Observation of grain growth in swift heavy ion irradiated NiO thin films

NiO thin films grown on Si(100) substrates by electron beam evaporation, were sintered at 500 °C and 700 °C. The films were irradiated with 120 MeV Au⁹⁺ ions. Irradiation had different effects depending upon the initial microstructure of the films. Irradiation of the films at a fluence of 3 × 10¹¹ ions cm⁻² leads to grain growth for the films sintered at 500 °C and grain fragmentation for the films sintered at 700 °C. At still higher fluences of irradiation, grain size in 500 °C sintered film decreased, but the same improved in 700 °C sintered film. Associated with the grain size, texturing of the films was also shown to undergo significant modifications under irradiation.     

外加气流对脉冲激光烧蚀制备纳米Si晶粒尺寸分布的影响

提出一种控制脉冲激光烧蚀制备纳米Si晶粒尺寸分布的新方法。在10Pa的Ar环境中,采用脉冲激光烧蚀高阻抗单晶硅靶沉积制备了纳米Si晶薄膜。在羽辉正上方2.0cm,距靶0.3～3.0cm范围内的不同位置引入氩气流,在烧蚀点正下方2.0cm处水平放置单晶Si(111)衬底来收集制备的纳米Si晶粒。利用扫描电子显微镜观察样品表面形貌,并对衬底不同位置上纳米Si晶粒进行统计。结果表明:在不引入气流时,晶粒的尺寸随靶衬间距的增加先增大后减小,晶粒尺寸峰值出现在距靶1.7cm处;引入气流后,晶粒尺寸分布发生变化,在距靶1.7cm引入气流时晶粒尺寸峰值最大,在距靶3.0cm引入气流时晶粒尺寸峰值最小,且出现晶粒尺寸峰值的位置随着引入气流位置的增加而增大。     

The grain size distribution in nanocomposite films

The grain size distributions and related mechanisms in nanocomposite films with nanostructures comprising a nanocrystalline (nc) phase surrounded by an amorphous (a) matrix under different amorphous phase amounts (V _a) have been analyzed by using a Monte Carlo grain growth model. The results show that with the V _a value increasing to a critical value of ～28%, the grain size distribution approaches lognormality, and it becomes off-lognormal when the V _a value is larger or smaller than ～28%. The simulated results are in a good agreement with the experiment. It is shown that the homogenous or inhomogeneous grain growth mode, determined by the energy exerted on the grain boundary, originates in lognormal or off-lognormal grain size distributions in nanocomposite films. Also, in a system with lognormal grain size distribution, the amorphous phase just covers all grain boundaries (GBs) and the length obtained by summing the boundary circumference of all nanograins is the longest. It is expected that this microstructure can result in exceptional properties of nanocomposite films.     

Consolidation of cryomilled Al–Si using spark plasma sintering

Cryomilled eutectic aluminum–12% silicon powder was sintered using spark plasma sintering (SPS) to create bulk compacts. The cryomilling serves to break up and disperse the eutectic phase in the powder to create a well-distributed Si phase throughout the matrix and to modify the morphology of the Si phase from plate-like to spherical, whilst refining the aluminium grain size to the nanometric level. The effects of different sintering times and temperatures using SPS on the densification of the powder, the aluminium grain size evolution, the growth of the Si phase and the morphology change of the Si phase were investigated. The compacts were analysed using X-ray diffraction, scanning electron microscopy and optical microscopy. The initial stages of densification appear to be highly dependent on the yield strength of the powder. An estimate of the temperature gradient seen in the powder bed was made and calculated to be near 200?°C at the highest point. The Al and Si phase growth was investigated and it was observed that the Si coarsening rate is increased due to the increased volume of grain boundaries. As the Si coarsens, any pinning effect on the Al grains is lost, resulting in a highly unstable microstructure that coarsens rapidly.     

An application of the dust grain charging model to determination of secondary electron spectra

Dust grains – objects of different shapes with a size distribution from micro to nanometers – are generally considered as a part of many space as well as laboratory plasmas. Among various dust charging processes, electron-induced secondary emission plays an important role in plasmas containing a noteworthy portion of high-energy electrons. Since a part of secondary electrons has not the energy high enough to overcome the surface potential barrier, the resulting grain charge is determined not only by the secondary emission yield (related to the grain material and size) but also by the secondary electron spectrum. We have developed a model of secondary electron emission from small dust grains. In the present contribution, we discuss the profile of a secondary emission yield that can be received from the model and the measured equilibrium grain charge, both as functions of an incident electron beam energy. A comparison of these quantities leads to an estimation of secondary electron spectra. We have found that: (1) the energy spectrum of secondary electrons does not change with the energy of primary electrons and (2) the energy spectrum depends on the target material being harder for gold and silver than for glass grains.     

