In situ grazing incidence small‐angle X‐ray scattering study of solvent vapor annealing in lamellae‐forming block copolymer thin films: Trade‐off of defects in deswelling

Solvent vapor annealing (SVA) is one route to prepare block copolymer (BCP) thin films with long‐range lateral ordering. The lattice defects in the spin‐coated BCP thin film can be effectively and rapidly reduced using SVA. The solvent evaporation after annealing was shown to have a significant impact on the in‐plane ordering of BCP microdomains. However, the effect of solvent evaporation on the out‐of‐plane defects in BCPs has not been considered. Using grazing‐incidence x‐ray scattering, the morphology evolution of lamellae‐forming poly(2‐vinlypyridine)‐b‐polystyrene‐b‐poly(2vinylpyridine) triblock copolymers, having lamellar microdomains oriented normal to substrate surface during SVA, was studied in this work. A micelle to lamellae transformation was observed during solvent uptake. The influence of solvent swelling ratio and solvent removal rate on both the in‐plane and out‐of‐plane defect density was studied. It shows that there is a trade‐off between the in‐plane and out‐of‐plane defect densities during solvent evaporation. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 980–989     

Morphology changes in bulk donor–acceptor poly(benzodithiophene‐benzotriazole) after post‐treatment

The bulk order in donor–acceptor poly(benzodithiophene‐benzotriazole) was improved by two different post‐treatment procedures applied to the specimen. Two‐dimensional wide‐angle X‐ray scattering was used to investigate the structural changes after treatment. After post‐treatment the polymer turned into a highly crystalline morphology with well‐resolved and intensive π‐stacking reflections which were absent in the pristine sample. To understand the ordering mechanisms taking place during the two post‐treatment procedures, structural parameters like coherence length and paracrystallinity were extracted from the X‐ray data indicating the impact on crystallite size and cumulative lattice disorder. During temperature annealing the intralayer packing transforms from amorphous to highly ordered. On the other hand, solvent vapor annealing enhances in higher extent the interlayer organization due to interpenetration of solvent molecules between alkyl side chains. These results provide important insights for the morphology optimization of semicrystalline conjugated polymers. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 2327–2334.     

Synthesis and self‐assembly of diblock copolymers composed of poly(3‐hexylthiophene) and poly(fluorooctyl methacrylate) segments

Regioregular poly(3‐hexylthiophene)‐b‐poly(1H,1H‐dihydro perfluorooctyl methacrylate) (P3HT‐b‐PFOMA) diblock copolymers were synthesized by atom transfer radical polymerization of fluorooctyl methacrylate using bromoester terminated poly(3‐hexylthiophene) macroinitiators in order to investigate their morphological properties. The P3HT macroinitiator was previously prepared by chemical modification of hydroxy terminated P3HT. The block copolymers were well characterized by ¹H NMR spectroscopy and gel permeation chromatography. Transmission electron microscopy was used to investigate the nanostructured morphology of the diblock copolymers. The block copolymers are able to undergo microphase separation and self‐assemble into well‐defined and organized nanofibrillar‐like micellar morphology. The development of the morphology of P3HT‐b‐PFOMA block copolymers was investigated after annealing in solvent vapor and also in supercritical CO₂. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Thickness‐dependent swelling of molecular layer‐by‐layer polyamide nanomembranes

The thickness‐dependent water vapor swelling of molecular layer‐by‐layer polyamide films is studied via specular X‐ray reflectivity. The maximum swelling ratio of these ultrathin films scale inversely with thickness but more importantly show a dual‐mode sorption behavior characterized by Langmuir‐like sorption at low relative humidity and network swelling at high relative humidity. The thickness‐dependent network parameters are extracted using a proposed model that builds on Painter‐Shenoy network swelling model while taking into account the glass‐like characteristic below a critical swelling ratio, which also scales inversely with thickness. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 412–417     

Control of all‐conjugated block copolymer crystallization via thermal and solvent annealing

Control of the crystallization of conjugated polymers is of critical importance to the performance of organic electronics, such as organic photovoltaic devices, due to the effect on charge separation and transport, particularly for all‐polymer devices. The block copolymer poly(3‐dodecylthiophene)‐block‐poly(9,9‐dioctylfluorene) (P3DDT‐b‐PF), which has matched crystallization temperatures for each block, is used to study the effects of processing history on resulting crystallization. For longer annealing times and rapid quenching to room temperature, P3DDT crystals are preferred whereas for shorter annealing times and slower quenching, PF crystals are preferred. Both crystal forms are evidenced for long annealing time and slow quenching. Additionally, for room temperature annealing in the presence of a chloroform vapor, PF crystals are found in the PF β phase with the predominant crystal peak oriented perpendicular to the thermally annealed case. These results will provide guidance for optimizing annealing strategies for future donor/acceptor block copolymer photovoltaic devices. © 2014 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2014 , 52, 900–906     

