Ni2+掺杂氧化锌阵列膜的水热合成及性能表征

采用低温水热法制备了Ni2+掺杂的ZnO阵列膜,研究了Ni2+掺杂对样品形貌、晶相结构和光谱特性的影响,并对可能的影响机理进行探讨.结果表明:Ni2浓度增加不会改变ZnO的纤锌矿结构,但在一定程度上可以起到控制其形貌及均匀度的作用.Ni2+掺杂量x≤0.007 mol/L时,有助于ZnO纳米棒沿c轴方向生长,提高结晶度,但ZnO的生长机理保持不变.Ni2+掺杂量较多时(x ＞0.007 mol/L),ZnO纳米棒的生长习性发生变化,其六方结构被破坏,水热膜由垂直于基片表面排列的纳米棒阵列转变为由结构不规则的多边形晶粒组成的密堆积排列.由于Ni2+固溶入ZnO晶格产生晶格畸变,引起薄膜内应力以及载流子浓度的变化,使得ZnO拉曼光谱的特征峰出现明显的降低和移动.光致发光谱表明,Ni2掺杂使ZnO纳米棒的紫外发光峰强度IUV与绿光发光峰强度IGR之比值IUV/IGR增大.     

钇掺杂多孔结构氧化锌纳米棒的制备与性能研究

采用两步法在二氧化锡掺氟(SnO2:F,FTO)导电玻璃基板上制备出钇(Y)掺杂多孔结构氧化锌(ZnO)纳米棒,首先利用浸渍-提拉法在FTO导电玻璃基板上制备ZnO晶种层,然后利用水热法在ZnO晶种层上生长Y掺杂ZnO纳米棒.研究了不同浓度Y掺杂ZnO纳米棒的晶相结构、微观形貌、化学组成及光学性能.实验结果表明:所制备的Y掺杂ZnO纳米棒为沿c轴择优取向生长的六方纤锌矿结构,随着Y掺杂浓度的增加,ZnO纳米棒(002)衍射峰强度先增大后减小,纳米棒的平均长度由1.3μm增加到2.6μm.ZnO纳米棒的形貌由锥状结构向柱状结构演化,纳米棒侧面的孔洞分布密度增加.所制备的Y掺杂ZnO纳米棒具有一个较弱的紫外发光峰和一个较强的宽可见发光峰.所制备样品的光学带隙随着Y掺杂浓度的增加而减小,其光学带隙在3.29～3.21 eV之间变化.利用Y掺杂ZnO纳米棒作为量子点敏化太阳能电池的光阳极可极大提高太阳电池的光电转换效率.     

氧分压对ZnO纳米结构的形貌及光学性能的影响

利用未采用催化剂的真空热蒸发法合成了不同形貌的硅基ZnO纳米结构,研究了氧分压对纳米ZnO结构及光学性能的影响.研究结果表明氧分压对ZnO纳米结构的形貌及光学性能具有明显的影响,在氧分压为25;、10;和5;时制得的纳米ZnO结构分别为纳米线、纳米带和纳米梳.X射线衍射测试表明制得的不同ZnO纳米材料均为六方纤锌矿结构,并具有明显的c轴择优取向性.采用PL谱对制备纳米结构的光学性能进行了测试.     

四针状ZnO晶须的制备及其光致发光性能

采用热蒸发氧化锌片的方法制备四针状ZnO晶须.并用X射线能谱仪(EDS)、X射线衍射仪(XRD)、傅里叶红外光谱仪(FTIR)、场发射扫描电子显微镜(FESEM)对ZnO晶须组成、结构和形貌进行了测试表征.结果表明:四针状ZnO晶须为六方纤锌矿结构;当前期升温速率为6c℃/min,保温温度为960 ℃,锌的投放量为5 g时,制得四针状ZnO晶须形貌均一规整,晶须针脚生长完全;光致发光(PL)谱图表明:四针状ZnO晶须有两处明显的荧光发射峰,390 nm附近的紫外发射峰由ZnO近带边激子跃迁引发,514 nm附近的绿光发射峰是表面态效应与氧空位电子引发的光生空穴效应共同作用的结果.     

