Optical investigations of GaAs/Ga1−x Al x As Quantum wells grown by molecular-beam epitaxy

Summary Measurements of photoluminescence, excitation photoluminescence and reflectance are performed at various temperatures on a series of GaAs/Ga_1−x Al _x As quantum well structures grown by molecularbeam epitaxy. The selective photoluminescence data of the GaAs buffer layers are analysed in order to correlate the optical properties with the growth conditions. The Stokes shift of the excitation emission line from quantum wells is investigated under various excitation conditions. A considerable decrease of the Stokes shift is observed in the case of nonresonant and intense excitations. Also the extrinsic photoluminescence, as well as its temperature dependence, are interpreted. In addition, the temperature effects on both the bulk and quantum well spectra are shown to clarify the excitation features and the contribution of the interband transitions. To speed up publication, the authors of this paper has agreed to not receive the proofs for correction.     

Weak localization in Al0.25Ga0.75As/In0.2Ga0.8As/GaAs wires

The phase coherence length L_Ø, its temperature dependence and the spin-orbit scattering length L_SO in Al_0.25Ga_0.75As/In_0.2Ga_0.8As/GaAs wires fabricated by electron-beam lithography and CH₄/H₂ Reactive Ion Etching (RIE), were extracted by fitting a 1-dimensional weak localization theory to two-terminal measurements in the temperature range between 2 K and 50 K. The scattering mechanism was found to be Nyquist (electron-electron collisions with small energy transfer).     

Optical spectroscopy of a-plane-oriented ZnO epilayers grown by plasma-assisted molecular beam epitaxy

a-plane ZnO layers were successfully grown, by plasma-assisted molecular beam epitaxy, on r-plane (011–2) sapphire substrates. Several features attributed to the A, B and C free excitonic transitions are identified through temperature-dependent photoluminescence (PL) and reflectivity measurements. The temperature dependence of the peak energy positions of these transitions was studied from 8 K to 300 K. So, the PL peak energy of the A free exciton was plotted and fitted with a Varshni empirical equation. In the σ polarization (E⊥c), for which A and B are allowed, the reflectivity spectrum measured at 8 K was fitted by using a program based on the theory of the spatial resonance dispersion Hopfield model. Our results indicate that the A and B free excitonic features are at a higher energy than those in ZnO on c-oriented sapphire and show a good PL even at 250 K. These results also show that the new and intense emission peak observed in the region of the first phonon replica (3.33–3.28 eV) and identified as a stacking fault in the epilayer disappears at high temperature above 150 K.     

On factors affecting alloy clustering in In0.52Al0.48As layers grown on InP substrates by molecular beam epitaxy

Growth of In_0.52Al_0.48As epilayers on InP (100) substrates by molecular beam epitaxy at a wide range of substrate temperatures (470 - 550 °C) and V/III flux ratios is carried out. Low temperature photoluminescence (PL) and double-axis X-ray diffraction (XRD) measurements showed a strong dependence of the PL and XRD linewidths and lattice-mismatch on the substrate temperature. Minimum PL and XRD linewidths and lattice-mismatch were found to occur at substrate temperatures between ≈ 500 - 520 °C. The XRD intensity ratios (I_epi/I_sub) were generally higher within the same substrate temperature range at which the lattice-mismatch was the lowest. XRD rocking-curves of samples grown at low temperatures showed the main epilayer peak to be a composition of smaller peaks which can strongly indicate the presence of alloy clustering. PL spectra taken at increasing temperatures showed the quenching of the main emission peak followed by the evolution of a distinct peak at lower energy, possibly associated with carrier localization due to the presence of lattice disorder. Within the range of V/III flux ratios investigated (32 to 266), the lowest PL linewidth of 14 meV was recorded for the samples grown at a V/III ratio of 160. The lattice-mismatch between the epilayer and the substrate for these samples was also found to be relatively insensitive to changes in the V/III flux ratios.     

Electron transport in high quality undoped ZnO film grown by plasma-assisted molecular beam epitaxy

High quality ZnO films were grown on c-plane sapphire substrate using low temperature ZnO buffer layer by plasma-assisted molecular beam epitaxy. The film deposited at 720 °C showed the lowest value of full-width at half maximum for the symmetric (0002) diffraction peak of about 86 arcsec. The highest electron mobility in the films was about 103-105 cm²/V s. From temperature-dependent Hall effect measurements, the mobility strongly depends on the dislocation density at low temperature region and the polar optical phonon scattering at high temperature, respectively. Moreover, by obtaining the activation energy of the shallow donors, it was supposed that hydrogen was source of n-type conductivity in as-grown ZnO films.     

分子束外延生长ZnSe自组织量子点光、电行为研究

分别应用光致发光、电容电压和深能级瞬态傅里叶谱技术详细研究ZnSe自组织量子点样品的光学和电学行为.光致发光温度关系表明ZnSe量子点的光致发光热猝火过程机理.两步猝火过程的理论较好模拟和解释了相关的实验数据.电容电压测量表明样品表观载流子积累峰出现的深度(样品表面下约100nm处)大约是ZnSe量子点层的位置.深能级瞬态傅里叶谱获得的ZnSe量子点电子基态能级位置为ZnSe导带下的011eV,这与ZnSe量子点光致发光热猝火模型得到的结果一致.     

