Alloy formation of Co/Ni/Pt(1 1 1)

The initial growth and alloy formation of ultrathin Co films deposited on 1 ML Ni/Pt(1 1 1) were investigated by Auger electron spectroscopy (AES), low energy electron diffraction (LEED), and ultraviolet photoelectron spectroscopy (UPS). A sequence of samples of d_Co Co/1 ML Ni/Pt(1 1 1) (d_Co = 1, 2, and 3 ML) were prepared at room temperature, and then heated up to investigate the diffusion process. The Co and Ni atoms intermix at lower annealing temperature, and Co-Ni intermixing layer diffuses into the Pt substrate to form Ni-Co-Pt alloys at higher annealing temperature. The diffusion temperatures are Co coverage dependent. The evolution of UPS with annealing temperatures also shows the formation of surface alloys. Some interesting LEED patterns of 1 ML Co/1 ML Ni/Pt(1 1 1) show the formation of ordered alloys at different annealing temperature ranges. Further studies in the Curie temperature and concentration analysis, show that the ordered alloys corresponding to different LEED patterns are Ni_xCo_1−xPt and Ni_xCo_1−xPt₃. The relationship between the interface structure and magnetic properties was investigated.     

Carbon monoxide adsorption on Co deposited Pt(1 0 0)-hex: IRRAS and LEED investigations

Infrared reflection absorption spectroscopy (IRRAS) was used to investigate carbon monoxide (CO) adsorption on Pt(1 0 0) surfaces deposited with Co layers with different thicknesses. Pt(1 0 0) surfaces cleaned in ultrahigh vacuum showed surface reconstruction, i.e., Pt(1 0 0)-hex: two absorption bands ascribable to adsorbed CO on the 1 × 1 surface and hex domains emerge at 2086 and 2074 cm⁻¹, respectively, after 1.0 L CO exposure. Deposition of a 0.3-nm-thick-Co layer on Pt(1 0 0)-hex at 333 K changes the low-energy electron diffraction (LEED) pattern from hex to p(1 × 1), indicating that the deposited Co lifts the reconstruction. The IRRAS spectrum for 1.0-L-CO-exposed Co_0.3 nm/Pt(1 0 0)-hex fabricated at 333 K yields a single absorption band at 2059 cm⁻¹. For Co_0.3 nm/Pt(1 0 0)-hex fabricated at 693 K, the LEED pattern shows a less-contrasted hex and the pattern remains nearly unchanged even after CO exposure of 11 L, although only 1.0 L CO exposure to Pt(1 0 0)-hex lifts the surface reconstruction. A Co_0.3 nm/Pt(1 0 0)-hex surface fabricated at 753 K exhibits an absorption band at 2077 cm⁻¹, which is considered to originate from CO adsorbed on the Pt-enriched surface alloy. Co_0.3 nm/Pt(1 0 0)-hex surfaces fabricated above 773 K show a clear hex-reconstructed LEED pattern, and the frequencies of the adsorbed CO bands are comparable to those of Pt(1 0 0)-hex, indicating that the deposited Co atoms are diffused near the surface region. The outermost surface of the 3.0-nm-thick-Co-deposited Pt(1 0 0)-hex is composed of Pt-Co alloy domains even at a deposition temperature of 873 K. Based on the LEED and IRRAS results, the outermost surface structures of Co_x/Pt(1 0 0)-hex are discussed.     

Oxygen adsorption on ultrathin Co/Ir(1 1 1) films: Compositional anomaly

Adsorption of oxygen on ultrathin Co/Ir(1 1 1) films thinner than 4 monolayers in an ultrahigh vacuum environment was studied. For oxygen adsorption on cobalt films, the complex adsorption kinetics emerges partly due to the incorporation of oxygen. The amount of oxygen adsorbed at the surfaces is higher than that incorporated into the film as revealed from sputter profiling measurements. At room temperature the CoO layer exhibits paramagnetism and could not contribute to the remanent Kerr intensity. As oxygen exposure increases, the reduction of the Kerr intensity is due to the reduction of the effective layer for the magnetic measurements. Compared with oxygen saturated cobalt films, the concentration of adsorbed oxygen per Co atom shows an oscillatory behavior. A compositional anomaly of a great amount of adsorbed oxygen in submonolayer Co coverage occurs because of the maximized number of adsorption and incorporation sites for oxygen on the surface. A larger charge transfer between Co and oxygen was observed for thinner Co overlayers as revealed from the larger chemical shifts of Auger lines.     

