Density functional study of initial HfCl4 adsorption and decomposition reactions on silicon surfaces with SiON interfacial layer

The initial adsorption and decomposition of HfCl₄ on silicon surfaces with different types of SiON interfacial layers are investigated using density functional theory. We find that the reactions of HfCl₄ on both the hydroxylated and nitrided silicon surfaces proceed through similar reaction pathways. By comparison of the reaction energies of HfCl₄ with the hydroxyl and amino surface sites, we find that it is both kinetically and thermodynamically favorable for the reactions of HfCl₄ on hydroxyl site of silicon substrates. Comparing with the adjacent bridging oxygen, we also find that the neighboring hydroxyl can facilitate the adsorption of HfCl₄ on the amido surface site. Also, it is more kinetically and thermodynamically favorable for the reaction of HfCl₄ with bridging NH site than that with NH₂ site.     

Effects of precursors on nucleation in atomic layer deposition of HfO2

Atomic layer deposition of hafnium dioxide (HfO₂) on silicon substrates was studied. It was revealed that due to low adsorption probability of HfCl₄ on silicon substrates at higher temperatures (450–600 °C) the growth was non-uniform and markedly hindered in the initial stage of the HfCl₄–H₂O process. In the HfI₄–H₂O and HfI₄–O₂ processes, uniform growth with acceptable rate was obtained from the beginning of deposition. As a result, the HfI₄–H₂O and HfI₄–O₂ processes allowed deposition of smoother, more homogeneous and denser films than the HfCl₄–H₂O process did. The crystal structure developed, however, faster at the beginning of the HfCl₄–H₂O process.     

Tunnel spin injection into graphene using Al2O3 barrier grown by atomic layer deposition on functionalized graphene surface

We demonstrate electrical tunnel spin injection from a ferromagnet to graphene through a high-quality Al₂O₃ grown by atomic layer deposition (ALD). The graphene surface is functionalized with a self-assembled monolayer of 3,4,9,10-perylene tetracarboxylic acid (PTCA) to promote adhesion and growth of Al₂O₃ with a smooth surface. Using this composite tunnel barrier of ALD-Al₂O₃ and PTCA, a spin injection signal of ∼30 Ω has been observed from non-local magnetoresistance measurements at 45 K, revealing potentially high performance of ALD-Al₂O₃/PTCA tunnel barrier for spin injection into graphene.     

Surface reaction mechanism of Y2O3 atomic layer deposition on the hydroxylated Si(1 0 0)-2 × 1: A density functional theory study

The surface reaction mechanism of Y₂O₃ atomic layer deposition (ALD) on the hydroxylated silicon surface is investigated by using density functional theory. The ALD process is designed into two half-reactions, i.e., Cp₃Y (Cp = cyclopentadienyl) and H₂O half-reactions. For the Cp₃Y half-reaction, the chemisorbed complex is formed along with the change of metal-Cp bonding from Y-C(π) to Y-C₁(σ). For the H₂O half-reactions, the chemisorbed energies are increased with the relief of steric congestion around yttrium metal center. In addition, Gibbs free energy calculations show that it is thermodynamically favorable for the Cp₃Y half-reactions. By comparing with the reaction of H₂O with {Si}-(O₂)YCp, it is thermodynamically more favorable and kinetically less favorable for the reactions of H₂O with {Si}-OYCp₂ as well as with {Si}-OYCp(OH).     

Structure, stability and magnetic properties of the Fe3O4(1 1 0) surface: Density functional theory study

Six surface models for the Fe₃O₄(1 1 0) surface were studied using the density functional theory (DFT), namely the AB-terminated surface (AB model), the AB-terminated with Fe_A vacancy (AB-Fe_A vac model), the AB-terminated with Fe_B vacancy (AB-Fe_B vac model), the B-terminated surface (B model), the B-terminated surface with Fe_B vacancy (B-Fe_B vac model), and the B-terminated surface with O vacancy (B-O vac model). Here, A and B denoted the Fe cations in tetrahedrally (Fe_A) and octahedrally (Fe_B) coordinated interstices. The stability, the electronic structure and the magnetic properties of the six surface models were also calculated. The results predict that the B-O vac model is more stable than other surface models. The half-metallic property remains in the AB and B models, while the other four surface models exhibit metallic properties. At the same time, the AB, AB-Fe_A vac, AB-Fe_B vac, B and the B-Fe_B vac models have ferrimagnetic properties, while the B-O vac model has antiferromagnetic property.     

