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1.
The stoichiometry of thin epitaxial layers of CuInSe2 on CaF2 and GaAs substrates was determined by the ESCA method. Substrate temperature was varied. It was found, that layers of exact stoichiometry are got at substrate temperatures around 700 K.  相似文献   

2.
Epitaxial layers of CuIn0.7Ga0.3Se2 could be prepared by flash evaporation onto (111)A-oriented GaAs substrates in the substrate temperature range Tsub = 745 … 870 K. At Tsub = 745 … 820 K the films had the chalcopyrite structure, at Tsub = 820 … 845 K an additional pseudohexagonal phase was found. Indications to the presence of a sphalerite phase were found at high substrate temperatures. Films grown at Tsub ≦ 750 K were always n-type conducting and showed a largely pronounced impurity band conduction effect. At Tsub ≧ 860 K the films were always p-type conducting and two acceptor states with ionization energies of some 10−3 eV and of 125 … 140 meV were found.  相似文献   

3.
The electrical properties of CuInSe2 epitaxial layers on (111)A-, (110)-, and (100)-oriented GaAs substrates are investigated. At substrate temperatures Tsub ≧ 820 K the p-type conductivity observed is governed by an acceptor state with an ionization energy of about 110 meV independent of the substrate orientation. At Tsub ≦ 770 K three different acceptor states are found in dependence on the substrate orientation: 390 meV for (111)A-, 110 meV for (110)-, and a very shallow acceptor for (100)-oriented substrates. A possible correlation between these acceptor states and intrinsic defects is proposed.  相似文献   

4.
The optical and structural properties of Ge20Se80, Ge25Se75 and Ge30Se70 bulk glasses and Agx(Ge0.20Se0.80)100−x thin films, where x = 0, 6, 11, 16, 20 and 23 at.% were studied. All samples were confirmed as amorphous according to XRD. The Raman spectra showed increase in 260 cm−1 and 237 cm−1 and decrease in 198 cm−1 and 216 cm−1 bands with different Se content in the bulk samples. The optical bandgap energy of bulk samples decreased (2.17–2.08 eV) and refractive index increased (2.389–2.426 at 1550 nm) with increasing Se content in bulk glasses. The Ge20Se80 thin films were prepared by vacuum thermal evaporation from Ge30Se70 bulk glasses. The Raman spectra of the films showed that peaks at 260 cm−1 and 216 cm−1 decreased their intensities with increasing Ag content in the thin films. The significant red shift of bandgap energy occurred upon different Ag content. The optically induced dissolution and diffusion resulted in graded refractive index profile along the film thickness caused by different Ag concentration. The refractive index increased from the substrate side to the top of thin films. The graded profile was getting more uniform with increasing content of silver in the thin film.  相似文献   

5.
MBE grown epitaxial films of CaF2 onto Si(111) substrates were investigated by gamma ray diffraction to obtain assertions about the real structure and the strain situation in the epitaxial systems. It were measured the integral reflection coefficient Ri and the angle distribution of the reflected intensity of both (111) and (333) reflections. It was found that (i) a high temperature annealing step during the wafer preparation (1200 °C) causes a drastical increase of real structure defects in the substrate material, (ii) expitaxial layers of 18 nm thickness are grown pseudomorphically, layers having a thickness of 30 nm are relaxed, (iii) the misfit dislocation network formed during the relaxation process is localized not in the deposit but in the substrate material.  相似文献   

6.
Thin films of CuInTe2, CuInSe2, CuInS2, CuGaSe2 and CuGaS2 were deposited onto (111)-and (100)-oriented CaF2 substrates by flash evaporation technique. Epitaxial growth occurs at substrate temperatures in the range from 750 to 900 K, dependent on the kind of film material. Contrary to the case of GaAs, GaP and Ge substrates there are always polycrystalline parts. The layers were found to be single phase and crystallizing in the chalcopyrite structure only. The composition of the films varied in dependence on the substrate temperature. In the range of about 700 K a nearly stoichiometric composition was found.  相似文献   

7.
In this paper, we report the effect of annealing temperature on the properties of copper indium diselenide (CuInSe2) thin films. The CuInSe2 thin films were fabricated at 500 °C for 2 h by annealing Cu‐In layers (as precursors) selenized in a glass tube with pure selenium powder. The structural and morphological properties of the CuInSe2 thin films were characterized respectively by means of x‐ray diffraction (XRD) and field‐emission scanning electron microscope (FE‐SEM). The type of CuInSe2 thin film has been identified as direct allowed and the band gap value was determined. The study of UV/Visible/NIR absorption shows that the band gap value of CuInSe2 thin film is about 1.07 eV, which is within an optimal range for harvesting solar radiation energy. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

