Resolution of objects within subwavelength range by using the near field of a dipole

We analyze the far-field resolution of apertures that are illuminated by a point dipole located at subwavelength distances. It is well known that radiation emitted by a localized source can be considered a combination of traveling and evanescent waves, when represented by the angular spectrum method. The evanescent wave part of the source can be converted to propagating waves by diffraction at the aperture; thereby it contributes to the far-field detection. Therefore one can expect an increase in the resolution of objects. We present explicit calculations showing that the resolution at the far zone is improved by decreasing the source-aperture distance. We also utilize the resolution enhancement by the near field of a dipole to resolve two closely located apertures. The results show that without the near field (evanescent field) the apertures are not resolved, whereas with the near field of the dipole the far zone intensity distribution shows improved resolution. This method eliminates the requirements of near-field techniques such as controlling and scanning closely located tip detectors.     

Enhanced near field mediated nanohole fabrication on silicon substrate by femtosecond laser pulse

Investigation of the process of nanohole formation on silicon surface mediated with near electromagnetic field enhancement in vicinity of gold particles is described. Gold nanospheres with diameters of 40, 80 and 200 nm are used. Irradiation of the samples with laser pulse at fluences below the ablation threshold for native Si surface, results in a nanosized surface modification. The nanostructure formation is investigated for the fundamental (λ = 800 nm, 100 fs) and the second harmonic (λ = 400 nm, 250 fs) of the laser radiation generated by ultrashort Ti:sapphire laser system. The near electric field distribution is analyzed by an Finite Difference Time Domain (FDTD) simulation code. The properties of the produced morphological changes on the Si surface are found to depend strongly on the polarization and the wavelength of the laser irradiation. When the laser pulse is linearly polarized the produced nanohole shape is elongated in the E-direction of the polarization. The shape of the hole becomes symmetrical when the laser radiation is circularly polarized. The size of the ablated holes depends on the size of the gold particles, as the smallest holes are produced with the smallest particles. The variation of the laser fluence and the particle size gives possibility of fabricating structures with lateral dimensions ranging from 200 nm to below 40 nm. Explanation of the obtained results is given on the basis simulations of the near field properties using FDTD model and Mie's theory.     

Localization of the electromagnetic field in the vicinity of gold nanoparticles: Surface modification of different substrates

Theoretical predictions and experimental results for nanosized modification of metal (Au), semiconductor (Si), or dielectric (soda lime glass) substrates using near-electromagnetic field enhancement in the vicinity of gold nanoparticles are presented. The near field properties for the system consisting of an isolated gold nanoparticle or nanoparticle aggregate deposited on the substrates, which is irradiated by electromagnetic wave, are investigated using Finite Difference Time Domain Simulation technique. The influence of the substrate material on the near field distribution characteristics is predicted. The results reveal that the field on the substrate surface is enhanced in the three investigated cases, but its spatial distribution and magnitude depend on the substrate material. In the case of the metal and semiconductor substrate the enhanced near field is strongly localized in the vicinity of the contact point with the particle, in an area with diameter smaller than the particle's one. The intensity of the enhanced field on the glass is more than an order of magnitude lower than the case of using silicon substrate. The properties of the near field on the substrate surface also depend on the particle arrangement. For a two-dimensional gold nanoparticle array, when the particles are closely arrayed, the intensity of the enhanced field on the substrate surface is minimal. With the increase of the interparticle distance the near field intensity increases. The validity of the obtained theoretical results is confirmed experimentally.     

The effects of strain on STM lithography on HS-ssDNA/Au (1 1 1) surface

Scanning tunneling microscopy (STM) lithography was utilized to investigate a 12-mer HS-ssDNA self-assembled Au (1 1 1) surface. Under low sample bias and high tunneling current, the repeated scanning resulted in the growth of nanostripes. The stripe orientation, the stripe width, and the spacer width between adjacent nanostripes were found to be dependent on their relative locations from dislocation points where two adjacent gold terraces overlap. The stripe and the spacer width also vary with the distance from these points. The results indicate that such stripes may reflect the strain distributions and the release pathway along the Au surfaces. The results also suggest that the presence of HS-ssDNA molecules enhances the lithography processes on the gold surface by acting as force transmitters.     