Surface reaction mechanism of atomic layer deposition of HfO2 on Ge(1 0 0)-2 × 1: A density functional theory study

Density functional theory is employed to investigate atomic layer deposition mechanism of HfO₂ on Ge(1 0 0)-2 × 1 surface. Both the HfCl₄ and H₂O half-reactions proceed through an analogous trapping-mediated mechanism. The neighboring hydroxyl in the reaction of HfCl₄ with two Ge-OH* sites has a major effect on the formation of HfCl₄ adsorbed complex. In addition, both the Ge and Si reaction pathways are qualitatively similar, however, adsorption of HfCl₄ is favorable on Ge than on Si surface hydroxyl sites. By comparison of the reactions of H₂O on the different surfaces, the differences in energy are negligible to alter the reaction mechanism.     

Deoxygenation of IrO2(1 1 0) surface: Core-level spectroscopy and density functional theory calculation

Deoxygenation of the IrO₂(1 1 0) surface is investigated at 403-493 K, using the core-level spectroscopy and density functional theory (DFT) calculation. The Ir-4f_7/2 signals of 1f-cus-Ir with and without on-top oxygen (O_top) emerge as surface features of the baked-out surface, whose positive and negative shifts in binding energy are in line with the DFT computation results. Progressively increasing the reduction temperature, the 1f-cus-Ir feature quickly disappears and the signal of 2f-cus-Ir emerges at 403 K. Meanwhile the feature of 1f-cus-Ir + O_top diminishes but persists when the Ir metal signal is evident. The intriguing coexistence of 1f-cus-Ir + O_top and Ir metal at 433-443 K is elucidated in the theoretical pathway study. DFT calculation reveals that O₂ desorption via pairing two neighboring O_top atoms is the rate-determining step of surface deoxygenation. Under the UHV conditions, O_top is replenished via migration of the surface oxygen species, including the threefold coordinated oxygen (O_3f) of a reduced surface. Hence the O_top atom is an active and long-lived surface species, which does not vanish until O_3f is consumed and surface Ir begins to cluster. Under the realistic pressure conditions, O_top can also be refreshed via the dissociative adsorption of gas-phase oxygen. In either pathway, O_top is a critical intermediary of IrO₂(1 1 0) oxidation catalysis.     

Enhanced water vapor barrier properties for biopolymer films by polyelectrolyte multilayer and atomic layer deposited Al2O3 double-coating

Commercial polylactide (PLA) films are coated with a thin (20 nm) non-toxic polyelectrolyte multilayer (PEM) film made from sodium alginate and chitosan and additionally with a 25-nm thick atomic layer deposited (ALD) Al₂O₃ layer. The double-coating of PEM + Al₂O₃ is found to significantly enhance the water vapor barrier properties of the PLA film. The improvement is essentially larger compared with the case the PLA film being just coated with an ALD-grown Al₂O₃ layer. The enhanced water vapor barrier characteristics of the PEM + Al₂O₃ double-coated PLA films are attributed to the increased hydrophobicity of the surface of these films.     

Early stages of interface formation of C60 on GaAs(1 0 0)

We present a detailed investigation of the electronic properties of C₆₀ grown on GaAs(1 0 0) substrates, as a function of the fullerene coverage, from the very early stages of interface formation up to the development of a bulk-like fullerene film. We monitor the chemical interactions and the energy levels alignment by means of X-rays, ultraviolet and inverse photoemission spectroscopies. The two latter techniques allow to investigate the electronic structure close to the Fermi level. Energy levels alignment at the interfaces of C₆₀ with p-doped and GaAs(1 0 0) are obtained and discussed.     