Growth and oxidation of a Ni3Al alloy on Ni(1 0 0)

The growth and oxidation of a thin film of Ni₃Al grown on Ni(1 0 0) were studied using Auger electron spectroscopy (AES), low energy electron diffraction (LEED), and high resolution electron energy loss spectroscopy (EELS). At 300 K, a 12 Å thick layer of aluminium was deposited on a Ni(1 0 0) surface and subsequently annealed to 1150 K resulting in a thin film of Ni₃Al which grows with the (1 0 0) plane parallel to the (1 0 0) surface of the substrate. Oxidation at 300 K of Ni₃Al/Ni(1 0 0) until saturation leads to the growth of an aluminium oxide layer consisting of different alumina phases. By annealing up to 1000 K, a well ordered film of the Al₂O₃ film is formed which exhibits in the EEL spectra Fuchs-Kliewer phonons at 420, 640 and 880 cm⁻¹. The LEED pattern of the oxide shows a twelvefold ring structure. This LEED pattern is explained by two domains with hexagonal structure which are rotated by 90° with respect to each other. The lattice constant of the hexagonal structure amounts to ∼2.87 Å. The EELS data and the LEED pattern suggest that the γ^′-Al₂O₃ phase is formed which grows with the (1 1 1) plane parallel to the Ni(1 0 0) surface.     

Observation of a (√3 × √3)-R30° reconstruction on GaN(0 0 0 1) by RHEED and LEED

A new reconstruction of √3 × √3-R30° has been observed on a GaN film grown on a 6H-SiC (0 0 0 1)-√3 × √3 surface using RHEED and LEED experimental techniques. The experimental LEED PF shows that the GaN film is Ga-terminated hexagonal. The surface is a mixture of two structures with a single bilayer height difference between them. One is a √3 × √3-R30° reconstruction with Ga-adatoms occupying the T4 sites. Another is a Ga-terminated 1 × 1 with no extra Ga on top. The area ratio of the √3 × √3 part to the 1 × 1 part is slightly larger than 1. The first principle total energy calculations and Tensor-LEED I-V curves simulations further confirm this structure model.     

Adatom and dimer migration in heteroepitaxy: Co/Pt(1 1 1)

By means of tight-binding molecular-dynamics simulations, Co adatom and dimer migration on a Pt(1 1 1) surface is investigated. Combining static and dynamic calculations, activation energies associated to these processes are determined. Since the size mismatch between Co and Pt is large, the presented simulations provide an illustration of the way in which growth can be affected by size effects in heteroepitaxy. In particular an increase of the mobility is found for Co dimers (heteroepitaxy) relatively to Pt ones (homoepitaxy).     

Mechanism of two-dimensional chiral growth of 6,13-pentacenequinone thin films on Si(1 1 1)

Thin film growth of 6,13-pentacenequinone (C₂₄H₁₂O₂, PnQ) on Si(1 1 1)-7 × 7 at room temperature (RT) was studied by low-energy electron microscopy (LEEM) and ab initio density functional theory (DFT) calculations. Our experiments yielded direct microscopic observation of enantiomorphic evolution mechanism in the initial stage of the chiral-like growth of PnQ islands, under kinetic growth conditions. We observed that the faster growth direction aligns with the direction of easier molecule incorporation, or lowest kink formation energy, rather than along the lowest energy step. Real time observation of the growth and subsequent relaxation of island shape revealed that kinetically stiff direction differs from the thermodynamic one. This feature together with anisotropic mass incorporation determines the enantiomorphic evolution and rotational arrangement of crystallites during the growth of elongated organic molecules, like PnQ.     

Growth of epitaxial thin Pd(1 1 1) films on Pt(1 1 1) and oxygen-terminated FeO(1 1 1) surfaces

Thin Pd films (1-10 monolayers, ML) were deposited at 35 K on a Pt(1 1 1) single crystal and on an oxygen-terminated FeO(1 1 1) monolayer supported on Pt(1 1 1). Low energy electron diffraction, Auger electron spectroscopy, and Kr and CO temperature programmed desorption techniques were used to investigate the annealing induced changes in the film surface morphology. For growth on Pt(1 1 1), the films order upon annealing to 500 K and form epitaxial Pd(1 1 1). Further annealing above 900 K results in Pd diffusion into the Pt(1 1 1) bulk and Pt-Pd alloy formation. Chemisorption of CO shows that even the first ordered monolayer of Pd on Pt(1 1 1) has adsorption properties identical to bulk Pd(1 1 1). Similar experiments conducted on FeO(1 1 1) indicate that 500 K annealing of a 10 ML thick Pd deposit also yields ordered Pd(1 1 1). In contrast, annealing of 1 and 3 ML thick Pd films did not result in formation of continuous Pd(1 1 1). We speculate that for these thinner films Pd diffuses underneath the FeO(1 1 1).     

