Plasma surface modification of poly (l-lactic acid) and poly (lactic-co-glycolic acid) films for improvement of nerve cells adhesion

Radio frequency (RF) plasma treatment in O₂ was applied to modify the surface of poly (l-lactic acid) (PLLA) and poly (d,l-lactic acid-coglycolic acid) (PLGA) as biodegradable polymers. The surface structure, morphology, wettability and surface chemistry of treated films were characterized by water drop contact angle measurement, scanning electron microscope (SEM), optical invert microscope, differential scanning calorimetry (DSC) and ATIR–FTIR spectroscopy. The cell affinity of the oxygen plasma treated film was evaluated by nervous tissue B65 cell culture in stationary conditions. The results showed that the hydrophilicity increased greatly after O₂ plasma treatment. The results showed that improved cell adhesion was attributed to the combination of surface chemistry and surface wettability during plasma treatment. Cell culture results showed that B65 nervous cell attachment and growth on the plasma treated PLLA was much higher than an unmodified sample and PLGA. Surface hydrophilicity and chemical functional groups with high polar component play an important role in enhancing cell attachment and growth.     

Surface and Bulk Structure of Thin Spin Coated and Plasma-Polymerized Polystyrene Films

Polystyrene (PS) spin coated thin films were modified by O₂ and Ar plasma as well as by UV irradiation treatments. The modified PS samples were compared with plasma polymerized and commercial polystyrene. The effects of plasma (O₂ and Ar) and UV irradiation treatments on the surface and the bulk properties of the polymer layers were discussed. The surface properties were evaluated by X-ray Photoelectron Spectroscopy and Contact angle measurements and the bulk properties were investigated by FTIR and dielectric relaxation spectroscopy. As a result only one second treatment time was sufficient to modify the surface. However, this study was also dedicated to understand the effect of plasma and plasma irradiation on the deposited layers of plasma polymers. The dielectric measurements showed that the plasma deposited films were not thermally stable and underwent an undesired post-plasma chemical oxidation.     

Surface modification of low density polyethylene (LDPE) film by low pressure O2 plasma treatment

In this work, low pressure glow discharge O₂ plasma has been used to increase wettability in a LDPE film in order to improve adhesion properties and make it useful for technical applications. Surface energy values have been estimated using contact angle measurements for different exposure times and different test liquids. In addition, plasma-treated samples have been subjected to an aging process to determine the durability of the plasma treatment. Characterization of the surface changes due to the plasma treatment has been carried out by means of Fourier transformed infrared spectroscopy (FTIR) to determine the presence of polar species such as carbonyl, carboxyl and hydroxyl groups. In addition to this, atomic force microscopy (AFM) analysis has been used to evaluate changes in surface morphology and roughness. Furthermore, and considering the semicrystalline nature of the LDPE film, a calorimetric study using differential scanning calorimetry (DSC) has been carried out to determine changes in crystallinity and degradation temperatures induced by the plasma treatment. The results show that low pressure O₂ plasma improves wettability in LDPE films and no significant changes can be observed at longer exposure times. Nevertheless, we can observe that short exposure times to low pressure O₂ plasma promote the formation of some polar species on the exposed surface and longer exposure times cause slight abrasion on LDPE films as observed by the little increase in surface roughness.     

Surface Properties of Low Density Polyethylene upon Low-Temperature Plasma Treatment with Various Gases

The surface of a LDPE was modified by Ar, O₂, N₂, CO₂ gaseous plasma. The changes in surface morphology and surface wettability were investigated using AFM and SEM. The surface chemical changes of LDPE were also characterized by FTIR-ATR. The SEM and AFM results demonstrated variable changes in surface roughness for different types of plasma gas used, the changes being more for the Ar and N₂ plasma treatments. Considering the nature of the LDPE film, XRD studies were carried out to determine changes in the percentage crystalinity. The results showed that all low pressure O₂, Ar, N₂, CO₂ gas plasmas improved the wettability of LDPE films. Contact angles decreased significantly depending on the discharge powers and exposure times. Surface morphology was also found to vary with plasma discharge powers, exposure times, and the type of gas being used. Ar and N₂ gas plasmas in general produced more superior results.     