Surface energy of M2AC(0 0 0 1) determined by density functional theory (M = Ti, V, Cr; A = Al, Ga, Ge)

We have studied the correlation between the valence electron configuration and the electronic structure of M₂AC(0 0 0 1) surfaces (M = Ti, V, Cr; A = Al, Ga, Ge) by density functional theory. The A surface termination is the most stable configuration for all systems studied according to our surface energy data. As the M valence electron population is increased, the surface energy increases by 22% and 12% for A = Al and Ga, respectively, while it decreases by 29% for A = Ge. This can be understood by evaluating the valence electron concentration induced changes in the surface density of states. Antibonding surface Md-Ap states are present as Ti is substituted by Cr in M₂AC(0 0 0 1) for A = Al and Ga, while antibonding surface Md-Ap states are not present as Ti is substituted by Cr in M₂GeC(0 0 0 1).     

Surface reactions of 2-iodopropane on GaAs(1 0 0)

The surface reactions of 2-iodopropane ((CH₃)₂CHI) on gallium-rich GaAs(1 0 0)-(4 × 1), was studied by temperature programmed desorption (TPD) and X-ray photoelectron spectroscopy (XPS). CH₃CHICH₃ adsorbs molecularly at 120 K but dissociates below room temperature to form chemisorbed 2-propyl ((CH₃)₂CH) and iodide (I) species. Thermal activation causes desorption of the molecular species at 240 K, and this occurs in competition with the further reactions of the (CH₃)₂CH and I chemisorbed species. Self-coupling of the (CH₃)₂CH results in the formation of 2,3-dimethylbutane ((CH₃)₂CH-CH(CH₃)₂) at 290 K. β-Hydride elimination in (CH₃)₂CH yields gaseous propene (CH₃CHCH₂) at 550 K while reductive elimination reactions of (CH₃)₂CH with surface hydrogen yields propane (CH₃CH₂CH₃) at 560 K. Recombinative desorption of the adsorbed hydrogen as H₂ also occurs at 560 K. We observe that the activation barrier to carbon-carbon bond formation with 2-propyls on GaAs(1 0 0) is much lower than that in our previous investigations involving ethyl and 1,1,1-trifluoroethyl species where the β-elimination process was more facile. The difference in the surface chemistry in the case of 2-propyl species is attributable to its rigid structure resulting from the bonding to the surface via the second carbon atom, which causes the methyl groups to be further away from the surface than in the case of linear ethyl and 1,1,1-trifluoroethyl species. The β-hydride and reductive elimination processes in the adsorbed 2-propyl species thus occurs at higher temperatures, and a consequence of this is that GaI desorption, which is expected to occur in the temperature range 550-560 K becomes suppressed, and the chemisorbed iodine leaves the surface as atomic iodine.     

The electrical properties of dielectric stacks of SiO2 and Al2O3 prepared by atomic layer deposition method

We produced dielectric stacks composed of ALD SiO₂ and ALD Al₂O₃, such as SiO₂/Al₂O₃, Al₂O₃/SiO₂, and SiO₂/Al₂O₃/SiO₂, and measured the leakage currents through the stacks in comparison with those of the single oxide layers. SiO₂/Al₂O₃ shows lowest leakage current for negative bias region below 6.4 V, and Al₂O₃/SiO₂ showed highest current under negative biases below 4.5 V. Two distinct electron conduction regimes are observed for Al₂O₃ and SiO₂/Al₂O₃. Poole-Frenkel emission is dominant at the high-voltage regime for both dielectrics, whereas the direct tunneling through the dielectric is dominant at the low-voltage regime. The calculated transition voltage between two regimes for SiO₂ (6.5 nm)/Al₂O₃ (12.6 nm) is −6.4 V, which agrees well with the experimental observation (−6.1 V). For the same EOT of entire dielectric stack, the transition voltage between two regimes decreases with thinner SiO₂ layer.     

