首页 | 本学科首页   官方微博 | 高级检索  
相似文献
 共查询到16条相似文献,搜索用时 46 毫秒
1.
利用准分子激光等离子体技术,在紫外预电离XeCl准分子激光器上获得了最短1.58 ns的短脉冲激光输出。实验中分析了聚焦到薄膜表面的光束能量密度对所产生的等离子体密度的影响,并对不同等离子体密度及维持时间情况下脉冲压缩效果进行了讨论,给出了激光器谐振腔在稳定腔及非稳腔两种工作方式下的实验结果。激光器在稳定腔工作时,脉宽可压缩至2.87 ns;采用非稳腔结构时,在脉冲能量不变情况下减小聚焦光斑面积,提高入射到薄膜表面的能量密度,得到了最短1.58 ns的短脉冲激光输出。该技术适用于任何其它准分子器件。  相似文献   

2.
利用激光诱导等离子体开关技术,在1 064 nm的Nd:YAG固体激光器上获得了脉宽4.4~6.4 ns的短脉冲激光输出。激光电离空气产生的等离子体开关控制脉冲宽度时,聚焦透镜焦距越短,压缩后的脉宽越窄,但激光能量损耗越大。压缩后的激光脉宽与激光能量近似成双曲线关系。在控制脉宽光路的焦点处放置带孔的Cu薄片可抑制等离子体的扩散,得到了脉宽最短可达4.4 ns的激光输出。  相似文献   

3.
激光诱导等离子体开关控制脉宽实验研究   总被引:5,自引:1,他引:5  
 利用激光诱导等离子体开关技术,在1 064 nm的Nd:YAG固体激光器上获得了脉宽4.4~6.4 ns的短脉冲激光输出。激光电离空气产生的等离子体开关控制脉冲宽度时,聚焦透镜焦距越短,压缩后的脉宽越窄,但激光能量损耗越大。压缩后的激光脉宽与激光能量近似成双曲线关系。在控制脉宽光路的焦点处放置带孔的Cu薄片可抑制等离子体的扩散,得到了脉宽最短可达4.4 ns的激光输出。  相似文献   

4.
5.
分析了准分子激光脉冲在放大过程中的展宽现象。将饱和开关技术应用于放电泵浦激光器放大腔的放大压缩,发展了脉冲负反馈饱和压缩技术。利用该技术在天光一号系统前端LPX-150激光器上成功获得能量100 mJ、脉宽10 ns的脉冲输出,其空间分布均匀性保持在3%以内。这证明该技术可与无阶梯诱导非相干技术联合使用,在保证光束均匀性基础上进行脉冲压缩。  相似文献   

6.
分析了准分子激光脉冲在放大过程中的展宽现象。将饱和开关技术应用于放电泵浦激光器放大腔的放大压缩,发展了脉冲负反馈饱和压缩技术。利用该技术在天光一号系统前端LPX-150激光器上成功获得能量100 mJ、脉宽10 ns的脉冲输出,其空间分布均匀性保持在3%以内。这证明该技术可与无阶梯诱导非相干技术联合使用,在保证光束均匀性基础上进行脉冲压缩。  相似文献   

7.
利用脉冲负反馈压缩准分子激光脉冲   总被引:1,自引:1,他引:1       下载免费PDF全文
 分析了准分子激光脉冲在放大过程中的展宽现象。将饱和开关技术应用于放电泵浦激光器放大腔的放大压缩,发展了脉冲负反馈饱和压缩技术。利用该技术在天光一号系统前端LPX-150激光器上成功获得能量100 mJ、脉宽10 ns的脉冲输出,其空间分布均匀性保持在3%以内。这证明该技术可与无阶梯诱导非相干技术联合使用,在保证光束均匀性基础上进行脉冲压缩。  相似文献   

8.
准分子激光全固态脉冲电源设计与实验研究   总被引:1,自引:2,他引:1       下载免费PDF全文
针对脉冲能量5~8 mJ的ArF准分子激光器,设计了基于可控硅开关结合三级磁脉冲压缩开关的全固态脉冲电源,采用国产可控硅和磁开关材料,获得了上升时间约150 ns,电压10~14 kV,传递能量0.35~0.68 J的激励脉冲,并实现了对准分子激光器快放电激励。三级磁开关总效率35%,分析表明磁开关损耗较大主要原因为电容能量转移不充分、导线铜损及磁芯材料铁损较大,并提出了相应改进办法。  相似文献   

9.
准分子激光全固态脉冲电源设计与实验研究   总被引:2,自引:1,他引:2       下载免费PDF全文
针对脉冲能量5~8 mJ的ArF准分子激光器,设计了基于可控硅开关结合三级磁脉冲压缩开关的全固态脉冲电源,采用国产可控硅和磁开关材料,获得了上升时间约150 ns,电压10~14 kV,传递能量0.35~0.68 J的激励脉冲,并实现了对准分子激光器快放电激励。三级磁开关总效率35%,分析表明磁开关损耗较大主要原因为电容能量转移不充分、导线铜损及磁芯材料铁损较大,并提出了相应改进办法。  相似文献   

