The micromagnetic ground states in epitaxial Fe (0 0 1) microstructures

The magnetic structure of planar epitaxial microstructures Fe (0 0 1) fabricated as rectangles and crosses of 200 nm to 20 μm sizes was studied using magnetic force microscopy and micromagnetic calculations. Most characteristic micromagnetic ground states were examined. The effect of microstructure sizes and orientation, with respect to the crystallographic axes, on the magnetic structure was considered. It was found that the micromagnetic ground state is a sequence of vortices or a diamond structure and also the Landau structure when the long microstructure axis is parallel to the easy axis of magnetization (EAM). When the microstructure sizes become smaller than 0.5 μm, micromagnetic states convert to a quasisingle-domain state. In microstructures oriented along the hard axis of magnetization in the film plane, micromagnetic ground states display either a concertina structure or a sequence of vortices and antivortices. In cross-shaped microstructures, the magnetic structure of the arms of the cross was found to be similar to that observed in rectangular microstructures of the same size and orientation relative to the crystallographic axes. However, the magnetic structure of the central part of the cross is not a superposition of the magnetic structures extended from the arms. It is determined by the EAM direction.     

A PdO(1 0 1) thin film grown on Pd(1 1 1) in ultrahigh vacuum

We present experimental results demonstrating that a high quality PdO(1 0 1) thin film can be grown on Pd(1 1 1) in ultrahigh vacuum by oxidizing the metal at 500 K using an oxygen atom beam, followed by annealing to 675 K. Low energy electron diffraction (LEED) images show that the [0 1 0] direction of the PdO(1 0 1) thin film aligns with the [−1 1 0] direction of the Pd(1 1 1) substrate, and that the PdO film grows in three degenerate domains, rotated 120° relative to one another. Based on excellent agreement between the experimental and simulated LEED patterns, we conclude that the surface structure of the PdO thin film deviates minimally from bulk-terminated PdO(1 0 1). Recent temperature programmed desorption (TPD) experiments also provide evidence that the PdO(1 0 1) thin film on Pd(1 1 1) is terminated by the stoichiometric surface in which half of the Pd atoms are coordinatively unsaturated (cus), corresponding to a cus-Pd atom density equal to about 35% of the surface density of Pd(1 1 1). The ability to generate a well-defined PdO(1 0 1) surface in ultrahigh vacuum should provide new opportunities for conducting model surface science studies of PdO, particularly studies aimed at elucidating the reactivity of PdO(1 0 1) toward species important in commercial applications of Pd catalysis.     

Time evolution of interface roughness during thermal oxidation on Si(0 0 1)

The surface morphological change at an initial stage of thermal oxidation on Si(0 0 1) surface with O₂ was investigated as a function of oxide coverage by a real-time monitoring method of Auger electron spectroscopy (AES) combined with reflection high energy electron diffraction (RHEED). At 653 °C where oxide islands grow laterally, protrusions were observed to develop under the oxide islands as a consequence of concurrent etching of the surface. The rate of etching was measured from a periodic oscillation of RHEED half-order spot intensity I_(1/2,0) and I_(0,1/2). At 549 °C where Langmuir-type adsorption proceeds, it was observed that both I_(1/2,0) and I_(0,1/2) decrease more rapidly in comparison with an increase of oxide coverage and the intensity ratio between them decreases gradually with O₂ exposure time. These suggest that Langmuir-type adsorption occurs at sites where O₂ adsorbs randomly, leading to subdivision of the 2×1 and 1×2 domains by oxidized regions, and that Si atoms are ejected due to volume expansion in oxidation to change the ratio between 2×1 and 1×2 domains.     

