Varied laser induced damage phenomena of gold coated gratings for pulse compression

In this paper, gold-coated gratings for pulse compression have been prepared and their laser damage experiments have been performed. Varied laser damage morphologies have been observed: when a 60 fs-pulsed laser with energy density slightly higher than the damage threshold was used, damage morphology with a characteristic of discrete distribution of small pits was appeared. These damage pits are linearly distributed at the junction of ridges and grooves. If the laser energy density is much higher than the damage threshold, the gold films was overall ablated and the grating structure disappeared. Besides, if the gold film has poor adhesion, it was peeled off. When a 450 ps-pulsed laser with energy density slightly higher than the damage threshold was used, part of grating ridges will be ablated and an obvious line exists between the ablated area and the unchanged area. In theory, the laser induced temperature field and stress field in gold-coated gratings were calculated based on the electromagnetic field using the finite element method. It is demonstrated that the temperature and thermal stress distribution characteristics are affected by the laser heating rate and the heat diffusion time (the calculated diffusion time ranges from 6 fs to 450 ps), which determines the laser damage characteristics. The possible damage drivers have electron hydrodynamic pressure, thermal ablation and thermal stress.     

Femtosecond pulsed laser ablation with spatial filtering

With the rise in demand for miniaturized features with better acute edge acuity and negligible thermal damage zone, one of the key vital areas lies in the refinement of the quality of the laser beam itself. Spatial filter is routinely used in optical micromachining systems to smoothen the Gaussian profile of the machining spot in order to obtain a feature of the desired quality. However, its profile smoothening effect has never been investigated for femtosecond pulsed laser micromachining process since the extremely high peak power of femtosecond pulses will cause damage on the filtering aperture of spatial filter. During the development of an acousto-optical micromachining system using femtosecond pulses, we found that if the damage of the filtering aperture can be circumvented, spatial filter can improve the machining quality of femtosecond pulse ablation, especially when ablation is conducted at low-fluency range (just above the ablation threshold fluency). In this paper, we investigate and demonstrate both the improvement and potential that beam refinement can bring about. In our experiment, a series of test patterns were ablated with a 400 nm second-harmonic Ti:Sapphire femtosecond laser of 150 fs duration at varying pulse energy ranging from 31 to 39 nJ. The specimen used in the experiment is a platinum- (Pt) sputtered coating of 100 nm thickness on a quartz substrate. The results show a significant improvement in the constancy of the shape as well as the size of ablated feature, revealing an improved beam profile and beam energy distribution due to spatial filtering.     

532nm皮秒脉冲激光对单晶硅的损伤特性研究

随着光电对抗和超短脉冲激光技术的发展,研究超短脉冲激光与单晶硅相互作用具有非常重要的理论和实际意义.为了进一步明确532 nm皮秒脉冲激光对单晶硅的损伤机理,本文开展了532 nm皮秒脉冲激光辐照单晶硅的损伤效应实验研究,测定了损伤阈值,明确了损伤机理,探讨了低通量下的脉冲累积效应.首先,利用波长为532 nm、脉冲宽...     