Effects of Ar‐ and Ar/O2‐plasma‐treated amorphous and crystalline polymer surfaces revealed by ToF‐SIMS and principal component analysis

The effects of argon (Ar) and a mixture of Ar and oxgyen(Ar/O₂) plasmas on amorphous and semi‐crystalline poly(bisphenol A hexane ether) thin films were investigated by time‐of‐flight secondary ion mass spectroscopy (ToF‐SIMS) and principal component analysis (PCA). PCA results of the ToF‐SIMS spectra indicate that an Ar/O₂ plasma produced less physical sputtering and had a higher chemical reactivity than did an Ar plasma, regardless of whether an amorphous or a crystalline surface was involved. However, the chemical differences between the Ar‐ and Ar/O₂‐plasma‐treated semi‐crystalline films were much smaller. The observed results can be explained by the higher resistance of the polymer crystalline regions to physical sputtering and chemical etching. Copyright © 2013 John Wiley & Sons, Ltd.     

Preparation and Characterization of Epoxy/Inorganic Anti‐electrostatic Nanocomposites Using Submicrometer Al(OH)3 and Colloid Al2O3

New organic‐inorganic hybrid materials and their anti‐electrostatic hybrid membranes are prepared via sol‐gel process. The polycondensation of epoxy oligomers and AEAPS/Al₂O₃ complexes which are organically surface modified submicrometer aluminum trihydroxide inorganic fillers with an active aminoterminal silane coupling agent, N‐(2‐aminoethyl)‐3‐aminopropyltrimethoxysilane (AEAPS), are performed. AEAPS enhances the interfacial interactions between the inorganic fillers and epoxy polymers. Meanwhile, this coupling agent maintains well dispersion of fillers in these composites. To improve the mechanical strength and thermal stability, pyromellitic dianhydride (PMDA) is used as curing agent. These hybrid films prepared from this method have excellent physical properties, such as UV‐shielding, high transmission in visible resign (> 85%), high hardness (7～8H) , high adhesive force (7～8) and low relative surface resistance (9.71 × 10¹¹～1.26 × 10¹⁰ Ω/cm²) with anti‐electrostatic characters. For thermal resistance, the best Td value of epoxy/PMDA/AEAPS/Al₂O₃ is 378.6 °C which is 85.4 °C higher than that of neat epoxy resin. Physical properties of these materials are almost the same as those of the nanocomposites prepared from expensive colloid Al₂O₃. Evidences from TEM micrograph show that the inorganic additives are dispersed evenly in organic matrix with nanometer scale.     

Plasma-assisted oxidation of Cu(100) and Cu(111)

Oxidized copper surfaces have attracted significant attention in recent years due to their unique catalytic properties, including their enhanced hydrocarbon selectivity during the electrochemical reduction of CO₂. Although oxygen plasma has been used to create highly active copper oxide electrodes for CO₂RR, how such treatment alters the copper surface is still poorly understood. Here, we study the oxidation of Cu(100) and Cu(111) surfaces by sequential exposure to a low-pressure oxygen plasma at room temperature. We used scanning tunnelling microscopy (STM), low energy electron microscopy (LEEM), X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure spectroscopy (NEXAFS) and low energy electron diffraction (LEED) for the comprehensive characterization of the resulting oxide films. O₂-plasma exposure initially induces the growth of 3-dimensional oxide islands surrounded by an O-covered Cu surface. With ongoing plasma exposure, the islands coalesce and form a closed oxide film. Utilizing spectroscopy, we traced the evolution of metallic Cu, Cu₂O and CuO species upon oxygen plasma exposure and found a dependence of the surface structure and chemical state on the substrate''s orientation. On Cu(100) the oxide islands grow with a lower rate than on the (111) surface. Furthermore, while on Cu(100) only Cu₂O is formed during the initial growth phase, both Cu₂O and CuO species are simultaneously generated on Cu(111). Finally, prolonged oxygen plasma exposure results in a sandwiched film structure with CuO at the surface and Cu₂O at the interface to the metallic support. A stable CuO(111) surface orientation is identified in both cases, aligned to the Cu(111) support, but with two coexisting rotational domains on Cu(100). These findings illustrate the possibility of tailoring the oxidation state, structure and morphology of metallic surfaces for a wide range of applications through oxygen plasma treatments.

