Morphological and optical properties of titanyl phthalocyanine films deposited by supersonic molecular beam epitaxy (SuMBE)

We studied the growth and properties of titanyl phthalocyanine (TiOPc) thin films made by supersonic molecular beam epitaxy (SuMBE). Interesting differences in the growth properties on amorphous (quartz) and crystalline (mica) substrates were found, indicating that SuMBE gives rise to an epitaxy of disc-like organic molecules on crystalline substrates. The combined control of the kinetic energy of the molecules in the supersonic beam specific to SuMBE and of the substrate temperature during deposition are the key parameters used to determine the final properties of the films. We show that SuMBE is a well-suited epitaxy method for the deposition of relatively large organic molecules, leading to layers of thin organic (single-)crystals with lateral dimensions in the micrometer range. By SuMBE we can control the growth of different polymorphs of TiOPc. We found and studied two ways to produce films of red and infrared absorbing phase II TiOPc, which is of interest for applications in organic solar cells.     

分子束外延制备的垂直易磁化MnAl薄膜结构和磁性

系统地研究了利用分子束外延方法在GaAs(001) 衬底上外延生长的MnAl_x薄膜的结构和垂直易磁化特性随组分及生长温度的依赖关系. 磁性测试表明, 可在较大组分范围内 (0.4≤x≤1.2) 获得大矫顽力的垂直易磁化MnAl_x薄膜, 然而同步辐射X射线衍射和磁性测试发现当x≤0.6时MnAl薄膜出现较多的软磁相, 当x >0.9时, MnAl薄膜晶体质量和化学有序度逐渐降低, 组分为MnAl_0.9时制备的薄膜有最好的[001]取向. 随着生长温度的增加, MnAl_0.9薄膜的有序度、垂直磁各向异性常数、矫顽力和剩磁比均增加, 350℃时制备的MnAl_0.9薄膜化学有序度高达0.9, 其磁化强度、剩磁比、矫顽力和垂直磁各向异性常数分别为265emu/cm³、93.3%、8.3kOe (1 Oe=79.5775A/m)和7.74Merg/cm³ (1 erg=10^-7J). 不含贵金属及稀土元素、良好的垂直易磁化性质、 与半导体材料结构良好的兼容性以及磁性能随不同生长条件的可调控 性使得MnAl薄膜有潜力应用于多种自旋电子学器件. 关键词： 分子束外延 大矫顽力材料 磁各向异性     

Evidence for the anomalous scaling behaviour of the molecular-beam epitaxy growth equation

According to the scaling idea of local slope, we investigate numerically and analytically anomalous dynamic scaling behaviour of (1+1)-dimensional growth equation for molecular-beam epitaxy. The growth model includes the linear molecular-beam epitaxy (LMBE) and the nonlinear Lai--Das Sarma--Villain (LDV) equations. The anomalous scaling exponents in both the LMBE and the LDV equations are obtained, respectively. Numerical results are consistent with the corresponding analytical predictions.     

Surface kinetics of GaN evaporation and growth by molecular-beam epitaxy

The kinetics of surface processes during the growth of GaN by molecular-beam epitaxy (MBE) with ammonia as the source of reactive nitrogen is studied theoretically and experimentally. A model of surface processes is developed taking into account specific effects of the blocking of NH₃ adsorption sites by Group III and Group V surface species. Parameters of the model (respective kinetic rate constants) are determined from comparison with experimental data. It is shown that the evaporation rate of GaN in ammonia atmosphere is much lower than that in vacuum. Kinetics of GaN growth under gallium-rich and nitrogen-rich conditions are compared. Under nitrogen-rich conditions the GaN surface is predicted to be enriched by NH_x surface radicals, in contrast to the case of growth under gallium-rich conditions or of free evaporation in vacuum. It is shown that use of the nitrogen-rich conditions allows one to increase the growth temperature by 80–90°C compared with the case of gallium-rich conditions or plasma-activated MBE. The increased growth temperature is favorable in improving the optical and electrical properties of the material grown.     