脉冲激光辐照氮化硅陶瓷损伤阈值的光谱测量

氮化硅陶瓷具有耐高温、耐腐蚀和耐磨损等优异性能, 可应用于金属材料和高分子材料难以胜任的极端工作环境。但具备这些优良特性的同时也给其加工带来了不便,传统的磨削加工方法效率低,设备损耗严重, 激光辅助加工为其提供了一种新途径。将等离子体光谱法和显微成像法相结合,对脉冲激光辐照氮化硅陶瓷的损伤阈值进行了测量,并分析了损伤机理。实验选用热压烧结氮化硅陶瓷为靶材,参考ISO21254国际损伤阈值测试标准搭建试验系统,采用1-on-1法利用Nd3+∶YAG固体脉冲激光分别在纳秒和微秒脉宽下辐照氮化硅陶瓷,两种脉宽分别选取10个能量密度梯度进行激光辐照,每个能量密度辐照10个点。利用光纤光谱仪采集光谱信息,利用金相显微镜获取显微图像信息,将光谱结果与显微成像结果对比分析, 发现纳秒脉宽下材料一旦损伤光谱上就会出现等离子体峰,通过分析光谱中等离子体峰,元素指认是否含有材料中特征元素即可判断损伤,为了区别空气电离击穿同时测量了空气等离子体光谱对比分析剔除干扰。微秒脉宽下显微图像观察到刚开始损伤时,光谱中只出现较强热辐射谱线并未出现等离子体谱线,进一步增加激光能量密度,光谱中会出现少量等离子体峰,因此不能直接以等离子体峰判断材料损伤阈值。利用金相显微镜观察损伤形貌,纳秒脉宽下在损伤区域内部观察到明显的烧蚀冲击状损伤,光谱呈现出大量等离子体谱线,说明纳秒激光辐照氮化硅损伤机制主要为等离子体冲击波引起的力学损伤效应。微秒脉宽在辐照区域边缘发现热烧蚀痕迹,损伤区内观察到大量熔融物,出现明显热辐射光谱,说明微秒激光辐照氮化硅损伤机制主要是由于长脉宽热积累引起的热损伤效应,随着能量密度增加热辐射谱上叠加有等离子体峰,等离子体峰值强度与损伤程度一致。利用零几率损伤阈值法对两种方法测得结果进行了拟合,分析发现等离子体光谱法更适用于纳秒脉宽下损伤阈值测量,得到结果为0.256 J·cm-2;显微成像法适用于微秒脉宽下损伤阈值测量,得到结果为6.84 J·cm-2。     

Ultraviolet laser removal of small metallic particles from silicon wafers

Laser removal of small 1 μm sized copper, gold and tungsten particles from silicon wafer surfaces was carried out using ultraviolet radiation at 266 nm generated by Nd:YAG harmonic generation. Successful removal of both copper and gold particles from the surface was achieved whereas tungsten particles proved to be difficult to remove. The cleaning efficiency was increased with an increase of laser fluence. The optimum processing window for safe cleaning of the surface without any substrate damage was determined by measuring the damage threshold laser fluence on the silicon substrate and the required fluence for complete removal of the particles. The different cleaning efficiencies with particle type are discussed by considering the adhesion force of the particle on the surface and the laser-induced cleaning force for the three different particles.     

Nanosecond pulsed laser ablation of silicon in liquids

Laser fluence and laser shot number are important parameters for pulse laser based micromachining of silicon in liquids. This paper presents laser-induced ablation of silicon in liquids of the dimethyl sulfoxide (DMSO) and the water at different applied laser fluence levels and laser shot numbers. The experimental results are conducted using 15 ns pulsed laser irradiation at 532 nm. The silicon surface morphology of the irradiated spots has an appearance as one can see in porous formation. The surface morphology exhibits a large number of cavities which indicates as bubble nucleation sites. The observed surface morphology shows that the explosive melt expulsion could be a dominant process for the laser ablation of silicon in liquids using nanosecond pulsed laser irradiation at 532 nm. Silicon surface’s ablated diameter growth was measured at different applied laser fluences and shot numbers in both liquid interfaces. A theoretical analysis suggested investigating silicon surface etching in liquid by intense multiple nanosecond laser pulses. It has been assumed that the nanosecond pulsed laser-induced silicon surface modification is due to the process of explosive melt expulsion under the action of the confined plasma-induced pressure or shock wave trapped between the silicon target and the overlying liquid. This analysis allows us to determine the effective lateral interaction zone of ablated solid target related to nanosecond pulsed laser illumination. The theoretical analysis is found in excellent agreement with the experimental measurements of silicon ablated diameter growth in the DMSO and the water interfaces. Multiple-shot laser ablation threshold of silicon is determined. Pulsed energy accumulation model is used to obtain the single-shot ablation threshold of silicon. The smaller ablation threshold value is found in the DMSO, and the incubation effect is also found to be absent.     

