Secondary electron emission yield from vertical graphene nanosheets by helicon plasma deposition

The secondary electron emission yields of materials depend on the geometries of their surface structures.In this paper,a method of depositing vertical graphene nanosheet(VGN)on the surface of the material is proposed,and the secondary electron emission(SEE)characteristics for the VGN structure are studied.The COMSOL simulation and the scanning electron microscope(SEM)image analysis are carried out to study the secondary electron yield(SEY).The effect of aspect ratio and packing density of VGN on SEY under normal incident condition are studied.The results show that the VGN structure has a good effect on suppressing SEE.     

金纳米结构表面二次电子发射特性

使用低气压蒸发工艺制备了金纳米结构,研究了金纳米结构的二次电子发射特性及其对表面形貌的依赖规律,表征了金纳米结构表面出射二次电子能量分布.实验结果表明:蒸发气压升高时,金纳米结构孔隙率增大,表面电子出射产额降低;能量分布表明金纳米结构仅对低能真二次电子有明显抑制作用,对背散射电子的作用效果则依赖于表面形貌.使用由半球和沟槽构成的复合结构,并结合二次电子发射唯象概率模型,对金纳米结构进行模型等效及电子发射特性仿真,模拟结果表明:纳米结构中的半球状纳米颗粒对两种电子产额均有增强作用;沟槽对真二次电子产额有强抑制作用,而对背散射电子产额仅有微弱抑制作用.本工作深入研究了金纳米结构表面电子发射机理,对于开发空间微波系统中纳米级低电子产额表面有重要参考价值.     

Secondary electron emission of sputtered alumina films

Secondary electron emission yieldδ was measured for thin films of alumina prepared byrf sputtering technique. Single pulse method was used along with 4-gridleed optics system to determineδ. Maximum value of 4·3 was obtained at primary energy of 350 eV. The Dionne’s theory was used to analyse the results and the emission probability escape depth and absorption coefficient of secondaries were also estimated. Fairly good correlation is observed between experimental and theoretical values ofδ for beam energies upto 1 keV.     

Secondary electron emission from thin carbon films

For the purpose of investigating how secondary electrons are produced in carbon, the correlation between energy-loss events and secondary electrons was studied experimentally by using the coincidence method. If a secondary electron is detected in coincidence with an electron transmitted through a thin film which has lost an amount of energy E, then the process causing this energy loss results in the production of secondary electrons. We established the existence of these coincidences and have taken inelastic and coincidence spectra for films of different thickness. We found that in carbon secondary electrons are predominantly produced as a result of energy losses of about 20 eV, with an efficiency of about 5%. The escape depth of secondary electrons was also estimated to be approximately 30 Å.     

Secondary electron yield enhancement by MgO capping layers

The yield of secondary electrons emitted from an epitaxial three monolayer (3 ML) NiO(1 0 0)/Ag(1 0 0) film excited by soft X-ray linearly polarized synchrotron radiation at the Ni L_2,3 absorption threshold has been measured for different values of the thickness of a MgO(1 0 0) capping layer. Compared with the as grown 3 ML NiO(1 0 0)/Ag(1 0 0) film, we observe a significant enhancement by about a factor 1.2 of the secondary electron emission for the capped 8 ML MgO(1 0 0)/3 ML NiO(1 0 0)/Ag(1 0 0) sample. A further substantial yield enhancement by a factor 1.6 with respect to the uncapped NiO sample is observed after deposition of an additional 8 ML MgO(1 0 0) film, for a total capping layer thickness of 16 ML. The observed secondary electron yield enhancement is discussed in terms of modified electronic structure, surface work function changes, and characteristic electron propagation lengths.     

Secondary electron emission from highly charged carbon grains

Surfaces in contact with a plasma can influence its characteristics and, on the other hand, the impact of plasma particles can change surface properties of materials immersed in a plasma. Carbon is often present in plasma systems either as a building material or a product of technological processes, thus its behavior is an important factor of these applications. The paper deals with investigations of secondary emission of 1–6 μm spherical grains from amorphous carbon under the electric field of the order of 10⁸ V/m. We have found that the secondary emission yield increases with the electric field at the sample surface nearly linearly and does not depend on the grain diameter. Long-lasting (hours) electron irradiation of the sample surface leads to a significant decrease of the yield that was attributed to the removal of an absorbed layer from the grain surface. This conclusion is supported by the fact that a similar effect was achieved after several minutes of simultaneous electron and ion treatments.     