Ordering poly(trimethylsilyl styrene‐block‐D,L‐lactide) block copolymers in thin films by solvent annealing using a mixture of domain‐selective solvents

Controlling the morphology, domain orientation, and domain size of block copolymer (BCP) thin films is desirable for many applications in nanotechnology. These properties can be tuned during solvent annealing by varying the solvent choice and degree of swelling which affect the effective miscibility and volume fraction of the BCP domains. In this work, we demonstrate with a bulk lamellae‐forming BCP, poly(4‐trimethylsilylstyrene‐block‐D ,L ‐lactide) (PTMSS‐b‐PLA), that varying the composition of a mixture of solvent vapors containing cyclohexane (PTMSS‐selective) and acetone (PLA‐selective), enables formation of perpendicularly oriented lamellae with sub‐20‐nm pitch lines. The BCP domain periodicity was also observed to increase by 30%, compared to bulk, following solvent annealing. Furthermore, solvent annealing alone is shown to induce a transition from a disordered to an ordered BCP. We rationalize our observations by hypothesizing that the use of a combination of domain selective solvent mixtures serves to increase the effective repulsion between the blocks of the copolymer. We furnish results from self‐consistent field theory calculations to support the proposed mechanism. © 2013 Wiley Periodicals, Inc. J. Polym. Sci. Part B: Polym. Phys. 2014 , 52, 36–45     

Molecular and morphological characterization of midblock‐sulfonated styrenic triblock copolymers

Midblock‐sulfonated triblock copolymers afford a desirable opportunity to generate network‐forming amphiphilic materials that are suitable for use in a wide range of emerging technologies as fuel‐cell, water‐desalination, ion‐exchange, photovoltaic, or electroactive membranes. Employing a previously reported synthetic strategy wherein poly(p‐tert‐butylstyrene) remains unreactive, we have selectively sulfonated the styrenic midblock of a poly(p‐tert‐butylstyrene‐b‐styrene‐b‐p‐tert‐butylstyrene) (TST) triblock copolymer to different extents. Comparison of the resulting sulfonated copolymers with results from our prior study provides favorable quantitative agreement and suggests that a shortened reaction time is advantageous. An ongoing challenge regarding the morphological development of charged block copolymers is the competition between microphase separation of the incompatible blocks and physical cross‐linking of ionic clusters, with the latter often hindering the former. Here, we expose the sulfonated TST copolymers to solvent‐vapor annealing to promote nanostructural refinement. The effect of such annealing on morphological characteristics, as well as on molecular free volume, is explored. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 490–497     

Tuning microdomain spacing with light using ortho‐nitrobenzyl‐linked triblock copolymers

Using sequential RAFT polymerization, single monomer insertion, and “click” chemistry, a series of triblock copolymers, poly(ethylene oxide)‐b‐polystyrene‐b‐poly(ethylene oxide), PEO‐b‐PS‐b‐PEO, were synthesized, where one of the two junction points is a UV cleavable ortho‐nitrobenzyl (ONB). Ordered patterns of PEO‐b‐PS‐b‐PEO were produced by solvent vapor annealing. Upon exposure to ultraviolet (UV) light, the PEO‐b‐PS‐b‐PEO was converted into a mixture of a PEO homopolymer and a PS‐b‐PEO diblock copolymer. It was found that the microdomain spacing could be tuned by adjusting the UV exposure time, due to the change in the copolymer architecture and the swelling of the PEO microdomain by the PEO homopolymer produced. By selective area exposure of the PEO‐b‐PS‐b‐PEO thin films, the domain spacing was changed over selected locations across the film, generating patterns of different microdomain sizes. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2018 , 56, 355–361.     

