High-resolution X-ray photoelectron spectroscopic studies of alkylated silicon(111) surfaces

Hydrogen-terminated, chlorine-terminated, and alkyl-terminated crystalline Si(111) surfaces have been characterized using high-resolution, soft X-ray photoelectron spectroscopy from a synchrotron radiation source. The H-terminated Si(111) surface displayed a Si 2p(3/2) peak at a binding energy 0.15 eV higher than the bulk Si 2p(3/2) peak. The integrated area of this shifted peak corresponded to one equivalent monolayer, consistent with the assignment of this peak to surficial Si-H moieties. Chlorinated Si surfaces prepared by exposure of H-terminated Si to PCl5 in chlorobenzene exhibited a Si 2p(3/2) peak at a binding energy of 0.83 eV above the bulk Si peak. This higher-binding-energy peak was assigned to Si-Cl species and had an integrated area corresponding to 0.99 of an equivalent monolayer on the Si(111) surface. Little dichloride and no trichloride Si 2p signals were detected on these surfaces. Silicon(111) surfaces alkylated with CnH(2n+1)- (n = 1 or 2) or C6H5CH2- groups were prepared by exposing the Cl-terminated Si surface to an alkylmagnesium halide reagent. Methyl-terminated Si(111) surfaces prepared in this fashion exhibited a Si 2p(3/2) signal at a binding energy of 0.34 eV above the bulk Si 2p(3/2) peak, with an area corresponding to 0.85 of a Si(111) monolayer. Ethyl- and C6H5CH2-terminated Si(111) surfaces showed no evidence of either residual Cl or oxidized Si and exhibited a Si 2p(3/2) peak approximately 0.20 eV higher in energy than the bulk Si 2p(3/2) peak. This feature had an integrated area of approximately 1 monolayer. This positively shifted Si 2p(3/2) peak is consistent with the presence of Si-C and Si-H surface functionalities on such surfaces. The SXPS data indicate that functionalization by the two-step chlorination/alkylation process proceeds cleanly to produce oxide-free Si surfaces terminated with the chosen alkyl group.     

An X-ray and UV photoelectron spectroscopic study of CO chemisorption and dissociation on the stepped Co(10 2) surface

The chemisorption and surface dissociation of CO on cobalt are studied by X-ray and HeI/HeII photoemission. The nature of the high-temperature γ-CO state is elucidated and the usefulness of the Δ(1Π–4σ) parameter as a measure of chemical reactivity is tested.     

A theoretical study of atomic oxygen chemisorption on the Ni(100) and Ni(111) surfaces

Atomic oxygen chemisorption has been studied for the fourfold hollow site of the Ni(100) surface and for the threefold hollow site of the Ni(111) surface. To model the Ni(100) surface, 10 different clusters in the range Ni₅ to Ni₄₁ were used, and for the Ni(111) surface, 11 different clusters in the range Ni₁₃ to Ni₄₃ were used. A detailed analysis of the orbital occupations of the cluster with and without oxygen for the different clusters shows that there are three different possible bonding mechanisms. In two of these, the basic feature is that a₁ electrons of the cluster are kicked out by the oxygen 2p_z orbital and moved to holes in the 2p_{x, y} orbitals. A picture where the oxygen electrons fit into the electronic structure of the cluster is emphasized. The third mechanism, which is applicable for only one cluster, can be described as the formation of two covalent bonds of E symmetry. The final best estimate of the oxygen chemisorption energy for the Ni(100) surface is about 130 kcal/mol, and for the Ni(111) surface, about 115 kcal/mol. In particular for the Ni(111) surface, an excited oxygen state with radical character is identified, which might be a catalytically important species. The excitation energy to reach this state should be on the order of 10 kcal/mol for the Ni(111) surface.     

