Mass spectral analysis and imaging of tissue by ToF-SIMS—The role of buckminsterfullerene, C60, primary ions

Recent developments in desorption/ionisation mass spectrometry techniques have made their application to biological analysis a realistic and successful proposition. Developments in primary ion source technology, mainly through the advent of polyatomic ion beams, have meant that the technique of secondary ion mass spectrometry (SIMS) can now access the depths of information required to allow biological imaging to be a viable option.Here the role of the primary ion C₆₀⁺ is assessed with regard to molecular imaging of lipids and pharmaceuticals within tissue sections. High secondary ion yields and low surface damage accumulation are demonstrated on both model and real biological samples, indicating the high secondary ion efficiency afforded to the analyst by this primary ion when compared to other cluster ion beams used in imaging. The newly developed 40 keV C₆₀⁺ ion source allows the beam to be focused such that high resolution imaging is demonstrated on a tissue sample, and the greater yields allow the molecular signal from the drug raclopride to be imaged within tissue section following in vivo dosing.The localisation shown for this drug alludes to issues regarding the chemical environment affecting the ionisation probability of the molecule; the importance of this effect is demonstrated with model systems and the possibility of using laser post-ionisation as a method for reducing this consequence of bio-sample complexity is demonstrated and discussed.     

Nanoscale imaging of hydrogen and sodium in alteration layers of corroded glass using ToF-SIMS: Is an auxiliary sputtering ion beam necessary?

The hydrogen (H)/sodium (Na) interface is of great interest in glass corrosion research. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is one of the few techniques that can provide nanoscale H and Na imaging simultaneously. However, the optimized condition for ToF-SIMS imaging of H in glass is still unclear. In H depth profiling using ToF-SIMS, H background control is a key, in which an analysis ion beam and a sputtering ion beam work together in an interlaced mode to minimize it. Therefore, it is of great interest to determine if an auxiliary sputtering ion beam is also necessary to control H background in ToF-SIMS imaging of H. In this study, H imaging with and without auxiliary sputtering beams (Cs⁺, O₂⁺, and Ar_n⁺) was compared on a corroded international simple glass (ISG). It was surprising that the H/Na interface could be directly imaged using positive ion imaging without any auxiliary sputtering ion beam under a vacuum of 2 to 3 × 10⁻⁸ mbar. The H⁺ background was about 5% atomic percent on the pristine ISG glass, which was significantly lower than the H concentration in the alteration layer (~15%). Moreover, positive ion imaging could show distributions of other interesting species simultaneously, providing more comprehensive information of the glass corrosion. If an auxiliary O₂⁺ sputtering ion beam was used, the H⁺ background could be reduced but still higher than that in the depth profiling. Besides, this condition could cause significant loss of signal intensities due to strong surface charging.     

Parallel detection,quantification, and depth profiling of peptides with dynamic-secondary ion mass spectrometry (D-SIMS) ionized by C60–Ar co-sputtering

Time-of-flight secondary ion mass spectrometry (ToF-SIMS) using pulsed C₆₀⁺ primary ions is a promising technique for analyzing biological specimens with high surface sensitivities. With molecular secondary ions of high masses, multiple molecules can be identified simultaneously without prior separation or isotope labeling. Previous reports using the C₆₀⁺ primary ion have been based on static-SIMS, which makes depth profiling complicated. Therefore, a dynamic-SIMS technique is reported here. Mixed peptides in the cryoprotectant trehalose were used as a model for evaluating the parameters that lead to the parallel detection and quantification of biomaterials. Trehalose was mixed separately with different concentrations of peptides. The peptide secondary ion intensities (normalized with respect to those of trehalose) were directly proportional to their concentration in the matrix (0.01–2.5 mol%). Quantification curves for each peptide were generated by plotting the percentage of peptides in trehalose versus the normalized SIMS intensities. Using these curves, the parallel detection, identification, and quantification of multiple peptides was achieved. Low energy Ar⁺ was used to co-sputter and ionize the peptide-doped trehalose sample to suppress the carbon deposition associated with C₆₀⁺ bombardment, which suppressed the ion intensities during the depth profiling. This co-sputtering technique yielded steadier molecular ion intensities than when using a single C₆₀⁺ beam. In other words, co-sputtering is suitable for the depth profiling of thick specimens. In addition, the smoother surface generated by co-sputtering yielded greater depth resolution than C₆₀⁺ sputtering. Furthermore, because C₆₀⁺ is responsible for generating the molecular ions, the dosage of the auxiliary Ar⁺ does not significantly affect the quantification curves.     