Manipulating morphology and orientation in thermally responsive block copolymer thin films

We demonstrate the use of combined thermal annealing and solvent vapor annealing (SVA) to tune the morphology of thermally responsive block copolymer (BCP) thin films. The BCP, poly(styrene‐b‐tert‐butyl acrylate) (PS‐b‐PtBA), undergoes a chemical deprotection to poly(styrene‐b‐acrylic anhydride) (PS‐b‐PAH) above a temperature threshold, giving rise to a structural and morphological transition. Our experiments systematically examine different thermal annealing and SVA protocols with two solvents (tetrahydrofuran and acetone) and map the resulting morphologies. Assessments of these processing protocols were accelerated using temperature gradients. Our results demonstrate that the final nanoscale morphologies after SVA are determined by the changes in the relative solvent/polymer interactions and surface tensions of the polymer blocks that accompany deprotection. Because of these driving forces, certain processing combinations led to irreversible morphological states, whereas others present opportunities for further manipulation. Accordingly, our study reveals that the morphology of this thermally sensitive BCP can be altered through judicious choice of annealing protocol. The protocols that combine equal numbers of SVA and thermal annealing (TA) steps are not necessarily equivalent, and the order of the SVA relative to TA is a deciding factor in the final morphology. © 2011 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2011     

Evolution in surface morphology during rapid microwave annealing of PS‐b‐PMMA thin films

Microwave annealing enables rapid (60 s) ordering and orientation of block copolymer films. The developed morphology in polystyrene‐block‐poly(methyl methacrylate) (PS‐b‐PMMA) thin films depends on details of the heating rate that is controlled by microwave output energy as well as the sample location in the microwave. Over a wide heating rate (1.1–2.7 °C/s), perpendicular orientation of the cylindrical mesostructure at the surface is >50% after 60 s, but goes through a maximum at 1.8 °C/s leading to approximately 97% perpendicular cylinders at the surface. The propagation of this perpendicular surface morphology through the film thickness is also dependent upon the microwave annealing conditions. The surface structure evolves with the microwave annealing time from imperfect ordering to perpendicular cylinders to parallel cylinders as the annealing time increases. This work demonstrates the importance of controlling the heating rate during microwave annealing, which will be critical for optimizing microwave conditions for directed self‐assembly. © 2016 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 1499–1506     

Annealing effect on performance and morphology of photovoltaic devices based on poly(3‐hexylthiophene)‐b‐poly(ethylene oxide)

Novel block copolymers, poly(3‐hexylthiophene)‐b‐poly(ethylene oxide) (P3HT‐b‐PEO) were synthesized via Suzuki coupling reaction of P3HT and PEO homopolymers. The copolymers were characterized by NMR, gel permeation chromatography, differential scanning calorimeter, and UV–vis measurements. A series of devices based on the block copolymers with a fullerene derivative were evaluated after thermal or solvent annealing. The device using P3HT‐b‐PEO showed higher efficiency than using P3HT blend after thermal annealing. Phase‐separated structures in the thin films of block copolymer blends were investigated by atomic force microscopy to clarify the relationship between morphologies constructed by annealing and the device performance. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

A facile approach to fabricate hierarchically structured poly(3‐hexylthiophene‐2,5‐diyl) films

Microstructured surfaces have great potentials to improve the performances and efficiency of optoelectronic devices. In this work, a simple robust approach based on surface instabilities was presented to fabricate poly(3‐hexylthiophene‐2,5‐diyl) (P3HT) films with ridge‐like/wrinkled composite microstructures. Namely, the hierarchically patterned films were prepared by spin coating the P3HT/tetrahydrofuran (THF) solution on a polydimethylsiloxane (PDMS) substrate to form stable ridge‐like structures, followed by solvent vapor swelling to create surface wrinkles with the orientation guided by the ridge‐like structures. During spin coating of the P3HT/THF solution, the ridge‐like structures were generated by the in‐situ template of the THF swelling‐induced creasing structures on the PDMS substrate. To our knowledge, it is the first report that the creasing structures are used as a recoverable template for patterning films. The crease‐templated ridge‐like structures were well modulated by the THF swelling time, the modulus of the PDMS substrate, the P3HT/THF solution concentration and the selective/blanket exposure of the PDMS substrate to O₂ plasma. UV–vis and fluorescence spectrometry measurements indicated that the light absorption and fluorescent emission were improved on the hierarchically patterned P3HT films, which can be utilized to enhance the efficiencies of organic solar cells. Furthermore, this simple versatile method based on the solvent swelling‐induced crease as the in‐situ recoverable template has been extended to pattern other spin‐coated films with different compositions. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 928–939     

Dewetting behavior of Langmuir−Blodgett films of polystyrene‐b‐poly(methyl methacrylate) induced by solvent vapor annealing

