化学气相沉积法制备氮化钛

本文以氮化钛的CVD制备为例,说明了源物质的选择对CVD过程的影响.在此基础上,综述了化学气相沉积技术在材料制备领域的最新进展.     

化学气相沉积法合成石墨烯的转移技术研究进展

化学气相沉积(CVD)法合成石墨烯已为人们广泛研究采用。其中,如何将生长的石墨烯材料转移到与各种器件匹配的基底上是十分重要的科学问题。本文从方法、特点和结果等方面综述了由CVD法合成石墨烯的几种主要转移技术的研究进展,并对转移技术的未来做出了展望。     

微波等离子体化学气相沉积法低温制备直纳米碳管膜

Among the three main methods for the synthesis of carbon nanotubes (CNTs)， chemical vapor deposition (CVD) has received a great deal of attention since CNTs can be synthesized at significantly low temperature. Plasma chemical vapor deposition methods can synthesize CNTs at lower temperature than thermal CVD. But in the usual catalytic growth of CNTs by CVD， CNTs are often tangled together and have some defects. These will limit the property research and potential applications. How to synthesize the straight CNTs at low temperature becomes a challenging issue. In this letter， straight carbon nanotube (CNT) films were achieved by microwave plasma chemical vapor deposition (MWPCVD) catalyzed by round Fe-Co-Ni alloy particles on Ni substrate at 610℃. It was found that， in our experimental condition， the uniform growth rate along the circumference of round alloy particles plays a very important role in the growth of straight CNT films. And because the substrate is conducting， the straight CNT films grown at low temperature may have the benefit for property research and offer the possibility to use them in the future applications.     

化学气相沉积法合成高结晶度的三元系Cd1-xZnxS纳米线

以硫化锌、硫化镉和活性碳粉作为反应物,利用化学气相沉积方法成功合成了单晶Cd1-xZnxS纳米线.为了解产物的结构、形貌、组分、微结构以及声子振动模式,对样品进行了扫描电镜、透射电镜、X射线衍射、能谱分析以及拉曼光谱分析.分析显示合成的纳米线为六方铅锌矿结构,生长方向沿着[210]方向,长度均为10μm,直径在80-100 nm之间,x的值约为0.2.拉曼光谱分析显示产物的拉曼峰位与纯CdS相比发生了蓝移.     

化学气相沉积法制备氧化锡自组装纳米结构

采用化学气相沉积法在镀有5-10 nm厚金膜的SiO2衬底上, 通过控制生长条件, 实现了二氧化锡纳米结构的自组装生长, 成功制备出了莲花状和菊花状的二氧化锡自组装纳米结构. 利用扫描电子显微镜、X射线衍射等表征分析手段对样品的表面形貌、结构及成份进行表征和研究. 并在此基础上, 讨论了两种自组装纳米结构的生长机制.     

减压化学气相沉积法制备规则螺旋状纳米碳管

以硅胶负载的Co纳米颗粒为催化剂,在低流量的减压体系中通过化学气相沉积法制备了规则螺旋状的纳米碳管.通过TEM和HRTEM研究了螺旋碳管的形貌、尺度分布以及管身、曲面和节点处的晶型;讨论了催化剂制备中pH值对催化剂的尺寸、规则程度和存在形态以致对螺旋碳管产量、管径厚度以及螺旋管的相对比例的影响;此外,还分析了反应压力对碳管生长的影响.     