New horizons in sputter depth profiling inorganics with giant gas cluster sources: Niobium oxide thin films

X‐ray photoelectron spectroscopy is used to study a wide variety of material systems as a function of depth (“depth profiling”). Historically, Ar⁺ has been the primary ion of choice, but even at low kinetic energies, Ar⁺ ion beams can damage materials by creating, for example, nonstoichiometric oxides. Here, we show that the depth profiles of inorganic oxides can be greatly improved using Ar giant gas cluster beams. For NbO_x thin films, we demonstrate that using Ar_x⁺ (x = 1000‐2500) gas cluster beams with kinetic energies per projectile atom from 5 to 20 eV, there is significantly less preferential oxygen sputtering than 500 eV Ar⁺ sputtering leading to improvements in the measured steady state O/Nb ratio. However, there is significant sputter‐induced sample roughness. Depending on the experimental conditions, the surface roughness is up to 20× that of the initial NbO_x surface. In general, higher kinetic energies per rojectile atom (E/n) lead to higher sputter yields (Y/n) and less sputter‐induced roughness and consequently better quality depth profiles. We demonstrate that the best‐quality depth profiles are obtained by increasing the sample temperature; the chemical damage and the crater rms roughness is reduced. The best experimental conditions for depth profiling were found to be using a 20 keV Ar₂₅₀₀⁺ primary ion beam at a sample temperature of 44°C. At this temperature, there is no, or very little, reduction of the niobium oxide layer and the crater rms roughness is close to that of the original surface.     

Chemical discrimination of multilayered paint cross sections for potential forensic applications using time‐of‐flight secondary ion mass spectrometry

Time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) equipped with a bismuth imaging source and an argon gas cluster ion beam (GCIB) was used to image polished cross‐sections of four automotive multilayer paint samples. Secondary ion mass spectrometry chemical imaging of the individual layers was possible after a GCIB sputter ion dose of (7 × 10¹⁵) ions/cm² was applied for the removal of polishing residue, at which point the chemical composition of the individual clear coats could be distinguished using principal components analysis. For the differentiation of the four clear coat chemistries, only four secondary ion peaks were necessary; C₂H₅O⁺ (m/z 45.04), C₉H₉NO₂⁺ (m/z 163.09), and C₁₀H₁₁NO₂⁺ (m/z 177.10) that appeared to be fragments of the carbamate‐based clear coat, and C₇H₁₁⁺ (m/z 95.09) that was strongly associated with the polyurethane‐based clear coat. Clear identification of the four paint samples based on this short peak list highlights the strength of the SIMS technique as a potential forensic approach to discriminate automotive paints and suggests that many more variables could be included in the multivariate and statistical analysis to differentiate a wider range of clear coat chemistries.     

Effects of pretreatment temperature on the analysis of size-fractionated aerosol particles using ToF-SIMS

Size-fractionated aerosol particles were collected with a MOUDI 10-stage cascade impactor from an urban roadside place in a downtown area of Hong Kong. Fine aerosol particulate samples from stage 6 (aerodynamic particle diameter between 0.56 and 1 μm) and stage 9 (aerodynamic particle diameter between 0.10 and 0.18 μm) were pretreated at a chosen temperature, including −100°C, −50°C, 25°C, and 60°C, in a load lock chamber and then analyzed using time-of-flight secondary ion mass spectrometry (ToF-SIMS) at the same temperature (−100°C). Principal component analysis (PCA) was applied to further analyze ToF-SIMS spectra of aerosol particles with different pretreatment temperatures from two selected stages. ToF-SIMS results showed that the intensities of aliphatic hydrocarbon ions such as C₄H₇⁺ and C₄H₉⁺ and amine ions such as C₂H₈N⁺ and C₄H₁₂N⁺ decreased with an increase of the pretreatment temperature under ultrahigh vacuum conditions. We have shown that analyses of this type of aerosol particles using ToF-SIMS should not be conducted at ambient temperature but at low temperature (eg, −50°C). In addition, we also developed a procedure that can be used to analyze aerosol particle samples under ultrahigh vacuum environment.     

