Superhydrophobic silicon surfaces with micro-nano hierarchical structures via deep reactive ion etching and galvanic etching

An effective fabrication method combining deep reactive ion etching and galvanic etching for silicon micro-nano hierarchical structures is presented in this paper. The method can partially control the morphology of the nanostructures and enables us to investigate the effects of geometry changes on the properties of the surfaces. The forming mechanism of silicon nanostructures based on silver nanoparticle galvanic etching was illustrated and the effects of process parameters on the surface morphology were thoroughly discussed. It is found that process parameters have more impact on the height of silicon nanostructure than its diameter. Contact angle measurement and tilting/dropping test results show that as-prepared silicon surfaces with hierarchical structures were superhydrophobic. What's more, two-scale model composed of micropillar arrays and nanopillar arrays was proposed to study the wettability of the surface with hierarchical structures. Wettability analysis results indicate that the superhydrophobic surface may demonstrate a hybrid state at which water sits on nanoscale pillars and immerses into microscale grooves partially.     

Functional antibody immobilization on 3-dimensional polymeric surfaces generated by reactive ion etching

Reactive ion etching (RIE) was used to pattern antibodies onto the surfaces of polymer substrates. A low pressure, inductively coupled oxygen plasma was used to anisotropically etch 25-30 mum deep features into poly(methyl methacrylate) (PMMA), Zeonex, and polycarbonate (PC). Scanning electron microscopy and contact angle measurements show that the resulting surfaces exhibit significant microroughness and enhanced hydrophilicity. Fourier transform infrared spectroscopy suggests that, in addition to enhanced surface area, chemical modifications may contribute to antibody immobilization. Polyclonal antibodies preferentially bind to the etched areas in RIE-patterned PMMA and Zeonex substrates but localize in unetched regions of RIE-patterned PC surfaces. Simple immunoassays were performed to demonstrate a potential application for RIE-modified polymer surfaces. Antibodies specific for the capture of fluorescently labeled cholera toxin, S. aureus enterotoxin B, and B. anthracis protective antigen were immobilized onto etched PMMA surfaces and shown to specifically capture their labeled antigen from solution. This work demonstrates a potentially useful fabrication methodology for constructing antibody microarrays on plastic substrates.     

Two‐dimensional non‐close‐packed arrays of nanoparticles via core‐shell nanospheres and reactive ion etching

Nanosized PTFE/polystyrene core‐shell particles were prepared by seed emulsion polymerization technique starting from PTFE seeds of 20 nm. At the end of the reaction, no residual PTFE nor secondary nucleation was observed and by appropriately choosing the ratio between the monomer and the PTFE seed it was possible to obtain particles, with predetermined size in the range 60–100 nm, featuring an extremely narrow size distribution. These particles were successfully employed as building blocks for the preparation of large scale nanosized monolayers through the floating technique. Reactive ion etching was further applied to modulate the size characteristics of the resulting 2D ordered nanostructure. Although for relatively short RIE times a peculiar continuous morphology was observed in which the particles are interconnected through thin arms, on further increasing the RIE time a well‐organized 2D arrangement of particles with size of about 30 nm was obtained. Considering the shell as an expendable ordering and spacing tool, the use of core‐shell nanospheres allows a wide variety of controlled morphologies to be designed and prepared thus opening new perspectives for nanostructure fabrication processes through nanosphere lithography (NSL). Copyright © 2011 John Wiley & Sons, Ltd.     

Study of reactive ion etching of Si and SiO2 for CFxCl4−x gases

A parametric study of the etching of Si and SiO₂ by reactive ion etching (RIE) was carried out to gain a better understanding of the etching mechanisms. The following fluorocarbons (FCs) were used in order to study the effect of the F-to-Cl atom ratio in the parent molecule to the plasma and the etching properties: CF₄, CF₃Cl, CF₂Cl₂, and CFCl₃ (FC-14, FC-13, FC-12, and FC-11 respectively). The Si etch rate uniformity across the wafer as a function of the temperature of the wafer and the Si load, the optical emission as a function of the temperature of the load, the etch rate of SiO₂ as a function of the sheath voltage, and the mass spectra for each of the FCs were measured. The temperature of the wafer and that of the surrounding Si load strongly influence the etch rate of Si, the uniformity of etching, and the optical emission of F, Cl, and CF₂. The activation energy for the etching reaction of Si during CF₄ RIE was measured. The etch rate of Si depends more strongly on the gas composition than on the sheath voltage; it seems to be dominated by ion-assisted chemical etching. The etching of photoresist shifted from chemical etching to ion-assisted chemical etching as a function of the F-to-Cl ratio and the sheath voltage. The etch rate of SiO₂ depended more strongly on the sheath voltage than on the F-to-Cl ratio.     

