ICP-AES的工作原理与维护保养

重点介绍电感耦合高频等离子体发射光谱仪（ICP-AES）的工作原理、在无机成分定性定量分析方面的优势和极其广泛的应用范围以及仪器的维护保养。     

ICP-OES测定铅汞镉的参数优化

采用电感耦合等离子体发射光谱仪对铅、汞、镉同时分析,优化仪器参数可提高检测灵敏度.主要讨论了雾化气流量、等离子气流量和观测高度对检测结果的影响以及如何调节这3个参数来增大信噪比、提高检测灵敏度.     

微波消解——电感耦合等离子发射光谱法测定塑料中的镉

采用微波消解技术对塑料进行消解,用电感耦合等离子法测定样品中镉的含量。通过优化试验确定仪器的工作条件,镉在0—1000ppm的含量范围内与强度呈良好的线性关系,相关系数为0.9999,方法检出限为0.005mg/L,样品回收率为95.96%～99.33%,测定结果的相对标准偏差为0.591%(n=6)。     

ICP-OES法测定焊料中铅的不确定度评定

对于用电感耦合等离子体-原子发射光谱法(ICP-OES)测定焊料中的金属元素铅含量的不确定度来源进行了分析和计算。测量不确定度主要来源于测量重复性、回收率、试样称量、标准溶液配制、校准曲线拟合和样品体积。依据不确定度评定的步骤,计算得到了各分量标准不确定度及合成标准不确定度。     

Study of Zn,Zn−Cd diffusion in In x Ga1−x As

 In this report,the diffusion of Zn,Zn-Cd in In_xGa_(1-x)As is investigated using ZnAs_2 and ZnAs_2+Cd as diffusion sources. The effect of the diffusion temperature,diffusion time,a variety of the diffusion source and composition x of the material on the relation of the(X_j-t~(1/2))are given.The diffusion velocity X_j~2/t of Zn in In_xGa_(1-x)As is faster than that of Zn-Cd in In_xGa_(1-x)As,and at 500-600℃,the surface acceptor concentration is from 1×10~(19)to 2×10~(20)cm~(-3),which is higher than that of Zn in InP.Reduction of contact resistance by use of In_xGa_(1-x)As contact layer for 1.3μm LED can be expected.     

As Doping in (Hg,Cd)Te: An Alternative Point of View

Acceptor doping of many II–VI compound semiconductors has proved problematic and doping of epitaxial mercury cadmium telluride (MCT, Hg_1−x Cd _x Te) with arsenic is no exception. High-temperature (>400°C) anneals followed by a lower temperature mercury-rich vacancy-filling anneal are frequently required to activate the dopant. The model frequently used to explain p-type doping with arsenic invokes an amphoteric nature of group V atoms in the II–VI lattice. This requires that group VI substitution with arsenic only occurs under mercury-rich conditions either during growth or the subsequent annealing and involves site switching of the As. However, there are inconsistencies in the amphoteric model and unexplained experimental observations, including arsenic which is 100% active as grown by metalorganic vapor-phase epitaxy (MOVPE). A new model, based on hydrogen passivation of the arsenic, is therefore proposed.     

The origin of hillocks in (Hg, Cd)Te grown by MOVPE

Dimethylcadmium, a precursor for the metalorganic vapor phase epitaxy of mercury cadmium telluride, has been shown to react with gallium arsenide to form trimethylarsine and dimethylarsine. An analogous reaction occurs between di-iso-propyltelluride and gallium arsenide to form iso-propylarsine and di-iso-propylarsine. It is proposed that if these reactions remove sufficient arsenic from a gallium arsenide substrate, metallic droplets will form on the wafer surface thereby creating the nucleation sites for hillocks. Analogous reactions have been observed between the precursors and a range of other substrates which can in turn be used to explain the origin of hillocks in epitaxial layers grown onto these materials.     

The role of surface adsorbates in the metalorganic vapor phase epitaxial growth of (Hg,Cd)Te onto (100) GaAs Substrates

It has been established that a compound present as an impurity in the propan-2-ol used in the preparation of GaAs (100) substrates for the metalorganic vapor phase epitaxy growth of (Hg,Cd)Te has a marked effect on the crystalline perfection and surface morphology of the resulting layers. In particular, the presence of this species, which contains Na, ensures that (i) the epitaxial overgrowth is of (100) orientation without the need for ZnTe nucleation layers, and (ii) the density of pyramidal hillocks on the surface can be reproducibly < 10 cm⁻².     