Three-dimensional depth profiling of molecular structures

Molecular time of flight secondary ion mass spectrometry (ToF-SIMS) imaging and cluster ion beam erosion are combined to perform a three-dimensional chemical analysis of molecular films. The resulting dataset allows a number of artifacts inherent in sputter depth profiling to be assessed. These artifacts arise from lateral inhomogeneities of either the erosion rate or the sample itself. Using a test structure based on a trehalose film deposited on Si, we demonstrate that the “local” depth resolution may approach values which are close to the physical limit introduced by the information depth of the (static) ToF-SIMS method itself.     

Peptide structural analysis using continuous Ar cluster and C60 ion beams

A novel application of time-of-flight secondary ion mass spectrometry (ToF-SIMS) with continuous Ar cluster beams to peptide analysis was investigated. In order to evaluate peptide structures, it is necessary to detect fragment ions related to multiple neighbouring amino acid residues. It is, however, difficult to detect these using conventional ToF-SIMS primary ion beams such as Bi cluster beams. Recently, C₆₀ and Ar cluster ion beams have been introduced to ToF-SIMS as primary ion beams and are expected to generate larger secondary ions than conventional ones. In this study, two sets of model peptides have been studied: (des-Tyr)-Leu-enkephalin and (des-Tyr)-Met-enkephalin (molecular weights are approximately 400 Da), and [Asn¹ Val⁵]-angiotensin II and [Val⁵]-angiotensin I (molecular weights are approximately 1,000 Da) in order to evaluate the usefulness of the large cluster ion beams for peptide structural analysis. As a result, by using the Ar cluster beams, peptide molecular ions and large fragment ions, which are not easily detected using conventional ToF-SIMS primary ion beams such as Bi₃ ⁺, are clearly detected. Since the large fragment ions indicating amino acid sequences of the peptides are detected by the large cluster beams, it is suggested that the Ar cluster and C₆₀ ion beams are useful for peptide structural analysis.     

A new SIMS paradigm for 2D and 3D molecular imaging of bio-systems

With the implementation of focused primary ion beams, secondary ion mass spectrometry (SIMS) has become a significant technique in the rapidly emerging field of mass spectral imaging in the biological sciences. Liquid metal ion guns (LMIG) offered the prospect of sub-100 nm spatial resolution, however this aspiration has yet to be reached for molecular imaging. This brief review shows that using LMIG the limitations of the static limit and low ionization probability will restrict useful imaging to around 2 μm spatial resolution with high-yield molecules. The only prospect of going beyond this in the absence of factors of 100 increase in ionization probability is to use polyatomic ion beams such as C₆₀⁺, for which bombardment induced damage is low. In these cases sub-micron imaging becomes possible, using voxels together with molecular depth profiling and 3D imaging. The discussion shows that conventional ToF-SIMS instrumentation then becomes a limitation in that the pulsed ion beam has a very low duty cycle which results in inordinately long analysis times, and pulsing the beam means that high-mass resolution and high spatial resolution are mutually incompatible. New instrumental configurations are described that allow the use of a dc ion beam and separate the mass spectrometry for the ion formation process. Early results from these instruments suggest that sub-micron analysis and imaging with high mass resolution and good ion yields are now realizable, although the low ion yield issue still needs to be solved.     

Depth profiling of polymer samples using Ga+ and C60+ ion beams

In this contribution, we focus on the use of C₆₀⁺ ions for depth profiling of model synthetic polymers: polystyrene (PS) and poly(methylmethacrylate) (PMMA). These polymers were spin coated on silicon wafers, and the obtained samples were depth‐profiled both with Ga⁺ ions and C₆₀⁺ ions. We observed an important yield enhancement for both polymers when C₆₀⁺ ions are used. More specifically, we discuss here the decrease in damage obtained with C₆₀, which is found to be very sensitive to the nature of the polymer. During the C₆₀⁺ sputtering of the PMMA layer, after an initial decrease, a steady state is observed in the secondary ion yield of characteristic fragments. In contrast, for PS, an exponential decrease is directly observed, leading to an initial disappearance cross section close to the value observed for Ga⁺. Though there is a significant loss of characteristic PS signal when sputtering with C₆₀⁺ ions beams, there are still significant enhancements in sputter yields when employing C₆₀⁺ as compared to Ga⁺. Copyright © 2008 John Wiley & Sons, Ltd.     

