单晶硅表面均匀小尺寸金字塔制备及其特性研究

表面织构是一种通过有效的光俘获增加短路电流从而提高太阳电池效率的主要途径之一.在加入间隙式超声和NaClO添加剂的碱性四甲基氢氧化铵(TMAH)溶液中对单晶硅表面进行织构化处理,研究超声与NaClO在织构过程中对金字塔成核和生长的影响,以及金字塔大小对高温工艺之后的单晶硅少子寿命的影响.研究表明,通过在织构溶液中加入间隙式超声控制气泡停留在硅片表面的时间和脱离硅片表面速度,增强了小尺寸金字塔的均匀分布.织构之后硅片在AM1.5G光谱下的加权平均反射率能够达到12.4%,在高温扩散和氧化之后少子寿命的大小与金字塔大小之间存在近似于指数衰减函数的关系. 关键词： 表面织构化 反射率 少子寿命 单晶硅太阳电池     

低温退火磷吸杂工艺对低少子寿命铸造多晶硅电性能的影响

本文针对低少子寿命铸造多晶硅片进行试验, 通过一种将多温度梯度磷扩散吸杂工艺与低温退火工艺结合的新型低温退火吸杂工艺, 去除低少子寿命多晶硅片中影响其电性能的Fe杂质及部分晶体缺陷, 提高低少子寿命多晶硅所生产的太阳电池各项电性能. 通过低温退火磷扩散吸杂工艺与其他磷扩散吸杂工艺的比较, 证明了低温退火吸杂工艺具有更好的磷吸杂和修复晶体缺陷的作用. IV-measurement发现经过低温退火工艺处理后的低少子寿命多晶硅, 制备的太阳电池光电转换效率比其他实验组高0.2%, 表明该工艺能有效地提高低少子寿命多晶硅太阳电池各项电性能参数及电池质量. 本研究结果表明新型低温退火磷吸杂工艺可将低少子寿命硅片应用于大规模太阳电池生产中, 提高铸造多晶硅材料在太阳能领域的利用率, 节约铸造多晶硅的生产成本. 关键词： 低温退火 磷吸杂 低少子寿命多晶硅 太阳电池     

ZnS中电子陷阱能级对光生电子弛豫过程的影响

采用微波吸收法,测量了在不同助熔剂条件及不同气氛下烧制的ZnS材料受到超短激光脉冲激发后的光电子衰减过程,并且测量了材料的热释光曲线。样品A采用过量的SrCl作为助熔剂,在1150℃下灼烧制备而成;其热释光曲线显示材料中有浅电子陷阱,电子陷阱密度小,光生电子衰减过程为双指数衰减过程,快过程寿命为45ns,慢过程寿命为312ns。样品B中加入了少量的NaCl作为助熔剂;热释光曲线显示有浅电子陷阱和深电子陷阱,且都有较高的密度,其光电子寿命为1615ns。在NH₄Br气氛中烧制样品C,热释光谱显示只有浅电子陷阱形成,光电子寿命为1413ns。结果表明材料的光电子寿命和浅电子陷阱密切相关,浅电子陷阱密度越大,光生电子寿命越长,深电子陷阱对光生电子瞬态过程影响很小。     

硅片及其太阳电池的光衰规律研究

采用氙灯模拟太阳光源,将光强调至1000 W/m2,研究常规太阳能级单晶硅片、多晶硅片和物理提纯硅片的原片、去损减薄片、热氧化钝化片、双面镀氮化硅(SiN x:H)膜钝化片、碘酒钝化片以及太阳电池的光衰规律.利用WT-2000少子寿命测试仪以及太阳电池I-V特性测试仪分别对硅片的少子寿命和太阳电池的I-V特性参数随光照时间的变化进行了测试.结果表明:所有硅片以及太阳电池在光照的最初60 min内衰减很快随后衰减变慢,180 min之后光衰速率变得很小,几乎趋于零.     

微波反射光电导衰减法测少子寿命演示实验

采用微波反射光电导衰减法设计了测试少子寿命的演示实验装置.实验装置主要由脉冲激光源、微波发射接收和数据采集处理系统等部分组成.该实验可以直观地演示非平衡载流子随时间的衰减过程,定量给出少子寿命、扩散系数和扩散长度.     