Femtosecond laser ablation of polypropylene for breathable film

A polypropylene (PP) film was ablated using a femtosecond laser with a center wavelength of 785 nm, a pulse width of 184 fs and a repetition rate of 1 kHz. Increments of both the pulse energy and the shot number of pulses lead to co-occurrence of photochemical and thermal effect, demonstrated by the spatial expansion of rim on the surface of PP. The shapes of the laser-ablated PP films were imaged by a scanning electron microscope (SEM) and measured by a 3D optical measurement system (NanoFocus). And, the gas and water vapor transmission rate, mechanical properties of PP film micropatterned by fs laser pulses was characterized. Our results demonstrate that a femtosecond pulsed laser is an efficient tool for breathable packaging films in modifying the flow of air and gas, where the micropatterns are specifically tailored in size, location and number of which is easily controlled by laser processing conditions.     

Stimulated Brillouin scattering of Q-switched laser pulses in large-core optical fibres

Q-switched Nd : glass laser pulses of 60 ns duration are transmitted through multimode fused-silica fibres of 0.4–1 mm core diam and lengths of up to 20 m. For laser radiation with narrow spectral width, stimulated Brillouin scattering (SBS) is observed for energies well below the threshold energy of fibre damage. The SBS threshold is shifted beyond the threshold of fibre damage through increasing the spectral width of the laser radiation. The SBS threshold energies of step-index and gradient-index fibres are measured for various fibre and laser parameters.     

铝合金焊前激光清洗的等离子体光谱在线检测

铝合金焊接技术在工业生产、制造和维修等领域有广泛的应用,焊缝内存在气孔导致焊接质量降低是铝合金焊接技术的常见问题。由于铝合金表面金属氧化物是导致气孔生成的主要来源,对激光清洗过程进行在线检测,不但可以实时分析表面氧化物的清洗状态,而且可以避免基体表面因为过度清洗造成损伤或二次氧化。提出采用激光诱导等离子体光谱(LIBS)在线检测铝合金焊前激光清洗过程,表征清洗后铝合金基体的表面状态。LIBS技术可以对多元素成分同时检测,拥有较低的检出限和较高的准确性。搭建基于Andor Mechelle 5000光谱仪的铝合金焊前激光清洗在线检测系统,剔除空气环境对实验结果的影响,测试6061铝合金表面氧化物和铝合金基体的LIBS光谱,分析两者独特的元素特征谱线,采用X射线能谱(EDS)测试结果验证元素特征谱线的准确性,并探讨激光清洗过程LIBS技术在线检测的可行性。实验测试等离子体光谱谱线强度与激光能量密度之间的关系,获得单次脉冲激光去除铝合金表面氧化物的损伤阈值,结合X射线能谱的检测结果研究激光损伤阈值的成因及影响。研究激光清洗过程等离子体光谱特征谱线与脉冲次数之间的关系,提出基于O/Al特征谱线强度比值作为在线检测清洗效果及二次氧化损伤的评判依据。为验证该评判依据的准确性,将O/Al特征谱线强度比值随清洗次数的变化趋势与X射线能谱测试获得的氧元素原子百分比变化趋势进行对比。实验结果表明:采用200~700 nm范围内激光诱导等离子体谱线特征分析激光清洗状态,可以剔除空气环境的影响;氧元素和铝元素特征谱线准确反映出表面氧化膜与铝合金基体的成分差异;X射线能谱检测元素成分和含量表明氧元素含量随着激光清洗能量密度先减后增,单次清洗铝合金的二次氧化损伤的激光能量阈值为11.46 J·cm-2,小于损伤阈值的激光能量密度对铝合金基体的多次清洗未造成损伤,等离子体光谱特征谱线强度与表面清洗状态相关, 656.5 nm(OⅡ)/396.2 nm(AlⅠ)谱线强度比值≤1.5%为激光清洗干净的依据。研究结果有利于铝合金的激光清洗实时控制技术和焊接装置集成化。     