F掺杂对溶胶-凝胶法制备的ZnO∶ Fe薄膜结构及光学性质的影响

采用溶胶-凝胶法在玻璃衬底上制备了Zn0.98-xFe0.02FxO(x =0,0.01,0.02,0.03,0.04)薄膜,进而利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、紫外-可见透过谱(UV-VIS)、光致发光(PL)多种测试手段研究了不同掺F浓度对ZnO∶ Fe薄膜的表面形貌、微结构、禁带宽度及光致发光的影响.结果表明:样品均为六角纤锌矿结构,当F掺杂浓度为2at;时,薄膜的结晶度最好且表现出明显的c轴择优取向.随着F掺杂浓度的进一步增大,薄膜的结晶性逐渐变差,c轴择优取向消失.F掺杂ZnO∶ Fe薄膜在可见光区均有很高的透过率,平均可达93;.样品的禁带宽度随着掺F浓度的增加而减小.PL谱观察到Zn0.98-xFe0.02FxO薄膜的发射峰主要由紫外发射峰和蓝光发射峰组成,其中2at;F掺杂样品的紫外发射强度最大,同时蓝光发射强度随着F含量的增大逐渐减小.     

衬底温度对直流磁控溅射法制备掺锆氧化锌透明导电薄膜性能的影响

利用直流磁控溅射法在石英衬底上制备出了高透明导电的掺锆氧化锌(ZnO:Zr)薄膜.研究了衬底温度对ZnO:Zr薄膜结构、形貌及光电性能的影响.XRD表明实验中制备的ZnO:Zr为六方纤锌矿结构的多晶薄膜,具有垂直于衬底方向的c轴择优取向.实验所制备ZnO:Zr薄膜的晶化程度和导电性能对衬底温度有很强的依赖性.当衬底温度为300 ℃时, ZnO:Zr薄膜具有最小电阻率7.58×10-4 Ω·cm,其可见光平均透过率超过了91;.     

物理气相传输法生长氧化锌晶体

以高纯氧化锌粉为升华源,采用物理气相传输法(PVT)法在1500℃下生长出了ZnO多晶体,生长速率达0.24 mm/h.样品XRD测试和拉曼分析表明,无籽晶自发成核生长的ZnO多晶体不仅具有六方纤锌矿结构,而且具有c轴方向择优生长特征.实验结果表明了PVT法可以进行大尺寸ZnO晶体的生长,并且可以达到0.2 mm/h以上的生长速率.     

Ga掺杂浓度对溶胶-凝胶法制备GZO薄膜光电性能的影响

采用溶胶-凝胶法在玻璃基片上制备掺镓氧化锌透明导电薄膜,用X射线衍射仪、扫描电子显微镜、紫外可见光分光光度计、霍尔效应仪等测试分别表征GZO薄膜的晶体结构、表面形貌、光电性能等,研究Ga掺杂量对GZO薄膜性能的影响.结果表明:所制备的GZO薄膜均为六方纤锌矿结构并有沿c轴择优生长趋势,随着Ga掺杂量的增加,薄膜透过率先增加再减小,当Ga掺杂量为4at;时透过率最高,可见光区平均透过率达97.4;,薄膜电阻率则随掺杂量增加而下降,在Ga掺杂量为5at;时达最小值7.62×10-3 Q·cm.     

共沉淀法制备Co掺杂纳米ZnO及其表征

以ZnCl2、CoCl2和NaOH为原料,采用共沉淀法制备了纯ZnO和Co掺杂ZnO(ZnO: Co)纳米粉体.利用XRD、EDS和FESEM对样品的结构和形貌进行了表征,利用光致发光光谱(PL)研究了样品的发光性质.结果表明,控制退火温度600 ℃煅烧2 h能得到纯度较高的ZnO: Co纳米粉体,此粉体属于六方纤锌矿结构;部分Co2 +取代了Zn2 +进入ZnO的晶格,掺入量为2.2 at;;Co掺杂对产品的形貌影响不大,掺杂前后均为准球形颗粒,掺杂后颗粒粒径略有减小;Co掺杂使ZnO的禁带宽度变窄,紫外发光峰位产生显著红移.     

溶胶-凝胶法制备Mg掺杂ZnO薄膜的微结构与光学性质

采用溶胶-凝胶技术在Si(111)和石英玻璃衬底上制备了Mg掺杂ZnO薄膜.用X射线衍射仪(XRD)、原子力显微镜(AFM)、扫描电镜(SEM)和紫外-可见(UV-Vis)分光光度计测试薄膜的微结构、表面形貌和光学性质.结果表明:所得Mg掺杂ZnO薄膜仍为六角纤锌矿型结构,呈c轴方向择优生长,随着退火温度升高,薄膜的晶格常数c由0.5288 nm减小到0.5278 nm,粗糙度从3.8 nm增大到6.5 nm,光学带隙由3.26 eV增大到3.31 eV.     