Surface relaxation and near-surface atomic displacements in the N/Cu(1 0 0) self-ordered system

The atomic displacements of Cu atoms induced by nitrogen adsorption on Cu(1 0 0) have been studied by channelling–blocking of swift ⁴He ions. This study has been performed at two adsorption stages. The first one corresponds to the formation of a dense, two-dimensional, self-ordered array of square-shaped islands covered by nitrogen. The second one corresponds to uniform coverage at saturation. We have determined by nuclear reaction analysis the absolute quantity of nitrogen adsorbed at these two stages. The values obtained, when confronted to previous observations of these stages by low energy electron diffraction and by scanning tunnelling microscopy, demonstrate that nitrogen remains mostly at the sample surface and that the N concentration in bulk Cu could not exceed 1%. However, channelling measurements show that this surface adsorption generates atomic displacements of Cu atoms down to depths of a few ten (1 0 0) interplanar distances. In the mean time, blocking measurements reveal that nitrogen adsorption induces a strong surface expansion: the interplanar distance between the first two (1 0 0) planes increases of about 0.2 Å, in contrast with the weak contraction observed on bare Cu(1 0 0) surfaces. This observation supports the hypothesis that, when nitrogen is adsorbed, the surface is submitted to stress variations, from tensile to compressive stress for, respectively, bare and nitrogen-covered surface regions. The surface forces corresponding to such variations have been introduced in molecular dynamics simulations. For coverage leading to self-ordering, these simulations do indeed predict displacements of subsurface Cu atoms. The adjustment of these displacements to those measured by channelling gives the amplitude of the stress variation.     

First-principles calculation of Mg(0 0 0 1) thin films: Quantum size effect and adsorption of atomic hydrogen

We have carried out first-principles calculation of Mg(0 0 0 1) free-standing thin films to study the oscillatory quantum size effect exhibited in the surface energy, work function, interlayer relaxation, and adsorption energy of the atomic hydrogen adsorbate. The quantum well states have been shown. The calculated energetics and interlayer relaxation of clean and H-adsorbed Mg films are clearly featured by quantum oscillations as a function of the thickness of the film, with oscillation period of about eight monolayers, consistent with recent experiments. The calculated quantum size effect in H adsorption can be verified by observing the dependence of H coverage on the thickness of Mg(0 0 0 1) thin films gown on Si(1 1 1) or W(1 1 0) substrate which has been experimentally accessible.     

Growth of metallic nanowires on anisotropic Si substrates: Pb on vicinal Si(0 0 1), Si(7 5 5), Si(5 3 3), and Si(1 1 0)

The spontaneous formation of mesoscopic Pb-wires, on 4° off-cut Si(0 0 1) vicinal surface, Si(7 5 5), Si(5 3 3), and Si(1 1 0) substrates was studied by low-energy electron microscopy. Before the deposition of Pb the substrates were modified by predeposition of a submonolayer amount of Au followed by annealing. The Au-induced reconstruction creates quasi-one-dimensional facets and superstructures. Their width ranged from several hundred nm in the case of the vicinal Si(0 0 1) down to atomic scale size, for the Si(1 1 0) surface. The best-developed arrays of parallel aligned mesoscopic wires were obtained during the deposition of Pb on substrates cooled slightly below room temperature. Wires with length to width ratio reaching 130 were produced on the Si(7 5 5) and the Si(5 3 3) substrates. The width of these nanowires was uniform over the whole substrate and was about 60 nm. The driving forces for the formation of the mesoscopic wires are the anisotropic strain due to the large misfit between the Pb and the Si lattice and one-dimensional diffusion of Pb.     

Molecular-beam epitaxy on shallow mesa gratings patterned on GaAs(3 1 1)A and (1 0 0) substrates

We report on the morphology and properties of the surface formed by molecular-beam epitaxy on shallow mesa gratings on patterned GaAs(3 1 1)A and GaAs(1 0 0). On GaAs(3 1 1)A substrates, the corrugated surface formed after GaAs growth on shallow mesa gratings along is composed of monolayer high steps and (3 1 1)A terraces. These pattern induced steps which are different on opposite slopes play an important role in InAs growth on this novel template leading to distinct lateral modulation of the island distribution. On GaAs(1 0 0) substrates, growth on shallow mesa gratings along [0 1 1], [0 1 0] and is drastically sensitive to the pattern direction due to the difference of steps along [0 1 1] and .     