Growth of GaAs nanostructures by area selective epitaxy by migration-enhanced epitaxy

We have carried out area selective epitaxial growth of GaAs nanostructures using solid source molecular-beam epitaxy (MBE) which makes it possible to achieve ‘damage-free’ structures. However, area selective epitaxy by MBE is very difficult unless the substrate temperature is very high. This problem has been solved by using migration-enhanced epitaxy (MEE) deposition sequence. To achieve well-defined nanostructures, lateral growth beyond the SiO₂ mask boundaries has to be strictly prohibited. By MEE method, uniform two-dimensional lattice structures with vertical sidewalls can be fabricated without shrinking holes, even though the mask diameter is as small as 30 nm with a dot density as high as 5.0×10⁹ cm⁻². Also uniform one-dimensional channel structures have been successfully grown.     

高质量宽带隙立方氮化硼薄膜的研究进展

文章着重介绍了最近研制出的高质量宽带隙立方氮化硼薄膜的三种制备方法和结构特性 :(1)用射频溅射法在Si衬底上制备出立方相含量在 90 %以上 ,Eg>6 .0eV的c-BN薄膜 ;(2 )用离子束辅助的化学气相沉积法(CVD) ,在金刚石上外延生长出立方含量达 10 0 %的单晶c -BN薄膜 ;(3)用微波电子回旋共振CVD法 (MW -ECR-CVD)在金刚石上外延生长出高纯c-BN薄膜 .这些高纯c -BN薄膜 ,可应用于制作各种半导体 (主要是高温、高频大功率 )电子器件 .     

An STM study of molecular-beam epitaxy growth of GaAs

Scanning tunneling microscopy has been used to investigate molecular-beam epitaxy growth of GaAs. By quenching the sample during deposition, we have imaged the GaAs(001) surface as it appeared during growth. Large scale images of the surface have been obtained at coverages varying from 0.25 to 1500 layers.     

Effect of growth conditions on photoluminescence of erbium-doped silicon layers grown using sublimation molecular-beam epitaxy

Erbium-doped epitaxial silicon layers were grown using two different growth techniques, namely, commonly used molecular-beam epitaxy (MBE) and solid-phase epitaxy (SPE). It is shown that an erbium-doped silicon epitaxial layer deposited through SPE on a cold substrate and subsequently annealed displays amore intense photoluminescence at a wavelength of 1.54 μm than do MBE-grown layers. __________ Translated from Fizika Tverdogo Tela, Vol. 46, No. 1, 2004, pp. 102–104. Original Russian Text Copyright ? 2004 by Shengurov, Svetlov, Chalkov, Andreev, Krasil’nik, Kryzhkov.     

Thickness uniformity of silicon layers grown from a sublimation source by molecular-beam epitaxy

The thickness distributions of epitaxial layers over the substrate area are experimentally and theoretically studied for deposition from a molecular beam formed by a sublimation source in vacuum. The calculated data agree well with the experimental results for the molecular-beam epitaxy of silicon.     

Comparison of resonant tunneling diodes grown on freestanding GaN substrates and sapphire substrates by plasma-assisted molecular-beam epitaxy

AlN/GaN resonant tunneling diodes (RTDs) were grown separately on freestanding GaN (FS-GaN) substrates and sapphire substrates by plasma-assisted molecular-beam epitaxy (PA-MBE). Room temperature negative differential resistance (NDR) was obtained under forward bias for the RTDs grown on FS-GaN substrates, with the peak current densities (J_p) of 175-700 kA/cm² and peak-to-valley current ratios (PVCRs) of 1.01-1.21. Two resonant peaks were also observed for some RTDs at room temperature. The effects of two types of substrates on epitaxy quality and device performance of GaN-based RTDs were firstly investigated systematically, showing that lower dislocation densities, flatter surface morphology, and steeper heterogeneous interfaces were the key factors to achieving NDR for RTDs.     