10.
盛政明  马锦秀  徐至展  余玮 《物理学报》1992,41(11):1796-1805
提出等离子体波对光脉冲产生相位调制的观点,把光脉冲在背景等离子体波中传播时的频率移动与脉宽压缩效应统一起来。给出了脉宽演化的方程,它类似于在势阱中运动的经典粒子的能量守恒方程;估算了脉宽压缩对应的等离子体波振幅阈值。数值计算进一步证实这些结论。最后指出实验上用等离子体波压缩短脉冲激光脉宽的可能性。 关键词:  相似文献   

11.
Copper nanoparticles (Cu NPs) were prepared by different chemical methods possessing different sizes. While, silver nanoparticles (Ag NPs) were prepared by borohydride reduction method. The influences the changes in sizes of Ag NPs and Cu NPs were demonstrated by the absorption spectra. When Ag NPs and Cu NPs irradiated with 193 and 308 nm excimer laser, respectively; the maximum absorption decreased as the number of pulses increased up to 10 thousands pulse; due to the size reduction. The TEM photography gives good criteria about the size reduction process. Moreover, the mechanism of photofragmentation was described.  相似文献   

12.
The influence of temporal pulse shaping on plasma plume generated by ultrafast laser irradiation of aluminum is investigated. Time resolved plasma emission spectroscopy is coupled with a temporal shaping procedure in a closed loop. The ionic emission is enhanced relative to the neutral one via an adaptive optimization strategy. The plasma emission efficiency in case of optimized and ultrashort temporal shapes of the laser pulses are compared, evidencing an enhancement of the ionization degree of the plasma plume. Simplified temporal shapes of the femtosecond laser pulses are extracted from the optimized shape and their corresponding effect on laser induced plasma emission is discussed.  相似文献   

13.
脉冲激光烧蚀Ge产生等离子体特性的数值模拟   总被引:1,自引:0,他引:1       下载免费PDF全文
 针对激光烧蚀半导体材料Ge初期的特点,建立了1维的热传导和流体动力学模型。对波长为248 nm、脉宽为17 ns、峰值功率密度为4×108 W/cm2的KrF脉冲激光在133.32 Pa氦气环境下烧蚀Ge产生等离子体的特性进行了数值模拟。结果表明:单个激光脉冲对靶的烧蚀深度达到55 nm,蒸气膨胀前端由于压缩背景气体产生压缩冲击波, 波前的速度最大,温度很高。从不同时刻的电离率分布图中得出,在靶面附近区域,Ge的1阶电离始终占优势;在中心区域,脉冲作用时间内,Ge的2阶电离率比1阶电离率大,脉冲结束后,Ge的2阶电离率下降,1阶电离率逐渐变大。  相似文献   

14.
Polyethersulfone (PES) films were processed with KrF laser irradiation of different pulse durations (τ). Scanning electron microscopy (SEM) and Raman spectroscopy were employed for the examination of the morphology and chemical composition of the irradiated surfaces, respectively. During ablation with 500 fs and 5 ps pulses, localized deformations (beads), micro-ripple and conical structures were observed on the surface depending on the irradiation fluence (F) and the number of pulses (N). In addition, the number density of the structures is affected by the irradiation parameters (τ, F, N). Furthermore, at longer pulse durations (τ = 30 ns), conical structures appear at lower laser fluence values, which are converted into columnar structures upon irradiation at higher fluences. The Raman spectra collected from the top of the structures following irradiation at different pulse durations revealed graphitization of the ns laser treated areas, in contrast to those processed with ultra-short laser pulses.  相似文献   

15.
In this work was investigated numerically and experimentally a simple laser doping method employing borosilicate (BSG) glass films as dopant sources which are deposited onto Si by the spin-coating technique. Both short (20 ns) and long (200 ns) pulse duration Excimer laser beams were used to deposit a large amount of energy in short time onto the near-surface region. Under suitable conditions, the irradiation leads to surface melting and dopant incorporation by liquid phase diffusion from the surface. Boron distribution profiles in the two-pulse duration regimes were studied as well as their electrical properties, and the junction formation of less than 25 nm in depth was demonstrated.  相似文献   

16.
This paper demonstrates the unique and exceptional capability of excimer laser micromachining in fabricating aspheric microlenses with precise surface profile control. A newly developed laser scanning method is introduced for machining refractive types of microlenses, which have pre-designed surface profiles aiming at minimizing the optical focal spot sizes. The machining accuracy and machined surface roughness are examined experimentally, and very good results are obtained. Optical testing on the fabricated aspheric microlenses shows significant improvement in focusing capability and the focal spot sizes are approaching optical diffraction limits. The proposed excimer laser micromachining method is flexible, versatile, and accurate, hence can be very useful and powerful in machining 3D microstructures of complex profiles and demanding profile accuracy.  相似文献   

设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号