High-resolution X-ray photoelectron spectroscopy of chlorine-terminated GaAs(111)A surfaces

Oxide-terminated and Cl-terminated GaAs(111)A surfaces have been characterized in the As and Ga 3d regions by high-resolution, soft X-ray photoelectron spectroscopy. The Cl-terminated surface, formed by treatment with 6 M HCl(aq), showed no detectable As oxides or As(0) in the As 3d region. The Ga 3d spectrum of the Cl-terminated surface showed a broad, intense signal at 19.4 eV and a smaller signal at 21.7 eV. The Ga 3d peaks were fitted using three species, one representing bulk GaAs and the others representing two chemical species on the surface. The large peak was well-fitted by the bulk GaAs emission and by a second doublet, assigned to surface Ga atoms bonded to Cl, that was shifted by 0.34 eV from the bulk GaAs 3d emission. The smaller peak, shifted by 2.3 eV in binding energy relative to the bulk GaAs Ga 3d signal, is assigned to Ga(OH)3. The data confirm that wet chemical etching allows for the formation of well-defined, Cl-terminated GaAs(111)A surfaces free of detectable elemental As, that can provide a starting point for further functionalization of GaAs.     

CO在Pt(111)和Pt-M(111)(M=Ni,Mg)表面吸附的理论研究

采用密度泛函理论与周期性平板模型相结合的方法,对CO在Pt(111)表面top,fcc,hcp和bridge 4个吸附位和Pt-M(111)(M=Ni,Mg)表面h-top,M-top,Pt(M)Pt-bridge,Pt(M)M-bridge,Pt(Pt)M-bridge,M(Pt)M-bridge,Pt1M2-hcp...     

High-resolution soft X-ray photoelectron spectroscopic studies and scanning auger microscopy studies of the air oxidation of alkylated silicon(111) surfaces

High-resolution soft X-ray photoelectron spectroscopy was used to investigate the oxidation of alkylated silicon(111) surfaces under ambient conditions. Silicon(111) surfaces were functionalized through a two-step route involving radical chlorination of the H-terminated surface followed by alkylation with alkylmagnesium halide reagents. After 24 h in air, surface species representing Si(+), Si(2+), Si(3+), and Si(4+) were detected on the Cl-terminated surface, with the highest oxidation state (Si(4+)) oxide signal appearing at +3.79 eV higher in energy than the bulk Si 2p(3/2) peak. The growth of silicon oxide was accompanied by a reduction in the surface-bound Cl signal. After 48 h of exposure to air, the Cl-terminated Si(111) surface exhibited 3.63 equivalent monoleyers (ML) of silicon oxides. In contrast, after exposure to air for 48 h, CH(3)-, C(2)H(5)-, or C(6)H(5)CH(2)-terminated Si surfaces displayed <0.4 ML of surface oxide, and in most cases only displayed approximately 0.20 ML of oxide. This oxide was principally composed of Si(+) and Si(3+) species with peaks centered at +0.8 and +3.2 eV above the bulk Si 2p(3/2) peak, respectively. The silicon 2p SXPS peaks that have previously been assigned to surface Si-C bonds did not change significantly, either in binding energy or in relative intensity, during such air exposure. Use of a high miscut-angle surface (7 degrees vs < or =0.5 degrees off of the (111) surface orientation) yielded no increase in the rate of oxidation nor change in binding energy of the resultant oxide that formed on the alkylated Si surfaces. Scanning Auger microscopy indicated that the alkylated surfaces formed oxide in isolated, inhomogeneous patches on the surface.     

氢原子在Ni(100), Ni(111)和Ni(110)面上吸附扩散势能面的结构

本文构造了氢-镍相互作用的5参数Morse势, 用经典的对势方法研究氢原子在Ni(100), Ni(111)和Ni(110)面上的吸附和扩散, 得到氢原子在三个表面上的吸附位、吸附几何、结合能及本征振动等数据, 和实验结果符合得很好。同时, 系统地研究了三个体系的吸附扩散势能面结构。     

X-ray photoelectron spectroscopic study of copper minerals

The valence states of Cu and S atoms have been studied by XPS for 25 samples of copper minerals. The Cu atoms are found to be monovalent in the following sulfides: CuS, CuCo₂S₄, Cu₃(Ge, Fe) (S, As)₄, CuFeS₂, CuFe₂S₃, Cu₂FeSnS₄, Cu₅FeS₄, Cu₃AsS₄, Cu₃(As, Sn, V)S₄, (Cu, Fe)₁₂Sb₄S₁₃, (Cu, Fe)₁₂As₄S₁₃, Cu₇S₄, Cu₂S, CuInS₂, CuGaS₂. The S 2p spectrum of CuS shows a doublet structure corresponding to the two different electronic states of the S atoms.     