GaAs/AlGaAs多量子阱中载流子动力学的实验研究

利用瞬态光栅激光光谱技术测量了(110)方向生长的本征GaAs/AlGaAs多量子阱的双极扩散系数.室温下,光激发的载流子浓度n_ex=3.4×10¹⁰/cm²时,测得双极扩散系数D_a=13.0 cm²/s,载流子的寿命τ_R=1.9 ns.改变光激发的载流子浓度(n_{ex关键词： 瞬态光栅 量子阱 空穴输运}     

稀土掺杂Gd2Te4O11亚碲酸盐荧光粉的合成及其发光性能

采用水热法制备了一系列稀土Dy³⁺,Tb³⁺,Eu³⁺掺杂的极性Gd₂Te₄O₁₁(GTO)亚碲酸盐荧光粉.对样品的物相结构、形貌和热稳定性等进行了表征,测试了样品的发光性能.结果显示,所制样品均为单相,呈短杆状形貌,尺寸在微米量级,热稳定性能良好.对于GTO:Dy³⁺荧光粉,在紫外光激发下的发光主要位于黄绿光区,获得最强发光强度的掺杂浓度为2.5%,色坐标为(0.39,0.43);荧光衰减曲线表明GTO:Dy³⁺样品发光寿命随着掺杂浓度增大逐渐减小,与Dy³⁺离子间的交叉弛豫有关.对于GTO:Eu³⁺荧光粉,在紫外光激发下的发光主要位于红光和橙红光区,其发射强度随着Eu³⁺掺杂浓度的增大而增强.当掺杂浓度为10%时,样品发光的色坐标为(0.62,0.38),位于橙红光区,且样品的发光寿命几乎不受掺杂浓度影响.对于GTO:Tb³⁺     

稀土离子Ce,Tb掺杂硼磷酸锶荧光粉的发光性质

采用高温固相法合成了2SrO·0.25B₂O₃·0.75P₂O₅:RE³⁺(RE=Ce,Tb)荧光粉。研究了其中Ce³⁺,Tb³⁺的光谱性质,Ce³⁺和Tb³⁺共掺杂时的能量传递效率,以及Ce³⁺和Tb³⁺的动力学过程。发现在共掺杂的样品中,Tb³⁺的⁵D₄→⁷F₅绿色发射比Tb³⁺单掺杂样品中的绿色发射有显著的提高。当Tb³⁺的含量从1%增加到8%时,Ce³⁺→Tb³⁺的能量传递效率逐渐增加至70%。通过动力学研究,在Ce³⁺和Tb³⁺共掺杂的样品中,提高Tb³⁺的浓度,Ce³⁺的寿命减小。此外,Ce³⁺离子寿命的倒数与Tb³⁺的浓度之间很好地符合线性函数关系,经过拟合Ce³⁺离子的电子跃迁速率和Ce³⁺→Tb³⁺的能量传递速率分别为5.1×10^-2和1.34ns^-1·mol^-1。Tb³⁺的⁵D₄→⁷F₅跃迁的衰减曲线很好地遵守指数式衰减,并且随着Ce³⁺的掺杂浓度提高,Tb³⁺的⁵D₄→⁷F₅寿命增加。结果表明在共掺杂的2SrO·0.25B₂O₃·0.75P₂O₅材料中存在Ce³⁺到Tb³⁺的有效能量传递,这种材料在541nm处有着较强的绿光发射,所以将在发光以及显示领域有潜在的应用前景。     

新型电子俘获型材料β-Sr2SiO4:Eu2+, La3+长余辉和光激励发光性能的研究

通过高温固相法在还原气体保护下制备出β-Sr₂SiO₄: Eu²⁺, La³⁺系列样品. 通过样品光谱显示, 光致发光、余辉及光激励发光中心均来自于Eu²⁺离子; 并且La³⁺ 的掺入有效增强光致发光、余辉及光激励发光强度. 热释光与余辉衰减测试证明, 与单掺Eu²⁺样品所具备的缺陷数量相比, 共掺La³⁺样品在浅陷阱区(T1区)较多的俘获中心数量是导致其余辉性能优化的主要因素; 其光激励发光强度的增强则归因于在深陷阱(T3区)的俘获中心数量增加. 共掺样品放置15h并在980nm红外激光激励后, 表现出光激励长余辉发光现象. 此现象的出现, 为电子俘获型材料的浅陷阱对深陷阱中的载流子再俘获过程的存在提供了直接证据. 因此, β-Sr₂ SiO₄: Eu²⁺, La³⁺ 材料可视为一种潜在的长余辉和光激励发光材料.     