Fabrication of size-tunable gold nanoparticles array with nanosphere lithography, reactive ion etching, and thermal annealing

Two-dimensional ordered arrays of gold (Au) nanoparticles were fabricated using two different variants of the nanosphere lithography technique. First, ordered arrays of polystyrene nanospheres on Si substrate were used as deposition masks through which gold films were deposited by electron beam evaporation. After the removal of the nanospheres, an array of triangular Au nanodisks was left on the Si substrate. After thermal annealing at increasing temperature, systematic shape transition of the nanostructures from original triangular Au nanodisks to rounded nanoparticles was observed. This approach allows us to systematically vary the size and morphology of the particles. In the second and novel technique, we made use of reactive ion etching to simultaneously reduce the dimension of the masking nanospheres and create arrays of nanopores on the substrate prior to the deposition of the Au films. These samples were subsequently annealed, which resulted in size-tunable and ordered Au nanoparticle arrays with the nanoparticles nested in the nanopores of the templated substrate. With the nanoparticles anchored in the nanopores, the substrate could be useful as a template for growth of other nanomaterials.     

Use of CF3,Br/Al,discharges for reactive ion etching of III-V semiconductors

The reactive ion etching of GaAs, InP, InGaAs, and InAlAs in CF₃Br/Ar discharges was investigated as a function of both plasma power density (0.56-1.3 W - cm^–2) and total pressure (10-40 mTorr) The etch rate of GaAs in 19CF₃Br:1Ar discharges at 10 m Torr increases linearly with power density, from 600 Å min^–1 at 0.56 W · cm^–2, to 1550 Å · min at 1.3 W · cm^–2. The in-based materials show linear increases in etch rates only for power densities above – 1.0 W · cm^–2. These etch rates are comparable to those obtained with CCI₂F₂:O₂ mixtures under the same conditions. Smooth surface morphologies and vertical sidewalls are obtained over a wide range of plasma parameters. Reductions in the near-surface carrier concentration in n-type GaAs are evident for etching with power densities of >0.8 W cm^–2, due to the introduction of deep level trapping centers. At 1.3 W· cm^–2, the Schottky barrier height of TiPtAu contacts on GaAs is reduced from 0.74 to 0.53 eV as a result of this damage, and the photoluminescent intensity from the material is degraded. Alter RIE, we detect the presence of both F and Br on the surface of all of the semiconductors. This contamination is worse than with CCl₂F₂-based mixtures. High-power etching with CF₃Br/Ar together with Al-containing electrodes can lead to the presence of a substantial layer of aluminum oxide on the samples if the moisture content in the reactor is appreciable.     

Functionalizable Nanomorphology Gradients via Colloidal Self-Assembly

We present a novel approach for the fabrication of tailored nanomorphology gradients on metal oxide surfaces. We first show the direct formation of a nanocolloidal density gradient by a dip-coating process. The obtained silica nanoparticle gradients are then subjected to a heat treatment. Control of this sintering step allows the precise tailoring of the particle morphology on the surface. Both these processes together provide a new tool to form precise, tunable, and material-independent nanomorphology gradients.     

Acid-catalyzed isomerization of pivalaldehyde to methyl isopropyl ketone via a reactive protosolvated carboxonium ion intermediate.

Quantitative rearrangement of pivalaldehyde to methyl isopropyl ketone is observed in acids such as trifluoromethanesulfonic acid, anhydrous HF, and trifluoroethyl alcohol-BF3 but not in trifluoroacetic acid. Studies in a mixture of trifluoroacetic acid and trifluoromethanesulfonic acid show that acids with H(o) < or = -11 are able to carry out complete isomerization. These results and density functional theory calculations at the B3LYP/6-31G level suggest that protonated pivalaldehyde undergoes further protosolvation at higher acidities to a reactive superelectrophilic species resulting in rearrangement. A mechanism for the pivalaldehyde rearrangement to methyl isopropyl ketone in strong protic acids involving a reactive protosolvated superelectrophilic intermediate is suggested. Aspects of the related mechanism of the reaction with isobutane with CO in HF/BF3 medium leading to methyl isopropyl ketone are also discussed.     

