共查询到20条相似文献,搜索用时 15 毫秒
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通过研究塑料化学镀铜的时间与铜沉积速率的关系,使学生理解甲醛作为还原剂进行塑料化学镀铜的原理;同时,掌握研究问题的方法和思路,为以后进行课程设计或进行研究性工作奠定基础。 相似文献
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超级化学镀铜填充微道沟的研究 总被引:2,自引:0,他引:2
超级化学铜填充技术不仅可以应用于半导体超大集成电路铜互连线, 而且可以应用于三维封装. 研究了不同浓
度、不同分子量的PEG 对以甲醛为还原剂的化学镀铜溶液中铜的沉积速率的影响. 随着添加剂PEG 浓度和分子量的
增大, 化学铜的沉积速率明显降低. 电化学研究结果表明PEG 通过抑制甲醛的氧化反应降低化学铜的沉积速率, PEG
分子量越大, 对化学铜的抑制作用越强. 利用PEG-6000 对化学铜的抑制作用和在溶液中低的扩散系数, 采用添加
PEG-6000 的化学镀铜溶液, 成功地实现了宽度在0.2 μm 以下微道沟的超级化学填充. 就PEG 的分子量、微道沟的深
径比等因素对超级化学铜填充的影响也做了研究. 相似文献
度、不同分子量的PEG 对以甲醛为还原剂的化学镀铜溶液中铜的沉积速率的影响. 随着添加剂PEG 浓度和分子量的
增大, 化学铜的沉积速率明显降低. 电化学研究结果表明PEG 通过抑制甲醛的氧化反应降低化学铜的沉积速率, PEG
分子量越大, 对化学铜的抑制作用越强. 利用PEG-6000 对化学铜的抑制作用和在溶液中低的扩散系数, 采用添加
PEG-6000 的化学镀铜溶液, 成功地实现了宽度在0.2 μm 以下微道沟的超级化学填充. 就PEG 的分子量、微道沟的深
径比等因素对超级化学铜填充的影响也做了研究. 相似文献
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经实验探究, 提出一种绿色环保的简易化学镀铜方法。首先利用葡萄糖银镜反应在洁净试管内壁附上一层活性物质, 在此基础上采用维生素C(即抗坏血酸)、味精(即谷氨酸一钠)和硫酸铜等物质按一定工艺操作, 在试管壁上镀上一层光亮的铜镜。本实验适合作为中学化学兴趣实验。 相似文献
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Yudina T. F. Pyatachkova T. V. Ershova T. V. Strogaya G. M. 《Russian Journal of Electrochemistry》2001,37(7):741-745
Several promising schemes of activation of dielectric surfaces prior to electroless plating are considered. The schemes are based on such reducing agents as sodium borohydride and formaldehyde and use no palladium. 相似文献
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A new method is described for the electroless deposition of copper onto glass.Commercially available glass slide was modified with γ-aminopropyltrimethoxysilane to form self-assembled monolayer (SAM) on it .Then it was dipped directly into PdCl2 solution instead of the conventional SnCl2 sensitization followed by PdCl2 activation.Experimental results showed that the Pd^2 ions from PdCl2 solution were coordinated to the amino groups on the glass surface resulting in the formation of N-Pd complex.In an electroless copper bath containin a formaldehyde reducing agent,the N-Pd complexes were reduced to Pd^0 atoms,which then acted as catalysts and initiated the deposition of copper metal.Although the copper deposition rate on SAM-modified glass was slow at the beginning,it reached to that of conventional method in about 5min. 相似文献
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化学镀铜过程混合电位本质的研究 总被引:5,自引:0,他引:5
现场测量了铜基和陶瓷基化学镀铜过程混合电位-时间曲线(Emix-t),成功地检测到了化学镀诱发过程.考察了添加剂和络合剂的浓度以及pH值对Emix-t曲线的影响,结合阴、阳极极化曲线及双电层理论对各种影响因素进行了讨论.新生铜活化的铜基化学镀铜的诱发过程是一个缓慢激活过程,所对应的Emix-t曲线是一个稍微倾斜的台阶,这不同于钯活化的基体的诱发过程.通过对不同活化工艺的Emix-t曲线的比较,发现较高的活化温度能明显减少活化时间,而且还可加速诱发过程,从而提高化学沉积铜的速度. 相似文献
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随着半导体集成度的不断提高,铜互连线的电阻率迅速提高。当互连线宽度接近7 nm时,铜互连线的电阻率与钴接近。IBM和美国半导体公司(ASE)已经使用金属钴取代铜作为下一代互连线材料。然而,钴种子层的形成和超级电镀钴填充7 nm微孔的技术工艺仍是一个很大的挑战。化学镀是在绝缘体表面形成金属种子层的一种非常简单的方法, 通过超级化学镀填充方式, 直径为几纳米的盲孔可以无空洞和无缝隙的方式完全填充。本文综述了化学镀钴的研究进展,并分析了还原剂种类对化学镀钴沉积速率和镀膜质量的影响。同时, 在长期从事超级化学填充研究的基础上, 作者提出了通过超级化学镀钴技术填充7 nm以及一下微盲孔的钴互连线工艺。 相似文献
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以塑料板上化学镀铜和制作"铜版画"为"联合生产"案例,强调中学实验教学应摒弃"一亩三分地"思维模式,对不同学段的实验计划进行科学合理的"顶层设计",树立全校"一盘棋"的"大实验" 观,开发和利用教学资源,降低实验成本,形成技术观念,提高教学效益。 相似文献