Interference-induced enhancement of intensity and energy of a quantum optical field by a subwavelength array of coherent light sources

Recently, we have shown a mechanism that could provide great resonant and nonresonant transmission enhancements of the classical (nonquantum) light waves passed through subwavelength aperture arrays in thin metal films not by the plasmon–polariton waves, but by the constructive interference of diffracted waves (beams generated by the apertures) at the detector placed in the far-field zone. We now present a quantum reformulation of the model. The Hamiltonian describing the phenomenon of interference-induced enhancement and suppression of both the intensity and energy of a quantum optical field is derived. The basic properties of the field energy determining by the Hamiltonian are analyzed. Normally, the interference (addition) of two or more waves causes enhancement or suppression of the light intensity, but not the light energy. The model shows that the phenomenon could be observed experimentally, for instance, by using a subwavelength array of the coherent quantum light-sources (one- and two-dimensional subwavelength apertures, fibers, dipoles, and atoms).     

Fs-Laser structuring of ridge waveguides

Thin films made by PLD from Er:ZBLAN and Nd:Gd₃Ga₅O₁₂ are micro machined to form optical wave guiding structures using Ti:sapphire and Yb:glass fiber laser radiation. For the manufacturing of the ridge waveguides grooves are structured by ablation using femtosecond laser radiation. The fluence, the scanning velocity, the repetition rate, and the orientation of the polarization with respect to the scanning direction are varied. The resulting structures are characterized using optical microscopy and scanning electron microscopy. Damping and absorption coefficients of the waveguides are determined by observing the light scattered from the waveguides due to droplets in the thin films and the surface roughness of the structured edges. To discriminate between damping due to droplets and the structured edges, damping measurements in the non-structured films and the structured waveguides are performed. Ridge waveguides with non-resonant damping losses smaller than 3 dB/cm are achieved. Due to the high repetition rate of the Yb:glass fiber laser, the manufacturing time for one waveguide has been decreased by a factor of more than 100 compared to earlier results achieved with the Ti:sapphire laser.     

Replication of mold for UV-nanoimprint lithography using AAO membrane

A simple and highly effective method to the replication of soft mold based on the anodic aluminum oxide (AAO) membrane was developed. The soft mold with nanopillar arrays was composed of the toluene diluted PDMS layer supported by the soft PDMS. A water contact angle as high as 114° was achieved. The hexagonally well-order arrays of holes of nanometer dimensions, ∼100 nm pore diameter and 125 nm center-to-center pore, could be gained over large areas by UV-nanoimprint lithography (UV-NIL) with the replicated soft PDMS mold. It is expected that the developed soft mold would find applications in light emitting diodes devices.     

Theoretical and experimental investigation of the near field under?ordered silica spheres on substrate

Investigation on the optical resonance and near field effects of a 2D periodic dielectric spheres on metallic surfaces by combining theoretical calculations with experimental studies were carried out. The light scattering and coupling was numerically studied. Nanostructures were fabricated on the metallic surfaces using these arrays of micro- and nano-spheres with a single laser pulse (KrF, λ=248 nm). The occurrence of such nanostructures is well explained by the theoretical calculations. The results can be useful in investigation and development of spheres-assisted nano-patterning.     

Thiolated polyethylene oxide as a non-fouling element for nano-patterned bio-devices

This work describes the synthesis of a thiolated polyethylene oxide that self-assembles on gold to create a non-fouling surface. Thiolated polyethylene oxide was synthesised by reacting 16-mercaptohexadecanoic acid with polyethylene glycol mono methyl ether. The coverage of the thiolated polyethylene oxide on gold was studied by cyclic voltammetry, and the modified surfaces were characterised by X-ray photoelectron spectroscopy and ellipsometry. Protein resistance was assessed using quartz crystal microbalance. Results showed a non-fouling character produced by the thiolated polyethylene oxide. The synthesised product was used as the passivation layer on nano-patterned surfaces consisting of arrayed nano-spots, fabricated by plasma based colloidal lithography. The specific adsorption of anti-bovine serum albumin in the mercaptohexadecanoic acid spots was verified by atomic force microscopy.     

Positioning of cationic silver nanoparticle by using AFM lithography and electrostatic interaction

One-dimensional metal lines of silver nanoparticles with a nano-sized width were generated onto silicon surface by using a nano-level lithography technique, field induced oxidation (FIO) by AFM, on self-assembled monolayer-modified Si wafers. This FIO technique provided SiO₂ lines a width of less than 100 nm. Short-time immersion of partially anodized silicon surface which is covered by a cationic silanol surfactant ((CH₃O)₃SiCH₂CH₂CH₂N(CH₃)₃⁺Cl⁻)-monolayer into quaternary ammonium (HSCH₂CH₂N(CH₃)₃⁺Br⁻)-covered silver nanoparticles readily and reproducibly gave nano-metal lines of silver onto silicon wafers. Hydrophilicity of the whole wafer surface was indispensable for homogeneously wetting the anodized SiO₂ area with a nanodimensional width.     

