Adsorption of CO on clean and oxygen covered Ni(111) surfaces

Adsorption of CO on Ni(111) surfaces was studied by means of LEED, UPS and thermal desorption spectroscopy. On an initially clean surface adsorbed CO forms a √3 × $\text{√3}\text{R30°}$ structure at θ = 0.33 whose unit cell is continuously compressed with increasing coverage leading to a c4 × 2-structure at θ = 0.5. Beyond this coverage a more weakly bound phase characterized by a $\text{√7}\text{2}$ × $\text{√7}\text{2R19°}$ LEED pattern is formed which is interpreted with a hexagonal close-packed arrangement (θ = 0.57) where all CO molecules are either in “bridge” or in single-site positions with a mutual distance of 3.3 Å. If CO is adsorbed on a surface precovered by oxygen (exhibiting an O 2 × 2 structure) a partially disordered coadsorbate 2 × 2 structure with θ_o = θ_co = 0.25 is formed where the CO adsorption energy is lowered by about 4 kcal/mole due to repulsive interactions. In this case the photoemission spectrum exhibits not a simple superposition of the features arising from the single-component adsorbates (i.e. maxima at 5.5 eV below the Fermi level with O_ad, and at 7.8 (5σ + 1π) and 10.6 eV (4σ) with CO_ad, respectively), but the peak derived from the CO 4σ level is shifted by about 0.3 eV towards higher ionization energies.     

Adsorption of ethylene on clean and oxygen precovered Cu(110) surfaces

UV photoemission spectroscopy (UPS) with He I and He II radiation is used to study the interaction of C₂H₄ with clean and oxygen precovered Cu(110) surfaces at 90 K. On the clean surface only-bonding of the C₂H₄ molecules is observed whereas preadsorbed oxygen causes a second molecular orbital to be involved in the chemisorption. This result is consistent with the differing behaviour of the work function change during thermal desorption of C₂H₄.     

H2O interaction with clean and oxygen precovered Ni(110)

The interaction of water vapour with clean as well as with oxygen precovered Ni(110) surfaces was studied at 150 and 273 K, using UPS, ΔΦ, TDS, and ELS. The He(I) (He(II)) excited UPS indicate a molecular adsorption of H₂O on Ni(110) at 150 K, showing three water-induced peaks at 6.5, 9.5 and 12.2 eV below E_F (6.8, 9.4 and 12.7 eV below E_F). The dramatic decrease of the Ni d-band intensity at higher exposures, as well as the course of the work function change, demonstrates the formation of H₂O multilayers (ice). The observed energy shift of all water-induced UPS peaks relative to the Fermi level (ΔE_max = 1.5 eVat 200 L) with increasing coverage is related to extra-atomic relaxation effects. The activation energies of desorption were estimated as 14.9 and 17.3 kcal/mole. From the ELS measurements we conclude a great sensitivity of H₂O for electron beam induced dissociation. At 273 K water adsorbs on Ni(110) only in the presence of oxygen, with two peaks at 5.7 and 9.3 eV below E_F (He(II)), being interpreted as due to hydroxyl species (OH)^δ? on the surface. A kinetic model for the H₂O adsorption on oxygen precovered Ni(110) surfaces is proposed, and verified by a simple Monte Carlo calculation leading to the same dependence of the maximum amount of adsorbed H₂O on the oxygen precoverage as revealed by work function measurements. On heating, some of the (OH)^δ? recombines and desorbs as H₂O at ? 320 K, leaving behind an oxygen covered Ni surface.     