Secondary electron emission control in X-ray photoelectron spectroscopy

Secondary electron emission (SEE) is a major player in surface charging during X-ray photoelectron spectroscopy (XPS); its characteristics and applicability as a current source for electrical measurements are studied. We employ sample biasing and a top retarding grid to control the photoelectron current, and further compare their I–V characteristics with direct spectroscopy of the secondary electrons. Using silica-coated gold substrates, the effect of sample work function on the emitted secondary electrons is shown and fine control over the surface potential gradients, in the range of 10–100 meV, is achieved. XPS-based chemically resolved electrical measurements (CREM) can thus be extended to the positive current regime.     

Secondary electron yield measurements of carbon covered multilayer optics

Carbon contamination on extreme ultraviolet (EUV) optics has been observed in EUV lithography. In this paper, we performed in situ monitoring of the build-up and removal of carbon contamination on Mo/Si EUV multilayers by measuring the secondary electron yield as a function of primary electron energy. An electron beam with an energy of 2 keV was used to simulate the EUV radiation induced carbon contamination. For a clean EUV multilayer, the maximum secondary electron yield is about 1.5 electrons per primary electron at a primary electron energy of 467 eV. The maximum yield reduced to about 1.05 at a primary electron energy of 322 eV when the surface was covered by a non-uniform carbon layer with a maximum thickness of 7.7 nm. By analyzing the change in the maximum secondary electron yield with the final carbon layer thickness, the limit of detection was estimated to be less than 0.1 nm.     

绝缘体二次电子发射系数测量装置的研制

成功研制了测量绝缘体二次电子发射系数的测量装置,该装置主要由栅控电子枪系统、真空系统和电子采集系统组成,测量装置产生的原电子流的能量范围为0.8~60 keV。采用单脉冲电子枪法,测量了原电子能量范围为0.8~45 keV的多晶MgO的二次电子发射系数。测量中,收集极(偏置盒)离材料表面设置为约35 mm,偏置电压设置为 45 V。测量得到：用磁控溅射法制备的MgO的二次电子发射系数最大值约为2.83,处于 2~26范围内,其对应的原电子能量约为980 eV。这表明该装置测量的绝缘体二次电子发射系数是可信的,但用磁控溅射法制备的MgO的二次电子发射系数较低,这可能是制备MgO时引入了过多的杂质在MgO二次电子发射体里面所引起的。     

Secondary electron emission from thin self-supporting films of silver

The paper deals with the measurement of secondary electron emission and the scattering of primary electrons on thin self-supporting films of Ag. The measured values of the practical range agree with the older results obtained by Kanter. New results are those concerning the maximum depth from which the primaries are scattered back to the front surface and the maximum range of secondaries, which has been found to be about 300 å.     

绝缘体二次电子发射系数测量装置的研制

 成功研制了测量绝缘体二次电子发射系数的测量装置，该装置主要由栅控电子枪系统、真空系统和电子采集系统组成，测量装置产生的原电子流的能量范围为0.8~60 keV。采用单脉冲电子枪法，测量了原电子能量范围为0.8~45 keV的多晶MgO的二次电子发射系数。测量中，收集极(偏置盒)离材料表面设置为约35 mm，偏置电压设置为 45 V。测量得到：用磁控溅射法制备的MgO的二次电子发射系数最大值约为2.83，处于 2~26范围内，其对应的原电子能量约为980 eV。这表明该装置测量的绝缘体二次电子发射系数是可信的，但用磁控溅射法制备的MgO的二次电子发射系数较低，这可能是制备MgO时引入了过多的杂质在MgO二次电子发射体里面所引起的。     

The diamond surface: II. Secondary electron emission

The total secondary electron emission spectrum from diamond has been examined, and details of the Auger spectra, characteristic loss spectra and K-level ionisation loss spectra have been presented. These features from the clean diamond surface were contrasted to those from graphite and amorphous-carbon. The fine structure in the carbon Auger spectra were compared with the line shape calculated using the band structure model, and the chemical sensitivity of the Auger spectra was demonstrated. A high energy Auger satellite peak in the diamond spectrum was ascribed to the Auger transition occurring from a doubly ionised carbon atom. This result was substantiated by the observation of loss peaks associated with the singly ionised level. The characteristic energy losses were assigned to interband transitions and plasma losses, and have been compared to optical data where possible.     