二维硫化钼基原子晶体材料的化学气相沉积法制备及其器件

二维过渡族金属硫属化合物因其带隙具有强烈的层数依赖性而在电子器件方面具有广泛的应用前景.其中单层二硫化钼(MoS₂)是该系列材料中最典型的一种直接带隙半导体,它具有优异的光、电、磁、热和力学性能.二维MoS₂有望在光电探测、光伏器件、场效应晶体管、存储器件、谷电子和自旋器件、温差电器件、微纳机电器件和系统等方面得以广泛应用.化学气相沉积(CVD)法已成为制备二维过渡族金属硫属化合物如MoS₂、MoSe₂、WS₂和WSe₂等原子层薄膜的主要手段,尤其科学界利用CVD法对二维MoS₂材料进行了深入的制备探索,通过该方法制备的MoS₂薄膜在电子和光电器件方面已经有广泛研究.本文将从二维MoS₂的基本物性出发,详细介绍CVD法制备MoS₂的各种工艺过程,如热分解硫代硫酸盐法、硫化Mo(MoO_3-x)薄膜制备法、MoO_3-x粉体与硫属前驱体气相合成法和钼箔表面直接硫化法,并介绍了基于MoS₂的二维异质结构筑方法.在制备材料的基础上,详细阐述了二维MoS₂在场效应晶体管、光电探测器、柔性电子器件以及异质结器件方面的应用,并展望了二维材料在半导体器件中的应用前景.     

化学气相沉积法制备的TiO_2薄膜的光学性质及其应用

以ＴｉＣ１４为源物质采用常压化学气相沉积法制备了ＴｉＯ２薄膜。用紫外光谱测定了膜的透过率,进而计算出折光率、消光系数、光学带隙能等光学参数。结果发现,在不同气流量、沉积温度为１００～２５０℃的条件下制备的ＴｉＯ２膜,其折射率在２．１６～２．８２范围内,消光系数在０．０４×１０－３～６．７０×１０－３范围内,光学带隙能在２．８～３．０８ｅＶ范围内。在光催化作用下,ＴｉＯ２膜用于处理苯酚溶液,苯酚的转化率高达５４．０５％。关键词##4化学气相沉积（ＣＶＤ）;;沉积率;;折光率;;消光系数;;光催化     

原子层沉积技术制备单原子催化剂

贵金属单原子催化剂因具有独特的催化性能和高的利用率而迅速引人关注.原子层沉积(ALD)逐渐成为大批量合成稳定单原子的有力工具.本文总结了采用ALD合成单原子的最新进展,以及未来的研究方向和趋势.     

光子晶体的制备与应用进展

光子晶体概念的提出到现在已有20多年,由于其特有的带隙和缺陷结构可实现对光子传播的控制,与传统的基于半导体晶体的电子技术相比更具优势,是未来光子计算机和光子通讯技术研发的核心。近年来,基于新材料、新方法制备的具有复杂结构的光子晶体不断涌现,其应用范围也从较早的波导、光开关、反射镜拓展到传感器、超棱镜、微透镜、太阳能电池、增强LED发光、光存储、生物芯片、仿生等新兴领域。本文结合了最新的研究状况,探讨了光子晶体的制备与应用进展。     

High Refractive Index Polymers

Rodlike polymers with repeat units composed of groups with high π-electron density directly on the backbone, such as linearly conjugated double bonds and aromatic heterocyclic rings, exhibit high isotropic refractive indexes and high birefringence values when oriented. Typical polyamide birefringence values for oriented films far exceed 0.5 and several are as high as 0.85; the corresponding parallel and perpendicular indexes for these polymers are in the 2.2-2.4 and 1.5-1.7 range, respectively, depending on the molecular structure and degree of orientation. The isotropic index values may be as high as 1.8-2.0.

In order to make optical devices utilizing these highly birefringent films, it is frequently necessary to bond them to films or glass, which necessitates the use of index-matching, optical-quality bonding agents. We devised two synthetic strategies to obtain polymers that exhibit these properties. In one approach, we synthesized a series of colorless, nonbirefringent, polyacrylates (and methacry-lates) containing halogenated carbazole rings; these results will be reported in a forthcoming paper that is currently being prepared. We have also modified rodlike polyamides by substituting index-enhancing groups directly on the amide nitrogen; the refractive index values of the resulting materials are in the 1.60-1.67 range. The most important finding of the latter research was the realization that rodlike polyamides not only exhibit unusually high birefringence, but also greatly enhanced isotropic refractive indexes, which is directly related to their rodlike conformation.     