The effect of Zn1−xSnxOy buffer layer thickness in 18.0% efficient Cd‐free Cu(In,Ga)Se2 solar cells

The influence of the thickness of atomic layer deposited Zn_1−xSn_xO_y buffer layers and the presence of an intrinsic ZnO layer on the performance of Cu(In,Ga)Se₂ solar cells are investigated. The amorphous Zn_1−xSn_xO_y layer, with a [Sn]/([Sn] + [Zn]) composition of approximately 0.18, forms a conformal and in‐depth uniform layer with an optical band gap of 3.3 eV. The short circuit current for cells with a Zn_1−xSn_xO_y layer are found to be higher than the short circuit current for CdS buffer reference cells and thickness independent. On the contrary, both the open circuit voltage and the fill factor values obtained are lower than the references and are thickness dependent. A high conversion efficiency of 18.0%, which is comparable with CdS references, is attained for a cell with a Zn_1−xSn_xO_y layer thickness of approximately 13 nm and with an i‐ZnO layer. Copyright © 2012 John Wiley & Sons, Ltd.     

The Zn(S,O,OH)/ZnMgO buffer in thin film Cu(In,Ga)(S,Se)2‐based solar cells part I: Fast chemical bath deposition of Zn(S,O,OH) buffer layers for industrial application on Co‐evaporated Cu(In,Ga)Se2 and electrodeposited CuIn(S,Se)2 solar cells

This paper is focused on the basic study and optimization of short time (<10 min) Chemical Bath Deposition (CBD) of Zn(S,O,OH) buffer layers in co‐evaporated Cu(In,Ga)Se₂ (CIGSe) and electrodeposited CuIn(S,Se)₂ ((ED)‐CIS) solar cells for industrial applications. First, the influence of the deposition temperature is studied from theoretical solution chemistry considerations by constructing solubility diagrams of ZnS, ZnO, and Zn(OH)₂ as a function of temperature. In order to reduce the deposition time under 10 min, experimental growth deposition studies are then carried out by the in situ quartz crystal microgravimetry (QCM) technique. An optimized process is performed and compared to the classical Zn(S,O,OH) deposition. The morphology and composition of Zn(S,O,OH) films are determined using SEM and XPS techniques. The optimized process is tested on electrodeposited‐CIS and co‐evaporated‐CIGSe absorbers and cells are completed with (Zn,Mg)O/ZnO:Al windows layers. Efficiencies similar or even better than CBD CdS/i‐ZnO reference buffer layers are obtained (15·7% for CIGSe and 8·1% for (ED)‐CIS). Copyright © 2009 John Wiley & Sons, Ltd.     

The Zn(S,O,OH)/ZnMgO buffer in thin‐film Cu(In,Ga)(Se,S)2‐based solar cells part II: Magnetron sputtering of the ZnMgO buffer layer for in‐line co‐evaporated Cu(In,Ga)Se2 solar cells

A ZnS/Zn_1‐xMg_xO buffer combination was developed to replace the CdS/i‐ZnO layers in in‐line co‐evaporated Cu(In,Ga)Se₂(CIGS)‐based solar cells. The ZnS was deposited by the chemical bath deposition (CBD) technique and the Zn_1‐xMg_xO layer by RF magnetron sputtering from ceramic targets. The [Mg]/([Mg] + [Zn]) ratio in the target was varied between x = 0·0 and 0·4. The composition, the crystal structure, and the optical properties of the resulting layers were analyzed. Small laboratory cells and 10 × 10 cm² modules were realized with high reproducibility and enhanced stability. The transmission is improved in the wavelength region between 330 and 550 nm for the ZnS/Zn_1‐xMg_xO layers. Therefore, a large gain in the short‐circuit current density up to 12% was obtained, which resulted in higher conversion efficiencies up to 9% relative as compared to cells with the CdS/i‐ZnO buffer system. Peak efficiencies of 18% with small laboratory cells and 15·2% with 10 × 10 cm² mini‐modules were demonstrated. Copyright © 2009 John Wiley & Sons, Ltd.