Nanostructures fabricated on metal surfaces assisted by laser with optical near-field effects

Nanostructures on metal film surfaces have been written directly using a pulsed ultraviolet laser. The optical near-field effects of the laser were investigated. Spherical silica particles (500–1000 nm in diameter) were placed on metal films. After laser illumination with a single laser shot, nanoholes were obtained at the original position of the particles. The mechanism for the formation of the nanostructure patterns was investigated and found to be the near-field optical resonance effect induced by the particles on the surface. The size of the nanohole was studied as a function of laser fluence and silica particle size. The experimental results show a good agreement with those of the relevant theoretical calculations of the near-field light intensity distribution. The method of particle-enhanced laser irradiation allows the study of field enhancement effects as well as its potentialapplications for nanolithography. Received: 10 December 2002 / Accepted: 20 January 2003 / Published online: 28 May 2003 RID="*" ID="*"Corresponding author. Fax: +65-777/1349, E-mail: HUANG_Sumei@dsi.a-star.edu.sg     

Extreme-ultraviolet harmonic generation near 13 nm with a two-color elliptically polarized laser field

Theoretical results for high-harmonic generation by a two-color elliptically polarized laser field are presented. Special emphasis is placed on coherent radiation near 13 nm in connection with the development of extreme-ultraviolet lithography. Linearly polarized radiation at this wavelength can be obtained with a linearly polarized bichromatic laser field, whereas circularly polarized radiation can be generated with a bichromatic circularly polarized field with counterrotating coplanar components. In both cases the harmonic emission efficiencies at the saturation intensity are more than 1 order of magnitude larger than for harmonic generation with a monochromatic linearly polarized field.     

Geometrical dependence of optical negative index meta-materials at 1.55 μm

We have studied the geometry dependency of fishnet-like negative refractive index meta-materials (NIMs), and developed a process to fabricate such NIMs using nanoimprint lithography (NIL) in a controlled way for it to achieve negative refractive index in the desired frequency range. As an example, we fabricated a fishnet structure with a minimum negative refractive index of −1.7 at 1560 nm, which was only 10 nm off the targeted wavelength of 1550 nm.     

Development of an optical parametric generator with pulsed dye amplification for high-resolution laser spectroscopy

An injection-seeded optical parametric generator (OPG), coupled with three pulsed dye amplification (PDA) stages, was shown to produce tunable, narrow linewidth laser radiation. The OPG was composed of a pair of beta barium borate (β-BBO) crystals and pumped by the third harmonic (355 nm) output of a seeded Nd:YAG laser. The OPG was injection-seeded at the idler wavelength (824 nm) using an external cavity diode laser (ECDL) with a mode-hop-free tuning range of 20 GHz. Using the PDA stages, the OPG output signal (624 nm) was amplified to 19 mJ/pulse, while maintaining a spectral linewidth of approximately 160 MHz at full-width-half-maximum (FWHM) which was within a factor of 2 of the Fourier limit. A system of lenses and apertures was used to minimize amplified spontaneous emission (ASE) in the PDA stages. Using the OPG/PDA system, two-photon laser-induced fluorescence measurements of atomic oxygen were performed by sum-frequency-mixing the 624-nm beam with the third harmonic output of the seeded Nd:YAG laser to generate approximately 1 mJ/pulse of ultraviolet radiation near 226 nm. Voigt line shapes were found to be in good agreement with oxygen atom spectra in atmospheric-pressure, laminar, counter-flow flames; the magnitude of Doppler and collisional broadening was approximately the same. The measured O-atom concentration profile was found to compare well with that calculated using an opposed-flow flame code.     

Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography

We present finite-difference time-domain (FDTD) analysis results of light absorption enhancement factor dependence on the profile shape of nano-gratings etched into the surfaces of metal-semiconductor-metal photodetector (MSM-PD) structures. The MSM-PDs patterned by nano-gratings are optimized geometrically, improving the light absorption near the design wavelength through plasmon-assisted electric field concentration effects. FDTD simulation results show about 50 times light absorption enhancement prediction for 850 nm light due to improved optical signal propagation through the nano-gratings in comparison with the conventional MSM-PD designs employing only a subwavelength aperture. We also report on the nano-grating profile shapes obtained typically in our experiments using focused ion-beam lithography and discuss the dependency of light absorption enhancement on the geometric parameters of nano-gratings inscribed into MSM-PDs.     