Surface composition and structure of palladium ultra-thin films deposited on Ni(1 1 1)

Ultra-thin palladium films deposited on the Ni(1 1 1) surface were characterized by X-ray photoelectron spectroscopy (XPS), low-energy electron diffraction (LEED) and X-ray photoelectron diffraction (XPD). For low coverage, LEED shows a (1 × 1) pattern similar to that of the substrate. For intermediate coverage, the LEED pattern displays extra spots around the main (1 × 1) spots, resembling a Moiré coincidence pattern, probably associated with the formation of Pd bi-dimensional islands oriented in different directions on the Ni(1 1 1) surface. The results obtained by XPS and XPD corroborate this finding. The LEED pattern displays this structure up to 500 °C. Annealing at 650 °C brings back the (1 × 1) pattern, which is associated with a Pd island coalescence and alloy formation by Pd diffusion in the first atomic layers of the Ni(1 1 1). In this paper we present a detailed study of this surface structure via a comparison between XPD experiment and theory.     

Growth of Co nanoparticles on a nanostructured θ-Al2O3 film on CoAl(1 0 0)

We have investigated the growth of Co nanoparticles on θ-Al₂O₃/CoAl(1 0 0) by means of Auger electron spectroscopy (AES), high-resolution electron energy loss spectroscopy (EELS), low energy electron diffraction (LEED) and scanning tunneling microscopy (STM). Due to Volmer-Weber growth, Co forms particles with a mean diameter of approximately 2.5 nm and height of 0.8 nm. Even on the entirely covered oxide, there is no Ostwald ripening and Co particles stay structurally isolated. The nanoparticles exhibit a small size distribution and tend to form chains, as predetermined by the streak structure of the oxide template. For sufficient high coverages Co-core-CoO-shell nanoparticles may be evidenced, which is explained as a result of surfactant oxygen. The nanostructured particles may open the door to numerous applications, such as in catalysis and magnetoelectronic applications, where large areas of ordered nanodots are desired.     

Epitaxial C60 thin films on Bi(0 0 0 1)

We have used the Bi(0 0 0 1)/Si(1 1 1) template to grow highly ordered C₆₀ epitaxial thin films and analyzed them using scanning tunneling microscopy and low-energy electron microscopy. The in situ low-energy electron microscope investigations show that the initial nucleation of the C₆₀ islands on the surface takes place at surface defects, such as domain boundaries and multiple steps. The in-plane lattice parameters of this C₆₀ film turns out to be the same as that of the bulk fcc(1 1 1) C₆₀. The line-on-line epitaxial structure is realized in spite of a weak interaction between the C₆₀ molecules and Bi(0 0 0 1) surface, while scanning tunneling spectroscopy indicates that there is a negligible charge transfer between the molecules and the surface.     

Growth and morphology of Cobalt thin films on Pd(1 1 1)

We report on the growth of thin Co films on Pd(1 1 1) at three different temperatures 180 K, 300 K, and 550 K. The structure and morphology was determined by scanning tunneling microscopy and low energy electron diffraction. The growth mode was found to vary with temperature. For 180 K and 300 K, we observed a tendency to double layer growth for the initial layers while at elevated temperatures, the initial film grows in single layer. For most conditions, non-ideal three-dimensional growth was observed. Two-dimensional growth was only found for growth temperature of 550 K and coverages above 5 ML. Depending on temperature, the Co islands at low coverages exhibit three principally different shapes: dendritic at 180 K, hexagonal at 300 K and triangular at 550 K. For growth at 550 K and coverages above 5 ML, the islands changed to an irregular shape. This transition is most likely responsible for the transition to 2D growth. Further, the large strain is relaxed by the creation of a dislocation network with mixed fcc and hcp stacking. Depending on the temperature and coverage, a hexagonal or a triangular network was observed. Finally, we have investigated the effect of annealing Co films prepared at 180 K and 300 K. Heating to 490 K leads to coarsening and intermixing.     