A low-pressure oxygen plasma oxidized Cu(100) and Cu(111) surfaces at room temperature. The time-dependent evolution of surface structure and chemical composition is reported in detail for a range of exposure times up to 30 min.     

A new copper(I) coordination polymer from 2,6-bis(1H-benzotriazol-1-ylmethyl)pyridine: Synthesis,characterization, and use as additive in transparent submicron UV filters

The use of a new copper(I) coordination polymer (CP) as additive in transparent composite films of 190 nm of thickness for ultraviolet (UV) shielding is presented. The luminescent 1-D Cu(I) CP was easily synthesized through a self-assembly process between Cu(I) iodide and 2,6-bis(1H-benzotriazol-1-ylmethyl)pyridine (L). The CP, [Cu₂(μ ? I)₂(μ ? L)₂]_n, was structurally characterized by infrared, UV–visible diffuse reflectance and photoluminescence spectroscopy, elemental and thermogravimetric analyses, single-crystal and powder X-ray diffraction, and relativistic density functional theory calculations. The CP was dispersed and immobilized into a polymeric matrix in the presence of Sudan I, yielding a composite material that exhibits a reduction of 49% of the UV transmittance at 350 nm. Thus, the use of a new Cu(I) CP in polymeric composite films appears as a novel approach toward ultrathin and transparent UV shielding films, which have potential applications as protection layers of paints and coatings that tend to degrade when exposed to UV radiation.     

The Role of Dielectric Barrier Discharge Atmosphere and Physics on Polypropylene Surface Treatment

Dielectric barrier discharge (DBD) is the discharge involved in corona treatment, widely used in industry to increase the wettability or the adhesion of polymer films or fibers. Usually DBD's are filamentary discharges but recently a homogeneous glow DBD has been obtained. The aim of this paper is to compare polypropylene surface transformations realized with filamentary and glow DBD in different atmospheres (He, N₂, N₂ + O₂ mixtures) and to determine the relative influence of both the discharge regime and the gas nature, on the polypropylene surface transformations. From wettability and XPS results it is shown that the discharge regime can have a significant effect on the surface transformations, because it changes both the ratio of electrons to gas metastables, and the space distribution of the plasma active species. This last parameter is important at atmospheric pressure because the mean free paths are short (m). These two points explain why in He, polypropylene wettability increase is greater by a glow DBD than by a filamentary DBD. In N₂, no significant effect of the discharge regime is observed because electrons and metastables lead to the same active species throughout the gas bulk. The specificity of a DBD in N₂ atmosphere compared to an atmosphere containing oxygen is that it allows very extensive surface transformations and a greater increase of the polypropylene surface wettability. Indeed, even in low concentration and independently of the discharge regime, when O₂ is present in the plasma gas, it controls the surface chemistry and degradation occurs.     