Adsorption of H2O on Al(111)

The adsorption of H₂O on Al(111) has been studied by ESDIAD (electron stimulated desorption ion angular distributions), LEED (low energy electron diffraction), AES (Auger electron spectroscopy) and thermal desorption in the temperature range 80–700 K. At 80 K, H₂O is adsorbed predominantly in molecular form, and the ESDIAD patterns indicate that bonding occurs through the O atom, with the molecular axis tilted away from the surface normal. Some of the H₂O adsorbed at 80 K on clean Al(111) can be desorbed in molecular form, but a considerable fraction dissociates upon heating into OH_ads and hydrogen, which leaves the surface as H₂. Following adsorption of H₂O onto oxygen-precovered Al(111), additional OH_ads is formed upon heating (perhaps via a hydrogen abstraction reaction), and H₂ desorbs at temperatures considerably higher than that seen for H₂O on clean Al(111). The general behavior of H₂O adsorption on clean and oxygen-precovered Al(111) (θ_O ? monolayer) is rather similar at low temperature, but much higher reactivity for dissociative adsorption of H₂O to form OH _adsis noted on the oxygen-dosed surface around room temperature.     

Interaction of H2O with a clean and oxygen precovered Ni(110) surface studied by XPS

The adsorption and reaction of H₂O on clean and oxygen precovered Ni(110) surfaces was studied by XPS from 100 to 520 K. At low temperature (T<150 K), a multilayer adsorption of H₂O on the clean surface with nearly constant sticking coefficient was observed. The O 1s binding energy shifted with coverage from 533.5 to 534.4 eV. H₂O adsorption on an oxygen precovered Ni(110) surface in the temperature range from 150 to 300 K leads to an O 1s double peak with maxima at 531.0 and 532.6 eV for T=150 K (530.8 and 532.8 eV at 300 K), proposed to be due to hydrogen bonded O_ads… HOH species on the surface. For T>350 K, only one sharp peak at 530.0 eV binding energy was detected, due to a dissociation of H₂O into O_ads and H₂. The s-shaped O 1s intensity-exposure curves are discussed on the basis of an autocatalytic process with a temperature dependent precursor state.     

Adsorption of SH and OH and coadsorption of S, O and H on Ni(111)

The adsorption of SH and OH radicals on Ni(111) is treated using an ab initio embedding theory. The Ni(111) surface is modeled as a three-layer, 28-atom cluster with the Ni atoms fixed at bulk lattice sites. The Ni(111) energy surface is very flat for SH adsorption if the H tilt angle is allowed to vary. At both atop and bridge sites, the S---H axis is tilted away from the surface normal by 70°, resulting in the sulfur atom being sp³-hybridized and the adsorption energy being 59 kcal mol⁻¹. For SH at the three-fold site, the S---H axis is normal to the surface, the sulfur is sp-hybridized, and the adsorption energy is 58 kcal mol⁻¹. OH is preferentially adsorbed at the three-fold site. The calculated adsorption energy is 90 kcal mol⁻¹ and the O---H axis is perpendicular to the surface. OH adsorption at the atop and bridge sites is 16 and 5 kcal mol⁻¹ less stable than at the three-fold site, respectively. Atomic H, O and S are preferentially adsorbed at the three-fold site. The calculated adsorption energies are 62, 92 and 87 kcal mol⁻¹, for H, O and S, respectively. The calculated adsorbate---Ni bond distances of 1.86 Å for H, 1.86 Å for O and 2.29 Å for S are in good agreement with experimental data. SH and OH bonding to the surface involves a combination of ionic and covalent contributions and substantial mixing with the Ni 3d orbitals. Dipole-moment calculations indicate strong ionic bonding for the atomic O/Ni system and ionic plus covalent character for the atomic S/Ni interactions. Adsorption of S and O at the three-fold site blocks H adsorption at the nearby surface. Moving H away from the S or O adatom reduces the repulsion. The dissociation of SH_ad → S_ad + H_ad is calculated to be exothermic by 5 kcal mol⁻¹ and OH_ad → O_ad + H_ad to be endothermic by 30 kcal mol⁻¹ for infinite separation between S, O and H.     