Attempts for molecular depth profiling directly on a rat brain tissue section using fullerene and bismuth cluster ion beams

The capabilities of time of flight secondary ion mass spectrometry (TOF-SIMS) have been recently greatly improved with the arrival in this field of polyatomic ion sources. This technique is now able to map at the micron scale intact organic molecules in a range of a thousand Daltons or more, at the surface of tissue samples. Nevertheless, this remains a surface analysis technique, and three-dimensional information on the molecular composition of the sample could not be obtained due to the damage undergone by the organic molecules during their irradiation. The situation changed slightly with the low damage and low penetration depth of the C₆₀ fullerene ion beams. Recent promising studies have shown the possibility of organic molecular depth profiling using this kind of beams onto model samples. This possibility has been tried out directly onto a rat brain tissue section, which is the most commonly used biological tissue model in TOF-SIMS imaging method developments. The tissue surface has been sputtered with a 10 keV energy fullerene ion beam, and surface analyses were done with a 25 keV Bi₃⁺ ion beam at regular time intervals. The total depth which was analysed was more than two microns, with total primary ion doses of more than 10¹⁶ ions cm⁻². Although not in contradiction with results previously published but with much lower doses, it is found that the molecular damage remains too large, thus making molecular imaging very difficult. In addition, most of the lipids, which are usually the main observable molecules in TOF-SIMS, are concentrated close to the sample surface in the first hundreds of nanometers.     

Surface molecular degradation of 3D glass polymer composite under low earth orbit simulated space environment

Epoxy resin reinforced with 3D parabeam glass fibre was subjected to low earth orbit (LEO) simulation conditions comprising ultra high vacuum, temperature cycling (TC), and ultraviolet (UV) radiation and atomic oxygen (AO) bombardment. Inspection of the same composite using only a selection of these hazardous conditions provided comparison measures to identify the effect of each condition on the surface degradation of the resin composite. Each of the individually selected conditions showed a different degradation mechanism that is accelerated by the presence of other conditions. X-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and scanning electron microscopy (SEM) were used to provide surface information. The resin composite samples suffered surface oxidation that increased the oxygen content to 17.24% in comparison with the untreated sample (only 14.2%). The samples that were treated with AO showed higher C-O and CO functional groups on the surface in comparison with the rest of the samples (as indicated by XPS). Molecular information (from ToF-SIMS) showed that surface oxidation differs with different conditions and in comparison with the use of all conditions. All treated samples were shown to suffer significant chain scission and loss of volatiles as a result of the LEO conditions. The extent of the chain scission reaction for each condition can be indicated by the extent of the reduction of the relative concentration of the aliphatic hydrocarbon ions. The relative intensity of the C₄H₁₁N₄O₂⁺ ion showed that AO bombardment accelerated the oxidation of the surface. The AO effect is doubled when UV and TC are also present. SEM results indicated that sample surfaces were eroded and roughened upon exposure to LEO conditions. Presence of AO and UV in the LEO conditions introduced white deposits onto the surface, believed to be crosslinked formations.     

Chemical Bonding State of Chlorine on Ag{100} as Determined by Angle-Resolved Secondary Ion Mass Spectrometry

The power of the angle-resolved ion desorption technique for straightforward characterization of surfaces is demonstrated. The structural sensitivity of secondary ion desorption has led to a successful application of angle-resolved ion sputtering yield measurements to the determination of the Cl chemical bonding structure on the Ag {100} surface. Angular distributions of the sputtered Cl^? ions show that chlorine dissociates at the surface to yield a bonding state of atomic form at the room temperature. Both the polar and the azimuthal angle dependencies of the sputter intensity for Ag⁺ and Cl^? ions reveal that the Cl adatom is chemi-sorbed high above the topmost substrate layer of Ag atoms. At all Cl exposures, the Ag-Cl bond is oriented along the <100> azimuth with the adsorbate occupying a C₄ symmetry site, not an a-top, a bridge, or a high symmetry site. Shadow-cone enhanced ion desorption spectra show that die geometrical structure of the Cl chemisorbed surface changes slightly as the exposure is increased.     