Sintering behavior of ZnO:Al ceramics fabricated by sol‐gel derived nanocrystalline powders

ZnO:Al ceramics (Zn:Al, 0.95:0.05) were prepared by using sol‐gel derived nanocrystalline powders. XRD patterns of the doped ceramics revealed the existence of both zincite (JCPDS 36‐1451) and gahnite (JCPDS 5‐0669) phases. Gahnite phase (ZnAl₂O₄) was segregated along the ZnO grain boundaries. At the sintering temperature of 1200 °C, relative density of the undoped and Al doped ceramics were measured as 0.695 and 0.628, respectively. Both grain size and relative density of the ceramics decreased with Al doping. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Preparation of undoped and indium doped ZnO thin films by pulsed laser deposition method

An original modification of the standard Pulse Laser Deposition (PLD) method for preparing both undoped and indium doped zinc oxide (ZnO:In) thin films at low substrate temperature is proposed. This preparation method does not demand any further post‐deposition annealing treatment of the grown films. The developed method allows to grow thin films at low substrate temperature that prevents them from the considerable loss of their intrinsic electrical and optical properties. The influence of deposition parameters on the electrical and optical parameters of the undoped and the indium doped ZnO thin films is also analysed. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Synthesis of bamboo‐like SiC whiskers from waste silica fume

A process for the utilization of wasted silica fume is proposed in this work. Silicon carbide (SiC) whiskers several tens of micrometers in length and with a bamboo‐like morphology have been successfully synthesized by a carbothermal reduction process using purified silica fume as the silicon source. The morphology and structure of SiC whiskers were investigated by X‐ray diffraction, Raman spectroscopy, scanning electron microscopy, and high‐resolution transmission electron microscopy. Studies found that the as‐synthesized whiskers were grown as single‐crystalline β‐SiC along the (111) growth direction. The whiskers consisted of hexagonal stems randomly decorated with larger‐diameter knots along their whole length. On the basis of the characterization results, a vapor–solid process was discussed as a possible growth mechanism of the β‐SiC whiskers.     

Fast synthesis of Cu‐doped ZnO nanosheets at ambient condition

A new, fast and low cost method to produce Cu‐doped ZnO nanosheets is reported for the first time in this paper. Zinc foil specimens were immersed into CuSO₄ aqueous solutions with various concentrations for 3 seconds and then dried at ambient condition. The immersed specimens were characterized with a scanning electron microscope, an X‐ray diffractometer and a transmission electron microscope. The results show that Cu‐doped ZnO nanosheets with a multilayer structure on a cupper layer are formed. Cu‐doped ZnO nanosheets show hexagonal crystalline structure and comprises polycrystalline grains with diameters of 5∼10 nm. A physical modal is suggested to explain the prepared Cu‐doped ZnO nanosheet structure, based on the chemical reactions and a metallurgical cell.     

室温电化学法制备白钨矿SrWO4晶态膜的生长特性研究

采用恒电流电化学技术直接在金属钨片上制备了具有白钨矿结构的钨酸锶(SrWO4)晶态薄膜,通过SEM和EDX测试分析方法,研究了薄膜在不同的生长阶段(包括薄膜从最初成核并开始生长,到薄膜布满整个基片,即薄膜生长结束)的生长特性.研究结果表明,SrWO4晶核和晶粒优先选择在基片的缺陷处堆砌生长,在薄膜生长的初期,一定数量的WO4负离子配位多面体沉积在基片上并形成具有白钨矿结构的骨架,继而Sr2+对该骨架进行填充,由此形成晶核和晶粒;随着沉积时间的延长,晶粒密度不断增大,晶核和晶粒也不断长大,并沿着c轴生长的方向开始分叉,晶粒越大分叉越多;最终,当SrWO4薄膜生长过程结束时,团簇生长的花菜状晶粒布满整个基片,形成致密的薄膜.该研究结果对晶态薄膜电化学制备生长机制的认识、以及采用电化学方法制备晶态薄膜的工艺调控都具有重要意义.     