Silicon grain arrays prepared using a pattern crystallization technique of pulsed-excimer laser irradiation

Silicon grain arrays were prepared using a pattern crystallization technique of pulsed KrF excimer laser irradiation. The precursor material was hydrogenated amorphous silicon (a-Si:H) thin films deposited on single crystal Si wafers by plasma-enhanced chemical vapor deposition. It was shown that Si grains with a uniform size and a well-defined periodicity embedded in the a-Si:H matrix were obtained by this simple technique. The grain size was less than 2 μm. Relativly strong photo-luminescence with two peaks at 720 and 750 nm was observed at room temperature. We expect to reduce Si grain sizes by optimizing the growth conditions of a-Si:H thin films and controlling the temperature distribution in the film during laser irradiation. Received: 21 November 2000 / Accepted: 12 December 2000 / Published online: 9 February 2001     

生长温度对磁控溅射ZnO薄膜的结晶特性和光学性能的影响

采用反应射频磁控溅射方法，在Si (100) 基片上制备了具有高c轴择优取向的ZnO薄膜.利用 原子力显微镜、透射电子显微镜、X射线衍射分析、拉曼光谱等表征技术，研究了沉积温度 对ZnO薄膜的表面形貌、晶粒尺度、应力状态等结晶性能的影响；通过沉积温度对透射光谱 和光致荧光光谱的影响，探讨了ZnO薄膜的结晶特性与光学性能之间的关系.研究结果显示， 在室温至500℃的范围内，ZnO薄膜的晶粒尺寸随沉积温度的增加而增加，在沉积温度为500 ℃时达到最大；当沉积温度为750℃时，ZnO薄膜的晶粒尺度有所减小；在室温至750℃的范 围内，薄膜中ZnO晶粒与Si基体之间均存在着相对固定的外延关系；在沉积温度低于500℃时 ，制备的ZnO薄膜处于压应变状态，而750℃时沉积的薄膜表现为张应变状态.沉积温度的不 同导致ZnO薄膜的折射率、消光系数、光学禁带宽度以及光致荧光特性的变化，沉积温度对 紫外光致荧光特性起着决定性的作用.此外，探讨了影响薄膜近紫外光致荧光发射的可能因 素. 关键词： ZnO薄膜 表面形貌 微观结构 光学常数     

Grain growth and static recrystallization kinetics in Co–20Cr–15W–10Ni (L-605) cobalt-base superalloy

The grain size evolution of cold-rolled L-605 cobalt-base superalloy during ultra-rapid annealing is investigated in this paper. Cold-worked specimens undergo static recrystallization, leading to grain refinement or grain coarsening depending on the annealing time and temperature. The kinetics of grain growth is found to be independent of the initial deformation. The evolution of grain size can be simply described by a grain growth model for high temperatures and long annealing times, and the mobility of interfaces is estimated by modelling. Fast annealing treatment process is a very promising technique to customize grain size and enhance mechanical strength. In particular, the reduction of annealing time is an efficient method to produce a refined microstructure through static recrystallization.     

A discrete nonlinear mass transfer equation with applications in solid-state sintering of ceramic materials

The evolution of grain structures in materials is a complex and multiscale process that determines the material's final properties [1]. Understanding the dynamics of grain growth is a key factor for controlling this process. We propose a phenomenological approach, based on a nonlinear, discrete mass transfer equation for the evolution of an arbitrary initial grain size distribution. Transition rates for mass transfer across grains are assumed to follow the Arrhenius law, but the activation energy depends on the degree of amorphization of each grain. We argue that the magnitude of the activation energy controls the final (sintered) grain size distribution, and we verify this prediction by numerical simulation of mass transfer in a one-dimensional grain aggregate.     

Thickness dependence of grain size and surface roughness for dc magnetron sputtered Au films

<正>The grain size and surface morphology of sputtered Au films are studied by x-ray diffraction and atomic force microscope.For as-deposited samples the grain growth mechanism is consistent with the two-dimensional(2D) theory, which gives relatively low diffusion coefficient during deposition.The annealing process demonstrates the secondary grain growth mechanism in which the thickness dependence of grain boundary energy plays a key role.The surface roughness increases with the increase of grain size.     