势垒硅掺杂对GaN基LED极化电场及其光电性能的影响

势垒硅掺杂对InGaN量子阱中的电场及LED器件的光电性能有着重要的影响。采用6×6 K·P方法计算了不同势垒硅掺杂浓度对量子阱中电场的变化,研究表明当势垒硅掺杂浓度>1e¹⁸ cm^-3时,阱垒界面处的电场强度会变大,这主要是由于硅掺杂浓度过高导致量子阱中界面电荷的聚集。进一步发现随着势垒掺杂浓度的升高,总非辐射复合随之增加,其中俄歇复合增加,而肖克莱-霍尔-里德复合随之减少,这是由于点陷阱的增大形成了缺陷能级。电流电压曲线表明势垒掺杂可有效改善GaN基LED的工作电压,这归于掺杂浓度的提高改善了载流子的传输特性。当掺杂浓度为1e¹⁸ cm^-3时,获得了较高的内量子效率,这主要是由于适当的势垒掺杂降低了量子阱中界面电荷的损耗。     

CdZnTe平面探测器对低能X/γ射线的光谱响应

基于3片不同条件下生长的CdZnTe晶片制备出平面电极(Planar)探测器CZT1、CZT2及CZT3.分析室温下3个探测器在不同场强作用下对低能X/γ射线的光谱响应,并结合相应晶体材料的载流子迁移特性和掺杂剂的浓度以及存在状态,归纳影响探测器分辨率的原因.掺杂In浓度高的探测器CZT1,由于材料中存在的深能级缺陷Cd2+i,作为电子的俘获中心,影响了载流子的收集效率,进而降低了探测器的能量分辨率;掺杂In浓度低的探测器CZT2对不同能量X/γ射线均具有较好的能量分辨率;而Al掺杂探测器CZT3,由于Al间隙原子Ali的存在作为电子的散射中心,最终影响了收集效率及能量分辨率.     

步进扫描时间分辨光谱及其在太阳电池光电导上的应用

建立傅里叶变换步进扫描时间分辨光电导光谱，并研究太阳电池中与转换效率密切相关的少数载流子寿命.实验选取三种典型的硅太阳电池(单晶硅样品1、多晶硅样品2和多晶硅样品3 )，发现其瞬态光电导的上升和衰退曲线可以分别用两个简单的指数函数描述.由于有复合中心的参与，复合过程中少数载流子的寿命比产生过程中的寿命短.为验证实验结果的可靠性，采用了提取样品少数载流子的体寿命和计算其有效扩散长度两种方法.通过与太阳电池暗伏安特性和负载特性研究相结合，进一步分析和讨论了少数载流子寿命与短路电流、开路电压和转换效率的关系.同时探讨了步进扫描时间分辨光谱实验的其他用途. 关键词： 步进扫描 时间分辨 硅太阳电池 瞬态光电导     

Effects of phosphorus diffusion gettering on minority carrier lifetimes of single-crystalline,multi-crystalline and UMG silicon wafer

Phosphorus diffusion gettering, which can effectively reduce the transition-metal impurities in the bulk of Si wafer and enhance the minority carrier lifetime (MCLT), is a well-known process to improve the performances of solar cells. Especially, the appropriate gettering process is further required for manufacturing solar cells using an upgraded metallurgical-grade silicon (UMG Si) wafer. In this work, an improvement in the MCLT of the UMG Si wafer including the single-crystalline and multi-crystalline Si wafer after phosphorus diffusion gettering was confirmed by using the quasi-steady state photo-conductivity (QSSPC) measurement and the microwave photo-conductance decay (μW-PCD) method. The experimental results were compared with the MCLT variations calculated through the simulation of the Fe distributions in the Si wafers. It was also observed that the efficiency of the UMG Si solar cell increased by 0.53% due to the two-step gettering process.     