HgTe/CdTe superlattices grown by molecular beam epitaxy

In this paper we present results concerning the optical absorption in HgTe-CdTe superlattices. We confirm the narrowing of the superlattice band-gap (the increase of cut-off wavelength, λ_c) compared to the band gap of the equivalent Hg_1?xCd_xTe alloy. We show also, as predicted by the theory, an increase of the cut-off wavelength of the superlattice when the HgTe layer thickness increases. At 300K, the agreement between theory and experiment is fairly good if we consider the onset of the absorption. The λ_c tail shifting towards shorter wavelengths could be explained by the interdiffusion between HgTe and CdTe layers. At 30K, no important change in the I.R. absorption is noticed for all the superlattices.We present for the first time a superlattice exhibiting an absorption in the 8–12 μm window.We have carried out Hall measurements on several superlattices and present for the first time transport properties on these alternate microstructures. The most important features concern the unexpected and not yet understood very high hole mobilities at 10K.     

Investigation of persistent photoconductivity in Si-dopedn-Al x Ga1−x as grown by molecular beam epitaxy

The persistent photoconductivity effect in Si-dopedn-Al _x Ga_1?x As layers grown by molecular beam epitaxy on (100)GaAs substrates has been investigated by detailed Halleffect and capacitance measurements at 10–300 K. In the alloy composition range 0.25<x <0.40 the electrical properties ofn-Al _x Ga_1?x As are governed by a deep electron trap having an emission barrier of 0.34–0.40 eV (depending on the doping concentration), as determined by admittance measurements. The concentration of deep electron traps, deduced from low-temperature capacitance measurements, is found to coincide with the amount of persistent photoconductivity observed in the material. Consequently, the earlier proposed population of two-dimensional subbands at the Al _x Ga_1?x As/GaAs-substrate hetero-interface, i.e. charge separation bymacroscopic barriers, can not account for the measured high overall number of persistent photoexcited carriers. Instead, the vanishing small capture rates of photoexcited electrons result frommicroscopic capture barriers. The dominant deep electron trap, which we attribute to deep donor-type (DX) centers, is found to be homogeneously distributed throughout the Al _x Ga_1?x As layer depth. From our Hall effect measurements a trap depth of 0.05–0.12 eV (depending on the doping concentration) below the conduction band is derived. The capture barrier is thus in the order of 0.30 eV. This value is in excellent agreement with data obtained from liquid phase epitaxially grown Si-dopedn-Al _x Ga_1?x As.     

Superfine structures of semiconductors grown by molecular‐beam epitaxy

We initiated the present study to investigate experimentally a fundamental quanturn-mechanical effect—the resonant transmission of electrons through potential barriers in semicon- ductors. The phenomenon of such resonance is a familiar one. In the simple case of a double barrier, the incident electrons are able to tunnel through both barriers without attenuation if their energies coincide with the resonant energies.¹ In the caSe of a series of equally spaced barriers, e.g., that of the KronigPenney model of a one-dimensional crystal, the electronic structure exhibits forbidden bands of attenuation that are separated by allowed bands where perfect transmission of electrons would occur.     

Anomalous electrical transport properties of Ag/Al bilayers grown on Si by molecular beam epitaxy

We have investigated the temperature dependent electrical resistivity, ρ(T), of Ag(100 nm)/Al(10 nm) bilayers grown on Si(111) and quartz substrates using molecular beam epitaxy (MBE). Bilayers grown on Si exhibited an anomalous negative temperature coefficient of resistivity (TCR) in the temperature range of 140-165 K of the ρ(T) plot. However, at temperatures below and above this negative TCR region, ρ(T) exhibited a characteristic positive TCR of metallic alloys. No such resistive anomaly was observed for the bilayers grown on quartz substrates. The observed resistive anomaly could be qualitatively explained by assuming two parallel conduction channels, that is, one at the interface having high Si content and obeying the polaronic behavior at <165 K and another far away from the interface having almost no Si impurity and thus exhibiting pure metallic behavior down to 4 K. In addition, bilayers exhibited a sharp resistive transition at ∼6.5 K, indicating a possibility of a new Ag-Al alloy being a superconducting material.     

Coevaporation phosphorus doping in Si grown by molecular beam epitaxy

Phosphorus-doped Si epilayers with bulk-like mobilities were grown by molecular beam epitaxy (Si-MBE) by coevaporation of phosphorus from a tin phosphide source. The behaviour of P doping as a function of growth parameters and of potential enhanced doping indicates a non-unity, almost growth-temperature independent incorporation efficiency with negligible surface segregation -a unique combination among coevaporated dopants in Si-MBE.     