The atom pencil: serial writing in the sub-micrometre domain

The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4-pole atom-flux concentrator and impinges on to micron- and sub-micron-sized apertures. The aperture translates above a fixed substrate and enables the writing of sharp features with sizes down to 280 nm. We have investigated the writing and clogging properties of an atom pencil tip fabricated from silicon oxide pyramids perforated at the tip apex with a sub-micron aperture.     

Femtosecond-laser nanofabrication onto silicon surface with near-field localization generated by plasmon polaritons in gold nanoparticles with oblique irradiation

Nanohole fabrication process with gold nanoparticles irradiated by femtosecond laser at different incident angles is investigated. Nanoparticles with diameter of 200 nm and laser irradiation with center wavelength of 800 nm are used in the present study. The analysis of the electromagnetic field distribution in the near-field zone of the particle is made by simulations based on finite-differential time domain (FDTD) method. It is shown that when gold nanoparticle is irradiated by laser pulse surface plasmon excitation can be induced, and associated with it, high-intensity near field is produced in a limited area around the particle. It is found that the change of the irradiation conditions by means of irradiation from various incident directions gives a possibility of laser nanoprocessing with tunable characteristics. Our results show that enhanced optical intensity is able to be induced on the substrate surface regardless of incident direction of the laser due to the image charge interaction with the substrate. Furthermore, the use of p-polarized laser irradiation at a certain angle gives a minimum of the spatial dimensions of the enhanced zone on the substrate which is about two times smaller than that obtained at normal incidence.     

The control of near-field optics: imposing direction through coupling with off-resonant laser light

The well-known spatially distributed form of the near field, associated with a dipolar source, is usually unsuitable for effecting the excitation of a location-specific detector in the vicinity. It is of interest, therefore, to identify a means of producing a much more greatly directed character to such a near field, imposing features that are more commonly associated with longer-range, wave-zone electromagnetic propagation. In this paper, it is shown that nonlinear optical coupling with off-resonant, throughput laser light can achieve this effect. Based on a quantum electrodynamical analysis it is shown that two mechanisms contribute; one requires both the source and detector to be irradiated by the throughput radiation, the other can operate with the source alone irradiated. The analysis leads to results identifying the dependence of each mechanism on the relative directions of the laser beam and the source–detector displacement. Contour maps of the ensuing near field, at the source emission frequency, exhibit a directionality that grows with the off-resonant beam intensity. The phenomenon affords a means of achieving optical control over the near-field distribution.     

Transmission of an obliquely incident beam of light through small apertures in a metal film

We recently found that the intensity of the electric near field of a triangular aperture in a metal film is strongly localized at one edge of the aperture for incident light polarized perpendicular to this edge. Previous numerical calculations of the near field of a triangular aperture in a planar metal film, using the field susceptibility technique, yielded a nearly quantitative agreement with the experiments. Using this numerical technique, we have investigated the influence of an obliquely incident plane wave on the near field of small circular and triangular apertures. An interpretation of the numerical results leads to a deeper understanding of the way in which light transmission through the aperture is excited. The data suggest that after excitation of currents in the metal film by the incident light, a scattering of these currents by the aperture generates the near field of the aperture. We found that the excitation of small apertures (size <100 nm) is due to a tangential magnetic field whereas the perpendicular electric field plays no role. The excitation of a small aperture can thus be described exclusively by a magnetic polarizability. We found that for thin metal films an interference of the scattered field with the field transmitted through the metal film changes the near field pattern. PACS 41.20.-q; 42.79.Ag; 68.37.Uv; 78.67.-n     

Systematic considerations for the patterning of photonic crystal devices by electron beam lithography

Photonic crystal devices with feature sizes of a few hundred nanometers are often fabricated by electron beam lithography. The proximity effect, stitching error and resist profiles have significant influence on the pattern quality, and therefore determine the optical properties of the devices. In this paper, detailed analyses and simple solutions to these problems are presented. The proximity effect is corrected by the introduction of a compensating dose. The influence of the stitching error is alleviated by replacing the original access waveguides with taper-added waveguides, and the taper parameters are also discussed to get the optimal choice. It is demonstrated experimentally that patterns exposed with different doses have almost the same edge-profiles in the resist for the same development time, and that optimized etching conditions can improve the wall angle of the holes in the substrate remarkably.