共查询到19条相似文献,搜索用时 78 毫秒
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微波等离子体化学气相沉积法低温制备直纳米碳管膜 总被引:7,自引:0,他引:7
Among the three main methods for the synthesis of carbon nanotubes (CNTs), chemical vapor deposition (CVD) has received a great deal of attention since CNTs can be synthesized at significantly low temperature. Plasma chemical vapor deposition methods can synthesize CNTs at lower temperature than thermal CVD. But in the usual catalytic growth of CNTs by CVD, CNTs are often tangled together and have some defects. These will limit the property research and potential applications. How to synthesize the straight CNTs at low temperature becomes a challenging issue. In this letter, straight carbon nanotube (CNT) films were achieved by microwave plasma chemical vapor deposition (MWPCVD) catalyzed by round Fe-Co-Ni alloy particles on Ni substrate at 610℃. It was found that, in our experimental condition, the uniform growth rate along the circumference of round alloy particles plays a very important role in the growth of straight CNT films. And because the substrate is conducting, the straight CNT films grown at low temperature may have the benefit for property research and offer the possibility to use them in the future applications. 相似文献
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化学气相沉积法合成高结晶度的三元系Cd1-xZnxS纳米线 总被引:1,自引:0,他引:1
以硫化锌、硫化镉和活性碳粉作为反应物,利用化学气相沉积方法成功合成了单晶Cd1-xZnxS纳米线.为了解产物的结构、形貌、组分、微结构以及声子振动模式,对样品进行了扫描电镜、透射电镜、X射线衍射、能谱分析以及拉曼光谱分析.分析显示合成的纳米线为六方铅锌矿结构,生长方向沿着[210]方向,长度均为10μm,直径在80-100 nm之间,x的值约为0.2.拉曼光谱分析显示产物的拉曼峰位与纯CdS相比发生了蓝移. 相似文献
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以硅胶负载的Co纳米颗粒为催化剂,在低流量的减压体系中通过化学气相沉积法制备了规则螺旋状的纳米碳管.通过TEM和HRTEM研究了螺旋碳管的形貌、尺度分布以及管身、曲面和节点处的晶型;讨论了催化剂制备中pH值对催化剂的尺寸、规则程度和存在形态以致对螺旋碳管产量、管径厚度以及螺旋管的相对比例的影响;此外,还分析了反应压力对碳管生长的影响. 相似文献
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二维过渡族金属硫属化合物因其带隙具有强烈的层数依赖性而在电子器件方面具有广泛的应用前景.其中单层二硫化钼(MoS2)是该系列材料中最典型的一种直接带隙半导体,它具有优异的光、电、磁、热和力学性能.二维MoS2有望在光电探测、光伏器件、场效应晶体管、存储器件、谷电子和自旋器件、温差电器件、微纳机电器件和系统等方面得以广泛应用.化学气相沉积(CVD)法已成为制备二维过渡族金属硫属化合物如MoS2、MoSe2、WS2和WSe2等原子层薄膜的主要手段,尤其科学界利用CVD法对二维MoS2材料进行了深入的制备探索,通过该方法制备的MoS2薄膜在电子和光电器件方面已经有广泛研究.本文将从二维MoS2的基本物性出发,详细介绍CVD法制备MoS2的各种工艺过程,如热分解硫代硫酸盐法、硫化Mo(MoO3-x)薄膜制备法、MoO3-x粉体与硫属前驱体气相合成法和钼箔表面直接硫化法,并介绍了基于MoS2的二维异质结构筑方法.在制备材料的基础上,详细阐述了二维MoS2在场效应晶体管、光电探测器、柔性电子器件以及异质结器件方面的应用,并展望了二维材料在半导体器件中的应用前景. 相似文献
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以TiC14为源物质采用常压化学气相沉积法制备了TiO2薄膜。用紫外光谱测定了膜的透过率,进而计算出折光率、消光系数、光学带隙能等光学参数。结果发现,在不同气流量、沉积温度为100~250℃的条件下制备的TiO2膜,其折射率在2.16~2.82范围内,消光系数在0.04×10-3~6.70×10-3范围内,光学带隙能在2.8~3.08eV范围内。在光催化作用下,TiO2膜用于处理苯酚溶液,苯酚的转化率高达54.05%。关键词##4化学气相沉积(CVD);;沉积率;;折光率;;消光系数;;光催化 相似文献
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原子层沉积技术制备单原子催化剂 总被引:1,自引:0,他引:1
贵金属单原子催化剂因具有独特的催化性能和高的利用率而迅速引人关注.原子层沉积(ALD)逐渐成为大批量合成稳定单原子的有力工具.本文总结了采用ALD合成单原子的最新进展,以及未来的研究方向和趋势. 相似文献
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以过渡金属为催化衬底的化学气相沉积法(Chemical Vapor Deposition,CVD)已经可以制备与机械剥离样品相媲美的石墨烯,是实现石墨烯工业应用的关键技术之一。原子尺度理论研究能够帮助我们深刻理解石墨烯生长机理,为实验现象提供合理的解释,并有可能成为将来实验设计的理论指导。本文从理论计算的角度,总结了各种金属衬底在石墨烯CVD生长过程中的各种作用与相应的机理,包括在催化碳源裂解、降低石墨烯成核密度等,催化加快石墨烯快速生长,修复石墨烯生长过程中产生的缺陷,控制外延生长石墨烯的晶格取向,以及在降温过程中石墨烯褶皱与金属表面台阶束的形成过程等。在本文最后,我们对当前石墨烯生长领域中亟需解决的理论问题进行了深入探讨与展望。 相似文献