Electronic structure of molecular beam epitaxy grown 1T'-MoTe_2 film and strain effect

Atomically thin transition metal dichalcogenide films with distorted trigonal(1T') phase have been predicted to be candidates for realizing quantum spin Hall effect. Growth of 1T' film and experimental investigation of its electronic structure are critical. Here we report the electronic structure of 1T'-MoTe_2 films grown by molecular beam epitaxy(MBE).Growth of the 1T'-MoTe_2 film depends critically on the substrate temperature, and successful growth of the film is indicated by streaky stripes in the reflection high energy electron diffraction(RHEED) and sharp diffraction spots in the low energy electron diffraction(LEED). Angle-resolved photoemission spectroscopy(ARPES) measurements reveal a metallic behavior in the as-grown film with an overlap between the conduction and valence bands. First principles calculation suggests that a suitable tensile strain along the a-axis direction is needed to induce a gap to make it an insulator. Our work not only reports the electronic structure of MBE grown 1T'-MoTe_2 films, but also provides insights for strain engineering to make it possible for quantum spin Hall effect.     

In0.2Ga0.8As/GaAs interface revealed by an AlAs marker layer

A detailed analysis of the microstructure of layered semiconductor heterostructures is only possible if the interface between the various layers can be accurately located. Microstructural features whose characterisation is dependent on the location of the interface include the planarity and width of the layers, the composition profile and the geometry of misfit dislocations (in the particular case of lattice mismatched heterostructures). We report on an investigation to image, at high resolution in the transmission electron microscope, the interface in an In_0.2Ga_0.8As/GaAs structure grown by molecular beam epitaxy. The difficulty in locating the interface, due to similarity in electron optical behaviour of GaAs and In_0.2Ga_0.8As when imaged in a 110 direction, was overcome by incorporating into the structure a marker layer of AlAs two unit cells thick (11.4 Å in total) between the GaAs and the In_0.2Ga_0.8As layers. Lattice fringe images of an In_0.2Ga_0.8As/AlAs/GaAs structure are presented which show, at near atomic resolution, the location of the misfit dislocations relative to the In_0.2Ga_0.8As/GaAs interface.     

Observation of triangle pits in PbSe grown by molecular beam epitaxy

PbSe thin films on BaF₂ (1 1 1) were grown by molecular beam epitaxy with different selenium beam flux. Evolution of PbSe surface morphologies with Se/PbSe beam flux ratio (R_f) has been studied by atomic force microscopy and high-resolution X-ray diffraction. Growth spirals with monolayer steps on PbSe surface are obtained using high beam flux ratio, R_f ≥ 0.6. As R_f decreases to 0.3, nano-scale triangle pits are formed on the surface and the surface of PbSe film changes to 3D islands when R_f = 0. Glide of threading dislocations in 〈1 1 0〉{1 0 0}-glide system and Pb-rich atom agglomerations are the formation mechanism of spiral steps and triangle pits. The nano-scale triangle pits formed on PbSe surface may render potential applications in nano technology.     

Photoluminescence of HgCdTe nanostructures grown by molecular beam epitaxy on GaAs

Photoluminescence (PL) of HgCdTe-based hetero-epitaxial nanostructures with 50 to 1100 nm-wide potential wells was studied. The nanostructures were grown by molecular beam epitaxy on GaAs substrates. A strong degree of alloy disorder was found in the material, which led to the broadening of the PL spectra and a considerable Stokes shift that could be traced up to temperature T～230 K. Annealing of the structures improved the ordering and led to the increase in the PL intensity. A remarkable feature of the PL was an unexpectedly small decrease of its intensity with temperature increasing from 84 to 300 K. This effect can be related to localization of carriers at potential fluctuations and to the specific character of Auger-type processes in HgCdTe-based nanostructures.     

Investigation of various optical transitions in GaAs/Al0.3Ga0.7As double quantum ring grown by droplet epitaxy

This work examines the optical transitions of a GaAs double quantum ring (DQR) embedded in Al_0.3Ga_0.7As matrix by photoreflectance spectroscopy (PR). The GaAs DQR was grown by droplet epitaxy (DE). The optical properties of the DQR were investigated by excitation‐intensity and temperature‐dependent PR. The various optical transitions were observed in PR spectra, whereas the photoluminescence (PL) spectrum shows only the DQR and GaAs band emissions. The various optical transitions were identified for the GaAs near‐band‐edge transition, surface confined state (SCS), DQR confined state, wetting layer (WL), spin–orbital split (E_GaAs + Δ_o), and AlGaAs band transition. PR spectroscopy can identify various optical transitions that are invisible in PL. The PR results show that the GaAs/AlGaAs DQR has complex electronic structures due to the various interfaces resulting from DE.     

Nanoscale superconductivity of ?-Ga islands grown by molecular beam epitaxy

We report on the preparation and superconductivity of metastable γ-Ga islands on Si(111) substrate. The Ga grows in a typical Volmer-Weber mode at a low temperature of 110 K, resulting in formation of Ga nanoislands at various sizes with the identical γ-phase. In-situ low temperature scanning tunneling spectra reveal quantized electronic states in ultrathin Ga islands. It is found that both the lateral size and thickness of the Ga islands strongly suppress the superconductivity. Due to substantial surface energy contribution, the transition temperature Tc scales inversely with the island thickness and the minimum thickness for the occurrence of superconductivity is calculated to be two monolayers.