Improved control of the phosphorous surface concentration during in‐line diffusion of c‐Si solar cells by APCVD

Emitter formation for industrial crystalline silicon (c‐Si) solar cells is demonstrated by the deposition of phosphorous‐doped silicate glasses (PSG) on p‐type monocrystalline silicon wafers via in‐line atmospheric pressure chemical vapor deposition (APCVD) and subsequent thermal diffusion. Processed wafers with and without the PSG layers have been analysed by SIMS measurements to investigate the depth profiles of the resultant phosphorous emitters. Subsequently, complete solar cells were fabricated using the phosphorous emitters formed by doped silicate glasses to determine the impact of this high‐throughput doping method on cell performance. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Direct detection of carrier traps in Si solar cells after light‐induced degradation

In solar cells fabricated from boron‐doped Cz‐Si wafers minority and majority carrier traps were detected by deep level transient spectroscopy (DLTS) after so‐called “light‐induced degradation” (LID). The DLTS signals were detected from mesa‐diodes with the full structure of the solar cells preserved. Preliminary results indicate metastable traps with energy levels positioned at E_V + 0.37 eV and E_C – 0.41 eV and apparent carrier capture cross‐sections in the 10^–17–10^–18 cm² range. The concentration of the traps was in the range of 10¹²–10¹³ cm^–3. The traps were eliminated by annealing of the mesa‐diodes at 200 °C. No traps were detected in Ga‐doped solar cells after the LID procedure or below the light protected bus bar locations in B‐doped cells. (© 2015 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

21.63% industrial screen‐printed multicrystalline Si solar cell

In this paper, we demonstrate industrially feasible large‐area solar cells achieving energy conversion efficiency up to 21.63% on p‐type boron doped multicrystalline Si wafers. Advanced light trapping, passivation and hydrogenation technology are used to achieve excellent light absorption with very low surface recombination velocity. The bulk lifetime of the multi‐crystalline Si wafers used for the fabrication exceeds 500 μs after optimized gettering and hydrogenation processes. The high bulk lifetime and excellent surface passivation enable V_oc to exceed 670 mV. The metallization process is carried out by screen printing and firing in a conventional belt furnace. Detailed performance parameters and quantum efficiency of the cells will be illustrated in the paper. In addition, free energy loss analysis and cell simulation are also performed using the control parameters measured during cell fabrication processes.     

Low‐Temperature Saw Damage Gettering to Improve Minority Carrier Lifetime in Multicrystalline Silicon

The minority carrier lifetime in multicrystalline silicon ? a material used in the majority of today's manufactured solar cells ? is limited by defects within the material, including metallic impurities which are relatively mobile at low temperatures (≤700 °C). Addition of an optimised thermal process which can facilitate impurity diffusion to the saw damage at the wafer surfaces can result in permanent removal of the impurities when the saw damage is etched away. We demonstrate that this saw damage gettering is effective at 500 to 700 °C and, when combined with subsequent low‐temperature processing, lifetimes are improved by a factor of more than four relative to the as‐grown state. The simple method has the potential to be a low thermal budget process for the improvement of low‐lifetime “red zone” wafers.

     

Determination of diffusion length in photovoltaic crystalline silicon by modelisation of light beam induced current

The diffusion length of minority carriers is one of the most important electrical parameters to qualify silicon for photovoltaic applications. One way to evaluate this parameter is to analyse the decay of the current induced when a focused beam is scanned away from the collector using Light Beam Induced Current (LBIC) technique. The LBIC signal was numerically calculated with 2D-DESSIS software under different boundary conditions, as a function of material thickness and surface recombination velocity in order to verify the limitations of analytical models and to fit the LBIC signal measured in thin silicon samples. Samples with thickness ranging from 55 μm to 2500 μm were evaluated with diffusion length values ranging from 70 μm to 2.5 mm. Analytical expressions of the Internal Quantum Efficiency (IQE) were also used to extract the minority carrier bulk and effective diffusion lengths from surface averaged spectral response and reflectivity data in thick solar cells.     

银铜双原子MACE法可控制备倒金字塔多晶黑硅的结构与性能

采用一步银铜双原子金属辅助化学腐蚀法,室温下在多晶硅表面制备纳米陷光结构,再利用纳米结构修正溶液在温度为50℃时对硅片进行各向异性重构,可控制备出不同尺寸的倒金字塔陷光结构.用分光光度计测量了多晶硅表面的反射率,用扫描电镜观察了多晶硅表面形貌,用少子寿命测试仪测量了多晶硅钝化后的少子寿命.结果表明:影响倒金字塔结构尺寸的主要影响因素是制备态黑硅纳米结构的深度,当深度越深,最终形成的结构尺寸也越大;纳米结构修正溶液重构时间越长,所形成的倒金字塔结构尺寸越大,反射率也变大;经原子层沉积钝化后的倒金字塔结构中少子寿命随其尺寸的增大而增加;当倒金字塔边长为600nm时综合效果最佳,反射率为9.87%,少子寿命为37.82μs.