8.
Doping of GaAs and Ga1−xAlxAs with Zn in the LPE process was studied by a radioanalytical method. It is found that Zn diffuses from the Ga-(Al)-As-Zn-solution into the n-GaAs substrate before epitaxial growth starts. This “pre-diffusion” and the following diffusion of Zn out of the epitaxial layer into the substrate results in three regions with distinct Zn-graduation in the vicinity of the pn-junction. There are no striking differences for GaAs/GaAs and Ga1−xAlxAs/GaAs structures. The Zn concentration in GaAs epitaxial layers decreases exponentially from the substrate up to the layer surface. From this profile the temperature dependence of the Zn segregation coefficient is calculated. At 900°C a value keff = 5,2 · 10−2 is found. The doping profile in Ga1−xAl/As layers is more complex. It is influenced by the changings of temperature during the growth of the layer and by the nonuniform Aldistribution over the layer thickness.  相似文献   

9.
Growth and fabrication of silicon-on-insulator structures, based on heteroepitaxial growth of insulating films on Si, is an area of research that has rapidly developed in recent years. Thin CaF2 films and Si/CaF2 multilayers were prepared on {111}-oriented Si substrates by molecular beam epitaxy (MBE) and were investigated by RHEED and RBS. For epitaxial growth the Si substrates were cleaned using the ultraviolet/ozone surface cleaning method which is an effective tool to remove contaminants from the surface by low-temperature in-vacuo preheating. The growth of CaF2 on such Si{111} substrates provides epitaxial layers with a high structural perfection. When this layer system, however, is used as a substrate for epitaxial Si growth the Si layers show always twin formation. Si layers without twins could be obtained only after deposition of thin amorphous Si buffer layers at room temperature, immediately followed by Si growth at 700 °C.  相似文献   

10.
CuInSe2 (CIS) chalcopyrite thin films were prepared using a low-cost, non-vacuum doctor-blade coating and the thermal annealing method. An acetone-based precursor solution containing copper chloride, indium chloride, selenium chloride, and an organic binder was deposited onto a Mo-sputtered soda lime glass substrate using a doctor-blade coating method. After coating, the precursor films were annealed in a quartz tube furnace under low vacuum without the use of a Se atmosphere or reduction conditions. Evolution of the morphology, crystal structure, and thermal decomposition behavior of the films was analyzed by X-ray diffraction, scanning electron microscopy, and thermogravimetric analysis, and the film formation mechanism was suggested. The as-deposited precursor film gradually decomposed with increase in temperature and formed Cu2−xSe and In2Se3 nuclei on the surface of the film. Incorporation of Cu2−xSe with In2Se3 yielded a chalcopyrite CIS phase, which crystallized on annealing above 400 °C. The obtained CIS film showed low-resistive ohmic behavior with a Mo electrode and a high absorption efficiency for visible–infrared (IR) light, making it suitable for use in photovoltaic applications.  相似文献   

11.
It is reported on the liquid phase epitaxial (LPE) growth of heterostructures on the base of InAs–AlxGa1–xSb. The paper includes the investigation of epitaxial layers of AlxGa1–xSb alloys on InAs substrates and results of experiments for the determination of optimum growth regimes.  相似文献   

12.
The structure and features of the surface morphology of Pb1 − x Mn x Se (x = 0.03) epitaxial films grown on freshly cleaved BaF2(111) faces and PbSe1 − x S x (100) (x = 0.12) single-crystal wafers were investigated by molecular beam condensation and the hot-wall method. It is shown that the epitaxial films, in accordance with the data in the literature for other chalcogenides, grow in the (111) and (100) planes, repeating the substrate orientation. Black aggregates are observed on the film surface of the films grown. The results obtained are compared with the data in the literature and generalized for other chalcogenides: A 4 B 6:Pb (S, Se, Te); Pb1 − x Sn x (S, Se, Te); and Pb1 − x Mn (Se, Te). It is established that the formation of black aggregates, which are second-phase inclusions on the surface of epitaxial films obtained by vacuum thermal deposition, is characteristic of narrow-gap A 4 B 6 chalcogenides.  相似文献   

13.
Semiconductors of the AIBIIIC2VI type, crystallizing in the chalcopyrite structure, grow epitaxially with their {112}-planes on monocrystalline substrates with a three-fold symmetry of faces. It is shown that application of the RHEED technique permits definitively to decide what kind of epitaxial overgrowth takes place, supposing the atomic scattering factors of the I and III atoms are sufficiently different and/or the c/a axis ratio differs markedly from 2. CuInSe2/GaAs and CuGaSe2/GaAs show one-dimensional epitaxy  相似文献   