Use of Neural Network to Control a Refractive Index of SiN Film Deposited by Plasma Enhanced Chemical Vapor Deposition

Refractive index of silicon nitride film deposited in a plasma enhanced chemical deposition system is modeled by using neural network. The deposition process was characterized with a full factorial experiment. Additional 12 experiments were conducted to test model appropriateness. Predicted model behaviors were in good agreement with actual measurements. Deposition mechanisms were qualitatively examined especially with respect to the pressure. Possible interactions between the pressure and other factors (SiH₄, NH₃, radio frequency (RF) power, and substrate temperature) were examined on the basis of SiH/NH bond ratio. The refractive index increased with increasing either SiH₄ flow rate or RF power. In contrast, the refractive index decreased with increasing NH₃ flow rate. Little interactions between the pressure and RF power were observed. Pressure effect on the refractive index was quite different depending on the level of SiH₄ flow rate or substrate temperature. In general, increasing the pressure increased the refractive index. Meanwhile, the refractive index was insensitive to parameter variations at relatively high pressures. The most complex interaction occurred as the pressure interacted with the temperature. Useful clues to control the refractive index were revealed from the predictive model.     

高折射率聚酰亚胺研究进展

聚酰亚胺作为一种高性能的功能材料在各个领域应用广泛,但较低的折射率限制了其在光学领域的应用。为了有效提高聚酰亚胺的折射率,许多学者研究了多种方法。本文介绍了国内外的研究团队制备高折射率聚酰亚胺的最新研究进展,总结了提高聚酰亚胺折射率的方法主要分为以下几种:在聚酰亚胺的主链引入硫原子;掺杂无机粒子进行杂化改性;开创新的合成工艺,通过详细论述上述几种方法的合成路线以及所得产物的性能,指出了合成高折射率聚酰亚胺的总趋势。     

光子晶体应用于化学及生物传感器的研究进展

光子晶体是由两种以上具有不同折光指数的材料在空间按照一定的周期顺序排列所形成的有序结构材料,它具有尺度为光波长量级的重复结构单元,通过对这些结构单元的合理设计.可以调控光子晶体的光学性质.近年来,光子晶体不仅在药物释放、光学开关、金属探针领域取得了广泛的应用,也为化学及生物传感器领域提供了新的检测原理和手段.本文概述了光子晶体的制备方法及近年来该技术在化学及生物传感器领域中的应用研究.     

TiO2光子晶体的光子带隙及其应用

最近利用TiO₂光子晶体控制光子的研究取得了一定进展。本文概述了TiO₂光子晶体的分类、性质、制备和应用。TiO₂光子晶体在反射器件、光电转换、化学传感器和光催化等方面应用前景广阔,目前,可见光和近红外波段的TiO₂光子晶体的合成是工作的难点,本文对今后TiO₂光子晶体的研究提出了展望。     

一类高折射率光固化有机硅树脂的性能研究

光固化有机硅材料兼具光固化的高效、能耗低和环保以及有机硅树脂优异的耐温、耐候性和电绝缘性能,因此,在LED等电子器件封装方面受到广泛关注.本文研究了自制的3种含丙烯酸酯基团的光固化苯基有机硅预聚物KDS-10、KMDS-03和KMS-03的光固化特性、光学性能和热稳定性能.结果表明,这些有机硅预聚物的折光指数随苯环含量的增加而增高,苯环含量从22.3%到37.7%,折光指数相应从1.496到1.542;3种预聚物与多种丙烯酸酯相容性好,用双官能的TPGDA作稀释剂,固化反应速率最快,丙烯酸酯基团的转化率也最高;光引发剂TPO引发的光固化反应速率和转化率均最高;高折射率有机硅预聚物KDS-10光固化后的薄膜具有优异的光学性能,在550 nm处的透过率为92.54%;玻璃化转变温度约为-17.41℃,起始分解温度为385℃.     

光子晶体研究进展

光子晶体是最近10余年间提出的新概念和新材料。本文简述了光子晶体的主要特性,重点阐述了光子晶体的制作方法,特别是高分子材料制作分子晶体的几种新方法。