Chemical states of ppm cerium in steel by ToF-SIMS analysis

Time-of-flight secondary ion mass spectrometry (ToF-SIMS) was employed for an analysis of the rare earth element Ce in pure iron and steel. Secondary ion images showed that the amount of the segregation of Ce and its oxides was much less as the concentration of Ce decreased to about 11 ppm in the pure iron. In terms of depth profiling from the surface to the matrix, variation of the CeO⁺/Ce⁺ ratio in a Ce oxides sample and a pure Ce sample exhibited difference between oxidized state and metallic state. It was demonstrated that metallic Ce was presented when the ratio of CeO⁺/Ce⁺ decreased to approximately 2 and even smaller. Oxygen content with concentration of tens of ppm may influence the ratio obviously. Such ToF-SIMS analysis was also feasible to discern the states of cerium in a Q345E steel with concentration in ppm level.     

Improvements in quantification accuracy of inorganic time‐of‐flight secondary ion mass spectrometric analysis of silicate materials by using C60 primary ions

Time‐of‐flight secondary ion mass spectrometry is a very useful tool for the comprehensive characterization of samples by in situ measurements. A pulsed primary ion beam is used to sputter secondary ions from the surface of a sample and these are then recorded by a time‐of‐flight mass spectrometer. The parallel detection of all elements leads to very efficient sample usage allowing the comprehensive analysis of sub‐micrometre sized samples. An inherent problem is accurate quantification of elemental abundances which mainly stems from the so‐called matrix effect. This effect consists of changes in the sputtering and ionization efficiencies of the secondary neutrals and ions due to different sample compositions, different crystal structure or even different crystallographic orientations. Here we present results obtained using C₆₀ molecules as a new primary ion species for inorganic analyses. The results show an improvement in quantification accuracy of elemental abundances, achieving relative errors as small as the certified uncertainties for the analyzed silicate standards. This improvement is probably due to the different sputter mechanism for C primary ions from that for single atomic primary ions such as Ga⁺, Cs⁺ or Ar⁺. The C cluster breaks up on impact, distributing the energy between its constituent carbon atoms. In this way it excavates nano‐craters, rather than knocking out single atoms or molecules from the surface via a collision cascade, leading to a more reproducible sputter process and much improved quantification. Copyright © 2009 John Wiley & Sons, Ltd.     

An effect of measurement conditions on the depth resolution for low‐energy dual‐beam depth profiling using TOF‐SIMS

An effect of measurement conditions on the depth resolution was investigated for dual‐beam time of flight‐secondary ion mass spectrometry depth profiling of delta‐doped‐boron multi‐layers in silicon with a low‐energy sputter ion (200 eV – 2 keV O₂⁺) and with a high‐energy primary ion (30 keV Bi⁺). The depth resolution was evaluated by the intensity ratio of the first peak and the subsequent valley in B⁺ depth profile for each measurement condition. In the case of sputtering with the low energy of 250 eV, the depth resolution was found to be affected by the damage with the high‐energy primary ion (Bi⁺) and was found to be correlated to the ratio of current density of sputter ion to primary ion. From the depth profiles of implanted Bi⁺ primary ion remaining at the analysis area, it was proposed that the influence of high‐energy primary ion to the depth resolution can be explained with a damage accumulation model. Copyright © 2013 John Wiley & Sons, Ltd.     

Molecular sputter depth profiling using carbon cluster beams

Sputter depth profiling of organic films while maintaining the molecular integrity of the sample has long been deemed impossible because of the accumulation of ion bombardment-induced chemical damage. Only recently, it was found that this problem can be greatly reduced if cluster ion beams are used for sputter erosion. For organic samples, carbon cluster ions appear to be particularly well suited for such a task. Analysis of available data reveals that a projectile appears to be more effective as the number of carbon atoms in the cluster is increased, leaving fullerene ions as the most promising candidates to date. Using a commercially available, highly focused C₆₀^q+ cluster ion beam, we demonstrate the versatility of the technique for depth profiling various organic films deposited on a silicon substrate and elucidate the dependence of the results on properties such as projectile ion impact energy and angle, and sample temperature. Moreover, examples are shown where the technique is applied to organic multilayer structures in order to investigate the depth resolution across film-film interfaces. These model experiments allow collection of valuable information on how cluster impact molecular depth profiling works and how to understand and optimize the depth resolution achieved using this technique.     