6H-SiC单晶的激光刻蚀及光谱分析

激光微加工是半导体精密加工的一个有效方法。对于碳化硅(SiC)单晶,使用紫外波段激光可以获得对入射能量最大的吸收效率。使用355 nm全固态激光器对6H-SiC单晶进行刻蚀。同时将样品置于不同的介质下以探究最优加工条件。使用拉曼光谱表征激光刻蚀后的SiC表面。刻蚀后表面主要由无定形硅及纳米晶石墨组成,对于空气下刻蚀的SiC晶片,无定形硅主要分布于刻蚀坑的周围,刻蚀坑内较少。而在液体下刻蚀的样品,无定形硅的空间分布相反。通过分析残留在表面的物质,在另一角度研究了激光刻蚀的反应机理。对于液体辅助的激光加工,以往的研究主要关注液层的厚度及粘度,对液体还原性的研究很少。为确定液体还原性的影响,使用共聚焦激光扫描显微镜及能量色散谱检测了不同液体辅助加工样品的表面形貌及氧含量。结果表明,液体还原性在激光刻蚀过程中有着较大的影响,使用有着还原性的液体作为介质可以有效减少表面氧化并获得更规则的表面形貌。     

用1064nm激光增强HfO2/SiO2薄膜的抗激光损伤能力的实验研究

 用1 064nm激光实验研究了HfO₂/SiO₂薄膜的激光损伤增强效应，实验以薄膜激光损伤阈值70%的激光能量开始，采用N-ON-1方式处理薄膜，激光脉冲的能量增量为5J/cm²。实验结果表明，激光处理薄膜表面能使激光损伤阈值平均提高到3倍左右，并且薄膜的损伤尺度也明显减小。对有缺陷的薄膜，其缺陷经低能量激光后熔和消除，其抗激光损伤能力得到增强，但增强得并不显著，而薄膜本身的激光预处理，可以使其激光损伤阈值大大提高。     

Femtosecond pulsed laser ablation of diamond-like carbon films on silicon

Femtosecond pulsed laser ablation (τ = 120 fs, λ = 800 nm, repetition rate = 1 kHz) of thin diamond-like carbon (DLC) films on silicon was conducted in air using a direct focusing technique for estimating ablation threshold and investigating the influence of ablation parameter on the morphological features of ablated regions. The single-pulse ablation threshold estimated by two different methods were ?_th(1) = 2.43 and 2.51 J/cm². The morphological changes were evaluated by means of scanning electron microscopy. A comparison with picosecond pulsed laser ablation shows lower threshold and reduced collateral thermal damage.     

波段外脉冲激光对锗透镜热冲击效应的数值与实验研究

基于热传导及热弹性力学的基本关系式,建立了激光辐照锗透镜的热力耦合数学物理模型,对瞬态热传导方程和应力平衡方程进行有限元数值求解,得到了锗透镜的温度场和应力场分布,并利用波长1.06 μm,脉冲宽度10 ns的Nd∶YAG脉冲激光对锗透镜进行了热冲击实验研究.数值分析表明,热应力损伤在锗透镜的脉冲强激光损伤中占据主导地位,在短脉冲激光辐照下,锗透镜出现热应力损伤的激光能量密度小于出现熔融损伤的激光能量密度,热应力损伤主要集中在光斑中心区域并体现为压应力损伤,将使材料表面出现裂纹或剥落,实验结果与数值分析基本相符.     

Plasma-mediated ablation of brain tissue with picosecond laser pulses

Plasma-mediated ablations of brain tissue have been performed using picosecond laser pulses obtained from a Nd:YLF oscillator/regenerative amplifier system. The laser pulses had a pulse duration of 35 ps at a wavelength of 1.053 µm. The pulse energy varied from 90 µJ to 550 µJ at a repetition rate of 400 Hz. The energy density at the ablation threshold was measured to be 20 J/cm². Comparisons have been made to 19 ps laser pulses at 1.68 µm and 2.92 µm from an OPG/OPA system and to microsecond pulse trains at 2.94 µm from a free running Er:YAG laser. Light microscopy and scanning electron microscopy were performed to judge the depth and the quality of the ablated cavities. No thermal damage was induced by either of the picosecond laser systems. The Er:YAG laser, on the other hand, showed 20 µm wide lateral damage zones due to the longer pulse durations and the higher pulse energies.     