Photoluminescence of Si/Ge nanostructures grown by molecular-beam epitaxy at low temperatures

Multilayer Si/Ge nanostructures grown by molecular-beam epitaxy at low temperatures (250–300°C) of germanium deposition are studied using photoluminescence and atomic-force microscopy (AFM). It is assumed that, upon low-temperature epitaxy, the wetting layer is formed through the intergrowth of two-dimensional (2D) and three-dimensional (3D) nanoislands.     

Formation of self-assembled InGaAsN/GaP quantum dots by molecular-beam epitaxy

We have grown self-assembled InGaAsN/GaP quantum dots (QDs) with an In composition of 50% via the Stranski–Krastanov growth mode of molecular-beam epitaxy, obtaining high-density InGaAsN islands of 8×10¹⁰ cm⁻². When the InGaAsN islands are directly exposed to the P₂ beam, we observe a quantum-well-like hetero-interface using cross-sectional transmission electron microscopy (XTEM). This result indicates that the InGaAsN island density is remarkably reduced by As/P exchange reactions. To suppress these exchange reactions, we deposit Ga corresponding to 1 monolayer on the InGaAsN islands. When the Ga deposition sequence is finished, we use XTEM to detect InGaAsN islands embedded in GaP, which indicates that As/P exchange reactions can be suppressed by Ga deposition. Subsequently, we grow a multiple-stacked InGaAsN/GaP 5QDs using the Ga deposition sequence and report their room-temperature photoluminescence spectra.     

低温InGaAs/InAlAs多量子阱的分子束外延生长与表征

采用气源分子束外延(GSMBE)生长了低温InGaAs材料,研究了生长温度及As压对InGaAs材料性质的影响,得到优化的生长条件为:生长温度为300 ℃、As压为77.3 kPa。通过Be掺杂,并采用In0.52Al0.48As/In0.53Ga0.47As多量子阱结构,将材料的方块电阻提高到1.632106 /Sq,载流子数密度降低至1.0581014 cm-3。X射线衍射结果表明:InGaAs多量子阱材料具有较高的晶体质量。这种Be掺杂InGaAs多量子阱材料缺陷密度大且电阻率高,是制作太赫兹光电导天线较理想的基质材料。收稿日期:; 修订日期:     

High-temperature photoluminescence of CdHgTe solid solutions grown by molecular-beam epitaxy

The spectra of the high-temperature (up to 300 K) photoluminescence of the heteroepitaxial structures based on the CdHgTe solid solutions that are grown using molecular-beam epitaxy and emit at room temperature in the wavelength interval λ = 1.5–4.3 μm are analyzed. It is demonstrated that the observed photoluminescence of the CdHgTe narrow-gap semiconductor at high temperatures and the specific features of the high-temperature spectra can be interpreted using the disorder of the solid solution as in the case of the solid solutions of the group-III nitrides.     

垂直磁各向异性L10-Mn1.67Ga超薄膜分子束外延生长与磁性研究

具有超强垂直磁各向异性的L1₀-Mn_xGa薄膜由于其与半导体材料结构及工艺的高度兼容性而受到广泛关注, 其超高垂直磁各向异性能和极低的磁阻尼因子预示着L1₀-Mn_xGa薄膜在高热稳定性自旋电子学器件中将发挥重要作用. 而L1₀-Mn_xGa超薄膜对于降低L1₀-Mn_xGa基垂直磁各向异性隧道结中的磁矩翻转临界电流密度有着重要的意义. 本文采用分子束外延的方法, 在半导体GaAs衬底上成功制备出了一系列不同厚度的L1₀-Mn_1.67Ga薄膜, 厚度范围为1-5 nm. 生长过程中反射式高能电子衍射原位检测以及X射线衍射结果均表明了其良好的单晶相. 磁性测量结果表明, 厚度在1 nm以上的L1₀-Mn_1.67Ga薄膜均可以保持垂直磁各向异性特征, 厚度为5 nm的L1₀-Mn_1.67Ga薄膜的垂直磁各向异性能可达到14.7 Merg/cm³. 这些结果为基于L1₀-Mn_1.67Ga的垂直磁各向异性隧道结在自旋转移扭矩驱动的磁随机存储器等低功耗器件的集成及应用提供了重要的实验支持.     