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Rodlike polymers with repeat units composed of groups with high π-electron density directly on the backbone, such as linearly conjugated double bonds and aromatic heterocyclic rings, exhibit high isotropic refractive indexes and high birefringence values when oriented. Typical polyamide birefringence values for oriented films far exceed 0.5 and several are as high as 0.85; the corresponding parallel and perpendicular indexes for these polymers are in the 2.2-2.4 and 1.5-1.7 range, respectively, depending on the molecular structure and degree of orientation. The isotropic index values may be as high as 1.8-2.0. In order to make optical devices utilizing these highly birefringent films, it is frequently necessary to bond them to films or glass, which necessitates the use of index-matching, optical-quality bonding agents. We devised two synthetic strategies to obtain polymers that exhibit these properties. In one approach, we synthesized a series of colorless, nonbirefringent, polyacrylates (and methacry-lates) containing halogenated carbazole rings; these results will be reported in a forthcoming paper that is currently being prepared. We have also modified rodlike polyamides by substituting index-enhancing groups directly on the amide nitrogen; the refractive index values of the resulting materials are in the 1.60-1.67 range. The most important finding of the latter research was the realization that rodlike polyamides not only exhibit unusually high birefringence, but also greatly enhanced isotropic refractive indexes, which is directly related to their rodlike conformation. 相似文献
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Refractive index of silicon nitride film deposited in a plasma enhanced chemical deposition system is modeled by using neural network. The deposition process was characterized with a full factorial experiment. Additional 12 experiments were conducted to test model appropriateness. Predicted model behaviors were in good agreement with actual measurements. Deposition mechanisms were qualitatively examined especially with respect to the pressure. Possible interactions between the pressure and other factors (SiH4, NH3, radio frequency (RF) power, and substrate temperature) were examined on the basis of SiH/NH bond ratio. The refractive index increased with increasing either SiH4 flow rate or RF power. In contrast, the refractive index decreased with increasing NH3 flow rate. Little interactions between the pressure and RF power were observed. Pressure effect on the refractive index was quite different depending on the level of SiH4 flow rate or substrate temperature. In general, increasing the pressure increased the refractive index. Meanwhile, the refractive index was insensitive to parameter variations at relatively high pressures. The most complex interaction occurred as the pressure interacted with the temperature. Useful clues to control the refractive index were revealed from the predictive model. 相似文献
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一类高折射率光固化有机硅树脂的性能研究 总被引:1,自引:0,他引:1
光固化有机硅材料兼具光固化的高效、能耗低和环保以及有机硅树脂优异的耐温、耐候性和电绝缘性能,因此,在LED等电子器件封装方面受到广泛关注.本文研究了自制的3种含丙烯酸酯基团的光固化苯基有机硅预聚物KDS-10、KMDS-03和KMS-03的光固化特性、光学性能和热稳定性能.结果表明,这些有机硅预聚物的折光指数随苯环含量的增加而增高,苯环含量从22.3%到37.7%,折光指数相应从1.496到1.542;3种预聚物与多种丙烯酸酯相容性好,用双官能的TPGDA作稀释剂,固化反应速率最快,丙烯酸酯基团的转化率也最高;光引发剂TPO引发的光固化反应速率和转化率均最高;高折射率有机硅预聚物KDS-10光固化后的薄膜具有优异的光学性能,在550 nm处的透过率为92.54%;玻璃化转变温度约为-17.41℃,起始分解温度为385℃. 相似文献
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