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Electroless Nickel and Copper Plating of Carbon Fibers with the Use of Sulfur-containing Reducing Agents 总被引:2,自引:0,他引:2
Terskaya I. N. Budanov V. V. Makarov S. V. Ermolina L. V. 《Russian Journal of Applied Chemistry》2004,77(2):236-240
The fundamental aspects of electroless nickel and copper plating of carbon fibers with the use of sodium hydroxymethane-sulfinate and thiourea dioxide as reducing agents were studied. 相似文献
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Electroless Copper Plating on Liquid Crystal Polymer Films Using Dimethylamine Borane as Reducing Agent 下载免费PDF全文
Dimethylamine borane (DMAB) was used in electroless copper plating on liquid crystal polymer (LCP) films. An orthogonal test was applied to optimize the plating condition. With Cu film resistivity as the evaluation index, the optimum plating condition is: 10 g/L of CuSO4 ? 5H2O, 14 g/L of EDTA‐2Na, 6 g/L of DMAB, 9.5 of pH value and 50 °C. As pH value increases, the Cu film resistivity decreases and the depo‐ sition rate increases. As temperature increases, the Cu film resistivity decreases first and then increases with a minimum at 50 °C while the deposition rate increases first and then decreases with a maximum at 50 °C. The decreased Cu film resistivity can be attributed to the occurrence of CuO. The adhesive strength of copper layer to LCP film is constant at pH values lower than 8.5 and decreases slightly with the increase in pH value. As temperature increases, the adhesive strength decreases slightly. The decreased adhesive strength with both pH and temperature may be a result of an increased corrosion attack from the bath to the surface of LCP films. Low Cu film resistivity and high deposition rate as well as high adhesive strength can be obtained using DMAB reducing agent. 相似文献
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T-ZnO晶须化学镀铜复合粉体的制备及其电磁性能的研究 总被引:11,自引:0,他引:11
采用化学镀的方法制备了Cu包覆四脚状氧化锌晶须(T-ZnO晶须)的复合粉体.使用X射线衍射分析仪(XRD)进行了物象分析,扫描电镜(SEM)观察了粉体的形貌.运用能谱仪(EDS)进行了成份分析.结果表明,晶须为纯氧化锌,晶体结构为六方晶系纤锌矿结构,镀层为纯铜. SEM观察晶须外观形貌为四脚状结构.同时使用波导法对T-ZnO晶须和化学镀铜得到的Cu/T-ZnO晶须复合粉体进行了电磁参数的测量.微波电磁性能试验表明,化学镀后晶须的微波吸收性能明显增加,在频率为13 GHz处反射率可达-12 dB左右,而且最大吸收峰的频率随铜析出量的不同而发生改变,这样有利于实现吸收频带的展宽. 相似文献
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The electroless Ni-P-carbon nanotubes composite plating was studied on the copper substrate. Metallurgical microscope, scanning electronic microscope, X-ray diffractometer and micro hardness tester were used to study the structure, constitution and performance of the electroless Ni-P-carbon nanotubes composite deposit. Experiential results show that, with the increment of carbon nanotubes content in electroless plating solution, the grain size on the sample surface decreases whereas the density of grains and the hardness for composite deposit increases. Moreover, adding carbon nanotubes not only improves the degree of crystallization for the composite deposit but also helps their transformation from the amorphous state to the nanocrystal state. 相似文献