模板技术制备有序大孔含硅聚酰亚胺薄膜

以二氧化硅胶体晶体为模板,将由含硅的芳香二酐单体与芳香二胺单体在N,N-二甲基乙酰胺溶液中进行共聚得到的聚酰胺酸填入模板的空隙,经热环化,得到了二氧化硅／含硅聚酰亚胺复合物,再用氢氟酸除去二氧化硅模板,制备出了有序大孔含硅聚酰亚胺薄膜,通过扫描电子显微镜和紫外-可见光分光光度计对样品进行了表征．研究表明,所制备的含硅聚酰亚胺多孔薄膜,孔大小均匀、无收缩,在空间排布高度有序,其有序结构与模板中二氧化硅微球自组装方式完全相同,并且大孔之间由小孔互相连通．由于大孔的周期性排列,制备的薄膜表现出较好的光学特性．含硅聚酰亚胺兼具聚酰亚胺和有机硅树脂的优良性能,使制备的有序大孔薄膜在光电器件、催化、吸附、生物材料等方面具有十分重要的应用价值．     

Microstructure analysis of a carbon-carbon composite using argon ion etching.

The microstructure of carbon-carbon composites obtained by chemical vapor infiltration of a carbon fiber felt was comparatively studied by reflection light microscopy, transmission electron microscopy (TEM), scanning electron microscopy (SEM), atomic force microscopy (AFM), and laser scanning confocal microscopy (LSCM). Ar+ ion etching was used to reveal and distinguish structural units of the pyrolytic carbon matrix. Mechanically polished samples, polished and subsequently ion etched samples, and fractured samples were compared. The values of surface roughness and surface height after polishing or after polishing and subsequent etching determined by AFM and LSCM correlate well with the degree of texture of the matrix layers obtained by polarized light microscopy and selected area electron diffraction. The carbon matrix is composed of structural units or "cells," which contain a carbon fiber and a sequence of several differently textured layers around each fiber. Within high-textured layers columnar grains are well recognizable using polarized reflection light microscopy and confocal microscopy. The size of depressions within high-textured carbon layers found by AFM after ion etching correlates well with the size of differently tilted domains detected by both TEM and SEM.     

Remarkably reactive dihydroindoloindoles via palladium-catalysed dearomatisation

Palladium-catalysed dearomatisation reactions allow access to a previously unknown class of indoloindole heterocycle: 5,10b-dihydroindolo[2,3-b]indoles. The highly reactive nature of these compounds is demonstrated by their facile reactions with water and with hydride, alkyl, aryl and allyl-based organometallic nucleophiles.     

Nanopatterning and micropatterning of cobalt containing block copolymers via phase‐separation and lithographic techniques

Reversible addition fragmentation transfer (RAFT) agent functionalized polydimethylsiloxane (PDMS‐RAFT) was used as a macro‐RAFT agent to polymerize a mixed sandwich cobaltocene containing monomer featuring η⁵‐cyclopentadienyl‐cobalt‐η⁴‐cyclobutadiene. High molecular weight block copolymers (BCP) consisting of a metallic block and a PDMS block with excellent control over molecular weight and polydispersity were prepared. Solid‐state self‐assembly of this BCP resulted in hexagonal domains of metallopolymer phase‐separated from PDMS. In solution, spherical micelles with a metallic core, stabilized by a PDMS corona were prepared. Pyrolysis of the BCP resulted in magnetic nanoparticles with 30% char yield. The BCP was used as an ink material for microcontact printing (μCP) to transfer long‐ranged patterns. © 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015 , 53, 2747–2754     

Fluoride ion transfer and stabilisation of reactive ions

Some general guidelines for the generation of salts with high fluoride ion donor ability are discussed. A preliminary scale for a limited number of fluoride ion donors is presented, cations are classified according to their anion-cation interaction properties. Examples for fluoride ion transfer reactions are given and the influence of anion-cation interaction on the stabilisation of reactive anions is discussed. In our work mainly TAS fluoride (Me₂N)₃S⁺Me₃SiF₂⁻ has been used as fluoride ion source: (a) for fluoride ion transfer to coordinatively unsaturated sulfur species, to SN and SO multiple bond systems, to SN, PN and CN heterocycles, (b) for the stabilisation of primary products of nucleophilic attacks and of intermediates in isomerisation processes or of intermediates in polymerisation processes, (c) for the generation of “naked” anions by silicon-element bond cleavage, and (d) for the activation of element-fluorine bonds by anion formation.     