Adsorption of H2O on clean and on boron-contaminated Rh surfaces

The adsorption and dissociation of H₂O on Rh(111) and Rh foil surfaces have been studied in UHV using Auger electron, electron energy loss (in the electronic range) and thermal desorption spectroscopy. H₂O adsorbs weakly on clean Rh samples at 110 K. The adsorption is accompanied by the appearance of a broad loss feature at 14–14.5 eV. At higher exposures new losses appeared at 8.6 and 10.5 eV. The desorption of H₂O took place in two stages, with T_p = 183 K (β, chemisorption) and 158 K (α, multilayer formation). There was no indication of dissociation of H₂O on a clean Rh(111) surface. Similar results were obtained for a clean Rh foil. However, when small amounts of boron segregated on the surface of Rh, they exerted a dramatic influence on the adsorptive properties of this surface and caused the dissociation of H₂O. This was exhibited by the formation of H₂, by the buildup of surface oxygen, by the appearance of an intense new loss at 9.4 eV, identified as B-O surface species, and by the development of “boron-oxide”-like Auger fine structure.     

Adsorption of oxygen on Pt(111)

Oxygen adsorbed on Pt(111) has been studied by means of temperature programmed thermal desorption spectroscopy (TPDS). high resolution electron energy loss spectroscopy (EELS) and LEED. At about 100 K oxygen is found to be adsorbed in a molecular form with the axis of the molecule parallel to the surface as a peroxo-like species, that is, the OO bond order is about 1. At saturation coverage (θ_mol= 0.44) a $\text{(}\text{3}\text{2}\text{×}\text{3}\text{2}\text{)R15°}$ diffraction pattern is observed. The sticking probability S at 100 K as a function of coverage passes through a maximum at θ = 0.11 with S = 0.68. The shape of the coverage dependence is characteristic for adsorption in islands. Two coexisting types of adsorbed oxygen molecules with different OO stretching vibrations are distinguished. At higher coverages units with v-OO = 875 cm^?1 are dominant. With decreasing oxygen coverages the concentration of a type with v-OO = 700 cm^?1 is increased. The dissociation energy of the OO bond in the speices with v-OO = 875 cm^?1 is estimated from the frequency shift of the first overtone to be ~ 0.5 eV. When the sample is annealed oxygen partially desorbs at ~ 160K, partially dissociates and orders into a p(2×2) overlayer. Below saturation coverage of molecular oxygen, dissociation takes place already at92 K. Atomically adsorbed oxygen occupies threefold hollow sites, with a fundamental stretching frequency of 480 cm^?1. In the non-fundamental spectrum of atomic oxygen the overtone of the E-type vibration is observed, which is “dipole forbidden” as a fundamental in EELS.     

Adsorption of acetylene and ethylene on a clean Ir(111) surface

The adsorption of C₂H₂ and C₂H₄ on Ir(111) is studied within the temperature range 180–500 K by the HREELS and XPS methods. The absolute concentration of hydrocarbon coverage is estimated by XPS. Data are obtained on the kinetics of adsorption of the two gases at different temperatures. It is established by HREELS studies that at 180 K C₂H₄ forms ethylidyne (CCH₃ whereas C₂H₂ is adsorbed as CCH and ethylidyne species. At 300 K both kinds of species are found on the Ir(111) surface after C₂H₂ or C₂H₄ exposures. The ethylidyne decomposes completely to CCH at 500 K, which can be accompanied by polymerization of adsorbed hydrocarbon species.     

binding states of CO and H2 on clean and oxidized (111)Pt

The binding states and sticking coefficients of CO and H₂ on clean and oxide covered (111)Pt are examined using flash desorption mass spectrometry and Auger electron spectroscopy (AES). On the clean surface at 78 K there is one major binding state of CO with a desorption activation energy which decreases with coverage plus a second smaller state, while H₂ exhibits three binding states with peak temperatures of 140, 230 and 310 K and saturation density ratios of 0.5 : 1 : 1. Desorption kinetics of CO are consistent with a first order state with a normal pre-exponential factor of 10^{13 ± 1} sec^?1, while all three peaks of H₂ are broader than expected. Interpretations in terms of anomalous pre-exponential factors, coverage dependent desorption activation energies, and desorption orders are considered. On the oxidized surface saturation densities of both gases are nearly identical to those on the clean surface, but desorption temperatures are increased significantly and the initial sticking coefficient on the oxide decreases slightly for CO and increases slightly for H₂.     