CO adsorption on Cu(1 1 1) and Cu(0 0 1) surfaces: Improving site preference in DFT calculations

CO adsorption on Cu(1 1 1) and Cu(0 0 1) surfaces has been studied within ab initio density functional theory (DFT). The structural, vibrational and thermodynamic properties of the adsorbate–substrate complex have been calculated. Calculations within the generalized gradient approximation (GGA) predict adsorption in the threefold hollow on Cu(1 1 1) and in the bridge-site on Cu(0 0 1), instead of on-top as found experimentally. It is demonstrated that the correct site preference is achieved if the underestimation of the HOMO–LUMO gap of CO characteristic for DFT is corrected by applying a molecular DFT + U approach. The DFT + U approach also produces good agreement with the experimentally measured adsorption energies, while introducing only small changes in the calculated geometrical and vibrational properties further improving agreement with experiment which is fair already at the GGA level.     

Adsorption of thiophene on Ni(1 0 0), Cu(1 0 0), and Pd(1 0 0) surfaces: ab initio periodic density functional study

Adsorption of thiophene on the (1 0 0) surfaces of Ni, Cu, and Pd has been investigated by the ab initio density functional theory method (periodic DMol³). Several parallel and perpendicular adsorption geometries are examined in detail. For Ni(1 0 0), both dissociative and molecular adsorption structures are found with small difference in energy. Thiophene adsorbs only molecularly on Cu(1 0 0) and Pd(1 0 0). The most stable molecular adsorption structures on all the surfaces are quite similar, where thiophene adsorbs on top of a 4-fold hollow with the symmetry axis rotated 45° from the metal rows. These stable structures arise from a good matching of the thiophene molecule to the metal surfaces. The calculated adsorption geometries are in reasonable agreement with XAFS experiments.     

RAS: An efficient probe to characterize Si(0 0 1)-(2 × 1) surfaces

A complete inspection of the capabilities of reflectance anisotropy spectroscopy (RAS) in studying the adsorption of molecules or atoms on the Si(0 0 1)-(2 × 1) surface is presented. First, a direct comparison between RA spectra recorded on the clean Si(0 0 1)-(2 × 1) and the corresponding topography of the surface obtained using scanning tunneling microscopy (STM) allows us to quantify the mixing of the two domains that are present on the surface. Characteristic RA spectra recorded for oxygen, hydrogen, water, ethylene, benzene are compared to try to elucidate the origin of the optical structures. Quantitative and qualitative information can be obtained with RAS on the kinetics of adsorption, by monitoring the RA signal at a given energy versus the dose of adsorbate; two examples are presented: H₂/Si(0 0 1) and C₆H₆/Si(0 0 1). Very different behaviours in the adsorption processes are observed, making of this technique a versatile tool for further investigations of kinetics.     

Decomposition mechanism of triethylindium (TEI) on a GaP(0 0 1)-(2×1) surface studied by LEED, AES, TPD and HREELS

Adsorption and decomposition of triethylindium (TEI: (C₂H₅)₃In) on a GaP(0 0 1)-(2×1) surface have been studied by low-energy electron diffraction (LEED), Auger electron spectroscopy (AES), temperature-programmed desorption (TPD) and high-resolution electron energy loss spectroscopy (HREELS). It is found from the TPD result that ethyl radical and ethylene are evolved at about 300–400 and 450–550 K, respectively, as decomposition products of TEI on the surface. This result is quite different from that on the GaP(0 0 1)-(2×4) surface. The activation energy of desorption of ethyl radical is estimated to be about 93 kJ/mol. It is suggested that TEI is adsorbed molecularly on the surface at 100 K and that some of TEI molecules are dissociated into C₂H₅ to form P–C₂H₅ bonds at 300 K. The vibration modes related to ethyl group are decreased in intensity at about 300–400 and 450–550 K, which is consistent with the TPD result. The TEI molecules (including mono- and di-ethylindium) are not evolved from the surface. Based on the TPD and HREELS results, the decomposition mechanism of TEI on the GaP(0 0 1)-(2×1) surface is discussed and compared with that on the (2×4) surface.     