激光推力器喷管热防护实验研究

 基于激光推力器喷管热烧蚀因素分析，初步提出了反射式和吸收式两种喷管热防护方法，并相应设计了两种喷管。以10 kW级脉冲式CO₂激光器为光源，三次反射激光推力器为对象，进行了两种方式下两种喷管的热防护初步实验研究。结果表明：两种喷管均发生不同程度烧蚀，与相对聚焦位置和激光作用时间有关；反射式热防护通过喷管光学表面对透射激光能量进行二次聚焦，以及良好的循环冷却，可能成为将来激光推力器喷管热防护的备选方案之一。     

Experimental and numerical investigation on structural effects of laser pulses for modal parameter measurement

In this paper it has been described part of the research devoted to the development of a complete non-intrusive experimental modal analysis procedure based on laser techniques both for excitation and for measurement. In particular, attention has been focused on the thermal effects generated by laser pulses on the excited structure. An analytical model of the energy exchange between the light pulse and the target surface is proposed together with a finite element model of thermal and mechanical behaviour of the structure under excitation. Both the models (analytical and numerical) have been experimentally validated by measuring the thermal and the vibration responses induced by the laser pulses. The experimental part of the study has been performed on a cantilever beam excited with laser pulses from an Nd : YAG source (532 nm, 100 mJ/pulse) using an high-speed infrared camera and a scanning laser Doppler vibrometer. Results from this work can be used to improve understanding concerning the features of laser excitation and to establish a mechanical equivalent system of forces and moments, useful in order to increase the accuracy in the measurements of modal parameters when laser pulses are used as excitation sources.     

Micro-ablation on silicon by femtosecond laser pulses focused with an axicon assisted with a lens

Micro-ablation of crystalline silicon was performed by irradiating a silicon substrate with femtosecond laser pulses of wavelengths 786 nm or 393 nm focused using a conical axicon assisted with a convex lens. Focusing the laser beam close to the tip of the axicon by means of the lens significantly improved the efficiency of concentration of laser pulse energy at the central spot of the resulting Bessel-Gaussian intensity distribution. As a result, micron-sized holes were formed with the diameter determined by the ablation threshold in the calculated fluence profile. It is possible to predict hole size from the laser pulse energy and the wavelength. Crystalline particles, a few tens of nanometers in size, were formed near the ablated zone.     

基于小波变换和数据融合技术的弱小目标检测

鉴于弱小目标检测所固有的难点及常用的单一分辨率下的检测方法还不能准确稳定地检测出目标，提出了一种弱小目标检测新方法。考虑到实际应用中的复杂背景和大量干扰噪声，运用数据融合技术，先对图像进行小波多分辨率分解，然后将不同分辨率下的子图进行最优加权平均融合来检测弱小目标。用实地拍摄的空中弱小目标红外和可见光图像分别进行实验验证，实验图像取256×256像素点阵大小，其中目标占10×10像素左右。结果表明该方法能够准确稳定地检测弱小目标，为后续的跟踪作了很好的铺垫。     

Excimer laser ablation of thin titanium oxide films on glass

Thin titanium dioxide films are deposited on glass substrates by magnetron sputter deposition. They are irradiated in air, by means of a KrF excimer laser. The ablation rate is measured as a function of the laser fluence per pulse, F, and of the number of pulses, N. Above a fluence threshold, the films are partially ablated. The ablated thickness does not vary linearly with N. This is the signature of a negative feedback between the film thickness and the ablation rate. The origin of this negative feedback is shown to be due to either thermal or electronic effects, or both. At high F, the film detachs from the substrate.     

Absorption and luminescence spectroscopy of fused silica by multiple pulses irradiation at 355 nm

In this work, the effects of laser irradiation on fused silica at 355 nm are investigated by using transient absorption spectroscopy and luminescence spectroscopy. Our result shows that no transient absorption or luminescence in the spectra range from 400 nm to 600 nm is observed when laser energy density is below the damage threshold. When the laser energy density reaches the threshold, an initial damage site will be created. After subsequent laser pulses irradiation, the damage size grows. At the same time, the intensity of the transient absorption and luminescence spectra at the damage site also raises remarkably with the laser pulse number increasing. The absorption band from 420 nm to 520 nm is probably related to the absorption of impurity such as metal ion of iron, cerium and copper. Laser modified fused silica exhibits intense broad luminescence bands due to oxygen-deficiency centers at 444 nm and 580 nm.