Initial growth of platinum on oxygen-covered Ni(1 1 0) surfaces

The initial growth of Pt on the Ni(1 1 0)-(3 × 1)-O and NiO(1 1 0) surfaces has been studied by coaxial impact collision ion scattering spectroscopy (CAICISS), low energy electron diffraction (LEED) and X-ray photoelectron spectroscopy (XPS). Prior to Pt deposition, the atomic structure of the near-surface regions of the Ni(1 1 0)-(3 × 1)-O and NiO(1 1 0) structures were studied using CAICISS, finding changes to the interlayer spacings due to the adsorption of oxygen. Deposition of Pt on the Ni(1 1 0)-(3 × 1)-O surface led to a random substitutional alloy in the near-surface region at Pt coverages both below and in excess of 1 ML. In contrast, when the surface was treated with 1800 L of atomic oxygen in order to form a NiO(1 1 0) surface, a thin Pt layer was formed upon room temperature Pt deposition. XPS and LEED data are presented throughout to support the CAICISS observations.     

Adsorption and reaction of bicyclic hydrocarbons at Pt(1 1 1) and Sn/Pt(1 1 1) surface alloys: trans-decahydronaphthalene (C10H18) and bicyclohexane (C12H22)

Adsorption and desorption of trans-decahydronaphthalene (C₁₀H₁₈) and bicyclohexane (C₁₂H₂₂) can be used to probe important aspects of non-specific dehydrogenation leading to surface carbon accumulation and establish better estimates of activation energies for C-H bond cleavage at Pt-Sn alloys. This chemistry was studied on Pt(1 1 1) and the (2 × 2)-Sn/Pt(1 1 1) and (√3 × √3)R30°-Sn/Pt(1 1 1) surface alloys by using temperature programmed desorption (TPD) mass spectroscopy and Auger electron spectroscopy (AES). These hydrocarbons are reactive on Pt(1 1 1) surfaces and fully dehydrogenate at low coverages to produce H₂ and surface carbon during TPD. At monolayer coverage, 87% of adsorbed C₁₀H₁₈ and 75% C₁₂H₂₂ on Pt(1 1 1) desorb with activation energies of 70 and 75 kJ/mol, respectively. Decomposition of C₁₀H₁₈ is totally inhibited during TPD on these Sn/Pt(1 1 1) alloys and decomposition of C₁₂H₂₂ is reduced to 10% of the monolayer coverage on the (2 × 2)-Sn/Pt(1 1 1) alloy and totally inhibited on the (√3 × √3)R30°-Sn/Pt(1 1 1) alloy. C₁₀H₁₈ and C₁₂H₂₂ are more weakly chemsorbed on these two alloys compared to Pt(1 1 1) and these molecules desorb in narrow peaks characteristic of each surface with activation energies of 65 and 73 kJ/mol on the (2 × 2) alloy and 60 and 70 kJ/mol on the (√3 × √3)R30°-Sn/Pt(1 1 1) alloy, respectively. Alloyed Sn has little influence on the monolayer saturation coverage of these two molecules, and this is decreased only slightly on these two Sn/Pt(1 1 1) alloys. The use of these two probe molecules enables an improved estimate of the activation energy barriers E* to break aliphatic C-H bonds in alkanes on Sn/Pt alloys; E* = 65-73 kJ/mol on the (2 × 2)-Sn/Pt(1 1 1) alloy and E* ? 70 kJ/mol on the (√3 × √3)R30°-Sn/Pt(1 1 1) alloy.     

Structural and morphological evolution of Co on faceted Pt/W(1 1 1) surface upon thermal annealing