An improvement on the adhesion‐strength of laminated ultra‐high‐molecular‐weight polyethylene fabrics: surface‐etching/modification using highly effective helium/oxygen/nitrogen plasma treatment

In this study, helium/oxygen/nitrogen (He/O₂/N₂)‐plasma was used to etch/modify the surface of ultra‐high‐molecular‐weight polyethylene (UHMWPE) fiber. After coated with polyurethane (PU), the plasma treated UHMWPE fabrics were laminated. It was found that the values of peeling strength between the laminated UHMWPE fabrics treated with He/O₂/N₂‐plasma were significantly higher (3–4 times) than that between pristine fabrics. The hydrophilic property and the value of the surface roughness of the UHMWPE fibers increased significantly after treated with He/O₂/N₂‐plasma. The mechanism of the oxidation/degradation of the polymers on the surface of the UHMWPE fiber during He/O₂/N₂‐plasma treatment was suggested. In addition, it was found that the higher content of functional groups (carbonyl, aldehyde, and carboxylic acid) on fiber surface and the higher value of surface roughness of the UHMWPE fiber treated with He/O₂/N₂‐plasma could significantly improve the adhesion‐strength of the laminated UHMWPE fabric. Especially, the micro‐aperture on the surface of UHMWPE fiber caused by the strenuous etching of He/O₂/N₂‐plasma treatment was also an important factor on improving the adhesion‐strength between the laminated UHMWPE fabrics. Copyright © 2010 John Wiley & Sons, Ltd.     

<Emphasis Type="Italic">In situ</Emphasis> XPS study of InAs oxidation in glow-discharge plasma

This is the first in situ XPS study of the InAs oxidation kinetics in glow-discharge plasma in the atmosphere of O₂ and CO₂ gases and in a mixture of O₂ and NF₃ gases. Chemical composition of the oxide films produced by cathodic and anodic polarization of samples was examined. Main regularities and features of the oxide film formation on the InAs surface in the normal and dark glow discharge modes were revealed. Normal glow discharge in oxygen-containing plasma was shown to form bilayer oxide films on the InAs surface. The bottom layer with thickness of some nanometers, which consists of arsenic and indium oxides, forms at the initial oxidation steps, its thickness remaining virtually unchanged. The upper layer consists of Al₂O₃ produced by sputtering of cathode material; it serves as a barrier to oxygen diffusion, its thickness building up linearly with the treatment time in glow-discharge plasma. Chemical composition of the growing proper InAs oxide film and the stoichiometry of subsurface region of a semiconductor substrate strongly depend on the oxidation process parameters. The obtained regularities are discussed.     

Self-organization of polymer particles on hydrophobic solid substrates in aqueous media. II. Self-organization of cationic polymer particles on polymer films and wettability control with particle monolayers

Self-organization of cationic polymer particles through hydrophobic interaction on polymer films in aqueous system and characteristic properties of the resulting particle monolayers were investigated. Cationic polymer particles bearing quaternary ammonium groups on their surfaces effectively self-organized on polymer films. With an increase of the particle surface charge density, the surface coverage and average aggregate size (N _a) decreased. The surface coverage control was accomplished by tuning the ionic strength of the media. The wettability of polymer films for water was imparted by the formation of particle monolayers on them. Annealing of the particle monolayers resulted in the increase of the adhesive strength, while the wettability for water was lost. Further improvements of both wettability and adhesive strength of particle monolayers were achieved by the immobilization of silica colloids on the particle monolayers. This method would be effective for the hydrophilization of polymer films.     

Preparation,properties, and catalytic activity of platinum-modified plasma electrolytic oxide structures on aluminum

Catalytically active Pt-containing oxide composites on aluminum have been prepared by plasma electrolytic oxidation (PEO) and by additional modification of the resulting coating by impregnation with an aqueous solution of chloroplatinic acid followed by calcination. The oxide film/metal composites have been characterized by X-ray diffraction, X-ray photoelectron spectroscopy, and electron microscopy. The modified films contain the γ-Al₂O₃ and Pt crystalline phases. Platinum in the surface and subsurface layers is in the Pt⁰ state. There are platinum-rich areas on the surface of the PEO films. A higher catalytic activity in CO oxidation into CO₂ is shown by the samples whose oxide film contains nickel and copper along with platinum.     