Local adsorption sites and bondlength changes in Ni(1 0 0)/H/CO and Ni(1 0 0)/CO

The local adsorption geometry of CO adsorbed in different states on Ni(1 0 0) and on Ni(1 0 0) precovered with atomic hydrogen has been determined by C 1s (and O 1s) scanned-energy mode photoelectron diffraction, using the photoelectron binding energy changes to characterise the different states. The results confirm previous spectroscopic assignments of local atop and bridge sites both with and without coadsorbed hydrogen. The measured Ni–C bondlengths for the Ni(1 0 0)/CO states show an increase of 0.16 ± 0.04 Å in going from atop to bridge sites, while comparison with similar results for Ni(1 1 1)/CO for threefold coordinated adsorption sites show a further lengthening of the bond by 0.05 ± 0.04 Å. These changes in the Ni–CO chemisorption bondlength with bond order (for approximately constant adsorption energy) are consistent with the standard Pauling rules. However, comparison of CO adsorbed in the atop geometry with and without coadsorbed hydrogen shows that the coadsorption increases the Ni–C bondlength by only 0.06 ± 0.04 Å, despite the decrease in adsorption energy of a factor of 2 or more. This result is also reproduced by density functional theory slab calculations. The results of both the experiments and the density functional theory calculations show that CO adsorption onto the Ni(1 0 0)/H surface is accompanied by significant structural modification; the low desorption energy may then be attributed to the energy cost of this restructuring rather than weak local bonding.     

Well-ordered (1 0 0) InAs surfaces using wet chemical treatments

Atomic ordering of HCl-isopropanol (HCl-iPA) treated and vacuum annealed (1 0 0) InAs surfaces was studied by scanning tunneling microscopy (STM), low-energy electron diffraction (LEED), and reflectance anisotropy spectroscopy (RAS). On the as-treated surface, a diffused (1 × 1) pattern is observed, which successively evolves to the β₂(2 × 4)/c(2 × 8) and (4 × 2)/c(8 × 2) ones after annealing to 330 °C and 410 °C, respectively. At the intermediate temperature of 370 °C, an ₂(2 × 4)/(4 × 2) mixed reconstruction is observed. Reflectance anisotropy spectra are compared with those of the corresponding reconstructions observed after As-decapping and found to be quite similar. Therefore we conclude that high-quality (1 0 0) InAs surfaces can be obtained by wet chemical treatment in an easy, inexpensive and practical way.     

Mechanism and energetics of dimerization of SiH2 radicals on H-terminated Si(0 0 1)-(2×1) surfaces

The mechanism and energetics are presented of the dimerization of two adsorbed surface SiH₂ groups on the H-terminated Si(0 0 1)-(2 × 1) surface to form Si₂H₄ species during the initial stages of growth in plasma deposition of hydrogenated amorphous silicon (a-Si:H) films. The reactions are observed during classical molecular-dynamics (MD) simulations of a-Si:H film deposition from SiH₂ radical precursors impinging on an initially H-terminated Si(0 0 1)-(2 × 1) surface and substrate temperature, T, over the range 500T700 K. The Si₂H₄ species resulting from the surface SiH₂ dimerization reactions undergo surface conformational changes resulting in either a non-rotated (NRD) or a rotated dimer (RD) configuration. The RD configuration is found to be the energetically favorable one. The MD simulation results for the structure of the NRD and RD surface Si₂H₄ configurations corroborate with ab initio calculations of optimized adsorption configurations of SiH₂ radicals on crystalline Si surfaces, as well as results of STM imaging of the thermal decomposition of disilane on Si(0 0 1).     

InAs wetting layer evolution on GaAs(0 0 1)

The evolution of two-dimensional (2D) strained InAs wetting layers on GaAs(0 0 1), grown at different temperatures by molecular beam epitaxy, was studied by in situ high-resolution scanning tunneling microscopy. At low growth temperature (400 °C), the substrate exhibits a well-defined GaAs(0 0 1)-c(4 × 4) structure. For a disorientation of 0.7°, InAs grows in the step-flow mode and forms an unalloyed wetting layer mainly along steps, but also in part on the terrace. The wetting layer displays some local c(4 × 6) reconstruction, for which a model is proposed. 1.2 monolayer (ML) InAs deposition induces the formation of 3D islands. At a higher temperature (460 °C), the wetting layer is obviously alloyed even at low InAs coverage. The critical thickness of the wetting layer for the 2D-to-3D transition is shifted to 1.50 ML in this case presumably since the strain is reduced by alloying.     