A quantum chemical study of ZrO2 atomic layer deposition growth reactions on the SiO2 surface

Zirconium oxide (ZrO₂) is one of the leading candidates to replace silicon oxide (SiO₂) as the gate dielectric for future generation metal-oxide-semiconductor (MOS) based nanoelectronic devices. Experimental studies have shown that a 1–3 monolayer SiO₂ film between the high permittivity metal oxide and the substrate silicon is needed to minimize electrical degradation. This study uses density functional theory (DFT) to investigate the initial growth reactions of ZrO₂ on hydroxylated SiO₂ by atomic layer deposition (ALD). The reactants investigated in this study are zirconium tetrachloride (ZrCl₄) and water (H₂O). Exchange reaction mechanisms for the two reaction half-cycles were investigated. For the first half-reaction, reaction of gaseous ZrCl₄ with the hydroxylated SiO₂ surface was studied. Upon adsorption, ZrCl₄ forms a stable intermediate complex with the surface SiO₂–OH^* site, followed by formation of SiO₂–O–Zr–Cl^* surface sites and HCl. For the second half-reaction, reaction of H₂O on SiO₂–O–Zr–Cl^* surface sites was investigated. The reaction pathway is analogous to that of the first half-reaction; water first forms a stable intermediate complex followed by evolution of HCl through combination of a Cl atom from the surface site and an H atom from H₂O. The results reveal that the stable intermediate complexes formed in both half-reactions can lead to a slow film growth rate unless process parameters are adjusted to lower the stability of the complex. The energetics of the two half-reactions are similar to those of ZrO₂ ALD on ZrO₂ and as well as the energetics of ZrO₂ ALD on hydroxylated silicon. The energetics of the growth reactions with two surface hydroxyl sites are also described.     

Adsorption of CO, NH3 and O2 on Fe site of La0.875Sr0.125FeO3 (0 1 0) surface by density function theory calculation

The adsorption of CO, NH₃ and O₂ gas molecules on Fe site of La_0.875Sr_0.125FeO₃ (0 1 0) surface has been investigated based on the density functional theory (DFT) with the spin polarized generalized gradient approximation (GGA). The optimal adsorption orientations as well as the adsorption energies for these molecules adsorption on Fe site of La_0.875Sr_0.125FeO₃ (0 1 0) surface are derived. Results show that adsorption configurations with C-down for CO, N-down for NH₃ are stable. For the O₂ molecule adsorption, the mode with an angle about 120° between the oxygen molecule and La_0.875Sr_0.125FeO₃ (0 1 0) surface is stable.     

A density functional theory study of formaldehyde adsorption and oxidation on CeO2(1 1 1) surface

The effects of different oxygen species and vacancies on the adsorption and oxidation of formaldehyde over CeO₂(1 1 1) surface were systematically investigated by using density functional theory (DFT) method. On the stoichiometric CeO₂(1 1 1) surface, the C-H bond rupture barriers of chemisorbed formaldehyde are much higher than that of formaldehyde desorption. On the reduced CeO₂(1 1 1) surface, the energy barriers of C-H bond ruptures are less than those on the stoichiometric CeO₂(1 1 1) surface. If the C-H bond rupture occurs, CO and H₂ form quickly with low energy barriers. When O₂ adsorbs on the reduced (1 1 1) surface (O₂/O_v species), the C-H bond rupture barriers of formaldehyde are greatly reduced in comparison with those on the stoichiometric CeO₂(1 1 1) surface. If O₂ adsorbs on oxygen vacancy at sub-layer surface, its oxidative roles on formaldehyde are much similar to that of O₂/O_v species.     

Formation of oxygen vacancies on the TiO2(1 1 0) surfaces

Density functional theory was employed to investigate the formation and properties of the oxygen vacancies on the rutile TiO₂(1 1 0) surface. It is found that the formation of the positively charged bridging-oxygen vacancy (BOV⁺, 4.2 eV) is the most favored one, followed by the positively charged in-plane-oxygen vacancy (POV⁺, 4.5 eV). In contrast, the formation of the neutral bridging-oxygen and in-plane-oxygen vacancies (BOV and POV), and their dication oxygen vacancies (BOV²⁺ and POV²⁺) needs much higher energies (7.9 and 8.3 vs. 8.1 and 8.6 eV), respectively.     