Adsorption of H2 and CO on clean and oxidized (110) Pt

Binding states and sticking coefficients of CO and H₂ on clean and oxide covered (110) planes of Pt are examined using flash desorption mass spectrometry to characterize binding states and Auger electron spectroscopy (AES) to characterize oxide densities. It is found that on the oxide both adsorbates have new binding states with significantly higher binding energies than on the clean surface. For H₂ the binding states associated with the clean surface are also shifted to higher energies as the oxide coverage increases. The oxide state for H₂ desorbs with first order kinetics, and isotope exchange experiments are used to examine exchange between isotopes and between states. The initial sticking coefficients for CO are 1.0 and 0.85 on clean and oxidized surfaces, and the initial sticking coefficient for H₂ increases from 0.15 on the clean surface to 0.28 on the oxidized surface. Enhanced bonding on the oxide is interpreted in terms of models involving microfacets, electronic structure alteration, and compound formation.     

Adsorption of ethylenediamine on clean and oxygen covered Fe/Ni(100) surfaces studied by XPS

The interaction of ethylenediamine with Fe/Ni(100) surfaces oxidized to various extents has been studied in the temperature range 260–450 K by means of X-ray photoelectron Spectroscopy. The use of ~ 1 monolayer of Fe enables us to characterize the oxidation states of the topmost layer atoms unambiguously, based on the XPS spectra using a conventional spectrometer. On clean and c(2 × 2)-O surfaces the ethylenediamine can dissociate the N-H bond at 260 K. On heating the adlayer to 340 K the dissociation was further developed. On the surfaces whose Fe atoms were oxidized to FeO/Ni(100) and further, only molecularly adsorbed species were present at 260 K and desorbed partly without dissociation of the N-H bond after heating to 340 K.     

Adsorption and desorption of hydrogen and ethene on clean Si (111) faces

Workfunction, surface conductivity, field effect mobility and desorbed species have been measured after adsorption of hydrogen and ethene on heated clean silicon (111) faces. Whereas the hydrogen studies mostly show the same drastic changes as with cleaved faces, ethene does not change the electronic parameters except the electron affinity due to the dipole moment of the adlayer. During that treatment desorption of ethene and hydrogen due to decomposition is observed. The results enable a study of hydrogenation of ethene for simultaneous adsorption.     

氢分子在Mg2Ni(010)面的吸附与分解

本文采用基于密度泛函理论(DFT)的第一原理赝势平面波(PW-PP)方法,对氢分子在Mg2Ni(010)面的吸附与分解进行了研究,发现氢分子以Horl的方式吸附在表面层Ni原子的顶位时吸附能最高,为0.6769 eV,这表明氢分子最可能以Horl的方式吸附在表面层Ni原子的顶位,此时氢分子跟表面的距离(rd)和氢分子的键长(rH)分别为1.6286 A和0.9174 (A).在分子吸附的基础上计算了氢分子沿着选取的反应路径分解时的反应势垒,发现要使氢分子分解需要0.2778 eV的活化能,而氢分子分解时的吸附能为0.8390 eV,分解后两个氢原子的距离为3.1712(A).在分子吸附和分解吸附时氢原子跟正下方的Ni原子都有较强的相互作用,氢原子所得到的电子主要来自氢分子正下方的Ni原子.     