Scaling behavior of the time-fractional equations for molecular-beam epitaxy growth: scaling analysis versus numerical stimulations

The scaling behavior of the time-fractional molecular-beam epitaxy (TFMBE) equations in 1+1 dimensions is investigated by numerical simulations and scaling analysis, respectively. The growth equations studied include the time-fractional linear molecular-beam epitaxy (TFLMBE) and the time-fractional Lai-Das Sarma-Villain (TFLDV). Growth exponents are obtained using the two methods. The analytical results are consistent with the corresponding numerical solutions based on Caputo-type fractional derivative.     

Grazing‐incidence X‐ray diffraction study of rubrene epitaxial thin films

The growth of organic semiconductors as thin films with good and controlled electrical performances is nowadays one of the main tasks in the field of organic semiconductor‐based electronic devices. In particular it is often required to grow highly crystalline and precisely oriented thin films. Here, thanks to grazing‐incidence X‐ray diffraction measurements carried out at the ELETTRA synchrotron facility, it is shown that rubrene thin films deposited by organic molecular beam epitaxy on the surface of tetracene single crystals have the structure of the known orthorhombic polymorph, with the (2 0 0) plane parallel to the substrate surface. Moreover, the exact epitaxial relationship between the film and the substrate crystalline structures is determined, demonstrating the presence of a unique in‐plane orientation of the overlayer.     

Self-organization of germanium nanoislands obtained in silicon by molecular-beam epitaxy

Nanometer germanium islands in epitaxial layers of silicon are obtained by molecular-beam epitaxy. The dimensions and shapes of the islands are determined in an atomic-force microscope. The photoluminescence spectra are found to contain lines that can be interpreted as quasidirect optical transitions in the islands. It is concluded on the basis of optical and microprobe measurements and theoretical calculations of the energies of electronic states that silicon is dissolved in the germanium islands. Values of the germanium and silicon contents in the solid solution are presented. Pis’ma Zh. éksp. Teor. Fiz. 67, No. 1, 46–50 (10 January 1998)     

Si(001)衬底上分子束外延生长Ge0.975Sn0.025合金薄膜

使用低、高温两步法生长的高质量Ge薄膜作为缓冲层,在Si(001)衬底上采用分子束外延法生长出Ge_0.975Sn_0.025合金薄膜.X射线双晶衍射和卢瑟福背散射谱等测试结果表明,Ge_0.975Sn_0.025合金薄膜具有很好的晶体质量,并且没有发生Sn表面分凝.另外,Ge_0.975Sn_0.025合金薄膜在500 ℃下具有很好的热稳定性,有望在Si基光电器件中得到应用. 关键词： GeSn Ge 分子束外延 外延生长     

Effect of interaction in the Ga–As–O system on the morphology of a GaAs surface during molecular-beam epitaxy

A thermodynamic analysis of processes of interphase interaction in the Ga–As–O system has been performed and their theoretical laws have been determined, taking into account nonlinear thermal physical properties of the compounds, the oxide film compositions, and modes of molecular-beam epitaxy of GaAs. The processes of interaction of the native oxide of GaAs with the substrate material and also with Ga and As₄ from a vapor gaseous phase have been studied experimentally. The experimental results correlate with the results of the thermodynamic analysis. The laws of influence of the removal of the proper oxide on the evolution of the GaAs surface morphology under conditions of the molecular-beam epitaxy have been proposed.