Surface properties of Hafnium diboride(0 0 0 1) as determined by X-ray photoelectron spectroscopy and scanning tunneling microscopy

The surface structure and properties of the HfB₂(0 0 0 1) (Hafnium diboride, HfB₂) surface have been investigated with X-ray photoelectron spectroscopy, low energy electron diffraction (LEED), and scanning tunneling microscopy (STM). Annealing temperatures above 1900°C produce a sharp (1×1) LEED pattern, which corresponds to STM images showing flat (0 0 0 1) terraces with a very low contamination level separated by steps 3.4 Å in height, corresponding to the separation of adjacent Hf planes in the HfB₂ bulk structure. For lower annealing temperatures, extra p(2×2) spots were observed with LEED, which correspond to intermediate terraces of a p(2×1) missing row structure as observed with STM.     

Structural fluctuation of dimers on Ge(0 0 1) surface near transition temperature

The structural fluctuation of the orientational arrangement of buckled dimers on a Ge(0 0 1) surface near the transition temperature of the order-disorder phase transition is investigated by time-resolving dynamical Monte Carlo simulations. STM images averaged in a finite period are derived from the simulation. The coexistence of the c(4 × 2) and the apparent (2 × 1) domains in the STM images observed by experiments is reproduced in the simulated STM images. We show that the coexistence on the Ge(0 0 1) surface can be attributed to the critical slowing down near the transition temperature.     

XPS and RBS investigations of Si–Er–O interactions on a Si(1 0 0)-2x1 surface

The interactions among erbium, oxygen and silicon atoms on a Si(1 0 0)-2x1 reconstructed surface have been studied by means of X-ray photoelectron spectroscopy and Rutherford backscattering spectrometry. Erbium and oxygen were deposited at 600 °C on the Si surface and their behavior has been observed after different thermal processes. It was found that at 600 °C, the formation of a stable surface complex Er–O–Si is obtained together with Si oxidation; after an 800 °C annealing, the amount of oxygen bound to Si decreases and the remaining O atoms are mainly bonded to Er. An abrupt change was observed after 900 and 1000 °C annealings, which bury the Er atoms about 60 Å below the substrate surface. Our results give some hints to hypotise the O diffusion towards the Si bulk.     

Local structure of OH adsorbed on the Ge(0 0 1)(2 × 1) surface using scanned-energy mode photoelectron diffraction

The local geometry of OH fragments adsorbed on the Ge(0 0 1)(2 × 1) surface has been examined using O 1s scanned energy mode photoelectron diffraction. These fragments were obtained by the dissociative reaction of the clean surface with H₂O. The Ge–O bond length is found to be 1.76 ± 0.02 Å and the Ge–O bond angle to be 15° ± 2° relative to the surface normal. Some information about the positions of the Ge dimer atoms has also been obtained.     

Surface vs. bulk magnetic properties of Co/Fe(0 0 1) and Fe/Co/Fe(0 0 1) as probed by linear magnetic dichroism in photoemission

The atomic-like behavior of the photoionization cross-section of core levels in solids is remarkably displayed in the observation of linear magnetic dichroism in the angular distribution (LMDAD) of photoelectrons. Nevertheless, structure-related effects are clearly visible as modulations of the dichroism signal, induced by photoelectron diffraction (PED). In this paper a comparison between the PED and LMDAD behaviours is presented for Fe 3p in Fe(0 0 1). In order to separate experimentally the surface and bulk contributions, ultrathin Co/Fe pseudomorphic overlayers were grown on the Fe(0 0 1) surface. Results confirms the PED nature of LMDAD modulations, which can be used as an estimate of the bulk sensitivity of the experiment.