The structural and morphological changes of a 1.1 monolayer (ML) Pt deposit on W(1 1 1) have been investigated in situ, in ultra-high vacuum, as a function of the annealing temperature from 700 to 1340 K, by a combination of grazing incidence X-ray diffraction and grazing incidence small-angle X-ray scattering. Before annealing, the thin Pt layer is two-dimensional and lattice-matched to the W(1 1 1) surface. The faceting of Pt/W(1 1 1) towards nanoscale three-sided pyramids with {2 1 1} facets has been detected from 715 K. At this stage, the pyramids, which have a 5-nm average lateral size, cover nearly perfectly the surface. At higher temperatures, they increase in size. The role of the edge energy in the nanofaceting process is discussed. In addition, 4 MLs Co are deposited at room temperature on the smallest Pt/W pyramids. The obtained three-dimensional Co islands are correlated with the Pt/W nanopyramids and Co is relaxed on Pt/W. At approximately 800 K, a CoPt alloy is formed and becomes better ordered as the annealing temperature increases. At 1100 K, both defaceting and phase separation begin; the CoPt alloy segregates on the W(1 1 1) flat surface, while Co forms an epitaxial layer on the {2 1 1} facets. In addition, in the temperature range of 1100-1200 K, a great majority of {2 1 1} large facets coexist with some {1 1 0} small facets. Finally, the surface becomes flat again at 1250 K.     

Epitaxial growth of cobalt clusters on the bare and the oxide film grown on NiAl(1 0 0) surfaces

The structure of the nano-sized cobalt clusters on bare NiAl(1 0 0) and an oxidized NiAl(1 0 0) surfaces have been investigated by AES, LEED and RHEED. The deposition of Co onto bare NiAl(1 0 0) at room temperature led to small crystalline Co grains and surface asperities of substrate. The latter is likely induced by replacement of surface Al, Ni atoms by Co deposit. At 800 K Co particles aggregate to form clusters, but incorporation of Co into bulk NiAl(1 0 0) could occur upon annealing at 900 K. On the other hand, pure face-centered cubic (fcc) phase of Co crystallites of ≈1 nm in diameter with inclusion of smaller-sized particles (D < 1 nm) are observed on Θ-Al₂O₃ after Co deposition at room temperature. After annealing the Co nano-clusters grow larger at expense of small particles (D ≈ 3 nm), where the [1 1 0] and [−1 1 0] axis of the Co(0 0 1) facets are parallel to the [1 0 0] and [0 1 0] directions of (0 0 1)oxide, respectively. The in-plane lattice constant of Co clusters is ca. 4% larger than that of bulk Co, yielding less strain at the Co/oxide interface. A 15° ± 10% random orientation of the normal to (0 0 1) facet of Co clusters with respect to (0 0 1)oxide surface was deduced from the “arc”-shape reflection spots in RHEED. These results suggest that both orientation and phase of Co clusters are strongly affected by the nature and structure of oxide surface.     

STM and LEED observations of a c(2 × 2) Ge overlayer on Pt(1 0 0)

We have investigated surface structures formed by deposition of 0.2 and 0.5-ML Ge on Pt(1 0 0) by using scanning tunneling microscopy (STM) and low electron energy diffraction (LEED). In addition, their temperature dependence and reactivity to CO have been studied. We observed the formation of disordered domains for Ge adatom coverages below 0.25-ML and complete c(2 × 2) structures at 0.25 to 0.5-ML Ge after annealing at 600-1200 K. Deposition of 0.2-ML Ge on a clean, hexagonally reconstructed (5 × 20)-Pt(1 0 0) substrate at 400 K lifts the reconstruction and ejects excess Pt atoms from the first layer into the adlayer. After annealing this surface to 600 K, the deposited Ge formed Ge adatoms on flat terraces and on round Pt adislands with incomplete c(2 × 2) structures, in addition to the presence of clean (1 × 1)-Pt(1 0 0) domains that were several nanometers across. Some domains of the unreconstructed (5 × 20)-Pt(1 0 0) surface still remained. After the deposition of 0.5-ML Ge and annealing at 600 K, disordered Ge domains disappeared and a c(2 × 2) Ge overlayer was produced all over the surface. Square terraces with square domains of the clean (1 × 1)-Pt(1 0 0) surface extended for nanometers. Annealing this surface to 900 K produced disordered Ge domains, and this was associated with an increase in Ge vacancies. When surfaces with 0.2-ML Ge were heated to 900 or 1200 K, or when a surface with 0.5-ML Ge was heated to 1200 K, larger domains of (5 × 20)-Pt(1 0 0) were formed with the agglomeration of disordered Ge adatoms. Pt clusters were observed in the Ge domains, and we consider these to be composed of those excess Pt atoms formed by lifting the reconstruction of the (5 × 20)-Pt(1 0 0) surface upon Ge agglomeration during cooling. A paper published elsewhere [T. Matsumoto, C. Ho, M. Batzill, B.E. Koel, Physical Review B, submitted for publication.] describes Na⁺-ion scattering spectroscopy (Na⁺-ISS) and X-ray photoelectron diffraction (XPD) experiments that distinguish between Ge present in an overlayer from incorporation into the top Pt layer to form a surface alloy for the surface structures reported here. Furthermore, these investigations revealed that disordered Ge adatoms observed herein might be associated with incomplete c(2 × 2) structures. Therefore, our observations of the formation of complete and incomplete domains of c(2 × 2) Ge adatoms indicate that interactions between Ge adatoms are repulsive at nearest neighbor distances and attractive at second-nearest neighbor distances. Regarding the reactivity of these surfaces, CO does not chemisorb on a Pt(1 0 0) surface with a c(2 × 2)-Ge overlayer and no measurable CO uptake was observed under UHV conditions at 220 K.     