金属掺杂钨基合金阴极的二次电子发射系数研究

实验中制备了W-Re,W-Sc,W-Zr,W-Y合金阴极,其中Re,Sc,Zr,Y元素所占合金阴极材料的质量分数都为5%。二次电子发射系数测试结果显示,Re掺杂合金阴极对提高纯钨阴极二次电子发射能力显著,掺杂5% Re的W-Re合金阴极材料具有最大二次电子发射系数,其值为1.8,相比于纯钨阴极,能够提高80%。鉴于Re对提高纯钨阴极二次电子发射能力显著,对Re掺杂质量分数分别为20%,10%,6%,5%,4%,3%W-Re合金阴极材料二次电子发射系数进行了研究,发现随着Re在W-Re合金阴极材料中含量的降低,其二次电子发射系数在不断增大,仅当Re含量下降至5%左右时,合金阴极具有最大二次电子发射系数,继续下降至4%,合金阴极二次电子发射系数不但没有升高,相反下降至1.41,当下降至3%时,合金阴极二次电子发射系数值迅速降低为1.1。     

Secondary electron emission spectroscopy of solid and liquid high-density polyethylene

Kinetic energy spectra of secondary electrons emitted from liquid and solid high-density polyethylene owing to low-energy electron impacts are measured as a function of temperature. It is found that the spectral features associated with high density-of-states parts of the conduction band smear out with increasing temperature, and disappear completely above the melting point. The smearing out of the conduction band structure is explained as a result of breakdown of the inter-molecular and/or the intra-molecular symmetry induced by thermal excitations of the molecular vibrations.     

Secondary electron emission characteristics of graphene films with copper substrate

For modern and future circular accelerators, especially high-intensity proton synchrotrons or colliders, the electron cloud effect is a key issue. So, in order to reduce the electron cloud effect, exploring very low secondary electron yield (SEY) material or coating used in vacuum tubes becomes necessary. In this article, we studied the SEY characteristics of graphene films with different thicknesses which were deposited on copper substrates using chemical vapor deposition. The SEY tests were done at temperatures of 25℃ and vacuum pressure of (2-6)×10^-9 torr. The properties of the deposited graphene films were investigated by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The SEY curves show that the number of graphene layers has a great effect on the SEY of graphene films. The maximum SEY of graphene films decreases with the increase of the number of layers. The maximum SEY of 6-8 layers of graphene film is 1.25. These results have a great significance for next-generation particle accelerators.     

Secondary emission from small dust grains at high electron energies

A previous model for secondary electron emission from small grains is modified to calculate yields for micron sized grains, both spherical and cylindrical, when the primary electrons constitute a high energy parallel beam. It is found that, in general, the secondary electron yield is significantly higher than for the case of normal incidence. Moreover, the equilibrium potentials of the grain are always positive due to this enhanced secondary emission. These results are compared with experimental data recently available for micron sized glass particles, and equilibrium potentials, calculated based on the model presented here, and are found to be in reasonably good agreement with their measured potentials     

A secondary electron emission correction for quantitative auger yield measurements

The Auger electron yield from the de-excitation of L_2,3 core holes of Cu is determined, in the approximation of isotropic emission, from the integral of the characteristic (elastic) Auger emission. The characteristic emission function is obtained from the secondary electron spectrum in two steps: First, the cascade background at a given Auger line is characterized accurately by the method of cascade linearization and subtracted. In the second step the resulting line is debroadened by an approximation to deconvolution debroadening. The concept of modulation stability is introduced as a criterion for credibility of the results of this analysis.     

Secondary electron emission data of cesiated oxygen free high conductivity copper

Because of its relevance for negative hydrogen ion sources, the change in secondary electron emission with the adsorption of Cs on Cu was studied. Properly prepared disks of oxygen free high conductivity (OFHC) copper yielded a maximum secondary electron emission δ_max=1.54±3%. The deposition of ≈0.5 monolayer of Cs resulted in δ_max=3.40±3%.     

Secondary electron yield from stainless steel surface coated with titanium nitride

The experiment on measurement of secondary electron yield from surface of a stainless steel Kh189 sample covered with titanium nitride is performed at stand “Recuperator”. This work is related to known problem of electron clouds formation in a vacuum chamber by a propagating charge particle beam. An original method of secondary electron yield measurement was developed in this experiment. The obtained results allow one to estimate efficiency of coating nitride titanium.     

Secondary electron emission and the detection of the vacuum level in ESCA

Samples irradiated in an ESCA spectrometer emit and receive intense electron fluxes due to secondary emission. Charging and surface potential of non conducting sample is mainly determined by these electron fluxes. The measurement of the secondary electron emission energy distribution (SEED) allows the determination of the sample vacuum level and in particular its work function in the case of conducting samples. Criteria to check the correctness of (SEED) measurements are presented.