In order to explore the degree of contact between hydrophilic blocks and the substrate, the dewetting behavior of Langmuir–Blodgett (LB) films of polystyrene‐block‐poly(methyl methacrylate) (PS‐b‐PMMA) induced by PMMA‐selective acetone vapor were investigated by atomic force microscopy (AFM) for the first time. With the annealing of acetone vapor, the LB films of PS‐b‐PMMA undergo the swelling and coalescing of aggregates, the formation of bicontinuous patterns, the formation of droplets, and the periodic increase and decrease of droplets. The emergence of the bicontinuous patterns indicates that the dewetting occurs via the spinodal dewetting mechanism. The periodic droplet evolution is a novel phenomenon observed for the first time and quite different from the single droplet evolution of spin‐coated films, which is probably due to the degree of contact between PMMA blocks and the substrate in the LB films being larger than that in the latter. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016 , 54, 825–830     

Synthesis and self‐assembly of thermotropic block copolymer with long alkyl tethered cage silsesquioxane in the side chain

Thermotropic POSS‐containing poly(methacrylate) with long alkyl chain tethered polyhedral oligomeric silsesquioxane (POSS) in the side chain and the block copolymers (PMMA‐b‐PMAC11POSS) were developed by through living anionic polymerization. The resulting polymers indicated a phase transition temperature at 112 °C from spherocrystal to isotropic phase. The POSS‐containing polymer segments tended to form matrix of microphase‐separated nanostructures in the bulk even in the very low volume fraction, for instance, PMMA cylindrical nanostructure was obtained by PMMA₁₇₅‐b‐PMAC11POSS₁₁ (?_PMAC11POSS = 0.44). The control of thin film morphology was carried out by not only solvent annealing, but also thermal annealing, resulting in the formation of well‐ordered dot‐ and fingerprint‐type nanostructures. This is the first report in a series of POSS‐containing block polymers that are capable for thermal annealing to generate well‐ordered microphase‐separated nanostructures in thin films. The novel thermotropic POSS‐containing block copolymer offers a promising material for block copolymer lithography. © 2011 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011     

Investigation of polymer–solvent interactions in poly(styrene sulfonate) thin films

The swelling behavior of acid form poly(styrene sulfonate) (PSS‐H) thin films were investigated using in situ spectroscopic ellipsometry (SE) to probe the polymer–solvent interactions of ion‐containing polymers under interfacial confinement. The interaction parameter (χ), related to the polymer and solvent solubility parameters in the Flory–Huggins theory, describes the polymer‐solvent compatibility. In situ SE was used to measure the degree of polymer swelling in various solvent vapor environments, to determine χ for the solvent‐PSS‐H system. The calculated solubility parameter of 40–44 MPa^1/2 for PSS‐H was determined through measured χ values in water, methanol, and formamide environments at a solvent vapor activity of 0.95. Flory–Huggins theory was applied to describe the thickness‐dependent swelling of PSS‐H and to quantify the water‐PSS‐H interactions. Confinement had a significant influence on polymer swelling at low water vapor activities expressed as an increased χ between the water and polymer with decreasing film thickness. As the volume fraction of water approached ～0.3, the measured χ value was ～0.65, indicating the water interacted with the polymer in a similar manner, regardless of thicknesses. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2017 , 55, 1365–1372     

An unusual photo‐oxidation pathway for a poly(2,6‐dimethyl‐1,4‐phenylene oxide) model compound

The long wavelength UV photochemistry was investigated of a model compound for poly(2,6‐dimethyl‐1,4‐phenylene oxide). Irradiation of the phenyl‐capped dimer of 2,6‐dimethyl phenol at wavelengths >290 nm with UVA‐340 fluorescent lamps in the absence of oxygen gave no detectable products after 27 days. Very low conversion to oxidation products was found in the presence of oxygen, but about 20% conversion to products in which solvent had added to the benzylic methyl groups occurred under aerobic conditions when the solvents had readily abstractable hydrogen atoms. A mechanism is proposed involving the facile, reversible abstraction of a benzylic hydrogen by oxygen as a first step in the oxidation. The hydroperoxyl radical that is formed can abstract hydrogen atoms from 2° and 3° carbons of the solvent, and these radicals can combine with the benzylic radicals to give the solvent adducts. © 2017 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2017 , 55, 2221–2226     

An in situ GISAXS study of selective solvent vapor annealing in thin block copolymer films: Symmetry breaking of in-plane sphere order upon deswelling