Crystal growth in alumina/poly(ethylene terephthalate) nanocomposite films

The crystal growth and morphology in 150‐nm‐thick PET nanocomposite thin films with alumina (Al₂O₃) nanoparticle fillers (38 nm size) were investigated for nanoparticle loadings from 0 to 5 wt %. Transmission electron microscopy of the films showed that at 1 wt % Al₂O₃, the nanoparticles were well dispersed in the film and the average size was close to the reported 38 nm. Above 2 wt % Al₂O₃, the nanoparticles started to agglomerate. The crystal growth and morphological evolution in the PET nanocomposite films kept at an isothermal temperature of 217 °C were monitored as a function of the holding time using in situ atomic force microscopy. It was found that the crystal nucleation and growth of PET was strongly dependent on the dispersed particles in the films. At 1 wt % Al₂O₃, the overall crystal growth rate of PET lamellae was slower than that of the PET homopolymer films. Above 2 wt % Al₂O₃, the crystal growth rate increased with nanoparticle loading because of heterogeneous nucleation. In addition, in these PET nanocomposite thin films, the Al₂O₃ nanoparticles induced preferentially oriented edge‐on lamellae with respect to the surface, which was not the case in unfilled PET as determined by grazing‐incidence X‐ray diffraction. © 2007 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 45: 747–757, 2007     

Preparation of cuprite (Cu2O), paramelaconite (Cu32+Cu21+O4) and tenorite (CuO) with magnetron sputtering ion plating: characterization by EPMA, XRD, HEED and SEM

Cu-O layers were deposited on Si-<100> wafers at 90°?C by means of reactive magnetron sputtering ion plating (R-MSIP). A Cu-target was sputtered in rf-mode by an oxygen/argon plasma, and the influence of the oxygen partial pressure on composition, structure, texture and morphology of the Cu-O layers was investigated. The analysis with EPMA, XRD, HEED and SEM yielded the following results: with an appropriate setting of the oxygen partial pressure, the oxygen content of the films could be controlled between 0 and 50 at-%. XRD bulk structure analysis shows changes in the crystal structure of the films with increasing oxygen content from the fcc structure of Cu, followed by the sc structure of Cu₂O (cuprite), the tetragonal structure of Cu₃ ²⁺Cu₂ ¹⁺O₄ (paramelaconite) to the monoclinic structure of CuO (tenorite). As revealed by HEED, the structure of the near-surface region of the latter two is the same as that of the bulk, whereas in the case of the films with fcc bulk structure, due to oxidation by air, the surface has the sc structure of Cu₂O, and in the case of the film with the sc structure, a monoclinic surface structure of CuO is observed. SEM analyses detected a disordered columnar growth of all Cu-O films.     

In situ and Real-Time Monitoring of Plasma-Induced Etching of PET and Acrylic Films

Residual gas analysis (RGA) and optical emission spectroscopy have been evaluated as potential in situ techniques for the detection of plasma-induced polymer surface etching. The detection is based on the measurement of CO and CO₂ species formed in the gas phase following oxidation of the etching fragments released from the polymer surface. Experiments were performed on poly(ethylene terephthalate) and UV-cured acrylic (tripropylene glycol diacrylate) films exposed to O₂ RF (13.56 MHz) plasmas. A linear correlation is obtained between the formation of CO and the polymer etching rate over the entire experimental range, but discrepancies appear for the formation of CO₂ at high treatment powers (etching rate > 1.0 g/min.cm²). This behavior is attributed to a deficit of oxidizing agents relative to the generation of etching fragments. The results suggest that both RGA and optical emission spectroscopy can be used to monitor in situ and in real-time the etching of polymer surfaces during plasma treatment.     