Simulation of polycrystalline 3D film growth: An investigation of the evolution of grain size and texture in diamond films

An analytical method for simulating gas phase film growth has been developed and used to study the growth of diamond films during prolonged deposition, i.e. the film thickness is much larger than the lateral grain size. From a model system composed of 10⁴ grains, reliable results can be evaluated for the growth of diamond films by (111) and (001) deposition under different initial conditions and with varying growth parameters. It is demonstrated that the rate of structure evolution is sensitively influenced by the aspect ratio of diamond crystal. A near-linear proportionality between the average grain size and the thickness of films can be approximately yielded for a large film thickness which is about 10 times of the average distance of the nuclei. The proportionality constant varies for a statistical nucleation from 0.0056 to 0.43 by changing the aspect ratio. Furthermore, the orientational distribution is drastically narrowed down so that the probability of coalescence of grains with a slight orientational difference is considerably increased. Received: 28 September 2000 / Accepted: 19 February 2001 / Published online: 3 May 2001     

由电阻率的准静态测量研究薄膜晶粒的生长动力学

提出一种用薄膜电阻率的准静态测量来进行薄膜晶粒生长动力学研究的方法。在超高真空系统中用直流溅射制备Pd膜,然后测量不同温度下Pd膜电阻率与退火时间的关系。利用二流体模型推算出对应晶粒尺寸大小的变化,并和TEM结果进行比较。在此基础上进一步分析了退火温度对薄膜中晶粒尺寸变化所起的作用,拟合出晶粒的生长曲线。实验结果表明晶粒长大是一种热激活生长过程,激活能约为0.53eV。 关键词：     

Influence of substrate temperature and ion-beam energy on the syntheses of aluminium nitride thin films by nitrogen-ion-assisted pulsed-laser deposition

Aluminium nitride (AlN) thin films have been grown on Si(100), Si(111) and Sapphire Al₂O₃(001) substrates by pulsed KrF excimer laser (wavelength 248 nm, duration 30 ns) ablation of an AlN target with the assistance of nitrogen-ion-beam bombardment. The influence of process parameters such as substrate temperature and ion-beam energy has been investigated in order to obtain high-quality AlN films. The AlN films deposited by pulsed-laser deposition (PLD) have been characterized by X-ray diffraction (XRD) to determine the crystalline quality, grain size and growth orientation with respect to the substrate. The XRD spectra of AlN films on Si(100), Si(111) and Sapphire substrates yield full-width-half-maximum (FWHM) values of approximately 1.6. The bonding characteristics in the films have been evaluated by Raman spectroscopy. The chemical composition of the films has been characterized by X-ray photoelectron spectroscopy (XPS). The surface morphology of the films has been measured by atomic force microscopy (AFM). At a substrate temperature of at least 600 °C, polycrystalline AlN films with orientations of AlN(100) and AlN(101) have been synthesized. PACS 68.55.-a; 81.15.Fg; 77.84.Bw     

Controlling mechanical and physical properties of Al-Si alloys by controlling grain size through grain refinement and electromagnetic stirring

The present study concerns the influence of a travelling magnetic field (TMF) on the hardness, tensile strength and electrical conductivity of directionally solidified grain-refined and non-refined Al-7 wt.% Si alloys. Upwards and downwards travelling fields have been applied to force convection within the solidifying melt. Modifications of the examined physical and mechanical properties depend on the formation of a fine equiaxed structure caused by both the addition of grain refining AlTi5B1-particles and by electromagnetic stirring as well. Electromagnetic stirring without grain refining particles leads to an increase in tensile strength. The addition of grain refiners into the melt leads to the highest reduction of the mean grain size and results in a decrease in electrical conductivity. A melt stirring by a sufficiently high magnetic field provides a homogeneous grain size distribution in the sample volume which impacts the distribution of hardness, tensile strength and electrical conductivity.     

ZnO:Ag film growth on Si substrate with ZnO buffer layer by rf sputtering

ZnO buffer layers were deposited on n-Si (1 0 0) substrate by rf magnetron sputtering at a lower power of 40 W. Then Ag-doped ZnO (SZO) films were deposited on buffered and non-buffered Si at a higher sputtering power of 100 W. The effects of buffer layer on the structural, electrical and optical properties of SZO films were investigated. The three-dimensional island growth process of ZnO buffer layer was discussed. The energy band diagram of p-SZO/n-Si heterojunction was constructed based on Anderson's model. Results show the ZnO buffer layer leads to better properties of SZO film, including larger grain size, smoother surface, higher carrier mobility, better rectifying behavior, lower interface state density, and weaker deep-level emission. It is because the ZnO buffer layer effectively relaxes the partial stress induced by the large lattice mismatch between SZO and Si.     