Theoretical study of CO and NO chemisorption on RhCu(111) surfaces

A systematic density functional theory study using periodic models is presented concerning the chemisorption of CO and NO on various sites of RhCu(111) surfaces. The properties of the adsorbed molecules on various mono- and bimetallic sites of these alloy surfaces have been obtained and compared to those corresponding to the pure Rh(111) and Cu(111) surfaces. It is shown that that the interaction of small probe molecules such as CO or NO on RhCu alloys is essentially dominated by the atomic nature of the surface active site with little influence of the rest of the metallic system. Moreover, it is suggested that it is possible to control the adsorption site of these molecules by appropriate choice of the surface composition.     

An X-ray photoelectron spectroscopic study of some copper(II) tetraaza complexes

A selected series of copper(II) tetraaza complexes, involving open-chain and macrocyclic ligands, has been studied by X-ray photoelectron spectroscopy. The binding energy data obtained are interpreted in terms of the structures of these complexes with particular reference to the existence of π-electron delocalisation over metal and ligand, peripheral ring substituents, cation-anion interaction and hydration water. It is apparent that the degree of cation-anion interaction and photoreduction is a function of the existing experimental conditions.     

Tilted CO on metal surfaces; CO/Pt(110), CO/Ni(110) and CO/Cu(100)

Tilting of CO at coverages greater than half a monolayer is considered as a mechanism for reducing the CO-CO repulsion. We find qualitative agreement with the experiment for CO/Pt(110), and predict a slightly smaller tilt for CO/Ni(110). For CO/Cu(100), we find that a bend of about 10° greatly reduces the repulsion.     

X-ray photoelectron spectroscopic studies of hydrophilic surfaces modified via admicellar polymerization

Admicellar polymerization with styrene monomer was used to coat the surface of two porous solids: titanium dioxide and alumina. X-ray photoelectron spectroscopy (XPS) measurements clearly indicate that after admicellar polymerization, organic material and surfactant are present on the surface of the solids. Water washes, performed immediately after admicellar polymerization, were successful in removing approximately 30% of the organic material, presumably mostly surfactant. The water wash was followed by Soxhlet extraction with toluene, with no measurable removal of organic material according to ignition loss measurements of the solid, gel permeation chromatography of the extracting solvent and also UV/VIS spectroscopy of the extracting solvent. However, there was a 5-15% drop in organic material after Soxhlet extraction according to XPS measurements. This difference is attributed to the difference in sampling; XPS samples only the exterior surface area while these bulk measurements sample both the interior and exterior surface area. This study details the ability of different washing steps to remove materials from the porous substrates used in this study.     

UV laser-stimulated resonant desorption from metal surfaces: NO/Ni(100)

NO chemisorbed on a Ni(100) surface at 170 K, has been desorbed with UV laser light (ArF, 193 nm = 6.42 eV) in the energy range of the most intense electronic absorption of the NO/Ni(100) system. The rotational and vibrational state distribution of the desorbing molecules is probed via laser-induced fluorescence. The desorbing molecules are vibrationally and rotationally excited. The rotational distribution is markedly non-Boltzmann. The velocity distributions are narrow and very different for various rotational states. They cannot be fitted to a Maxwell distribution. We believe that these results provide evidence for the resonant nature of the light-absorption-desorption process for NO on a Ni(100) surface.     

