性递减的新型氧化铝薄膜, 且氧化铝薄膜呈现出虹彩环形结构色. 通过控制氧化电压和氧化时间可以调控虹彩环的疏密程度. 对草酸电解液中具有虹彩环形结构色氧化铝薄膜形成机理的理论分析表明, 在阳极电化学反应过程中, 阴极碳棒的作用效果类似点电极, 理论分析的结果与本文的实验现象相符合.     

氧气压强对PLD制备MgZnO薄膜光学性质的影响(英文)

使用准分子脉冲激光沉积(PLD)方法在Si(100)基片上制备了高度c轴取向的MgZnO薄膜。分别使用SEM、XRD、XPS、PL谱和吸收谱表征了薄膜的形貌、结构、成分和光学性质。实验发现氧气压强对MgZnO薄膜的结构和光学性质有重要影响。当氧气压强由5 Pa增大到45 Pa时,薄膜的PL谱紫外峰蓝移了86meV,表明氧气压强的增大提高了MgZnO薄膜中Mg的溶解度。在15 Pa氧气压强下制备的薄膜显示了独特、均匀的六角纳米柱状结构,其PL谱展示了优异的发光特性,具有比其他制备条件下超强的紫外发射和微弱的可见发光。500~600 nm范围内的绿光发射,我们讨论其机理可能源于深能级中与氧相关的缺陷。使用PLD得到纳米柱状结构表明:优化制备条件,可望使用PLD制备ZnO纳米阵列的外延衬底;可使用PLD技术开发基于ZnO纳米结构的高效发光器件。     

Eu掺杂SiC_xO_y薄膜的Eu~(3+)发光机制

利用磁控溅射技术在低温250℃下制备Eu掺杂SiC_xO_y薄膜,研究薄膜的Eu~(3+) 发光激发机制。实验结果表明,薄膜的发光谱由来自基体材料的蓝光和来自Eu~(3+) 的红光组成;随着薄膜中Eu含量由0.19%增加到2.27%,其红光强度增加3倍左右,而蓝光逐渐减弱。Raman光谱及荧光瞬态谱分析表明,其蓝光由中立氧空位缺陷发光中心引起。结合薄膜的Eu~(3+) 激发光谱分析,SiC_xO_y∶Eu薄膜的红光增强源于薄膜中Eu~(3+) 离子浓度的增加和/或基体材料的中立氧空位缺陷发光中心与Eu~(3+) 离子的能量转移。     

多孔硅/多孔氧化铝与PVK复合光致发光特性

用旋涂法实现了多孔硅、多孔氧化铝与聚乙烯咔唑(PVK)的复合,研究了多孔硅／PVK、多孔氧化铝／PVK复合体系的光致发光性能。PL谱的测试发现,多孔硅／PVK复合体系的PL谱同时具有多孔硅和PVK的发射峰。此外,在485nm的位置出现了一个新峰,讨论了这个峰的来源。而多孔氧化铝与PVK复合后,没有产生新的峰。但多孔氧化铝与PVK复合后,由于多孔氧化铝纳米孔的纳米限制效应使PVK的发光峰出现大幅度蓝移。从多孔硅与多孔氧化铝发光机制的不同出发,讨论了多孔硅、多孔氧化铝与PVK复合后产生不同结果的原因。     

Nanoscale islands and color centers in porous anodic alumina on silicon fabricated by oxalic acid

Anodic oxidation of Al film on silicon substrate in oxalic acid is investigated through the j–t curves and its photoluminescence (PL). Their growth is analyzed with three typical stages according to j–t curve, which is agreed with the growth of nanoscale SiO₂ islands at the interface between Al film and Si substrate. The violet and blue peaks of PL were due to F⁺ and F centers, respectively. The evolvement from F⁺ to F centers during the late stage of anodization was revealed by the PL behavior at different stage.     

Photoluminescence properties of anodic alumina membranes with ordered nanopore arrays

Photoluminescence (PL) of anodic alumina membranes (AAMs) with ordered nanopore arrays fabricated in oxalic acid has been investigated under different annealing temperatures. The PL intensity firstly increases, and at 500 °C reaches a maximum value, then decreases. The structural transition from amorphous to γ-Al₂O₃ in AAMs has been confirmed by X-ray diffraction. Thermogravimetric analysis results and electron paramagnetic resonance measurements revealed that the PL band of alumina membranes could be attributed to the oxygen-related defect centers (F⁺ centers) rather than the luminescent centers transformed from oxalic impurities.     

The investigation of photoluminescence centers in porous alumina membranes

To investigate the origin of blue photoluminescence (PL) in porous alumina membrane, we have prepared an anodic aluminum oxide film with a pore diameter of 40 nm in oxalic acid solution by a two-step anodization process. Our results show that the as-prepared alumina membrane is amorphous and exhibits a broad emission band peaking at around 452 nm with two sub-peaks located at 443 nm and 470 nm. As indicated by the PL excitation spectra, there are two excitation peaks which can account for the sub-peaks observed in the PL emission band. We have proposed that the broad emission band with two sub-peaks can be attributed to two luminescence centers in porous alumina membranes, namely, oxygen defects and oxalic impurities. Furthermore, we have rationalized that the two emission centers show similar influence on the PL band in the blue region based on a simple model. PACS 81.07.-b; 81.16.Dn; 79.60.Jv     