Thin films of asymmetric poly(styrene-b-4-vinylpyridine) (PS-b-P4VP) block copolymers are studied by means of in situ grazing-incidence small-angle X-ray scattering (GISAXS) during solvent vapor annealing in tetrahydrofuran, a solvent selective for the PS majority block of the copolymer. Upon swelling, PS-b-P4VP block copolymers form hexagonal arrays of spherical P4VP microdomains in a PS matrix in films 7–9 layers thick. Deswelling the films induces a transition from hexagonal to face-centered orthorhombic (fco) symmetry, which is stable only at ∼7 layers of spherical microdomains. Dry films show co-existing hexagonal and orthorhombic symmetries when the solvent is removed slowly, whereas instantaneous solvent removal suppresses the fco structure, resulting in films with only hexagonal structure. The in-plane order of microdomains is significantly deteriorated in dry films independent of the solvent removal rate.Spherical block copolymer microdomains are known to undergo a transition from hexagonal to orthorhombic packing in isothermally annealed thin films when the number of sphere layers is increased from 4 to 5. In this paper, in situ GISAXS experiments reveal that a similar transition occurs during solvent vapor annealing in a selective solvent. Interestingly, the transition from hexagonal to orthorhombic packing of spheres occurs as solvent is removed from a thin block copolymer film. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2016, 54, 331–338     

Ionic aggregates in Zn‐ and Na‐neutralized poly(ethylene‐ran‐methacrylic acid) blown films

The morphology of ionic aggregates in semicrystalline Zn‐ and Na‐neutralized poly(ethylene‐ran‐methacrylic acid) (EMAA) ionomer blown films has been explored with scanning transmission electron microscopy (STEM) and small angle X‐ray scattering. The ionic aggregates of Zn‐EMAA are spherical, monodisperse, and uniformly distributed in as‐extruded pellets and blown films prepared at low and high blow‐up ratio. Thus, although the biaxial stresses of film blowing are sufficient to alter the PE superstructure, the ionic aggregates in Zn‐EMAA are unaffected. In contrast, the morphology of Na‐EMAA as detected by STEM changes from featureless in the as‐extruded pellets to a heterogeneous distribution of Na‐rich aggregates in the blown films. This transformation in Na‐EMAA morphology is consistent with our earlier study of quiescent annealing, suggesting that the morphological change is the result of thermal processing rather than the biaxial stresses of film blowing. © 2005 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 43: 3549–3554, 2005     

Order‐order transitions of a triblock copolymer with a homopolymer (ABC/A) blend film induced by saturated solvent vapor annealing

The morphology transition of binary mixtures of polystyrene‐block‐poly(butadiene)‐block‐poly(2‐vinylpyridine)(SBV) triblock and polystyrene (PS) homopolymer thin films was investigated as a function of the volume fraction of added homopolymer and the annealing time in benzene vapor. It was found that the weight ratio of PS in the blends influenced the transition process. When PS content was >5%, the order‐order transition (OOT) of core‐shell cylinders (C) →sphere in “diblock Gyroid” (sdG) → sphere in lamella (sL) → sphere (S) was observed, which was similar to ABC triblock copolymer except for the increased surface area of the PS phase. When PS content reached to 10–30%, the OOT in the sequence of C → sL → S was observed. The disappearance of the Gyroid phase is due to the change of the effective volume fraction. Further increasing the PS content, C phase also disappeared and sL → S was expected to take place. © 2014 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2014 , 52, 1030–1036     

Facile non‐lithographic route to highly aligned silica nanopatterns using unidirectionally aligned polystyrene‐block‐polydimethylsiloxane films

Thin films (monolayer and bilayer) of cylinder forming polystyrene‐block‐polydimethylsiloxane (PS‐b‐PDMS) were shear aligned by the swelling and deswelling of a crosslinked PDMS pad that was physically adhered to the film during solvent vapor annealing. The nanostructures formed by self‐assembly were exposed to ultraviolet‐ozone to partially oxidize the PDMS, followed by calcination in air at 500 °C. In this process, the PS segments were fully decomposed, while the PDMS yielded silica nanostructures. The highly aligned PDMS cylinders were thus deposited as silica nanolines on the silicon substrate. Using a bilayer film, the center‐to‐center distance of these features were effectively halved from 38 to 19 nm. Similarly, by sequential shear‐alignment of two distinct layers, a rhombic array of silica nanolines was fabricated. This methodology provides a facile route to fabricating complex topographically patterned nanostructures. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2015 , 53, 1058–1064