X-ray photoelectron spectroscopic study of tetraphenyldithiapyranylidene and its polyiodides

High resolution X-ray photoelectron spectra are reported for tetraphenyldithiapyranylidene (DIPSσ₄), three of its polyiodides, and its diperchlor allows to emphasize the evolution of the structure with iodine contents. The chemical nature of the iodine species is also inferred from the I3d_{$\text{5}\text{2}$} signal shape. The low binding energy of the highest occupied molecular orbital is compared to that of other π-systems, and the Iteration of the electron delocalization is shown to be rel     

Theoretical study of NO adsorption/dissociation on Pd (100) and (111) surfaces

Both adsorption and dissociation of the diatomic molecular NO on Pd (100) and (111) surfaces are studied using the extended London‐Eyring‐Polyani‐Sato (LEPS) method constructed by means of 5‐MP (the 5‐parameter Morse potential). All critical characteristics of the system that we obtain, such as adsorption geometry, binding energy, eigenvalues for vibration, are in good agreement with the experimental results. On Pd (100) surface, NO prefers to adsorb in fourfold hollow site (H) uprightly at low coverage. With increase in the coverage NO gradually tilts in fourfold hollow and bridge sites. For NO? Pd (111) system, two adsorption states are found at low coverage, of which one adsorption state is the B(tilt) state that the centroid of NO projects at bridge site, another (H? B? H state) that NO almost parallels to the (111) surface with the vibration frequency of 610 cm^?1, but the frequency is near to that of the atoms, which is easy to be ignored in experiments. At high coverage, two transitional states (BH and HT) are found. NO is difficult to dissociate on Pd (100) and (111) surfaces. Especially for NO? Pd (111) system, the three‐well‐potential dissociation mode is initially put forward to show the remarkable dissociation process with two dissociation transitional states of NO on Pd (111). Copyright © 2008 John Wiley & Sons, Ltd.     

Electrochemical self-assembly of alkanethiolate molecules on Ni(111) and polycrystalline Ni surfaces

In this work, the electrochemical formation of alkanethiolate self-assembled monolayers (SAMs) on Ni(111) and polycrystalline Ni surfaces from alkanethiol-containing aqueous 1 M NaOH solutions was studied by combining Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), electrochemical techniques, and density functional theory (DFT) calculations. Results show that alkanethiolates adsorb on Ni concurrent with NiO electroreduction. The resulting surface coverage depends on the applied potential and hydrocarbon chain length. Electrochemical and XPS data reveal that alkanethiolate electroadsorption at room temperature takes place without S-C bond scission, in contrast to previous results from gas-phase adsorption. A complete and dense monolayer, which is stable even at very high cathodic potentials (-1.5 V vs SCE), is formed for dodecanethiol. DFT calculations show that the greater stability against electrodesorption found for alkanethiolate SAMs on Ni, with respect to SAMs on Au, is somewhat related to the larger alkanethiolate adsorption energy but is mainly due to the larger barrier to interfacial electron transfer present in alkanethiolate-covered Ni. A direct consequence of this work is the possibility of using electrochemical self-assembly as a straightforward route to build stable SAMs of long-chained alkanethiolates on Ni surfaces at room temperature.     

Molecular beam photoelectron spectroscopy of Ni(CO)4

The nickel carbonyl HeI (21.2175 eV) photoelectron spectrum has been reinvestigated with improved resolution and molecular beam sampling. The 9T₂ and 2E photoelectron bands are shown to be intrinsically diffuse, which is attributed to D_2d geometries. The ordering of the next seven outer valence electronic states is proposed from a linear least-squares fit of the spectrum.     

An X-ray photoelectron spectroscopic study of novel SiON glasses

Novel SiON glasses obtained by melting mixtures of crystalline α-SiO₂ and α-Si₃N₄ were investigated by means of X-ray photoelectron spectroscopy (XPS). The incorporation of nitrogen into the SiO₂ network was recently proved by ²⁹Si-MAS-NMR (magic-angle spinning nuclear magnetic resonance) and Si K-XANES (X-ray absorption near edge structure). The Si 2p XPS and the Si KLL XAES (X-ray excited Auger electron spectroscopy) studies of the SiON glasses confirm the formation of mixed structural units (SiO_xN_4-x) by the presence of an additional spectral component energetically located between SiO₂- and Si₃N₄-like signals. The N 1s and O 1s XPS spectra support the conclusion about the incorporation of nitrogen into the SiO₂ network.