Differentiation of isomeric oxygenated adsorbates using low-energy ion/surface collisions

Reactive scattering of polyatomic ions in the hyperthermal collision energy range (<100 eV) is used to distinguish isomeric oxygenated adsorbates and to quantify their relative amounts when co-adsorbed at a surface. The self-assembled monolayers (SAMs) of interest are constructed from HO-terminated, CH₃O-terminated, and CH₃CH₂O-terminated dialkyl disulfides. Projectile ions used for ion/surface scattering experiments include CF₃⁺, SiCl₃⁺, and the molecular ion of pyridine, C₅H₅N√⁺. Each of these ions exhibits a unique scattered ion profile upon collision with the SAM monolayer surfaces, and so provides different information about the surfaces. Hydrogen atom abstraction by the C₅H₅N√⁺ ion is more prominent at the CH₃CH₂O- and CH₃O-terminated surfaces than the HO-terminated surface, while collisions of SiCl₃⁺ yield reactively scattered products which reflect the chemical composition of these surfaces. For instance, SiCl₂OH⁺ and SiCl₂OCH₃⁺ are scattered from the HO-terminated and CH₃O-terminated surfaces, respectively. Ion/surface collisions involving the CF₃⁺ ion produce chemically sputtered ions from the oxygenated adsorbates, which are valuable for quantitation of those groups. Preferential sputtering of the CH₃O-terminated versus the HO-terminated SAM surface is ascribed to favored thermochemistry and the more accessible CH₃O-terminated adsorbate. Fundamental ion/surface scattering processes, such as inelastic collisions leading to surface-induced dissociation (SID), ion/surface reaction, and chemical sputtering are examined over a range of collision energies for each of the ion/surface types mentioned, and their value in surface analysis is demonstrated.     

RIMS analysis of ion induced fragmentation of molecules sputtered from an enriched U3O8 matrix

Resonance ionization mass spectrometry was used to measure the composition of the sputtered flux from 15 keV Ga⁺, Au⁺, Au₂ ⁺ and Au₃ ⁺ primary ions impacting a ²³⁵U enriched U₃O₈ standard. We demonstrate that molecular fragmentation decreases as the primary ion mass and nuclearity increases. Stopping and range of ions in matter calculations show that cluster ions (Au₂ ⁺ and Au₃ ⁺) deposit more of their energy via direct knock-ons with near-surface target atoms, whereas monatomic ions (Ga⁺ and Au⁺) penetrate much deeper into the target sub-surface region. We correlate these results to the experimental observations by showing that increased cluster ion sputter yields partition the projectile energy over a larger number of sputtered molecules. Therefore, while cluster ions deposit more total energy into the near surface region of the target compared to monatomic ions, the energy per molecule decreases with projectile mass and nuclearity. Less energy per molecule decreases the number of U–O bond breaks and, consequently, leads to a decrease in molecular fragmentation. Additionally, the extent of molecular fragmentation as a function of ion dose was evaluated. We show that molecular fragmentation increases with increased ion dose; primarily as a result of sub-surface chemical damage accumulation. The relative intensity of this effect appears to be projectile independent.     

ToF-secondary ion mass-spectrometric study of copper deposition and stripping on directly heated screen-printed gold electrodes

We report about a new kind of directly heated gold electrode. All electrodes including a directly heated gold loop electrode, a Ag pseudo reference, and a carbon counter electrode have been screen-printed on a ceramic alumina substrate. Thermal behaviour was studied by potentiometry using either an external or the integrated reference electrode. Stripping voltammetric copper signals were greatly improved at elevated deposition temperature. Secondary ion mass spectrometric studies (ToF-SIMS) revealed that different negative ionic species of copper complexes can be found on the gold electrode surface as a result of ion bombardment during SIMS analysis like Cu^?, CuCl^? and CuCl₂ ^?. SIMS surface imaging using a fine focussed ion beam over the surface allowed us to obtain ion images (chemical maps) of the analyzed sample. SIMS depth profile analysis of the gold loop electrode was performed after copper deposition at room temperature (23 °C) and at 60 °C. CuCl₂ ^? ion was used for the depth profile studies as it has shown the highest intensity among other observed species. Surface spectroscopic analysis, surface imaging and depth profile analysis have shown that the amount of deposited copper species on the gold loop electrode was increased upon increasing electrode temperature during the deposition step. Therefore, the presence of chloride in the solution will hinder underpotential deposition of Cu(0) and lead to badly defined and resolved stripping peaks.