14.
In the present paper, we report about synthesis of nanostructured organic–inorganic heterojunction of CdS/Polyaniline/CuInSe2 thin films by cost effective chemical route at room temperature, for solar cell application. As such obtained thin films are characterized for structural, compositional, morphological, optical and electrical properties by X-ray diffraction (XRD) pattern, energy dispersive X-ray (EDAX) analysis, scanning electron microscopy (SEM), optical absorbance spectra and I–V response respectively. The XRD reveals the polycrystalline nature of the thin films having tetragonal crystal structure and a crystallite size of 19 nm. The presence of observed and expected elements in the EDAX spectra confirms the elemental compositions in CdS/Polyaniline/CuInSe2 thin films. From SEM images it can be inferred that the surface morphology of the Polyaniline thin films exists like clothing fibers, while CdS/CuInSe2 shows granular shape particles distributed over the substrate and the SEM of CdS/Polyaniline/CuInSe2 represents mixing and attachment of circular particles to fiber like structure. The optical absorbance spectra have shown red shift in absorbance strength and energy band gap value of CdS/CuInSe2 from ~ 1.36 eV to ~ 1.62 eV upon formation of CdS/Polyaniline/CuInSe2 thin film. The I–V response of CdS/CuInSe2 and CdS/Polyaniline/CuInSe2 measured under dark and illumination to 100 mW/cm2 light, exhibited the solar characteristics from these graphs and the conversion efficiency calculated is observed to be 0.26 and 0.55% for CdS/CuInSe2 and CdS/Polyaniline/CuInSe2 thin films respectively.  相似文献   

15.
Infrared reflectivity spectra of CdIn2Se4 single crystals are measured at room temperature in the wavenumber range from 180 to 4000 cm−1 for the polarization directions Ec and E ‖[112]. The spectra reveal two vibrational modes with nearly the same frequencies for both polarization directions. The frequencies of the modes with highest energy compare well with the corresponding mode frequencies in ZnIn2Se4, CuInSe2 and AgInSe2. It is concluded that these modes are sphalerite-like in nature and that their frequencies are essentially determined by the properties of the In Se bond.  相似文献   

16.
In the present work, some factors are pointed out hindering the growing of good-quality epitaxial layers and heterostructures in the system GaSb–AlSb. Their influence is studied on the morphology of the surface and the cleavage of the epitaxial structures GaSb–Ga1–xAlxSb. The characteristics of the optimal technological regime are shown.  相似文献   

17.
Undoped or Ga doped ZnSe single crystal layers with thicknesses between 3 and 13 μm were grown on ZnSxSe1?x (0 ? x ? 1) single crystal substrates by liquid phase epitaxy in a sealed tube system from a Zn or Zn-Ga alloy solution. Smooth and uniform epitaxial layers with high crystal perfection were obtained on the (111)- and (100)-oriented substrates. All the epitaxial layers were n-type and highly conductive (0.1 < ? < 10 Ω cm). A remarkable enhancement of the blue part of the photoluminescence spectra at room temperature was observed for the epitaxial layers grown from the Zn-Ga alloy solution.  相似文献   

18.
The tetragonal crystal‐structure type of chalcopyrites (chemical formula AIBIIICVI2) is a superstructure of sphalerite type. The c /a ratio differs generally from the ideal value 2, i.e., the crystal structure is pseudocubically distorted. For CuInSe2 and CuGaSe2 thin films, simulations demonstrate that it is theoretically possible to reveal the tetragonality in electron backscatter‐diffraction (EBSD) patterns for CuGaSe2, whereas it may not be possible for CuInSe2. EBSD experiments on CuGaSe2 thin films using the ”Advanced Fit” band‐detection method show that it is possible to extract accurate misorientation‐angle distributions from the CuGaSe2 thin film. Pole figures revealing the texture of the CuGaSe2 thin film are shown, which agree well with X‐ray texture measurements from the same layer. (© 2008 WILEY ‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

19.
This paper presents the fabrication and the lasing characteristics of 1.3 μm-wavelength ridge-waveguide laser. The epitaxial material used in this study was grown applying the step-cooling technique of liquid phase epitaxy (LPE). The growth conditions for InGaAsP layers lattice-matched to the (001) InP-substrate are reported for lattice compositions corresponding to photoluminescence peak wavelengths of 1.07, 1.14, and 1.31 μm. We have used a conventional multiple-bin sliding boat to grow the LPE layers and a second apparatus for achieving batches of melts of uniform compositions. In the LPE apparatus the various batch melts (In–Sn In–Zn; In–Ga–As of different composition) were saturated with phosphorus using the seed dissolution technique. The epitaxial layers were grown by a single phase technique at a constant temperature. This LPE growth technique is useful for the fabrication of double-heterostructure wafers with an uniform alloy composition and a well-defined layer thickness. Using these epitaxial materials, metal-clad ridge-waveguide (MCRW) lasers have been prepared with stripe widths of 3.5 μm. CW threshold currents of 18 mA at room temperature are achieved for 200 μm long cavities. These lasers have T0 values ranging from 50 to 70 K and well linear L-I-characteristics.  相似文献   

20.
CuGaTe2 thin films with thicknesses in the range from 0.1 to 0.2 μm were deposited onto semi-insulating (111) A-oriented GaAs substrates by flash evaporation under controlled growth conditions. Epitaxial growth begins at a substrate temperature of Tsub = 695 K. In the range Tsub = 695 … 820 K the films have the chalcopyrite structure, at Tsub = 820 to 840 K a second phase was observed besides the chalcopyrite phase. At Tsub > 840 K the films become polycrystalline. All epitaxial films were p-type conducting and showed an increase of the hole concentration with rising substrate temperature. The measured mobilities indicate to the presence of a high concentration of neutral impurities or defects.  相似文献   

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