Formation and structure of a (√19 × √19)R23.4°-Ge/Pt(1 1 1) surface alloy

An ordered (√19 × √19)R23.4°-Ge/Pt(1 1 1) surface alloy can be formed by vapor depositing one-monolayer Ge on a Pt(1 1 1) substrate at room temperature and subsequently annealing at 900-1200 K. The long-range order of this structure was observed by low energy electron diffraction (LEED) and confirmed by scanning tunneling microscopy (STM). The local structure and alloying of vapor-deposited Ge on Pt(1 1 1) at 300 K was investigated by using X-ray Photoelectron Diffraction (XPD) and low energy alkali ion scattering spectroscopy (ALISS). XPS indicates that Ge adatoms are incorporated to form an alloy surface layer at ∼900 K. Results from XPD and ALISS establish that Ge atoms are substitutionally incorporated into the Pt surface layer and reside exclusively in the topmost layer, with excess Ge diffusing deep into the bulk of the crystal. The incorporated Ge atoms at the surface are located very close to substitutional Pt atomic positions, without any corrugation or “buckling”. Temperature Programmed Desorption (TPD) shows that both CO and NO adsorb more weakly on the Ge/Pt(1 1 1) surface alloy compared to that on the clean Pt(1 1 1) surface.     

The magnetic map of NiMn alloy thin films on Co(0 0 1) and Co(1 1 1)

Following the experimental work of Groudeva-Zotova et al. [S. Groudeva-Zotova, D. Elefant, R. Kaltofen, D. Tietjen, J. Thomas, V. Hoffmann, C.M. Schneider, J. Magn. Magn. Mater. 263 (2003) 57] where the magnetic and structural characteristics of a bi-layer NiMn-Co exchange biasing systems was investigated, density functional calculations with generalized gradient corrections were performed on (Mn_0.5Ni_0.5)_n ordered alloy on Co(0 0 1) and one Mn_1−xNi_x monolayer on Co(1 1 1). For the Mn_0.5Ni_0.5 monolayer on Co(0 0 1), magnetic moments per surface atom of 0.65 μ_B and 3.76 μ_B were obtained for Ni and Mn, respectively. Those magnetic moments are aligned parallel to the total moment of Co(0 0 1). A complex behavior of the Mn moment in dependence of the thickness “n” is obtained for (Mn_0.5Ni_0.5)_n on Co(0 0 1). Investigations on Mn_1−xNi_x monolayer on Co(1 1 1) have shown that the crystallographic orientation does not modify significantly neither the magnetic moments of Mn and Ni atoms nor their ferromagnetic coupling with the Co(1 1 1) substrate, except for x = 0.66. For x = 0.66 the Mn sub-lattice presents an antiferromagnetic coupling leading to a quenching of the Ni magnetic moment.     

Formation of Co ultrathin films on Si(1 1 1): Growth mechanisms, electronic structure and transport

The AES, EELS, AFM and resistance measurement investigations have been performed to determine the growth mechanism, electronic structure and resistance-thickness dependence of Co layers on silicon at the thickness range from submonolayer up to several monolayer coverage. These layers were obtained under UHV high-rate deposition with using re-evaporation of Co from a Ta foil. The layer-by-layer growth of Co on Si(1 1 1) with some light segregation of Si has been found on the AES data. An enlarged and reduced concentration of valence electrons in the interface Si layer at the thickness ranges 0-1 Å and in the Co film at d = 1-2 Å has been observed. Resistance measurement of the Co film showed a fast decrease of the resistance down to some value limited by quantum-size effect in accordance with the formation of a two-dimensional Co phase at d = 1-2 Å.