Optical,thermal and microstructural studies of epoxy-CoSO4.7H2O hybrid material

Organic–inorganic polymer hybrid films of epoxy polymer were prepared, using Cobaltous sulfate heptahydrate (CoSO₄.7H₂O) as a filler component, by physical blending method. UV–Vis optical absorption spectra were analyzed to determine optical band gaps (E_g) of the hybrid material. FTIR studies revealed the interaction of inorganic component with molecules of the polymer matrix. Glass transition temperature (T_g) and degradation temperature were determined by DSC. TG analysis showed the improvement in thermal stability of prepared hybrid films. XRD patterns revealed the amorphous nature of the pure epoxy polymer. Additional sharp peaks were seen for higher filler levels (FLs), indicating self formed nanostructures in the material, which was also evident from SEM analysis.     

Silicon Oxide Coatings with Very High Rates (>10?nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode

Silicon oxide films are deposited in atmospheric-pressure (AP) He/O₂/HMDSO plasma excited by a 150?MHz VHF power using a cylindrical rotary electrode. The atomic bonding configurations and deposition rate are studied by controlling the O₂ concentration (O₂/HMDSO source ratio) and VHF power density, the other parameters being maintained constant. Under the addition of 0.03?% O₂ to the process gas mixture (O₂/HMDSO????0.09), AP-VHF plasma greatly enhances the fragmentation and oxidation of HMDSO, so that an almost inorganic film is obtained at a very high deposition rate of 33?nm?s^?1. A silicon oxide coating on a polycarbonate pane is demonstrated with no significant thermal deformation of the pane, showing that AP-VHF plasma would be an efficient coating tool for polymer substrates.     

Electronic properties of Cu clusters and islands and their reaction with O2 on SnO2(110) surfaces

The deposition of Cu on SnO₂(110) surfaces, and its oxidation to Cu_xO, have been studied by low-energy electron diffraction (LEED) and angle-integrated photoemission using synchrotron radiation photoemission spectroscopy (SRPES). With the growth of copper on SnO₂(110), which was found to follow the Volmer-Weber (“islanding”) growth mode, a small amount of metal-phase Sn segregates to the surface, and even when the copper thickness reaches several tens of Å, Sn metal still is seen at the surface. But when this surface is annealed at 800 K in 5 × 10^?6 mbar O₂ for 20 min, the Sn atoms are totally converted to SnO₂. Simultaneously, the deposited Cu atoms become oxidized. The surface charges up both during LEED and SRPES data acquisition. The clean SnO₂(110) surface shows a 1 × 1 structure. With Cu deposition, the substrate LEED pattern gradually becomes weaker. With even more copper deposited, a Cu(111)-1 × 1-oriented particle structure appears, indicating coalescence of the Cu islands to 3-dimensional Cu(111) epitaxy. After subsequent heating to 500 K, the substrate signal appears again, and we see the SnO₂ 1 × 1 pattern. In conclusion, Cu atoms quite easily form clusters on the SnO₂(110) surface already after a slight heat treatment. The results show that this system is quite active towards O₂ gas exposure, and that the surface conductivity changes during O₂ exposure.     

Cu、N共掺杂TiO2纳米管光催化重整甘油制备合成气

通过碱性水热-离子交换法制备了Cu、N共掺杂TiO₂纳米管(Cu/N-TNT),对其光催化重整甘油制备合成气性能进行了研究。结果表明,Cu/N-TNT具有富含氧空位(O_v)的管状结构,N以Ti-N形式取代部分O形成杂质能级,Cu以Cu²⁺形式掺杂在催化剂晶格间隙和表面,Cu、N共掺杂促进TiO₂表面电荷有效分离,有利于其光催化重整甘油制备合成气活性和选择性的提高。紫外光照射8h时,掺Cu量为0.15%的Cu/N-TNT催化剂上CO和H₂产量分别为7.3和8.5 mmol·g^-1,是原始TiO₂的9.1和70.8倍,n_H2/n_CO从0.52提高为1.18,n_CO/n_CO2从0.21提高至0.42。Cu/N-TNT表面N和O_V为醛类脱羰和甲酸脱水生成CO提供反应活性位点,Cu作为浅势阱提...