氢分子在Mg2Ni(010)面的吸附与分解

本文采用基于密度泛函理论(DFT)的第一原理赝势平面波(PW-PP)方法,对氢分子在Mg2Ni(010)面的吸附与分解进行了研究,我们发现氢分子以Hor1的方式吸附在表面层Ni原子的顶位时吸附能最高,为0.6769eV,这表明氢分子最可能以Hor1的方式吸附在表面层Ni原子的顶位,此时氢分子跟表面的距离( )和氢分子的键长( )分别为1.6286Å和0.9174Å. 在分子吸附的基础上计算了氢分子沿着选取的反应路径分解时的反应势垒,发现要使氢分子分解需要0.2778eV的活化能,而氢分子分解时的吸附能为0.8390eV,分解后两个氢原子的距离为3.1712Å. 在分子吸附和分解吸附时氢原子跟正下方的Ni原子都有较强的相互作用,氢原子所得到的电子主要来自氢分子正下方的Ni原子.     

Adsorption of H2O, OH, and O on CuCl(111) Surface: A Density Functional Theory Study

运用广义梯度密度泛函理论(GGA)的PW91方法结合周期平板模型研究了H2O在CuCl (111)表面上的吸附及分解. 通过构型优化参数的计算和比较发现：对于O和OH,三重穴位吸附较为稳定,吸附能分别为309.5和416.5 kJ/mol;水分子与预吸附氧的表面作用时分解成为OH,并放热180.1 kJ/mol. 同时对于吸附前后的吸附O与表面Cu的伸缩振动频率、态密度以及吸附质与底物的电荷转移情况进行了计算和分析,并给出了可能的分解反应机理.     

Adsorption position of oxygen on the Pt(111) surface

The adsorption position of oxygen on the clean Pt(111) surface has been determined by means of the transmission channeling technique. Oxygen adsorbs in a well ordered p(2 × 2) overlayer structure at temperatures 200 T 350 K. From an analysis of the angular scans along the [111], [110] and [100] axial directions it is concluded that the O atoms are adsorbed in the fcc three-fold hollow site exclusively at a height of 0.85 ± 0.06 Å above the Pt surface layer. From a narrowing of the [111] angular O scan, the O RMS displacement parallel to the surface is found to be 0.16 ±0.03 Å.     

Vibrational spectra of coadsorbed CO and H on Ni(100) and Ni(111)

High resolution electron energy loss spectra are reported for coadsorbed hydrogen and carbon monoxide on Ni(100) and Ni(111). On neither surface was there any evidence for either C-H or O-H bonds. On Ni(111) one CO stretching frequency is observed and it does not change significantly in the presence of coadsorbed hydrogen. This is consistent with segregation of CO and H into islands. On Ni(100) the situation is much different; one frequency is observed in the absence of H(a) while three CO stretching frequencies are observed for the coadsorbed layers. These are attributed to on-top, two-fold bridged and four-fold binding of CO to the Ni(100) surface. These results demonstrate significant structure sensitivity for the organization of these coadsorbed species.     

Adsorption and reaction of nitric oxide and oxygen on Rh(111)

Adsorption of NO and O₂ on Rh(111) has been studied by TPD and XPS. Both gases adsorb molecularly at 120 K. At low coverages (θ_NO < 0.3) NO dissociates completely upon heating to form N₂ and O₂ which have peak desorption temperatures at 710 and 1310 K., respectively. At higher NO coverages NO desorbs at 455 K and a new N₂ state obeying first order kinetics appears at 470 K. At saturation, 55% of the adsorbed NO decomposes. Preadsorbed oxygen inhibits NO decomposition and produces new N₂ and NO desorption states, both at 400 K. The saturation coverage of NO on Rh(111) is approximately 0.67 of the surface atom density. Oxygen on Rh(111) has two strongly bound states with peak temperatures of 840 and 1125 K with a saturation coverage ratio of 1:2. Desorption parameters for the 1125 peak vary strongly with coverage and, assuming second-order kinetics, yield an activation energy of $\text{85 ± 5}\text{kcal}\text{mol}$ and a pre-exponential factor of 2.0 cm² s^?1 in the limit of zero coverage. A molecular state desorbing at 150 K and the 840 K state fill concurrently. The saturation coverage of atomic oxygen on Rh(111) is approximately 0.83 times the surface atom density. The behavior of NO on Rh and Pt low index planes is compared.