Micro/nanopatterning of proteins via contact printing using high aspect ratio PMMA stamps and nanoimprint apparatus

Micro- and nanoscale protein patterns have been produced via a new contact printing method using a nanoimprint lithography apparatus. The main novelty of the technique is the use of poly(methyl methacrylate) (PMMA) instead of the commonly used poly(dimethylsiloxane) (PDMS) stamps. This avoids printing problems due to roof collapse, which limits the usable aspect ratio in microcontact printing to 10:1. The rigidity of the PMMA allows protein patterning using stamps with very high aspect ratios, up to 300 in this case. Conformal contact between the stamp and the substrate is achieved because of the homogeneous pressure applied via the nanoimprint lithography instrument, and it has allowed us to print lines of protein approximately 150 nm wide, at a 400 nm period. This technique, therefore, provides an excellent method for the direct printing of high-density sub-micrometer scale patterns, or, alternatively, micro-/nanopatterns spaced at large distances. The controlled production of these protein patterns is a key factor in biomedical applications such as cell-surface interaction experiments and tissue engineering.     

Gas separation in nanoporous membranes formed by etching ion irradiated polymer foils

Polymer membranes with pores with radii in the range of several 10–100 nm were formed by irradiating polyimide foil with highly energetic heavy ions and etching the latent ion tracks with hypochlorite. The aerial density of the pores could be chosen up to an upper limit of 10⁸ pores cm^?2, at which too many pores start to overlap. The straight cylindrical pores were tested for their gas permeation and gas separation performance. With a gas mixture of CO and CO₂ as model system, gas chromatographic measurements showed that CO penetrates faster through the membrane than CO₂, leading to gas separation. This is possible because the mean free path of the molecules is in the order of the pore radius, which is in the transition flow region close to molecular flow conditions.     

Metal-organic framework membranes fabricated via reactive seeding

A facile reactive seeding (RS) method was developed for the preparation of continuous MOF membranes on alumina porous supports, in which the porous support acted as the inorganic source reacting with the organic precursor to grow a seeding layer.     

Electrocatalysis via Direct Electrochemistry of Myoglobin Immobilized on Colloidal Gold Nanoparticles

The direct electron transfer between immobilized myoglobin (Mb) and colloidal gold modified carbon paste electrode was studied. The Mb immobilized on the colloidal gold nanoparticles displayed a pair of redox peaks in 0.1 M pH 7.0 PBS with a formal potential of –(0.108 ± 0.002) V (vs. NHE). The response showed a surface‐controlled electrode process with an electron transfer rate constant of (26.7 ± 3.7) s ^?1 at scan rates from 10 to 100 mV s^?1 and a diffusion‐controlled process involving the diffusion of proton at scan rates more than 100 mV s^?1. The immobilized Mb maintained its activity and could electrocatalyze the reduction of both hydrogen peroxide and nitrite. Thus, the novel renewable reagentless sensors for hydrogen peroxide and nitrite were developed, respectively. The activity of Mb with respect to the pseudo peroxidase with a K_M^app value of 0.65 mM could respond linearly to hydrogen peroxide concentration from 4.6 to 28 μM. The sensor exhibited a fast amperometric response to NO₂^? reduction and reached 93% of steady‐state current within 5 s. The linear range for NO₂^? determination was from 8.0 to 112 μM with a detection limit of 0.7 μM at 3σ.     

Colloidal synthesis of organic-capped ZnO nanocrystals via a sequential reduction-oxidation reaction

A nonhydrolytic route to quantum-sized (d < 9 nm) ZnO nanocrystals in homogeneous organic solutions is presented. Nearly spherical ZnO nanocrystals were grown in a surfactant mixture of hexadecylamine and oleic acid (OLEA) by means of a two-step chemical process, based on the hot reduction (at 180-250 degrees C) of a zinc halide by superhydride (LiBEt3H) followed by oxidation of the resulting product. The experimental results suggested that the controlled growth of ZnO in the nanosized regime depended both on the OLEA-assisted generation of intermediate metallic nanoparticles and on the adjustment of their oxidation conditions by using a mild oxidant, trimethylamine-N-oxide, rather than molecular oxygen. The present synthetic approach demonstrates to be particularly suitable to prepare organic-soluble ultra-small ZnO nanocrystals of low size dispersion and of stable size, which are appealing for optoelectronic, catalytic, and sensing purposes.     

Chemically assisted ion beam etching of silicon and silicon dioxide using SF6

A chemical flux of sulfur hexafluoride (SF₆) in conjunction with low-energy Ar-ion bombardment has been used for chemically assisted ion beam etching (CAIBE) of silicon and silicon dioxide. The study has shown a large degree of independent control over the selectivity and anisotropy in dry etching. The total etch rate could be controlled by varying either the Ar-ion milling parameters or the chemical flux of SF₆. Etch rate enhancement of 7–8 for silicon and 3–4 for silicon dioxide have been obtained over pure physical etching.