InAlO3（ZnO）15超晶格纳米串的合成及其电学性质

通过化学气相沉积方法成功合成了InAlO3(ZnO)15超晶格纳米串。扫描电镜观察到InAlO3(ZnO)15纳米片沿生长方向均匀排列,直径约为80～150 nm,长度约为7～20μm。X射线衍射结果表明样品具有InAlO3(ZnO)15超晶格纳米结构。高分辨透射电子显微镜显示相邻两个In-O层中间共16层In(Al)O(ZnO)m+block,并研究了其生长机制。在0.6～3 V电压范围内,I-V特性曲线出现非线性性质。     

Growth and conductivity enhancement of N-doped ZnO nanorod arrays

A simple two-step process was developed for growing the nitrogen-doped ZnO (NZO) nanorod arrays on glass substrates. ZnO particles serve as a seed layer deposited by the electrostatic spray deposition method for the growth of NZO nanorods in aqueous solution. FE-SEM images revealed that nanorods have approximately uniform length distribution with hexagon end planes and grow vertically along the c-axis, which was also confirmed by X-rays diffraction. In addition, NZO nanorods had an average diameter of 140±20 nm and an average length of 1.2 to 2.7 μm with a wurtzite-type structure of ZnO. N doping had no prominent effect on the structure and crystal orientation, but it helps to increase the length and reduction in the diameter of nanorods. Moreover, electrical resistivity was found to decrease first and then increase with further nitrogen doping due to the decrease of mobility and increase of carrier concentration. Also the transmittance increased initially, but at higher nitrogen contents it decreased. Annealing the nanorods imparts no effect on the morphology, but there was a significant decrease in electrical resistivity due to the formation of oxygen vacancies. The realization of p-type ZnO nanorod arrays with durable and controlled transport properties is important for the fabrication of nanoscale electronic and optoelectronic devices.     

Lu5Ir4Si10 whiskers: Morphology,crystal structure,superconducting and charge density wave transition studies

Highly perfect single crystal whiskers of Lu₅Ir₄Si₁₀ were successfully grown out of the melt. Details of the surface and morphology of the whiskers are presented. X-ray diffraction data confirmed that the whisker structure has the same tetragonal P4/mbm space group symmetry as bulk single crystals with lattice parameters a=12.484(1) and c=4.190(2) Å. By means of field emission scanning electron microscopy, the morphology of the whiskers has been studied. Using a 4-circle X-ray diffractometer we found that whiskers grow along the c-axis direction and all side faces are oriented along the [1 1 0] direction. The mosaicity has been measured and is found to be almost perfect: below 0.15° along the c-axis. According to our transport measurements performed along the c-axis, the whiskers present a sharp superconducting transition at T_c=4.1 K and show a charge density wave (CDW) transition at 77 K. From the hysteresis of the temperature dependance of the electrical resistivity study, the CDW transition is found to be of first order.     

Temperature dependence of growth orientation and surface morphology of Li‐doped ZnO thin films on SiO2/Si substrates

ZnO thin films doped with Li (ZnO:Li) were deposited onto SiO₂/Si (100) substrates by direct‐current sputtering technique in the temperature range from room temperature to 500 °C. The crystalline structure, surface morphology and composition, and optical reflectivity of the deposited films were studied by X‐ray diffraction (XRD), Scanning Electron Microscopy (SEM), X‐ray Photoelectron Spectroscopy (XPS) and optical reflection measurements. Rough surface p‐type ZnO thin film deposition was confirmed. The results indicated that the ZnO:Li films growed at low temperatures show c‐axis orientation, while a‐axis growth direction is preferable at high temperatures. Moreover, the optical reflectivity from the surface of the films matched very well with the obtained results. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

离子液体辅助溶胶-凝胶法制备ZnO∶Al透明导电薄膜及其光电性能研究

采用溶胶-凝胶法,以离子液体为辅助溶剂,在玻璃衬底上制备了ZnO∶Al(ZAO)薄膜。通过X-射线衍射(XRD)、场发射扫描电镜(FE-SEM)、紫外-可见分光光度计(UV-Vis)和霍尔效应等测试手段,分析了不同Al掺杂浓度ZAO薄膜的微观结构、光学和电学性能。结果表明,所制备的薄膜为非(002)取向的多晶膜。随着Al离子掺杂浓度的提高,薄膜的(002)晶面取向增强,晶粒逐渐由片状向球形转变,电阻率先降低后升高。进一步研究发现,在还原气氛NH3下退火可显著降低薄膜的电阻率,Al掺杂浓度为1 mol%时,薄膜电阻率达到4.7×10-2Ω·cm,可见光透过率平均在80%以上。