Intrinsic luminescence centers in γ- and θ-alumina nanoparticles

In this study, we investigate the photoluminescence(PL) properties of γ and θ-alumina nanoparticles synthesized by the chemical wet method followed by annealing. The obtained experimental results indicate the presence of some favorable near ultraviolet(NUV)-orange luminescent centers for usage in various luminescence applications, such as oxygen vacancies(F, F~+_2, F~(2+)_2, and F_2centers), OH related defects, cation interstitial centers, and some new luminescence bands attributed to trapped-hole centers or donor–acceptor centers. The energy states of each defect are discussed in detail. The defects mentioned could alter the electronic structure by producing some energy states in the band gap that result in the optical absorption in the middle ultraviolet(MUV) region. Spectra show that photoionazation of F and F_2 centers plays a crucial role in providing either free electrons for the conduction band, or the photoconversions of aggregated oxygen vacancies into each other, or mobile electrons for electrons-holes recombination process by the Shockley–Read–Hall(SRH)mechanism.     

Mechanism of light emission in low energy ion implanted silicon

A silicon wafer implanted with a single low energy (42 keV) silicon ion beam results in strong luminescence at room temperature. The implantation results in the formation of various luminescent defect centers within the crystalline and polymorphous regions of the wafer. The resulting luminescence centers (LC) are mapped using fluorescence lifetime imaging microscopy (FLIM). The emission from the ion-implanted wafer shows multiple PL peaks ranging from the UV to the visible; these emissions originate from bound excitonic states in crystal defects and interfacial states between crystalline/amorphous silicon and impurities within the wafer. The LCs are created from defects and impurities within the wafer and not from nanoparticles.     

Optical properties of alumina membranes prepared by anodic oxidation process

The luminescence property of anodic alumina membranes (AAMs) with ordered nanopore arrays prepared by electrochemically anodizing aluminum in oxalic acid solutions have been investigated. Photoluminescence emission (PL) measurement shows that a blue PL band occurs in the wavelength ranges of 300-600 nm. The PL intensity and peak position of AAMs depend markedly on the excitation wavelength. A new peak located at 518 nm can be observed under a monitoring wavelength at 429 nm in the photoluminescence excitation (PLE) spectra. Convincing evidences have been presented that the PLE would be associated with the residual aluminum ions in the membrane. The PLE and PL of AAMs, as a function of anodizing times, have been discussed. It is found that the oxalic impurities incorporated in the AAMs would have important influences on the optical properties of AAMs in the initial stage of anodization. The PL and PLE spectra obtained show that there are three optical centers, of which the first is originated from the F⁺ centers in AAMs, the second is correlated with the oxalic impurities incorporated in the AAMs, and the third is associated with the excess aluminum ions in the membrane.     

Effect of heat treatment on the structure of incorporated oxalate species and photoluminescent properties of porous alumina films formed in oxalic acid

The present work focuses on the use of IR spectroscopy and photoluminescence spectral measurements for studying the treatment temperature effect on the compositional and luminescent properties of oxalic acid alumina films. In line with the recent researches we have also found that heat treatment of porous alumina films formed in oxalic acid leads to considerable changes in their photoluminescence properties: upon annealing the intensity of photoluminescence (PL) increases reaching a maximum at the temperature of around 500 °C and then decreases. IR spectra of as-grown and heat-treated films have proved that PL emission in the anodic alumina films is related with the state of ‘structural’ oxalate species incorporated in the oxide lattice. These results allowed us to conclude that PL behavior of oxalic acid alumina films can be explained through the concept of variations in the bonding molecular orbitals of incorporated oxalate species including σ- and π-bonds.     

草酸沉淀法制备细颗粒红色荧光粉Y2O3：Eu3+的发光特性

对草酸作为沉淀剂制备的细颗粒红色荧光粉Y₂O₃:Eu³⁺进行结构和发光特性研究,结果表明:其一次粒径为20～30nm,团聚尺寸D₅₀=0.53μm。该荧光粉最大激发峰位于252.2nm,较微米级荧光粉233nm红移了19.2nm;最大的发射峰位于612nm,与微米级的相比几乎没有差别。Eu³⁺离子的掺入构成了发光中心,其最佳掺杂的质量分数为9%,荧光粉发光的猝灭浓度由微米级的6%提高到9%。由于纳米晶存在表面缺陷和悬挂键,其亮度约为微米晶的70%左右,随着团聚尺寸的增加、煅烧温度的提高和助熔剂的加入,荧光粉的发光强度增大。包膜能部分消除表面缺陷和悬挂键,提高发光亮度。荧光粉的色坐标为x=0.6479,y=0.3442。     

掺杂LiF的ESR谱和ENDOR谱研究

LiF:Mg,Cu热释光(TL)磷光体在γ辐照后产生F⁰顺磁中心,其g因子为g_xx=2.0030,g_yy=2.0450,g_zz=2.0251,裂分为A_xx=511.04G,A_yy=505.42G,A_zz=507.26G。F⁰中心的浓度随Mg⁺⁺浓度的增加而下降。磷光体的ENDOR谱显示F⁰中心附近有铜核存在。照射前和照射后24h测量均未发现Cu⁺⁺的ESR谱,表明铜是以Cu⁺形式掺入的,照射并未引起Cu⁺离子化合价的改变。LiF:Mg,Cu,P在γ辐照前具有轴对称的Cu⁺⁺离子的ESR谱,辐照后产生了O^-空穴中心和PO₃^2-自由基,改变了Cu⁺⁺的环境,使Cu⁺⁺的谱发