高速率沉积磁控溅射技术制备Ge点的退火生长研究

采用磁控溅射技术在Si衬底上以350?C沉积14 nm的非晶Ge薄膜,通过退火改变系统生长热能,实现了低维Ge/Si点的生长.利用原子力显微镜(AFM)和拉曼(Raman)光谱所获得的形貌和声子振动信息,对Ge点的形成机理和演变规律进行了研究.实验结果表明:在675?C退火30 min后,非晶Ge薄膜转变为密度高达8.5×109cm-2的Ge点.通过Ostwald熟化理论、表面扩散模型和对激活能的计算,很好地解释了退火过程中,Ge原子在Si表面迁移、最终形成纳米点的行为.研究结果表明用高速沉积磁控溅射配合热退火制备Ge/Si纳米点的方法,可为自组织量子点生长实验提供一定的理论支撑.     

Structure and thermophysical properties of single-wall Si nanotubes

In this work, molecular dynamics (MD) simulation based on the environment-dependent interatomic potential is carried out to explore the structure, atomic energy distribution, and thermophysical properties of single-wall Si nanotubes (SWSNTs). The unique structure of SWSNTs leads to a wider range energy distribution than crystal Si (c-Si), and results in a bond order in the range of 4.8–5. The thermal conductivity of SWSNTs is much smaller than that of bulk Si, and shows significantly slower change with their characteristic size than that of Si films. Out of the three types of SWSNTs studied in this work, pentagonal SWSNTs have the highest thermal conductivity while hexagonal SWSNTs have the lowest one. The specific heat of SWSNTs is a little larger than that of bulk c-Si. Pentagonal and hexagonal SWSNTs have close specific heats, which are a little larger than that of rectangular SWSNTs.     

In situ monitoring of nucleation and evolution of Ge nanodots on faintly oxidized Si(1 1 1) surfaces

We have investigated the nucleation and evolution of germanium (Ge) nanodot (ND)s taking place while depositing Ge onto the silicon (Si) (1 1 1) surfaces with ultra-thin Si oxide films by using ultra-high vacuum in situ high-resolution transmission electron microscopy in the profile-imaging geometry. Various types of growth phenomena such as nucleation, growth and coalescence of Ge NDs have successfully been observed. The results show that the growth phenomena of the Ge NDs are dramatically rapid after their size reaches the size of the critical nucleus. The critical nucleus size estimated from a model using the cohesive energy of the Ge NDs has been consistent with observed one.     

同质与异质外延掺杂CVD金刚石薄膜的结构与性能

采用化学气相沉积(CVD)技术,以高温高压(HTHP)合成的(100)金刚石和p型(100)Si为衬底制备了硫掺杂和硼-硫共掺杂金刚石薄膜,利用原子力显微镜(AFM)、扫描隧道显微镜(STM)及隧道电流谱(CITS)等手段分析同质和异质外延CVD掺杂金刚石薄膜的结构和性能.结果表明:异Si衬底上CVD金刚石的形核密度低,薄膜表面比较粗糙,粗糙度达到18.5nm;同质HTHP金刚石衬底上CVD金刚石薄膜晶粒尺寸约为10—50nm,表面平整,表面粗糙度为1.8nm.拉曼测试和电阻测量的结果显示,在HTHP金刚 关键词： 金刚石 掺杂 外延     

脉冲激光晶化超薄非晶硅膜的分子动力学研究

利用准分子脉冲激光晶化非晶硅薄膜是制备高密度尺寸可控的硅基纳米结构的有效方法之一.本文将脉冲激光对非晶硅超薄膜的影响处理为热传导问题,采用了基于Tersoff势函数的分子动力学方法模拟了在非晶氮化硅衬底上2.7 nm超薄非晶硅膜的脉冲激光晶化过程.研究了不同激光能量对非晶硅薄膜晶化形成纳米硅的影响,发现在合适的激光能量窗口下,可以获得高密度尺寸可控的纳米硅薄膜,进而模拟了在此能量作用下非晶硅膜中成核与生长的机理与微观过程,并对晶化所获得的纳米硅薄膜的微结构进行了分析. 关键词： 非晶硅 分子动力学 脉冲激光晶化