Self-limiting growth of ZnO films on (0 0 0 1) sapphire substrates by atomic layer deposition at low temperatures using diethyl-zinc and nitrous oxide

Atomic layer deposition (ALD) of zinc oxide (ZnO) films on (0 0 0 1) sapphire substrates was conducted at low temperatures by using diethyl-zinc (DEZn) and nitrous oxide (N₂O) as precursors. It was found that a monolayer-by-monolayer growth regime occurred at 300 °C in a range of DEZn flow rates from 5.7 to 8.7 μmol/min. Furthermore, the temperature self-limiting process window for the ALD-grown ZnO films was also observed ranging from 290 to 310 °C. A deposition mechanism is proposed to explain how saturated growth of ZnO is achieved by using DEZn and N₂O. Transmission spectroscopic studies of the ZnO films prepared in the self-limiting regime show that the transmittances of ZnO films are as high as 80% in visible and near infrared spectra. Experimental results indicate that ZnO films with high optical quality can be achieved by ALD at low temperatures using DEZn and N₂O precursors.     

First-principles calculations of precursor adsorption on substrate during atomic layer deposition: The example of SiO2 deposition using tris(dimethylamino)silane

In this study, we investigate the reaction mechanisms of precursor adsorption during the atomic layer deposition (ALD) using density functional theory (DFT) calculations and ideal-gas methods; herein, we considered adsorption of tris(dimethylamino)silane (TDMAS) on a hydroxylated SiO₂ surface to be the example for our investigation. When the reaction free energy is calculated, the DFT results obtained at 0 K suggest that the dissociation of a hydrogen atom from TDMAS is favorable upon TDMAS adsorption, which is inconsistent with the experimental results where one dimethylamino group is released. The experimental results can be accurately predicted when enthalpy and entropy changes are considered at elevated temperatures, thereby indicating the significance of finite-temperature effects in free-energy changes for solid-gas reactions. We analyze the changes in enthalpy and entropy and find that dimethylamine is a more favorable gaseous product than H₂ owing to its larger translational and rotational entropy.     

DFT study of Pt adsorption on low index SrTiO3 surfaces: SrTiO3(1 0 0), SrTiO3(1 1 1) and SrTiO3(1 1 0)

Density Functional Theory has been used to determine the energetically preferred structures of submonolayer, monolayer, and multilayer Pt films on both ideal terminations of SrTiO₃(1 0 0), SrTiO₃(1 1 1), and SrTiO₃(1 1 0). The strength of the resulting metal/metal oxide interfaces was characterized by the adsorption energy of the film and the film’s work of separation. The two polar surfaces, SrTiO₃(1 1 1) and SrTiO₃(1 1 0), form significantly stronger interfaces than the non-polar SrTiO₃(1 0 0) surface. Approximate criteria were applied to predict the growth mode of Pt on each surface.     

Initial stages of H2O adsorption and hydroxylation of Fe-terminated α-Fe2O3(0 0 0 1) surface

The adsorption modes of H₂O on a Fe-terminated hematite(0 0 0 1) surface have been investigated by first principles Density Functional theory within a periodic slab model and the generalized gradient approximation. Molecular adsorption and dissociative adsorption in monolayer coverage, one H₂O per surface Fe, were both considered. Five plausible orientations were studied to determine the most favorable adsorption position. Molecular adsorption is shown to have a small effect on the underlying surface structure, while hydroxylation has a strong effect on the surface geometry. Electronic densities of state calculations reveal details of these different interactions. The heterolytic dissociation, which produces two types of surface hydroxyls, is the preferable adsorption mode, being slightly favored energetically over the molecular adsorption. Homolytic dissociative adsorption, forming a single hydroxyl on surface Fe, is energetically unfavored, even though strong binding interaction (∼3 eV) is found between the OH radical and surface. Dissociative adsorption on an oxidized ferryl site was also studied to investigate suggested local reactivity enhancement.